JPS6433544A - Pattern forming method - Google Patents

Pattern forming method

Info

Publication number
JPS6433544A
JPS6433544A JP18995287A JP18995287A JPS6433544A JP S6433544 A JPS6433544 A JP S6433544A JP 18995287 A JP18995287 A JP 18995287A JP 18995287 A JP18995287 A JP 18995287A JP S6433544 A JPS6433544 A JP S6433544A
Authority
JP
Japan
Prior art keywords
resist
dye
absorbance
added
dissolving speed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18995287A
Other languages
Japanese (ja)
Inventor
Hiroshi Hashimoto
Eiichi Kawamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP18995287A priority Critical patent/JPS6433544A/en
Publication of JPS6433544A publication Critical patent/JPS6433544A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE:To form a pattern with superior size controllability, by using a resist in which plural kinds of dye with absorbance and dissolving speed different with each other are mixed and added in the resist with a mixing ratio corresponding to the reflectance of a thin film as the resist. CONSTITUTION:In the titled method, the resist in which plural kinds of dye with the absorbance and dissolving speed different with each other are mixed and added in the resist with the mixing ratio corresponding to the reflectance of the thin film having the same reflectance as that of silicide or equivalent to that, is used as the resist. As the plural kinds of dye, for example, assuming that the dye having two different kinds of properties consisting of first dye A having high absorbance and high dissolving speed (almost same as that of the resist to be added) and second dye B having low absorbance and low dissolving speed, it is possible to control the absorbance by the added quantity of the A, and also, to control the dissolving speed by the added quantity of the B.
JP18995287A 1987-07-29 1987-07-29 Pattern forming method Pending JPS6433544A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18995287A JPS6433544A (en) 1987-07-29 1987-07-29 Pattern forming method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18995287A JPS6433544A (en) 1987-07-29 1987-07-29 Pattern forming method

Publications (1)

Publication Number Publication Date
JPS6433544A true JPS6433544A (en) 1989-02-03

Family

ID=16249943

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18995287A Pending JPS6433544A (en) 1987-07-29 1987-07-29 Pattern forming method

Country Status (1)

Country Link
JP (1) JPS6433544A (en)

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5643635A (en) * 1979-09-19 1981-04-22 Japan Synthetic Rubber Co Ltd Photoresist composition
JPS56147146A (en) * 1980-04-18 1981-11-14 Fujitsu Ltd Photoetching method
JPS6088941A (en) * 1983-10-21 1985-05-18 Nagase Kasei Kogyo Kk Photoresist composition
JPS6120024A (en) * 1984-06-11 1986-01-28 ミネソタ　マイニング　アンド　マニユフアクチユアリング　コンパニー Single layer halation preventing system
JPS6242521A (en) * 1985-08-20 1987-02-24 Fujitsu Ltd Manufacture of semiconductor device
JPS62118523A (en) * 1985-11-19 1987-05-29 Fujitsu Ltd Wiring formation
JPS6373240A (en) * 1986-09-17 1988-04-02 Hitachi Ltd Resist
JPS63282734A (en) * 1987-05-14 1988-11-18 Mitsubishi Kasei Corp Positive type photoresist composition

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5643635A (en) * 1979-09-19 1981-04-22 Japan Synthetic Rubber Co Ltd Photoresist composition
JPS56147146A (en) * 1980-04-18 1981-11-14 Fujitsu Ltd Photoetching method
JPS6088941A (en) * 1983-10-21 1985-05-18 Nagase Kasei Kogyo Kk Photoresist composition
JPS6120024A (en) * 1984-06-11 1986-01-28 ミネソタ　マイニング　アンド　マニユフアクチユアリング　コンパニー Single layer halation preventing system
JPS6242521A (en) * 1985-08-20 1987-02-24 Fujitsu Ltd Manufacture of semiconductor device
JPS62118523A (en) * 1985-11-19 1987-05-29 Fujitsu Ltd Wiring formation
JPS6373240A (en) * 1986-09-17 1988-04-02 Hitachi Ltd Resist
JPS63282734A (en) * 1987-05-14 1988-11-18 Mitsubishi Kasei Corp Positive type photoresist composition

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