JPS6441155A - Supporting device for electron lens - Google Patents
Supporting device for electron lensInfo
- Publication number
- JPS6441155A JPS6441155A JP62196846A JP19684687A JPS6441155A JP S6441155 A JPS6441155 A JP S6441155A JP 62196846 A JP62196846 A JP 62196846A JP 19684687 A JP19684687 A JP 19684687A JP S6441155 A JPS6441155 A JP S6441155A
- Authority
- JP
- Japan
- Prior art keywords
- casing
- vessel
- vacuum
- lens
- electron lens
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000012423 maintenance Methods 0.000 abstract 3
- 238000010276 construction Methods 0.000 abstract 2
- 230000000149 penetrating effect Effects 0.000 abstract 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 2
- 230000008878 coupling Effects 0.000 abstract 1
- 238000010168 coupling process Methods 0.000 abstract 1
- 238000005859 coupling reaction Methods 0.000 abstract 1
Abstract
PURPOSE:To eliminate troublesome vacuum maintenance, power supply, and water service by arranging an electron lens in a vacuum casing in the condition as accommodated in a vessel of airtight construction, and by coupling a communication pipe with this vessel in such a way as penetrating the vacuum casing. CONSTITUTION:In a vacuum casing 1 an electron lens 2 arranged around a lens barrel 3 is installed with a certain gap to the bore in the condition as accommodated in a vessel 4 of airtight construction, and a communication pipe 5 is coupled with the vessel as penetrating the casing 1, and the vessel is put in communication with outside the casing 1. To exhaust the casing 1, the internal gas is put in communication through a gap 9 formed between the walls of the lens barrel 3 and vessel 4 and the bore of the casing 1, wherein the gas passage resistance is reduced greatly, and gas exhaustion for vacuum maintenance of inside the casing 1 can be made smoothly. Out gas from the electron lens 2 is exhausted directly to outside the casing 1 via the above- mentioned communication pipe 5 without causing discharge inside casing 1, and thus no inconvenience will be generated for vacuum maintenance of the casing 1. Also power supply and water service to the lens 2 are connected the casing 1 via the pipe 5.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62196846A JPS6441155A (en) | 1987-08-05 | 1987-08-05 | Supporting device for electron lens |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62196846A JPS6441155A (en) | 1987-08-05 | 1987-08-05 | Supporting device for electron lens |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6441155A true JPS6441155A (en) | 1989-02-13 |
Family
ID=16364635
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62196846A Pending JPS6441155A (en) | 1987-08-05 | 1987-08-05 | Supporting device for electron lens |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6441155A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0461366A2 (en) * | 1990-05-17 | 1991-12-18 | Etec Systems, Inc. | Thermally stable magnetic deflection assembly and method of making same |
| JP2007058130A (en) * | 2005-08-26 | 2007-03-08 | Japan Science & Technology Agency | Extreme-ultraviolet ray microscope and testing method |
| WO2007043414A1 (en) | 2005-10-11 | 2007-04-19 | Nikon Corporation | Multilayer reflecting mirror, multilayer reflecting mirror manufacturing method, optical system, exposure apparatus and device manufacturing method |
-
1987
- 1987-08-05 JP JP62196846A patent/JPS6441155A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0461366A2 (en) * | 1990-05-17 | 1991-12-18 | Etec Systems, Inc. | Thermally stable magnetic deflection assembly and method of making same |
| US5136166A (en) * | 1990-05-17 | 1992-08-04 | Etec Systems, Inc. | Temperature stable magnetic deflection assembly |
| JP2007058130A (en) * | 2005-08-26 | 2007-03-08 | Japan Science & Technology Agency | Extreme-ultraviolet ray microscope and testing method |
| WO2007043414A1 (en) | 2005-10-11 | 2007-04-19 | Nikon Corporation | Multilayer reflecting mirror, multilayer reflecting mirror manufacturing method, optical system, exposure apparatus and device manufacturing method |
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