JPS6430221A - Resist film formation - Google Patents
Resist film formationInfo
- Publication number
- JPS6430221A JPS6430221A JP18544587A JP18544587A JPS6430221A JP S6430221 A JPS6430221 A JP S6430221A JP 18544587 A JP18544587 A JP 18544587A JP 18544587 A JP18544587 A JP 18544587A JP S6430221 A JPS6430221 A JP S6430221A
- Authority
- JP
- Japan
- Prior art keywords
- resist
- resist film
- substrate
- film
- contact
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE:To enable a resist film to be formed of a bit of resist required by a method wherein a resist film is formed in a space encircled by a frame body using the surface tention due to the viscosity of resist solution; the space encircled by the frame body is enlarged to grow the resist film; a thin film in specified size is brought into contact with a substrate to transfer the resist film to the substrate. CONSTITUTION:Resist solution is jetted from multiple resist jetting ports 14 with the fourth side 2 and an intermediate side 12 in contact with each other to form a resist film 3 in a space encircled by a horizontal U-shaped frame part 1 and the fourth side 2. Later, the fourth side 2 is shifted in the arrow direction to gradually enlarge the resist film 3. When the resist film 3 is sufficiently enlarged, a substrate is brought into contact with the resist 3 for transfer to form the resist film 3 on the substrate. Thus, the resist solution is effectively used and furthermore, the viscosity of resist solution can be controlled enabling the thickness of resist film to be controlled easily.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18544587A JPS6430221A (en) | 1987-07-27 | 1987-07-27 | Resist film formation |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18544587A JPS6430221A (en) | 1987-07-27 | 1987-07-27 | Resist film formation |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6430221A true JPS6430221A (en) | 1989-02-01 |
Family
ID=16170918
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18544587A Pending JPS6430221A (en) | 1987-07-27 | 1987-07-27 | Resist film formation |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6430221A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6372302B1 (en) | 1999-09-10 | 2002-04-16 | Tdk Corporation | Process for producing a magnetic recording medium |
-
1987
- 1987-07-27 JP JP18544587A patent/JPS6430221A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6372302B1 (en) | 1999-09-10 | 2002-04-16 | Tdk Corporation | Process for producing a magnetic recording medium |
US6821602B2 (en) | 1999-09-10 | 2004-11-23 | Tdk Corporation | Magnetic recording medium and process for producing the same |
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