JPS6455381A - Plasma treatment device - Google Patents

Plasma treatment device

Info

Publication number
JPS6455381A
JPS6455381A JP21008687A JP21008687A JPS6455381A JP S6455381 A JPS6455381 A JP S6455381A JP 21008687 A JP21008687 A JP 21008687A JP 21008687 A JP21008687 A JP 21008687A JP S6455381 A JPS6455381 A JP S6455381A
Authority
JP
Japan
Prior art keywords
electromagnet
vacuum tank
treated
film thickness
changed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP21008687A
Other languages
Japanese (ja)
Inventor
Hiroyuki Tanimoto
Masaya Tokai
Shinobu Ezaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP21008687A priority Critical patent/JPS6455381A/en
Publication of JPS6455381A publication Critical patent/JPS6455381A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To change a plasma region on a raw film material and to improve the distribution characteristics of film thickness by changing the relative position of a magnet and the raw film material which are arranged on the same central axis by a regulating means. CONSTITUTION:When electric power is fed to an electromagnet 5 provided to a vacuum exhauster 2 from an electric source 6 for a coil, plasma generated in a vacuum tank 1 is trapped. A material 9 to be treated is continuously carried into the vacuum tank 1 and carried out from the vacuum tank 1 via a treating roll 10. In this case, the attitude of the electromagnet 5 is changed via a coil supporting base 18 by operating jack bolts 19 provided to the bottom of a casing 14 and both the electromagnet 5 and a target 7 are relatively tilted. Thereby a plasma region can be changed and the distribution of film thickness stuck on the material 9 to be treated can be uniformized.
JP21008687A 1987-08-26 1987-08-26 Plasma treatment device Pending JPS6455381A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21008687A JPS6455381A (en) 1987-08-26 1987-08-26 Plasma treatment device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21008687A JPS6455381A (en) 1987-08-26 1987-08-26 Plasma treatment device

Publications (1)

Publication Number Publication Date
JPS6455381A true JPS6455381A (en) 1989-03-02

Family

ID=16583587

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21008687A Pending JPS6455381A (en) 1987-08-26 1987-08-26 Plasma treatment device

Country Status (1)

Country Link
JP (1) JPS6455381A (en)

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