JPS6445160U - - Google Patents
Info
- Publication number
- JPS6445160U JPS6445160U JP13613587U JP13613587U JPS6445160U JP S6445160 U JPS6445160 U JP S6445160U JP 13613587 U JP13613587 U JP 13613587U JP 13613587 U JP13613587 U JP 13613587U JP S6445160 U JPS6445160 U JP S6445160U
- Authority
- JP
- Japan
- Prior art keywords
- mask
- opening
- substrate
- expands
- film forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 2
- 239000012528 membrane Substances 0.000 claims 1
- 230000015572 biosynthetic process Effects 0.000 description 1
Description
第１図は本考案による成膜マスクの一実施例を
示し、Ａは概略斜視図、同Ｂは断面図である。第
２図は従来の成膜マスクの一例を示す概略断面図
である。
１０……成膜マスク、１１……第一マスク、１
１ａ，１２ａ……開口部、１２……第二のマスク
、Ｓ……基板。
FIG. 1 shows an embodiment of a film forming mask according to the present invention, in which A is a schematic perspective view and B is a sectional view. FIG. 2 is a schematic cross-sectional view showing an example of a conventional film-forming mask. 10... Film formation mask, 11... First mask, 1
1a, 12a...opening, 12...second mask, S...substrate.
Claims (1)
第一のマスクと、該第一のマスク上に重ねられる
比較的厚い第二のマスクとから成り、上記第一の
マスクが形成すべき膜の形状と同じ形状の少なく
とも一つの開口部を有しており、上記第二のマス
クが前記第一のマスクの開口部に対応し且つ該開
口部よりやや大きく選定されていて上方に向かつ
てテーパー状に広がる開口部を有していることを
特徴とする成膜マスク。 It consists of a relatively thin first mask placed on the substrate to be deposited, and a relatively thick second mask superimposed on the first mask, and the first mask is to be formed. The second mask has at least one opening having the same shape as the membrane, and the second mask corresponds to the opening of the first mask, is selected to be slightly larger than the opening, and is directed upward. A film forming mask characterized by having an opening that expands in a tapered shape.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13613587U JPS6445160U (en) | 1987-09-05 | 1987-09-05 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13613587U JPS6445160U (en) | 1987-09-05 | 1987-09-05 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6445160U true JPS6445160U (en) | 1989-03-17 |
Family
ID=31396360
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13613587U Pending JPS6445160U (en) | 1987-09-05 | 1987-09-05 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6445160U (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004190057A (en) * | 2002-12-09 | 2004-07-08 | Nippon Filcon Co Ltd | Mask for forming thin film pattern of lamination structure comprising patterned mask film and supporting body, and its manufacturing method |
| JP2004235138A (en) * | 2003-01-09 | 2004-08-19 | Hitachi Ltd | Method for manufacturing organic el panel, and organic el panel |
| JP2004232025A (en) * | 2003-01-30 | 2004-08-19 | Ulvac Japan Ltd | Mask for vapor deposition and production method therefor |
| JP2014214367A (en) * | 2013-04-26 | 2014-11-17 | コニカミノルタ株式会社 | Plasma cvd film depositing mask, plasma cvd film depositing method, and organic electroluminescent element |
| JP2014214366A (en) * | 2013-04-26 | 2014-11-17 | コニカミノルタ株式会社 | Plasma cvd film depositing mask, plasma cvd film depositing method, and organic electroluminescent element |
| WO2015034097A1 (en) * | 2013-09-09 | 2015-03-12 | 株式会社ブイ・テクノロジー | Film formation mask, film formation device, film formation method, and touch panel substrate |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5727047A (en) * | 1980-07-25 | 1982-02-13 | Seiko Epson Corp | Semiconductor device |
| JPS5956579A (en) * | 1982-09-24 | 1984-04-02 | Fujitsu Ltd | Compound metal mask |
-
1987
- 1987-09-05 JP JP13613587U patent/JPS6445160U/ja active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5727047A (en) * | 1980-07-25 | 1982-02-13 | Seiko Epson Corp | Semiconductor device |
| JPS5956579A (en) * | 1982-09-24 | 1984-04-02 | Fujitsu Ltd | Compound metal mask |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004190057A (en) * | 2002-12-09 | 2004-07-08 | Nippon Filcon Co Ltd | Mask for forming thin film pattern of lamination structure comprising patterned mask film and supporting body, and its manufacturing method |
| JP2004235138A (en) * | 2003-01-09 | 2004-08-19 | Hitachi Ltd | Method for manufacturing organic el panel, and organic el panel |
| JP2004232025A (en) * | 2003-01-30 | 2004-08-19 | Ulvac Japan Ltd | Mask for vapor deposition and production method therefor |
| JP4547130B2 (en) * | 2003-01-30 | 2010-09-22 | 株式会社アルバック | Manufacturing method of vapor deposition mask |
| JP2014214367A (en) * | 2013-04-26 | 2014-11-17 | コニカミノルタ株式会社 | Plasma cvd film depositing mask, plasma cvd film depositing method, and organic electroluminescent element |
| JP2014214366A (en) * | 2013-04-26 | 2014-11-17 | コニカミノルタ株式会社 | Plasma cvd film depositing mask, plasma cvd film depositing method, and organic electroluminescent element |
| WO2015034097A1 (en) * | 2013-09-09 | 2015-03-12 | 株式会社ブイ・テクノロジー | Film formation mask, film formation device, film formation method, and touch panel substrate |
| JP2015052162A (en) * | 2013-09-09 | 2015-03-19 | 株式会社ブイ・テクノロジー | Film deposition mask, film deposition apparatus, film deposition method and touch panel substrate |
| CN105531394A (en) * | 2013-09-09 | 2016-04-27 | 株式会社V技术 | Film formation mask, film formation device, film formation method, and touch panel substrate |