JPS6456870A - Thin film forming device - Google Patents

Abstract

PURPOSE:To form a good-quality thin film at high velocity with high efficiency by successively providing the waveguide of microwave, a vacuum waveguide, a plasma formation chamber and a sample chamber under specified conditions and constituting a thin film forming device. CONSTITUTION:A vacuum chamber 4 consists of a vacuum waveguide 10, a plasma formation chamber 11, the end part 16 thereof and a sample chamber 9 and the waveguide 10 is made to an L-shape and connected with the waveguide 7 of microwave via a window 6 and both a yoke 12 made of magnetic soft iron for absorbing a magnetic flux and electromagnets 8 for generating a magnetic field are provided around the waveguide 10. Further the formation chamber 11 has diameter and length for forming a microwave cavity resonator in which microwave is resonated and the electromagnets 8 more than a pair are provided to the outer peripheral both ends and a mirror field is formed so that magnetic flux density is made extremely small. Furthermore a cylindrical target 13 for impressing negative voltage is provided to the inner wall of the formation chamber 11 and ring-shaped permanent magnets 14 more than a pair having reversed polarities are provided to the outsides of the upper and lower both ends of the target 13 and a magnetic flux is leaked to the inside surface of the target 13 and a substrate 2 is placed on a base plate holder of the sample chamber 9. Thereby a high-purity thin film having good quality is formed on the low-temp. substrate 2.