JPS645745B2 - - Google Patents

Info

Publication number
JPS645745B2
JPS645745B2 JP55105328A JP10532880A JPS645745B2 JP S645745 B2 JPS645745 B2 JP S645745B2 JP 55105328 A JP55105328 A JP 55105328A JP 10532880 A JP10532880 A JP 10532880A JP S645745 B2 JPS645745 B2 JP S645745B2
Authority
JP
Japan
Prior art keywords
sample
charged particle
ion
energy
energy analyzer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55105328A
Other languages
Japanese (ja)
Other versions
JPS5730254A (en
Inventor
Masabumi Jinno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Original Assignee
Shimadzu Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp filed Critical Shimadzu Corp
Priority to JP10532880A priority Critical patent/JPS5730254A/en
Publication of JPS5730254A publication Critical patent/JPS5730254A/en
Publication of JPS645745B2 publication Critical patent/JPS645745B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00Particle spectrometers or separator tubes
    • H01J49/26Mass spectrometers or separator tubes
    • H01J49/34Dynamic spectrometers
    • H01J49/42Stability-of-path spectrometers, e.g. monopole, quadrupole, multipole, farvitrons

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Electron Tubes For Measurement (AREA)

Description

【発明の詳細な説明】 本発明は切換え操作によつて複数種の表面分析
法が適用できる表面分析装置に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a surface analysis device that can apply a plurality of types of surface analysis methods by switching operations.

試料表面分析には試料をX線で照射して試料か
ら放射される光電子をエネルギー分析するX線光
電子分析、試料を電子線で照射して試料から放射
されるオージエ電子をエネルギー分析するオージ
エ電子分光、試料をイオン線で照射し、試料表面
で散乱された照射イオンのエネルギー分析を行う
イオン散乱分光、同じく試料をイオン線で照射し
イオン衝撃によつて試料から放出されるイオン
(二次イオン)の質量分析を行う二次イオン質量
分析等種々な方法があり、夫々に対して専用の装
置がある。しかしこれらの分析法は試料を真空中
に置くので、同一の試料についてこれら各種の分
析法を適用しようとすると大変手数と時間を要す
る上、試料の同一個所を各種方法で分析すると云
うことはきわめて困難であり、また試料を装置か
ら装置に移す際試料表面が空気に触れるため試料
表面が変質して各種分析法によつて得られたデー
タの総合評価を困難にする。
Sample surface analysis involves X-ray photoelectron analysis, in which the sample is irradiated with X-rays and the energy of the photoelectrons emitted from the sample is analyzed, and Auger electron spectroscopy, in which the sample is irradiated with an electron beam and the energy of Auger electrons emitted from the sample is analyzed. , Ion scattering spectroscopy, in which a sample is irradiated with an ion beam and the energy of the irradiated ions scattered on the sample surface is analyzed; Similarly, the sample is irradiated with an ion beam, and ions (secondary ions) are released from the sample due to ion bombardment. There are various methods such as secondary ion mass spectrometry for performing mass spectrometry, and there are dedicated devices for each method. However, since these analytical methods place the sample in a vacuum, applying these various analytical methods to the same sample requires a lot of effort and time, and it is extremely difficult to analyze the same part of the sample using various methods. In addition, when the sample is transferred from one device to another, the surface of the sample is exposed to air, which alters the quality of the sample surface, making it difficult to comprehensively evaluate the data obtained by various analytical methods.

このため一つ装置で上記したような各種の表面
分析法が実施できる装置が提案された。これらの
提案は試料を照射する放射線源を複合化すること
を内容としたもので、試料から出る各種放射線の
分析に関しては各種分析用の装置を試料の周囲に
配置する方針であるため、装置が大型化すると云
う問題がある。
For this reason, an apparatus has been proposed that can perform the various surface analysis methods described above with one apparatus. These proposals are based on combining the radiation sources that irradiate the sample, and the plan is to place various analytical devices around the sample in order to analyze the various types of radiation emitted from the sample. There is a problem with increasing the size.

従つて本発明は一台で上述したような各種表面
分析法が実施できる表面分析装置の小型化を目的
としてなされた。
Therefore, the present invention has been made with the aim of downsizing a surface analysis device that can perform the various surface analysis methods described above with a single device.

