JPS6429801A - Substrate for supporting fresnel zone plate for x-rays - Google Patents

Substrate for supporting fresnel zone plate for x-rays

Info

Publication number
JPS6429801A
JPS6429801A JP18611387A JP18611387A JPS6429801A JP S6429801 A JPS6429801 A JP S6429801A JP 18611387 A JP18611387 A JP 18611387A JP 18611387 A JP18611387 A JP 18611387A JP S6429801 A JPS6429801 A JP S6429801A
Authority
JP
Japan
Prior art keywords
film
supporting
zone plate
nitride
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18611387A
Other languages
Japanese (ja)
Inventor
Masaru Kawada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Original Assignee
Shimadzu Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp filed Critical Shimadzu Corp
Priority to JP18611387A priority Critical patent/JPS6429801A/en
Publication of JPS6429801A publication Critical patent/JPS6429801A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1876—Diffractive Fresnel lenses; Zone plates; Kinoforms

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)

Abstract

PURPOSE:To support a zone plate for X-rays without degrading condensing efficiency and without deteriorating imaging characteristics by using a nitride subjected to film formation by a CVD method as a supporting film of the zone plate. CONSTITUTION:A nitride film 8 of boron nitride, silicon nitride or the like which is the supporting film of the metallic pattern of the zone plate is formed on the front side of a silicon wafer 7 to serve as a supporting base for a substrate. The rear side of the silicon wafer is coated with a protective film 9 except the part of the nitride film 8 on the front side to be used as the supporting film of the zone plate. This wafer is subjected to anisotropic etching from the rear side of the wafer by an aq. potassium hydroxide soln., or aq. sodium hydroxide soln. or aq. soln. of ethylene diamine and pyrocatechol, etc. A 'Pyrex(R)' ring 10 is thereafter stuck to the rear side at need in order to improve the strength of the silicon wafer 7 of the supporting base. The supporting substrate consisting of such supporting film of the metallic pattern which does not degrade the condensing efficiency and does not degrade the imaging characteristics is thereby obtd.
JP18611387A 1987-07-24 1987-07-24 Substrate for supporting fresnel zone plate for x-rays Pending JPS6429801A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18611387A JPS6429801A (en) 1987-07-24 1987-07-24 Substrate for supporting fresnel zone plate for x-rays

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18611387A JPS6429801A (en) 1987-07-24 1987-07-24 Substrate for supporting fresnel zone plate for x-rays

Publications (1)

Publication Number Publication Date
JPS6429801A true JPS6429801A (en) 1989-01-31

Family

ID=16182588

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18611387A Pending JPS6429801A (en) 1987-07-24 1987-07-24 Substrate for supporting fresnel zone plate for x-rays

Country Status (1)

Country Link
JP (1) JPS6429801A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04161899A (en) * 1990-10-26 1992-06-05 Nikon Corp X-ray diffraction element
US6593254B2 (en) 1999-09-29 2003-07-15 Infineon Technologies Ag Method for clamping a semiconductor device in a manufacturing process
CN102207569A (en) * 2011-06-07 2011-10-05 中国科学院微电子研究所 Method for manufacturing phase zone plate

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04161899A (en) * 1990-10-26 1992-06-05 Nikon Corp X-ray diffraction element
US6593254B2 (en) 1999-09-29 2003-07-15 Infineon Technologies Ag Method for clamping a semiconductor device in a manufacturing process
CN102207569A (en) * 2011-06-07 2011-10-05 中国科学院微电子研究所 Method for manufacturing phase zone plate

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