JPS6442110A - Formation of conductor pattern - Google Patents

Formation of conductor pattern

Info

Publication number
JPS6442110A
JPS6442110A JP19807087A JP19807087A JPS6442110A JP S6442110 A JPS6442110 A JP S6442110A JP 19807087 A JP19807087 A JP 19807087A JP 19807087 A JP19807087 A JP 19807087A JP S6442110 A JPS6442110 A JP S6442110A
Authority
JP
Japan
Prior art keywords
photoresist
pattern
trapezoidal shape
inverted trapezoidal
formation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19807087A
Other languages
Japanese (ja)
Inventor
Kazuo Shiiki
Isamu Yuhito
Hidetoshi Moriwaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP19807087A priority Critical patent/JPS6442110A/en
Publication of JPS6442110A publication Critical patent/JPS6442110A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To enhance the reproducibility of the formation of a pattern by a method wherein a photoresist pattern with an inverted trapezoidal shape whose taper angle is larger than 90 deg. is used instead of a pattern having an overhang. CONSTITUTION:If a conductor material is evaporated from an upper part of photoresist patterns with an inverted trapezoidal shape, side walls of the inverted trapezoidal shape produce shadowy parts; this causes spaces which are not reached by particles to be evaporated; a conductor pattern formed between the photoresist patterns is not connected to a conductor material to be formed on a photoresist. If the photoresist is dissolved by using a solvent, an excess conductor material formed on the photoresist is removed. By this setup, a conductor pattern which is reversed with reference to the photoresist patterns can be obtained with good reproducibility.
JP19807087A 1987-08-10 1987-08-10 Formation of conductor pattern Pending JPS6442110A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19807087A JPS6442110A (en) 1987-08-10 1987-08-10 Formation of conductor pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19807087A JPS6442110A (en) 1987-08-10 1987-08-10 Formation of conductor pattern

Publications (1)

Publication Number Publication Date
JPS6442110A true JPS6442110A (en) 1989-02-14

Family

ID=16385023

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19807087A Pending JPS6442110A (en) 1987-08-10 1987-08-10 Formation of conductor pattern

Country Status (1)

Country Link
JP (1) JPS6442110A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002033215A (en) * 2000-07-14 2002-01-31 Murata Mfg Co Ltd Conductor pattern and electronic component provided therewith
US7107666B2 (en) * 1998-07-23 2006-09-19 Bh Electronics Method of manufacturing an ultra-miniature magnetic device
US20140225700A1 (en) * 2013-02-08 2014-08-14 Qualcomm Incorporated Substrate-less discrete coupled inductor structure
US11749455B2 (en) 2022-01-10 2023-09-05 Bh Electronics, Inc. Methods of fabricating ultra-miniature laminated magnetic cores and devices

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7107666B2 (en) * 1998-07-23 2006-09-19 Bh Electronics Method of manufacturing an ultra-miniature magnetic device
JP2002033215A (en) * 2000-07-14 2002-01-31 Murata Mfg Co Ltd Conductor pattern and electronic component provided therewith
US6723494B2 (en) 2000-07-14 2004-04-20 Murata Manufacturing Co., Ltd. Conductor pattern and electronic component having the same
US20140225700A1 (en) * 2013-02-08 2014-08-14 Qualcomm Incorporated Substrate-less discrete coupled inductor structure
US11749455B2 (en) 2022-01-10 2023-09-05 Bh Electronics, Inc. Methods of fabricating ultra-miniature laminated magnetic cores and devices

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