上述したような各種表面分析法において試料か
ら放射される放射線を分析する部分は、荷電粒子
線のエネルギー分析器、イオン質量分析器及び荷
電粒子検出器を構成要素としており、X線光電子
分析、オージエ電子分光では質量分析器が不要で
あり、イオン散乱分光では質量分析器は原理的に
は不要であるが、これがある方が良い場合(散乱
イオンと二次イオンのエネルギーが近接している
ような場合)があり、二次イオン質量分析ではエ
ネルギー分析器と質量分析器との直列配置が用い
られる。
In the various surface analysis methods mentioned above, the part that analyzes the radiation emitted from the sample consists of a charged particle beam energy analyzer, an ion mass analyzer, and a charged particle detector. Electron spectroscopy does not require a mass spectrometer, and ion scattering spectroscopy does not require a mass spectrometer in principle, but there are cases where it is better to have one (such as when the scattered ions and secondary ions have close energies) secondary ion mass spectrometry uses a series arrangement of an energy analyzer and a mass analyzer.

本発明は分析法によつて構成要素の組合せが異
なる放射線分析部の複合化を計るもので、試料を
照射する放射線源の複合化を前提として静電型エ
ネルギー分析器の後方に揺動フレームを配置し、
このフレーム上に揺動中心を中心とする2つの半
径方向に沿つてその一方に四重極質量分析器と荷
電粒子検出器の直列配置を、他の一つに荷電粒子
検出器を単独に設け、これらの何れかをエネルギ
ー分析器の後方に位置せしめ得るようにした表面
分析装置を提供するものである。以下実施例によ
つて本発明を説明する。
The present invention aims to integrate a radiation analysis section with different combinations of components depending on the analysis method, and is based on the assumption that the radiation source that irradiates the sample will be integrated, and a swinging frame is installed behind the electrostatic energy analyzer. place,
On this frame, a quadrupole mass spectrometer and a charged particle detector are arranged in series on one side along two radial directions centered on the center of oscillation, and a charged particle detector is installed independently on the other one. The present invention provides a surface analysis device in which any one of these can be positioned behind an energy analyzer. The present invention will be explained below with reference to Examples.

図は本発明の一実施例装置を示す。1は電子
銃、2はX線源、3はイオン銃で夫々試料4に電
子ビーム、X線ビーム、イオンビームを投射す
る。電子銃1とイオン銃3とは試料4に対して異
なる方向に配置されているが、これらは直列的に
配置して粒子線光学系を共通にすることができ
る。試料4からは照射する放射線の種類に応じて
種々な放射線が発射され荷電粒子線エネルギー分
析器5に入射する。荷電粒子線エネルギー分析器
5は静電型であつて例えば同心二重球殻電極間に
電圧を印加するものである。静電型エネルギー分
析器は荷電粒子の質量には全く影響を受けないか
ら、イオン、電子何れにも電極に印加する電圧の
方向を変えるだけでそのまゝ適用できる。荷電粒
子の入射方向と出射方向は異なつているが図では
便宜上両者を一直線上に画いてある。6は荷電粒
子線エネルギー分析器5の後(粒子線出射側)に
配置された揺動フレームで支点ピン12を中心に
揺動できる。フレーム6にはピン12を中心とす
る扇形端縁に2つのスリツト10,11が設けて
あり、スリツト10とピン12とを結ぶ一つの半
径線上でスリツト10の後に電子増倍管7が取付
けてあり、またスリツト11とピン12を結ぶも
う一つの半径線上にはスリツト11の後方に四重
極質量分析器8と電子増倍管9の直列配列が設け
てある。フレーム6を揺動させることにより上記
2つの半径線の何れかを荷電粒子線エネルギー分
析器5の出射粒子線束の中心線と一致させること
ができる。13はフレーム6を表面分析装置の真
空器壁14の外から操作するロツドでベロー15
によつてロツド13と器壁14との間の気密を保
つている。16はフレームのロツド13とは反対
の側にある圧力バランス用のベローである。
The figure shows an embodiment of the invention. 1 is an electron gun, 2 is an X-ray source, and 3 is an ion gun, each of which projects an electron beam, an X-ray beam, and an ion beam onto a sample 4, respectively. Although the electron gun 1 and the ion gun 3 are arranged in different directions with respect to the sample 4, they can be arranged in series to share a particle beam optical system. Various types of radiation are emitted from the sample 4 depending on the type of radiation to be irradiated and enter the charged particle beam energy analyzer 5. The charged particle beam energy analyzer 5 is of an electrostatic type, and applies a voltage between, for example, concentric double spherical shell electrodes. Since electrostatic energy analyzers are completely unaffected by the mass of charged particles, they can be applied to either ions or electrons by simply changing the direction of the voltage applied to the electrodes. Although the incident direction and the outgoing direction of charged particles are different, they are drawn on a straight line in the figure for convenience. Reference numeral 6 denotes a swinging frame arranged after the charged particle beam energy analyzer 5 (on the particle beam emission side) and can swing around a fulcrum pin 12 . Two slits 10 and 11 are provided in the frame 6 at the fan-shaped edge with the pin 12 at the center, and an electron multiplier tube 7 is installed after the slit 10 on one radius line connecting the slit 10 and the pin 12. On another radial line connecting the slit 11 and the pin 12, a quadrupole mass spectrometer 8 and an electron multiplier 9 are arranged in series behind the slit 11. By swinging the frame 6, either of the two radius lines can be made to coincide with the center line of the particle beam flux emitted from the charged particle beam energy analyzer 5. 13 is a rod for operating the frame 6 from outside the vacuum vessel wall 14 of the surface analysis device; and a bellows 15
This maintains airtightness between the rod 13 and the vessel wall 14. 16 is a bellows for pressure balance on the opposite side of the frame from the rod 13.

