JPS6445160U - - Google Patents

Info

Publication number
JPS6445160U
JPS6445160U JP13613587U JP13613587U JPS6445160U JP S6445160 U JPS6445160 U JP S6445160U JP 13613587 U JP13613587 U JP 13613587U JP 13613587 U JP13613587 U JP 13613587U JP S6445160 U JPS6445160 U JP S6445160U
Authority
JP
Japan
Prior art keywords
mask
opening
substrate
expands
film forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13613587U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP13613587U priority Critical patent/JPS6445160U/ja
Publication of JPS6445160U publication Critical patent/JPS6445160U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
JP13613587U 1987-09-05 1987-09-05 Pending JPS6445160U (US20030204162A1-20031030-M00001.png)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13613587U JPS6445160U (US20030204162A1-20031030-M00001.png) 1987-09-05 1987-09-05

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13613587U JPS6445160U (US20030204162A1-20031030-M00001.png) 1987-09-05 1987-09-05

Publications (1)

Publication Number Publication Date
JPS6445160U true JPS6445160U (US20030204162A1-20031030-M00001.png) 1989-03-17

Family

ID=31396360

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13613587U Pending JPS6445160U (US20030204162A1-20031030-M00001.png) 1987-09-05 1987-09-05

Country Status (1)

Country Link
JP (1) JPS6445160U (US20030204162A1-20031030-M00001.png)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004190057A (ja) * 2002-12-09 2004-07-08 Nippon Filcon Co Ltd パターニングされたマスク被膜と支持体からなる積層構造の薄膜パターン形成用マスク及びその製造方法
JP2004232025A (ja) * 2003-01-30 2004-08-19 Ulvac Japan Ltd 蒸着用マスクおよびその製造方法
JP2004235138A (ja) * 2003-01-09 2004-08-19 Hitachi Ltd 有機elパネルの製造方法および有機elパネル
JP2014214366A (ja) * 2013-04-26 2014-11-17 コニカミノルタ株式会社 プラズマcvd成膜用マスク、プラズマcvd成膜方法、及び有機エレクトロルミネッセンス素子
JP2014214367A (ja) * 2013-04-26 2014-11-17 コニカミノルタ株式会社 プラズマcvd成膜用マスク、プラズマcvd成膜方法、及び有機エレクトロルミネッセンス素子
WO2015034097A1 (ja) * 2013-09-09 2015-03-12 株式会社ブイ・テクノロジー 成膜マスク、成膜装置、成膜方法及びタッチパネル基板

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5727047A (en) * 1980-07-25 1982-02-13 Seiko Epson Corp Semiconductor device
JPS5956579A (ja) * 1982-09-24 1984-04-02 Fujitsu Ltd 複合メタルマスク

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5727047A (en) * 1980-07-25 1982-02-13 Seiko Epson Corp Semiconductor device
JPS5956579A (ja) * 1982-09-24 1984-04-02 Fujitsu Ltd 複合メタルマスク

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004190057A (ja) * 2002-12-09 2004-07-08 Nippon Filcon Co Ltd パターニングされたマスク被膜と支持体からなる積層構造の薄膜パターン形成用マスク及びその製造方法
JP2004235138A (ja) * 2003-01-09 2004-08-19 Hitachi Ltd 有機elパネルの製造方法および有機elパネル
JP2004232025A (ja) * 2003-01-30 2004-08-19 Ulvac Japan Ltd 蒸着用マスクおよびその製造方法
JP4547130B2 (ja) * 2003-01-30 2010-09-22 株式会社アルバック 蒸着マスクの製造方法
JP2014214366A (ja) * 2013-04-26 2014-11-17 コニカミノルタ株式会社 プラズマcvd成膜用マスク、プラズマcvd成膜方法、及び有機エレクトロルミネッセンス素子
JP2014214367A (ja) * 2013-04-26 2014-11-17 コニカミノルタ株式会社 プラズマcvd成膜用マスク、プラズマcvd成膜方法、及び有機エレクトロルミネッセンス素子
WO2015034097A1 (ja) * 2013-09-09 2015-03-12 株式会社ブイ・テクノロジー 成膜マスク、成膜装置、成膜方法及びタッチパネル基板
JP2015052162A (ja) * 2013-09-09 2015-03-19 株式会社ブイ・テクノロジー 成膜マスク、成膜装置及び成膜方法並びにタッチパネル基板
CN105531394A (zh) * 2013-09-09 2016-04-27 株式会社V技术 成膜掩模、成膜装置、成膜方法以及触摸面板基板

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