JPS6459752A - Ion source for mass spectrograph device - Google Patents

Ion source for mass spectrograph device

Info

Publication number
JPS6459752A
JPS6459752A JP62214801A JP21480187A JPS6459752A JP S6459752 A JPS6459752 A JP S6459752A JP 62214801 A JP62214801 A JP 62214801A JP 21480187 A JP21480187 A JP 21480187A JP S6459752 A JPS6459752 A JP S6459752A
Authority
JP
Japan
Prior art keywords
secondary ion
region
mass analysis
corpuscular beam
deflected
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62214801A
Other languages
Japanese (ja)
Inventor
Kiichiro Otsuka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd filed Critical Jeol Ltd
Priority to JP62214801A priority Critical patent/JPS6459752A/en
Publication of JPS6459752A publication Critical patent/JPS6459752A/en
Pending legal-status Critical Current

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  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Electron Tubes For Measurement (AREA)

Abstract

PURPOSE:To raise analysis sensitivity by providing a deflection electrode for deflecting secondary ion and introducing the deflected ion to a mass analysis site via a slit provided at the predetermined position. CONSTITUTION:A sample fed from liquid chromatograph 6 infuses to a surface through the inside of a porous member 10 via an introduction tube 7 and is ionized due to the exposure thereof to a primary corpuscular beam B. The splash region A of a solvent molecule is formed in a normal direction from the part of the porous member 10 exposed to the primary corpuscular beam B. Secondary ion generated due to the impact of the primary corpuscular beam B is deflected with a deflection electrode 8 and released from said region A. Furthermore, the secondary ion passes a slit placed off said region A and enters a mass analysis site 1. According to the aforesaid system, the secondary ion enters the mass analysis site 1 without any contamination by the solvent molecule and analysis sensitivity is thereby made higher.
JP62214801A 1987-08-28 1987-08-28 Ion source for mass spectrograph device Pending JPS6459752A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62214801A JPS6459752A (en) 1987-08-28 1987-08-28 Ion source for mass spectrograph device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62214801A JPS6459752A (en) 1987-08-28 1987-08-28 Ion source for mass spectrograph device

Publications (1)

Publication Number Publication Date
JPS6459752A true JPS6459752A (en) 1989-03-07

Family

ID=16661751

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62214801A Pending JPS6459752A (en) 1987-08-28 1987-08-28 Ion source for mass spectrograph device

Country Status (1)

Country Link
JP (1) JPS6459752A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008021504A (en) * 2006-07-12 2008-01-31 Fujitsu Ltd Irradiation direction-variable ion irradiation device, and secondary ion mass spectrometer

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008021504A (en) * 2006-07-12 2008-01-31 Fujitsu Ltd Irradiation direction-variable ion irradiation device, and secondary ion mass spectrometer

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