図はスリツト11を通る半径線は荷電粒子エネ
ルギー分析器5の出射粒子線束の中心線と一致し
ている状態を示し、この場合イオン銃3を作動さ
せてHe等の稀ガスのイオンビームで試料4を照
射し、試料から出る二次イオンをエネルギー分析
器5によつてエネルギー選別した後スリツト11
を通して四重極質量分析器8に入射させて質量分
離を行つて電子増倍管9で検出することにより二
次イオン質量分析ができる。フレーム6を矢印方
向に回動させてスリツト10を通る半径線をエネ
ルギー分析器5の出射粒子線束の中心線と合せた
場合は、イオン銃3を作動させて試料4から放射
される散乱イオンをエネルギー分析器5でエネル
ギー選別し、エネルギー走査を行つて分析器5か
ら出たイオンをスリツト10を通して電子増倍管
7で検出することによりイオン散乱分光分析が実
施できる。また電子銃1或はX線源2を作動させ
て試料4を電子ビーム或はX線で照射し試料から
放射される電子をエネルギー分析器5でエネルギ
ー走査をしながらエネルギー分離してスリツト1
0を通して電子増倍管7で検出することによりオ
ージエ電子分光分析或はX線光電子分光分析が実
施できる。これらの場合エネルギー分析器5の電
極間に印加する電圧の極性をイオンのエネルギー
分析を行う場合と逆にする。なお前述したイオン
散乱分光分析で照射イオンの試料により散乱され
たイオンと試料自体を構成していた原子から生じ
た2次イオンのエネルギーが近接していてエネル
ギースペクトルの上で両者を識別し難いときはス
リツト11をエネルギー分析器5の後方に位置さ
せる図示の状態とし、エネルギー分析されたイオ
ンを更に質量分離して2次イオンを除き散乱イオ
ンのみを電子増倍管9で検出すると云う方法を採
ることができる。
The figure shows a state in which the radial line passing through the slit 11 coincides with the center line of the emitted particle beam from the charged particle energy analyzer 5. In this case, the ion gun 3 is operated and the ion beam of rare gas such as He is used to sample the sample. 4, and the secondary ions emitted from the sample are energy-selected by the energy analyzer 5, and then the slit 11
Secondary ion mass spectrometry can be performed by making the ions enter a quadrupole mass spectrometer 8 through the ion beam, performing mass separation, and detecting with an electron multiplier tube 9. When the frame 6 is rotated in the direction of the arrow to align the radius line passing through the slit 10 with the center line of the emitted particle beam flux of the energy analyzer 5, the ion gun 3 is activated to detect scattered ions emitted from the sample 4. Ion scattering spectroscopic analysis can be carried out by selecting energy with an energy analyzer 5, performing energy scanning, and detecting the ions emitted from the analyzer 5 through a slit 10 with an electron multiplier 7. In addition, the electron gun 1 or the X-ray source 2 is operated to irradiate the sample 4 with an electron beam or X-rays, and the energy of the electrons emitted from the sample is separated while being scanned by the energy analyzer 5.
Auger electron spectroscopy or X-ray photoelectron spectroscopy can be carried out by detecting with an electron multiplier tube 7 through 0. In these cases, the polarity of the voltage applied between the electrodes of the energy analyzer 5 is reversed to that when performing ion energy analysis. In addition, in the above-mentioned ion scattering spectroscopic analysis, when the energies of the ions scattered by the sample of irradiated ions and the secondary ions generated from the atoms that made up the sample itself are close to each other, it is difficult to distinguish between the two on the energy spectrum. In this method, the slit 11 is positioned behind the energy analyzer 5 as shown in the figure, and the energy-analyzed ions are further mass-separated, secondary ions are removed, and only the scattered ions are detected by the electron multiplier 9. be able to.

