JPS6439387A - Plasma treating equipment - Google Patents
Plasma treating equipmentInfo
- Publication number
- JPS6439387A JPS6439387A JP62192611A JP19261187A JPS6439387A JP S6439387 A JPS6439387 A JP S6439387A JP 62192611 A JP62192611 A JP 62192611A JP 19261187 A JP19261187 A JP 19261187A JP S6439387 A JPS6439387 A JP S6439387A
- Authority
- JP
- Japan
- Prior art keywords
- generation chamber
- chamber
- microwave
- plasma
- generation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE:To simplify the cleaning and maintenance of an equipment by integrating a microwave lead-in tube with a plasma generation chamber and providing a window plate fixing part of a microwave inlet in an electronic cyclotron resonance type plasma equipment. CONSTITUTION:A microwave waveguide 21 is integrated with a plasma generation chamber 23 and the generation chamber 23 and a sample chamber 36 are made up separately. Since a supporting plate 24 on the side of the generation chamber 23 and a partition plate 25 on the side of the sample chamber 36 can separate the generation chamber 23 and the sample chamber 36 by removing connecting screws 30 and the generation chamber 23 can be moved by a frame 37, the internal part of the generation chamber 23 can be easily cleaned. The fixed surface of a window fixing material 26 of the window plate 22 of the microwave inlet in the generation chamber 23 faces the internal part of the plasma generation part and since the generation chamber 23 can be separated from the sample chamber 36, the window plate 22 can be changed by removing connecting screws 29. As a result, the readjustment of matching adjustment of the microwaves becomes unnecessary.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62192611A JPH0631448B2 (en) | 1987-08-03 | 1987-08-03 | Plasma processing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62192611A JPH0631448B2 (en) | 1987-08-03 | 1987-08-03 | Plasma processing device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6439387A true JPS6439387A (en) | 1989-02-09 |
| JPH0631448B2 JPH0631448B2 (en) | 1994-04-27 |
Family
ID=16294139
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62192611A Expired - Fee Related JPH0631448B2 (en) | 1987-08-03 | 1987-08-03 | Plasma processing device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0631448B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20010044059A (en) * | 2000-06-29 | 2001-06-05 | 박용석 | Electron cyclotron resonance ashing apparatus for processing glass substrate or waper |
| JP6412223B1 (en) * | 2017-08-14 | 2018-10-24 | Ｓｐｐテクノロジーズ株式会社 | Plasma processing equipment |
-
1987
- 1987-08-03 JP JP62192611A patent/JPH0631448B2/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20010044059A (en) * | 2000-06-29 | 2001-06-05 | 박용석 | Electron cyclotron resonance ashing apparatus for processing glass substrate or waper |
| JP6412223B1 (en) * | 2017-08-14 | 2018-10-24 | Ｓｐｐテクノロジーズ株式会社 | Plasma processing equipment |
| JP2019036614A (en) * | 2017-08-14 | 2019-03-07 | Ｓｐｐテクノロジーズ株式会社 | Plasma processing apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0631448B2 (en) | 1994-04-27 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |