TW332222B - Sputtering apparatus with isolated coolant and sputtering target therefor the invention relates to a replaceable sputtering target device comprising a round target unit, a recessed rim having an annular rim, an annular rim rear face, tension members and annular waterproof surface. - Google Patents
Sputtering apparatus with isolated coolant and sputtering target therefor the invention relates to a replaceable sputtering target device comprising a round target unit, a recessed rim having an annular rim, an annular rim rear face, tension members and annular waterproof surface.Info
- Publication number
- TW332222B TW332222B TW084109919A TW84109919A TW332222B TW 332222 B TW332222 B TW 332222B TW 084109919 A TW084109919 A TW 084109919A TW 84109919 A TW84109919 A TW 84109919A TW 332222 B TW332222 B TW 332222B
- Authority
- TW
- Taiwan
- Prior art keywords
- annular
- sputtering
- rim
- target
- rear face
- Prior art date
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- Physical Vapour Deposition (AREA)
Abstract
A replaceable sputtering target device comprising: a round target unit (25) in which at least a portion of which is a target center made of a sputtering material, the front face of the target unit is a sputtering face (32) made of a target center material, the rear face (33) has received a waterproof treatment, its annular heat-dissipating surface is symmetrical to its center point; a recessed rim (34) having: an annular rim in which its front face (34a) surrounds the sputtering face (32) and retracts backward from the sputtering face (34a) and has a function of vacuum seal; an annular rim rear face (34b) surrounding the rear face (33) of the target unit and having a waterproof function; tension members (35,75) installed at the center point of the target rear face; and annular waterproof surface on the surrounding of the rear plate center tension member.
Applications Claiming Priority (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US60670190A | 1990-10-31 | 1990-10-31 | |
US07/626,987 US5130005A (en) | 1990-10-31 | 1990-12-13 | Magnetron sputter coating method and apparatus with rotating magnet cathode |
US07/791,415 US5284561A (en) | 1991-11-13 | 1991-11-13 | Method and apparatus for sputter coating employing machine readable indicia carried by target assembly |
US07/816,137 US5409590A (en) | 1989-04-17 | 1991-12-31 | Target cooling and support for magnetron sputter coating apparatus |
US08/164,759 US5449445A (en) | 1991-11-13 | 1993-12-10 | Sputtering target with machine readable indicia |
US08/388,205 US5490914A (en) | 1995-02-14 | 1995-02-14 | High utilization sputtering target for cathode assembly |
US08/439,490 US6689254B1 (en) | 1990-10-31 | 1995-05-11 | Sputtering apparatus with isolated coolant and sputtering target therefor |
Publications (1)
Publication Number | Publication Date |
---|---|
TW332222B true TW332222B (en) | 1998-05-21 |
Family
ID=60654555
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW084109919A TW332222B (en) | 1990-10-31 | 1995-09-21 | Sputtering apparatus with isolated coolant and sputtering target therefor the invention relates to a replaceable sputtering target device comprising a round target unit, a recessed rim having an annular rim, an annular rim rear face, tension members and annular waterproof surface. |
Country Status (1)
Country | Link |
---|---|
TW (1) | TW332222B (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI396766B (en) * | 2005-03-11 | 2013-05-21 | Soleras Advanced Coatings Nv | Flat end-block for carrying a rotatable sputtering target |
TWI495748B (en) * | 2013-11-28 | 2015-08-11 | Metal Ind Res & Dev Ct | Deposition apparatus |
TWI641710B (en) * | 2014-12-03 | 2018-11-21 | 愛發科股份有限公司 | Target assembly |
-
1995
- 1995-09-21 TW TW084109919A patent/TW332222B/en active
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI396766B (en) * | 2005-03-11 | 2013-05-21 | Soleras Advanced Coatings Nv | Flat end-block for carrying a rotatable sputtering target |
TWI495748B (en) * | 2013-11-28 | 2015-08-11 | Metal Ind Res & Dev Ct | Deposition apparatus |
TWI641710B (en) * | 2014-12-03 | 2018-11-21 | 愛發科股份有限公司 | Target assembly |
US10435783B2 (en) | 2014-12-03 | 2019-10-08 | Ulvac, Inc. | Target assembly |
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