本発明表面分析装置は上述したような構成で、
一つの装置で簡単な切換え操作で各種の表面分析
ができ、それらの分析のための放射線分析部が荷
電粒子エネルギー分折部を共通にし、その後方に
位置する部分のみを揺動フレームに取付けて交換
可能にしたから装置構成が簡単でかつ小型にでき
る。
The surface analysis device of the present invention has the above-mentioned configuration,
A single device can perform various types of surface analysis with simple switching operations, and the radiation analysis section for these analyzes uses a common charged particle energy dispersion section, and only the section located behind it is mounted on a swinging frame. Since the device is replaceable, the device configuration can be made simple and compact.

【図面の簡単な説明】[Brief explanation of drawings]

図面は本発明の一実施例装置の要部を示す正面
図である。 1……電子銃、2……X線源、3……イオン
銃、4……試料、5……荷電粒子エネルギー分析
器、6……揺動フレーム、7,9……電子増倍
管、8……四重極質分析器、10,11……スリ
ツト。
The drawing is a front view showing essential parts of an apparatus according to an embodiment of the present invention. 1... Electron gun, 2... X-ray source, 3... Ion gun, 4... Sample, 5... Charged particle energy analyzer, 6... Oscillating frame, 7, 9... Electron multiplier, 8...quadrupole analyzer, 10,11...slit.

Claims (1)

【特許請求の範囲】[Claims] 1 試料を電子線、イオン線、X線等で照射する
ための電子線源、イオン線源、X線源等を有し、
試料から放射される各種放射線を分析する手段と
して上記各種放射線が入射せしめられる荷電粒子
エネルギー分析器を設け、その後方に揺動フレー
ムを配置し、このフレーム上にその揺動中心を中
心とする二つの半径方向に沿つて、その一方に四
重極質量分析器と荷電粒子検出器の直列配置を他
の一つには荷電粒子検出器を単独に取付け、これ
らの何れかを上記荷電粒子エネルギー分析器の後
方に位置せしめ得るようにした複合型表面分析装
置。
1. Equipped with an electron beam source, ion beam source, X-ray source, etc. for irradiating the sample with electron beams, ion beams, X-rays, etc.
As a means of analyzing various types of radiation emitted from a sample, a charged particle energy analyzer into which the various types of radiation mentioned above are incident is provided, and a swinging frame is placed behind it, and two sensors are placed on this frame, with the center of swing being the center of the charged particle energy analyzer. A quadrupole mass spectrometer and a charged particle detector are installed in series along one radial direction, and a charged particle detector is installed independently on the other, and one of these is used for the above-mentioned charged particle energy analysis. A composite surface analysis device that can be placed at the rear of the instrument.
JP10532880A 1980-07-30 1980-07-30 Complex surface analyzer Granted JPS5730254A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10532880A JPS5730254A (en) 1980-07-30 1980-07-30 Complex surface analyzer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10532880A JPS5730254A (en) 1980-07-30 1980-07-30 Complex surface analyzer

Publications (2)

Publication Number Publication Date
JPS5730254A JPS5730254A (en) 1982-02-18
JPS645745B2 true JPS645745B2 (en) 1989-01-31

Family

ID=14404647

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10532880A Granted JPS5730254A (en) 1980-07-30 1980-07-30 Complex surface analyzer

Country Status (1)

Country Link
JP (1) JPS5730254A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0725124B2 (en) * 1988-09-08 1995-03-22 積水化成品工業株式会社 Cooling device for resin molding

Also Published As

Publication number Publication date
JPS5730254A (en) 1982-02-18

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