JPS6435841A - High-dose ion implanter - Google Patents
High-dose ion implanterInfo
- Publication number
- JPS6435841A JPS6435841A JP62190466A JP19046687A JPS6435841A JP S6435841 A JPS6435841 A JP S6435841A JP 62190466 A JP62190466 A JP 62190466A JP 19046687 A JP19046687 A JP 19046687A JP S6435841 A JPS6435841 A JP S6435841A
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- gas
- ion
- arc
- ash3
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 150000002500 ions Chemical class 0.000 abstract 5
- 239000003463 adsorbent Substances 0.000 abstract 2
- RBFQJDQYXXHULB-UHFFFAOYSA-N arsane Chemical compound [AsH3] RBFQJDQYXXHULB-UHFFFAOYSA-N 0.000 abstract 2
- 229910000070 arsenic hydride Inorganic materials 0.000 abstract 2
- 238000000354 decomposition reaction Methods 0.000 abstract 2
- 238000010884 ion-beam technique Methods 0.000 abstract 2
- 229910001260 Pt alloy Inorganic materials 0.000 abstract 1
- 238000010891 electric arc Methods 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 239000007787 solid Substances 0.000 abstract 1
- 238000001179 sorption measurement Methods 0.000 abstract 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62190466A JPS6435841A (en) | 1987-07-31 | 1987-07-31 | High-dose ion implanter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62190466A JPS6435841A (en) | 1987-07-31 | 1987-07-31 | High-dose ion implanter |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6435841A true JPS6435841A (en) | 1989-02-06 |
Family
ID=16258582
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62190466A Pending JPS6435841A (en) | 1987-07-31 | 1987-07-31 | High-dose ion implanter |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6435841A (ja) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100809138B1 (ko) * | 2004-05-14 | 2008-02-29 | 닛신 이온기기 가부시기가이샤 | 이온주입장치 |
| WO2008136858A3 (en) * | 2006-11-08 | 2009-04-30 | Varian Semiconductor Equipment | Techniques for removing molecular fragments from an ion implanter |
-
1987
- 1987-07-31 JP JP62190466A patent/JPS6435841A/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100809138B1 (ko) * | 2004-05-14 | 2008-02-29 | 닛신 이온기기 가부시기가이샤 | 이온주입장치 |
| WO2008136858A3 (en) * | 2006-11-08 | 2009-04-30 | Varian Semiconductor Equipment | Techniques for removing molecular fragments from an ion implanter |
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