JPS6442119A - Vertical-type reaction device - Google Patents

Vertical-type reaction device

Info

Publication number
JPS6442119A
JPS6442119A JP19850987A JP19850987A JPS6442119A JP S6442119 A JPS6442119 A JP S6442119A JP 19850987 A JP19850987 A JP 19850987A JP 19850987 A JP19850987 A JP 19850987A JP S6442119 A JPS6442119 A JP S6442119A
Authority
JP
Japan
Prior art keywords
reaction tube
spacer
thermocouple
wall
tip part
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19850987A
Other languages
Japanese (ja)
Inventor
Yoshiko Mino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP19850987A priority Critical patent/JPS6442119A/en
Publication of JPS6442119A publication Critical patent/JPS6442119A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To always keep a definite distance between a tip part of a thermocouple and an outer wall of a reaction tube by a method wherein a recessed spacer is installed at the tip part of the thermocouple and the spacer is brought into contact with the outer wall of the reaction tube. CONSTITUTION:A thermocouple 5 for temperature adjustment use is installed in such a way that it pierces a heater 2; a recessed spacer 7 used to keep a definite distance is fixed to a tip part of the thermocouple 5 and is brought into contact with an outer wall of a reaction tube 1. The spacer 7 is attached to the tip part of all thermocouples which are installed after piercing the heater. By this setup, even when the thermocouples are displaced due to a deviation lof the reaction tube, the deviation can be adjusted by referring to a contact state between the spacer 7 and the reaction tube 1. By this setup, the individual thermocouples can be positioned by keeping a definite distance with reference to the outer wall of the reaction tube.
JP19850987A 1987-08-07 1987-08-07 Vertical-type reaction device Pending JPS6442119A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19850987A JPS6442119A (en) 1987-08-07 1987-08-07 Vertical-type reaction device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19850987A JPS6442119A (en) 1987-08-07 1987-08-07 Vertical-type reaction device

Publications (1)

Publication Number Publication Date
JPS6442119A true JPS6442119A (en) 1989-02-14

Family

ID=16392320

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19850987A Pending JPS6442119A (en) 1987-08-07 1987-08-07 Vertical-type reaction device

Country Status (1)

Country Link
JP (1) JPS6442119A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016157930A (en) * 2015-02-25 2016-09-01 株式会社日立国際電気 Substrate processing apparatus, thermo couple, and manufacturing method of semiconductor device
US10684174B2 (en) 2015-02-25 2020-06-16 Kokusai Electric Corporation Substrate processing apparatus, and thermocouple

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016157930A (en) * 2015-02-25 2016-09-01 株式会社日立国際電気 Substrate processing apparatus, thermo couple, and manufacturing method of semiconductor device
US10684174B2 (en) 2015-02-25 2020-06-16 Kokusai Electric Corporation Substrate processing apparatus, and thermocouple
US11300456B2 (en) 2015-02-25 2022-04-12 Kokusai Electric Corporation Substrate processing apparatus, and thermocouple

Similar Documents

Publication Publication Date Title
ES474813A1 (en) Apparatus and method for maintaining calibration of a thermocouple used in a bushing for the drawing of glass fiber
AT362527B (en) DEVICE FOR MONITORING AND CONTROLLING THE FILLING PROCESS OF AN ANALYZER MEASURING CHAMBER
JPS6442119A (en) Vertical-type reaction device
DE3571276D1 (en) Trimming method for a temperature sensor
JPS53125587A (en) Temperature controller
GB1531107A (en) Apparatus and method for measuring the self-heating rate of a chemical reaction
JPS5315868A (en) Temperature measuring device
KR840001324A (en) Rotary device
JPS5629043A (en) Fuel concentration increasing device for starting at ordinary temperature
ES463679A1 (en) Temperature sensing device
FR2252566A1 (en) Temperature sensor for fluids in pipes - clamp and shell maintain sensor in contact with pipe
JPS5437757A (en) Thermistor device for temperature controlling of contact heating type roller fixing device
JPS5226640A (en) Heater temperature controlling device
ATE127224T1 (en) DEVICE FOR MONITORING TEMPERATURE-DEPENDENT CHANGES.
JPS5292742A (en) Measuring method for welding groove gap
JPS51117048A (en) Toner concentration detect method
JPS53125855A (en) Optical fiber drawing furnace
JPS53103237A (en) Combustion apparatus
JPS53124443A (en) Fixing device
JPS51120447A (en) Method of manufacturing a heating pipe
PL101103B1 (en) SENSOR OF THE TEMPERATURE REGULATOR, METHOD OF FILLING THE SENSOR AND DEVICE FOR FILLING THE SENSOR
JPS51141705A (en) A method of operating heat treatment furnaces
JPS5476194A (en) Method and device for measuring thermal conductivity of fluid
JPS5674928A (en) Preparation method of semiconductor device
JPS5424339A (en) High-frequency heating device