JPS6454238A - Judgement on crystallization near surface of amorphous alloy - Google Patents
Judgement on crystallization near surface of amorphous alloyInfo
- Publication number
- JPS6454238A JPS6454238A JP62211076A JP21107687A JPS6454238A JP S6454238 A JPS6454238 A JP S6454238A JP 62211076 A JP62211076 A JP 62211076A JP 21107687 A JP21107687 A JP 21107687A JP S6454238 A JPS6454238 A JP S6454238A
- Authority
- JP
- Japan
- Prior art keywords
- rays
- crystallization
- amorphous alloy
- diffraction
- sample
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Analysing Materials By The Use Of Radiation (AREA)
Abstract
PURPOSE:To enable accurate judgement on the occurrence of crystallization even when oriented crystallization occurs in an amorphous alloy, by combining a thin film X ray diffraction spectrum and a symmetrical reflection X ray diffraction spectrum. CONSTITUTION:X rays radiated from an X ray source 10 are made incident into the surface of a sample 12A of an amorphous alloy at an angle alpha through a solar slit 16, where the angle alpha of incidence is set below 6 deg., which enables a reduction in the penetration depth of the X rays. Diffraction X rays from the surface of the sample 12A is detected with a detector 14 through the solar slit 18 to judge crystallization near the surface of the alloy from intensity of diffraction X rays. A symmetrical reflection method is employed for a highly oriented amorphous alloy to measure the diffraction X rays as diffracted at a symmetrical position with normal of the surface of the sample in the angle in combination with a low angle fixed X ray diffraction method, thereby obtaining a finding regarding not only crystallization but also the orientation of a crystallized object.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62211076A JPS6454238A (en) | 1987-08-25 | 1987-08-25 | Judgement on crystallization near surface of amorphous alloy |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62211076A JPS6454238A (en) | 1987-08-25 | 1987-08-25 | Judgement on crystallization near surface of amorphous alloy |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6454238A true JPS6454238A (en) | 1989-03-01 |
Family
ID=16600008
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62211076A Pending JPS6454238A (en) | 1987-08-25 | 1987-08-25 | Judgement on crystallization near surface of amorphous alloy |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6454238A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1151882A (en) * | 1997-08-07 | 1999-02-26 | Fujitsu Ltd | Method and device for measuring x-ray reflectance, magnetic sensor and its manufacture |
| CN110749573A (en) * | 2019-11-21 | 2020-02-04 | 山东建筑大学 | In-situ synchrotron radiation characterization method for amorphous alloy crystallization kinetic characteristics |
-
1987
- 1987-08-25 JP JP62211076A patent/JPS6454238A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1151882A (en) * | 1997-08-07 | 1999-02-26 | Fujitsu Ltd | Method and device for measuring x-ray reflectance, magnetic sensor and its manufacture |
| CN110749573A (en) * | 2019-11-21 | 2020-02-04 | 山东建筑大学 | In-situ synchrotron radiation characterization method for amorphous alloy crystallization kinetic characteristics |
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