JPS6447017A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPS6447017A JPS6447017A JP20356787A JP20356787A JPS6447017A JP S6447017 A JPS6447017 A JP S6447017A JP 20356787 A JP20356787 A JP 20356787A JP 20356787 A JP20356787 A JP 20356787A JP S6447017 A JPS6447017 A JP S6447017A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- jig
- semispherical
- leading
- quartz tube
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE:To improve the substitution of gas by mixing gasses evenly by a method wherein the tubular part of a heat-resistant jig with its end semispherically expanded is engaged with a gas leading-in part of a quartz tube while leading-in gas is agitated in the semispherical parts of the jig to be led in the quartz tube as laminar flow. CONSTITUTION:A jig 21 comprising a tubular part 22 and an expanding semispherical part 23 is manufactured so that the tubular part 22 may be engaged with a gas leading-in part 11a of a quartz tube 11 as well as the jig 21 may open a door 17 to be engaged with the gas leading-in part 11a of the quartz tube 11. The outlet end 24 of expanded part in medium density is porous- structured while the tubular part 22 and the spherical part of the semispherical part in high density is gas intransmissive-structured. When the jig 21 is filled with leading-in gas and grain dust 25, the dust 25 is arrested inside the porous outlet end 24 to feed the furnace with clean gas 26. In such a constitution, the gas led in the semispherical part 23 as turbulence can be decelerated in the semispherical part to be sufficiently agitated for feeding to the furnace as laminar flow.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20356787A JPS6447017A (en) | 1987-08-18 | 1987-08-18 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20356787A JPS6447017A (en) | 1987-08-18 | 1987-08-18 | Manufacture of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6447017A true JPS6447017A (en) | 1989-02-21 |
Family
ID=16476265
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP20356787A Pending JPS6447017A (en) | 1987-08-18 | 1987-08-18 | Manufacture of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6447017A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007521633A (en) * | 2003-08-20 | 2007-08-02 | ビーコ・インストゥルメンツ・インコーポレイテッド | Alkyl push airflow for vertical flow rotating disk reactor |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61284915A (en) * | 1985-06-11 | 1986-12-15 | Matsushita Electric Ind Co Ltd | Thin film vapor growth apparatus |
JPS62111418A (en) * | 1985-11-08 | 1987-05-22 | Matsushita Electric Ind Co Ltd | Vapor growth apparatus |
-
1987
- 1987-08-18 JP JP20356787A patent/JPS6447017A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61284915A (en) * | 1985-06-11 | 1986-12-15 | Matsushita Electric Ind Co Ltd | Thin film vapor growth apparatus |
JPS62111418A (en) * | 1985-11-08 | 1987-05-22 | Matsushita Electric Ind Co Ltd | Vapor growth apparatus |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007521633A (en) * | 2003-08-20 | 2007-08-02 | ビーコ・インストゥルメンツ・インコーポレイテッド | Alkyl push airflow for vertical flow rotating disk reactor |
US9982362B2 (en) | 2003-08-20 | 2018-05-29 | Veeco Instruments Inc. | Density-matching alkyl push flow for vertical flow rotating disk reactors |
US10364509B2 (en) | 2003-08-20 | 2019-07-30 | Veeco Instruments Inc. | Alkyl push flow for vertical flow rotating disk reactors |
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