JPS644672A - Positive photosensitive anionic electrocoating composition - Google Patents

Positive photosensitive anionic electrocoating composition

Info

Publication number
JPS644672A
JPS644672A JP15784287A JP15784287A JPS644672A JP S644672 A JPS644672 A JP S644672A JP 15784287 A JP15784287 A JP 15784287A JP 15784287 A JP15784287 A JP 15784287A JP S644672 A JPS644672 A JP S644672A
Authority
JP
Japan
Prior art keywords
unsaturated monomer
group
unsaturated
halide
positive photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15784287A
Other languages
Japanese (ja)
Inventor
Takeshi Akagi
Kenji Seko
Toshio Kondo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kansai Paint Co Ltd
Original Assignee
Kansai Paint Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kansai Paint Co Ltd filed Critical Kansai Paint Co Ltd
Priority to JP15784287A priority Critical patent/JPS644672A/en
Publication of JPS644672A publication Critical patent/JPS644672A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Paints Or Removers (AREA)

Abstract

PURPOSE:To obtain the title composition excellent in sensitivity to ultraviolet rays and capable of forming a developable, smooth, nonsticky film on a copper- clad laminate, containing a specified anionic vinyl resin. CONSTITUTION:An unsaturated monomer (A) is obtained by addition- polycondensing 1mol. of an unsaturated monomer (a) having one polymerizable unsaturated group and 1sec amino group in the molecule with 0.01-5mol. of benzoquinonediazidosulfonyl halide and/or a naphthoquinonediazidosulfonyl halide (b) at room temperature to 80 deg.C for 10min-6hr. 5-98wt.% component A is copolymerized with 2-60wt.% at least one unsaturated monomer (B) selected from among carboxyl group-containing, phosphoric acid group-containing and sulfonic acid group-containing unsaturated monomers and 0-90wt.% monoethylenically unsaturated monomer (C) at 30-120 deg.C for 2-20hr in an organic solvent to obtain an anionic vinyl resin. After this resin is neutralized, it is dispersed or dissolved in water.
JP15784287A 1987-06-26 1987-06-26 Positive photosensitive anionic electrocoating composition Pending JPS644672A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15784287A JPS644672A (en) 1987-06-26 1987-06-26 Positive photosensitive anionic electrocoating composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15784287A JPS644672A (en) 1987-06-26 1987-06-26 Positive photosensitive anionic electrocoating composition

Publications (1)

Publication Number Publication Date
JPS644672A true JPS644672A (en) 1989-01-09

Family

ID=15658540

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15784287A Pending JPS644672A (en) 1987-06-26 1987-06-26 Positive photosensitive anionic electrocoating composition

Country Status (1)

Country Link
JP (1) JPS644672A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0358049A (en) * 1989-07-27 1991-03-13 Fuji Photo Film Co Ltd Photosensitive composition
US5102519A (en) * 1989-05-16 1992-04-07 Kansai Paint Co., Ltd. Process for preparing a printed-circuit board
US5223373A (en) * 1991-04-29 1993-06-29 Industrial Technology Research Institute Positive working photosensitive composition and photosensitive electrodeposition composition prepared therefrom
US5236810A (en) * 1989-10-03 1993-08-17 Kansai Paint Co., Ltd. Process for preparing printed-circuit board

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5102519A (en) * 1989-05-16 1992-04-07 Kansai Paint Co., Ltd. Process for preparing a printed-circuit board
JPH0358049A (en) * 1989-07-27 1991-03-13 Fuji Photo Film Co Ltd Photosensitive composition
US5236810A (en) * 1989-10-03 1993-08-17 Kansai Paint Co., Ltd. Process for preparing printed-circuit board
US5223373A (en) * 1991-04-29 1993-06-29 Industrial Technology Research Institute Positive working photosensitive composition and photosensitive electrodeposition composition prepared therefrom

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