JPS6431150A - Heat resistant photosensitive material - Google Patents

Heat resistant photosensitive material

Info

Publication number
JPS6431150A
JPS6431150A JP18702587A JP18702587A JPS6431150A JP S6431150 A JPS6431150 A JP S6431150A JP 18702587 A JP18702587 A JP 18702587A JP 18702587 A JP18702587 A JP 18702587A JP S6431150 A JPS6431150 A JP S6431150A
Authority
JP
Japan
Prior art keywords
photosensitive material
specified
formula
resistant photosensitive
heat resistant
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18702587A
Other languages
English (en)
Inventor
Tadashi Niwa
Sadakatsu Suzuki
Yoichi Imai
Masayuki Kato
Yoshio Taguchi
Chihiro Imai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tonen General Sekiyu KK
Original Assignee
Toa Nenryo Kogyyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toa Nenryo Kogyyo KK filed Critical Toa Nenryo Kogyyo KK
Priority to JP18702587A priority Critical patent/JPS6431150A/ja
Publication of JPS6431150A publication Critical patent/JPS6431150A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G03F7/0758—Macromolecular compounds containing Si-O, Si-C or Si-N bonds with silicon- containing groups in the side chains

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
JP18702587A 1987-07-27 1987-07-27 Heat resistant photosensitive material Pending JPS6431150A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18702587A JPS6431150A (en) 1987-07-27 1987-07-27 Heat resistant photosensitive material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18702587A JPS6431150A (en) 1987-07-27 1987-07-27 Heat resistant photosensitive material

Publications (1)

Publication Number Publication Date
JPS6431150A true JPS6431150A (en) 1989-02-01

Family

ID=16198875

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18702587A Pending JPS6431150A (en) 1987-07-27 1987-07-27 Heat resistant photosensitive material

Country Status (1)

Country Link
JP (1) JPS6431150A (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04313756A (ja) * 1991-04-11 1992-11-05 Shin Etsu Chem Co Ltd 感光材及びその製造方法
JPH07319162A (ja) * 1993-02-17 1995-12-08 Shin Etsu Chem Co Ltd 感光性樹脂組成物及び電子部品用保護膜
CN103408577A (zh) * 2013-08-13 2013-11-27 中国科学院化学研究所 基于芳基二胺的胺基硅烷化合物及其制备方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04313756A (ja) * 1991-04-11 1992-11-05 Shin Etsu Chem Co Ltd 感光材及びその製造方法
JPH07319162A (ja) * 1993-02-17 1995-12-08 Shin Etsu Chem Co Ltd 感光性樹脂組成物及び電子部品用保護膜
CN103408577A (zh) * 2013-08-13 2013-11-27 中国科学院化学研究所 基于芳基二胺的胺基硅烷化合物及其制备方法

Similar Documents

Publication Publication Date Title
TNSN88060A1 (fr) Polymides claires hautement solubles
GB1181255A (en) Cross-Linked Polyimides and Methods of Producing Same
EP0397023A3 (en) Crosslinkable polyimides from bis (aminophenoxy) benzonitriles
DE69127397D1 (de) 9,9-Bis(perfluoroalkyl)xanthenem 9-Aryl-9-perfluoroalkylxanthene, Monomere und davon abgeleitete Polymere
JPS5445397A (en) Preparation of polyester
JPS6431150A (en) Heat resistant photosensitive material
JPS57143329A (en) Photosensitive resin and its production
KR910009779A (ko) 폴리이미드 제조방법
JPS5659845A (en) Novel polycondensate
JPS5536406A (en) 3-methyl-5-succinic anhydrous-3-cyclohexene-1,2-dicarboxylic anhydride
JPS6416834A (en) Polyamic acid copolymer, polyimide copolymer therefrom and production thereof
JPS5674126A (en) Novel polytitanocarbosilane and its preparation
JPS57151619A (en) Preparation of aromatic polyester
JPS5576852A (en) Novel derivative of anthranilic acid
Harris et al. Soluble Aromatic Polyimides Derived From New Phenylated Diamines.(Retroactive Coverage)
JPS55137132A (en) Polyimide
JPS55137133A (en) Polyamidic acid
JPS5565227A (en) Production of polyimide solution
JPS5776030A (en) Polypyrazole and its preparation
JPS5657827A (en) Polyimide having phenoxaphosphine ring and its preparation
JPS55161823A (en) Production of polyester having high polymerization degree
JPS6416836A (en) Novel polyimide copolymer and polyamic acid copolymer and production thereof
JPS54151964A (en) Maleimide ester and its preparation
JPS55165921A (en) Aromatic copolyamide
JPS6433135A (en) Reactive polyimide and its production