JPS6439714A - Plasma device - Google Patents

Plasma device

Info

Publication number
JPS6439714A
JPS6439714A JP62195184A JP19518487A JPS6439714A JP S6439714 A JPS6439714 A JP S6439714A JP 62195184 A JP62195184 A JP 62195184A JP 19518487 A JP19518487 A JP 19518487A JP S6439714 A JPS6439714 A JP S6439714A
Authority
JP
Japan
Prior art keywords
conductor
plasma
dielectric
generate
generated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62195184A
Other languages
Japanese (ja)
Other versions
JP2544936B2 (en
Inventor
Masakazu Taki
Junichi Nishimae
Kenji Yoshizawa
Tadashi Yanagi
Yoshihiro Ueda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP62195184A priority Critical patent/JP2544936B2/en
Publication of JPS6439714A publication Critical patent/JPS6439714A/en
Application granted granted Critical
Publication of JP2544936B2 publication Critical patent/JP2544936B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Plasma Technology (AREA)

Abstract

PURPOSE:To enhance the outer diameter accuracy of a dielectric and the inner diameter accuracy of an outer conductor, to enhance the heat exchanging rate of the conductor and to generate a uniform and high density plasma by disposing the dielectric around the inner conductor of a coaxial line, and constructing to generate a plasma between the dielectric and the coaxial line. CONSTITUTION:A microwave generated by a magnetron 21 is propagated in a waveguide 22, and coupled to a coaxial line made of an outer conductor 24 and an inner conductor 25. Since the microwave coupled to the line is so excited as to have an electric field component perpendicular to the conductor 24, discharge gas introduced between the conductor 24 and a dielectric 26 to generate a uniform plasma 27. Since the conductor 24 made of metal having good thermal conductivity is contacted directly with the plasma 27 even if heat by the microwave discharge is generated, heat can be efficiently and externally discharged. When discharging power density is raised, a high density plasma can be generated.
JP62195184A 1987-08-06 1987-08-06 Plasma equipment Expired - Lifetime JP2544936B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62195184A JP2544936B2 (en) 1987-08-06 1987-08-06 Plasma equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62195184A JP2544936B2 (en) 1987-08-06 1987-08-06 Plasma equipment

Publications (2)

Publication Number Publication Date
JPS6439714A true JPS6439714A (en) 1989-02-10
JP2544936B2 JP2544936B2 (en) 1996-10-16

Family

ID=16336849

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62195184A Expired - Lifetime JP2544936B2 (en) 1987-08-06 1987-08-06 Plasma equipment

Country Status (1)

Country Link
JP (1) JP2544936B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005062335A3 (en) * 2003-12-12 2005-10-20 R3T Gmbh Rapid Reactive Radica Device for producing excited and/or ionised particles in a plasma and method for producing ionised particles
CN111690913A (en) * 2020-07-22 2020-09-22 中南大学 Microwave shielding pipe and magnetic field enhanced flat PECVD (plasma enhanced chemical vapor deposition) equipment

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005062335A3 (en) * 2003-12-12 2005-10-20 R3T Gmbh Rapid Reactive Radica Device for producing excited and/or ionised particles in a plasma and method for producing ionised particles
US7665416B2 (en) 2003-12-12 2010-02-23 R3T Gmbh Rapid Reactive Radicals Technology Apparatus for generating excited and/or ionized particles in a plasma and a method for generating ionized particles
CN111690913A (en) * 2020-07-22 2020-09-22 中南大学 Microwave shielding pipe and magnetic field enhanced flat PECVD (plasma enhanced chemical vapor deposition) equipment
CN111690913B (en) * 2020-07-22 2023-06-23 中南大学 Microwave shielding tube and magnetic field enhanced flat PECVD (plasma enhanced chemical vapor deposition) equipment

Also Published As

Publication number Publication date
JP2544936B2 (en) 1996-10-16

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