JPS64523U - - Google Patents
Info
- Publication number
- JPS64523U JPS64523U JP9583187U JP9583187U JPS64523U JP S64523 U JPS64523 U JP S64523U JP 9583187 U JP9583187 U JP 9583187U JP 9583187 U JP9583187 U JP 9583187U JP S64523 U JPS64523 U JP S64523U
- Authority
- JP
- Japan
- Prior art keywords
- plate
- gas introduction
- introduction means
- transfer mechanism
- wafer transfer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims description 3
- 239000004809 Teflon Substances 0.000 claims description 2
- 229920006362 Teflon® Polymers 0.000 claims description 2
- 229910052782 aluminium Inorganic materials 0.000 claims 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 1
Landscapes
- Delivering By Means Of Belts And Rollers (AREA)
Description
第１図は本考案のウエハ搬送機構の一例を示す
概要断面図であり、第２図は従来のウエハ搬送機
構の一例を示す概要断面図である。
１…金属製台座、２…テフロン板、３…ガス導
入手段、４…エアーチユーブ接続ノズル、５…ガ
ス導路、６…貫通斜孔、７…エアベアツギテ。
FIG. 1 is a schematic sectional view showing an example of a wafer transfer mechanism of the present invention, and FIG. 2 is a schematic sectional view showing an example of a conventional wafer transfer mechanism. DESCRIPTION OF SYMBOLS 1...Metal pedestal, 2...Teflon plate, 3...Gas introducing means, 4...Air tube connection nozzle, 5...Gas guide path, 6...Through oblique hole, 7...Air bearing fitting.
Claims (1)
属製台座の上面に所定の厚さのフツ素樹脂の板を
配設し、該フツ素樹脂板には前記ガス導入手段と
同じ間隔で、該ガス導入手段に連通する貫通斜孔
を有する金属製の部材が埋設されていることを特
徴とするウエハ搬送機構。 (2) 金属製台座はアルミニウム板であり、フツ
素樹脂板はテフロン板である実用新案登録請求の
範囲第１項に記載のウエハ搬送機構。[Scope of Claim for Utility Model Registration] (1) A fluororesin plate of a predetermined thickness is arranged on the upper surface of a metal pedestal on which gas introduction means are arranged at predetermined intervals, and the fluororesin plate is A wafer transfer mechanism characterized in that a metal member having diagonal through holes communicating with the gas introduction means is buried at the same interval as the gas introduction means. (2) The wafer transfer mechanism according to claim 1, wherein the metal pedestal is an aluminum plate and the fluororesin plate is a Teflon plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9583187U JPS64523U (en) | 1987-06-22 | 1987-06-22 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9583187U JPS64523U (en) | 1987-06-22 | 1987-06-22 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS64523U true JPS64523U (en) | 1989-01-05 |
Family
ID=30960895
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9583187U Pending JPS64523U (en) | 1987-06-22 | 1987-06-22 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS64523U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007517649A (en) * | 2004-01-16 | 2007-07-05 | アトテック・ドイチュラント・ゲーエムベーハー | Nozzle arrangement and method for treatment of workpieces on treatment media |
-
1987
- 1987-06-22 JP JP9583187U patent/JPS64523U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007517649A (en) * | 2004-01-16 | 2007-07-05 | アトテック・ドイチュラント・ゲーエムベーハー | Nozzle arrangement and method for treatment of workpieces on treatment media |