JPS6442885A - Semiconductor laser - Google Patents

Semiconductor laser

Info

Publication number
JPS6442885A
JPS6442885A JP20019487A JP20019487A JPS6442885A JP S6442885 A JPS6442885 A JP S6442885A JP 20019487 A JP20019487 A JP 20019487A JP 20019487 A JP20019487 A JP 20019487A JP S6442885 A JPS6442885 A JP S6442885A
Authority
JP
Japan
Prior art keywords
substrate
face
etching
tilted
laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP20019487A
Other languages
Japanese (ja)
Inventor
Mitsuhiro Kitamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP20019487A priority Critical patent/JPS6442885A/en
Publication of JPS6442885A publication Critical patent/JPS6442885A/en
Pending legal-status Critical Current

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  • Semiconductor Lasers (AREA)

Abstract

PURPOSE:To improve a semiconductor laser in property, yield, and property reproductivity by a method wherein a light resonator direction is made to be tilted against a semiconductor substrate face. CONSTITUTION:An etching mask 2 is formed on an n-InP semiconductor substrate 1 with a face (111) orientation, and a crystal face (100) 3 is formed through a chloride series reactive ion beam etching so as to form an angle of 50 deg. with the substrate 1. In this process, the substrate 1 is subjected to etching as it is tilted so as to make a beam direction nearly parallel to the face (100). As mentioned above, a resonating direction of laser rays is made to be tilted against the substrate face, whereby a laser ray 12 can be efficiently extracted in a upward and oblique direction against the substrate 1 and easily and optically coupled with an optical fiber, and the optical input for an optical fiber can be obtained, which is larger than a few mW.
JP20019487A 1987-08-10 1987-08-10 Semiconductor laser Pending JPS6442885A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20019487A JPS6442885A (en) 1987-08-10 1987-08-10 Semiconductor laser

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20019487A JPS6442885A (en) 1987-08-10 1987-08-10 Semiconductor laser

Publications (1)

Publication Number Publication Date
JPS6442885A true JPS6442885A (en) 1989-02-15

Family

ID=16420363

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20019487A Pending JPS6442885A (en) 1987-08-10 1987-08-10 Semiconductor laser

Country Status (1)

Country Link
JP (1) JPS6442885A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0428390A2 (en) * 1989-11-13 1991-05-22 Sharp Kabushiki Kaisha Manufacturing method of optical diffraction grating element

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0428390A2 (en) * 1989-11-13 1991-05-22 Sharp Kabushiki Kaisha Manufacturing method of optical diffraction grating element

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