JPS6430358U - - Google Patents
Info
- Publication number
- JPS6430358U JPS6430358U JP3564988U JP3564988U JPS6430358U JP S6430358 U JPS6430358 U JP S6430358U JP 3564988 U JP3564988 U JP 3564988U JP 3564988 U JP3564988 U JP 3564988U JP S6430358 U JPS6430358 U JP S6430358U
- Authority
- JP
- Japan
- Prior art keywords
- reaction chamber
- substrate
- vapor phase
- metal thin
- active metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 5
- 239000010409 thin film Substances 0.000 claims description 4
- 238000010438 heat treatment Methods 0.000 claims description 2
- 239000002184 metal Substances 0.000 claims 3
- 238000001947 vapour-phase growth Methods 0.000 claims 3
- 238000010586 diagram Methods 0.000 description 3
Landscapes
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3564988U JPS6430358U (en, 2012) | 1988-03-17 | 1988-03-17 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3564988U JPS6430358U (en, 2012) | 1988-03-17 | 1988-03-17 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6430358U true JPS6430358U (en, 2012) | 1989-02-23 |
Family
ID=31262293
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3564988U Pending JPS6430358U (en, 2012) | 1988-03-17 | 1988-03-17 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6430358U (en, 2012) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59110775A (ja) * | 1982-12-13 | 1984-06-26 | Koujiyundo Kagaku Kenkyusho:Kk | 金属膜形成方法 |
-
1988
- 1988-03-17 JP JP3564988U patent/JPS6430358U/ja active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59110775A (ja) * | 1982-12-13 | 1984-06-26 | Koujiyundo Kagaku Kenkyusho:Kk | 金属膜形成方法 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CA2051554A1 (en) | Thin film deposition method | |
| IT1234946B (it) | Procedimento e dispositivo per diffondere una o una pluralita' di impurita' in un corpo di semiconduttore. | |
| JPS6430358U (en, 2012) | ||
| EP0321925A3 (en) | Apparatus for analysis employing electron | |
| JPH0248422Y2 (en, 2012) | ||
| JP3439629B2 (ja) | 低温活性ゲッター及びその製造方法 | |
| Kita et al. | Method and Apparatus for Producing Oxide Thin Film | |
| JPH0139712Y2 (en, 2012) | ||
| JPH0314165U (en, 2012) | ||
| JPH0351834U (en, 2012) | ||
| JPH04219391A (ja) | 分子線結晶成長装置 | |
| JPS6449675U (en, 2012) | ||
| JPH02125328U (en, 2012) | ||
| JPH04210466A (ja) | 真空成膜装置 | |
| JPH0187154U (en, 2012) | ||
| JPS62126362U (en, 2012) | ||
| JPS6163833U (en, 2012) | ||
| JP2979832B2 (ja) | 低応力金属膜の作製方法 | |
| JPH023075U (en, 2012) | ||
| JPH0320434U (en, 2012) | ||
| JPS5614412A (en) | Manufacture of amorphous silicon film | |
| JPH0245627U (en, 2012) | ||
| JPS63283737A (ja) | 真空用反応容器 | |
| JPS6311562U (en, 2012) | ||
| JPH0399762U (en, 2012) |