JPS6430221A - Resist film formation - Google Patents

Resist film formation

Info

Publication number
JPS6430221A
JPS6430221A JP18544587A JP18544587A JPS6430221A JP S6430221 A JPS6430221 A JP S6430221A JP 18544587 A JP18544587 A JP 18544587A JP 18544587 A JP18544587 A JP 18544587A JP S6430221 A JPS6430221 A JP S6430221A
Authority
JP
Japan
Prior art keywords
resist
resist film
substrate
film
contact
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18544587A
Other languages
Japanese (ja)
Inventor
Toshihiro Yamashita
Tsunehiro Naganami
Atsushi Sudo
Yuichiro Yagishita
Minoru Hirose
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP18544587A priority Critical patent/JPS6430221A/en
Publication of JPS6430221A publication Critical patent/JPS6430221A/en
Pending legal-status Critical Current

Links

Landscapes

  • Application Of Or Painting With Fluid Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To enable a resist film to be formed of a bit of resist required by a method wherein a resist film is formed in a space encircled by a frame body using the surface tention due to the viscosity of resist solution; the space encircled by the frame body is enlarged to grow the resist film; a thin film in specified size is brought into contact with a substrate to transfer the resist film to the substrate. CONSTITUTION:Resist solution is jetted from multiple resist jetting ports 14 with the fourth side 2 and an intermediate side 12 in contact with each other to form a resist film 3 in a space encircled by a horizontal U-shaped frame part 1 and the fourth side 2. Later, the fourth side 2 is shifted in the arrow direction to gradually enlarge the resist film 3. When the resist film 3 is sufficiently enlarged, a substrate is brought into contact with the resist 3 for transfer to form the resist film 3 on the substrate. Thus, the resist solution is effectively used and furthermore, the viscosity of resist solution can be controlled enabling the thickness of resist film to be controlled easily.
JP18544587A 1987-07-27 1987-07-27 Resist film formation Pending JPS6430221A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18544587A JPS6430221A (en) 1987-07-27 1987-07-27 Resist film formation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18544587A JPS6430221A (en) 1987-07-27 1987-07-27 Resist film formation

Publications (1)

Publication Number Publication Date
JPS6430221A true JPS6430221A (en) 1989-02-01

Family

ID=16170918

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18544587A Pending JPS6430221A (en) 1987-07-27 1987-07-27 Resist film formation

Country Status (1)

Country Link
JP (1) JPS6430221A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6372302B1 (en) 1999-09-10 2002-04-16 Tdk Corporation Process for producing a magnetic recording medium

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6372302B1 (en) 1999-09-10 2002-04-16 Tdk Corporation Process for producing a magnetic recording medium
US6821602B2 (en) 1999-09-10 2004-11-23 Tdk Corporation Magnetic recording medium and process for producing the same

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