TWI396766B - Flat end-block for carrying a rotatable sputtering target - Google Patents

Flat end-block for carrying a rotatable sputtering target Download PDF

Info

Publication number
TWI396766B
TWI396766B TW095100457A TW95100457A TWI396766B TW I396766 B TWI396766 B TW I396766B TW 095100457 A TW095100457 A TW 095100457A TW 95100457 A TW95100457 A TW 95100457A TW I396766 B TWI396766 B TW I396766B
Authority
TW
Taiwan
Prior art keywords
axis
range
mechanisms
end block
sealing mechanisms
Prior art date
Application number
TW095100457A
Other languages
Chinese (zh)
Other versions
TW200643205A (en
Inventor
Krist Dellaert
Boever Johannes De
Bosscher Wilmert De
Gregory Lapeire
Original Assignee
Soleras Advanced Coatings Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Soleras Advanced Coatings Nv filed Critical Soleras Advanced Coatings Nv
Publication of TW200643205A publication Critical patent/TW200643205A/en
Application granted granted Critical
Publication of TWI396766B publication Critical patent/TWI396766B/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/3407Cathode assembly for sputtering apparatus, e.g. Target

Description

用於支承可旋轉濺射目標的扁平端塊Flat end block for supporting a rotatable sputtering target

本發明係有關於一端塊,該一端塊被使用以在濺射裝置中支承濺射目標。更特別的,本發明係有關於一端塊,當沿著目標之對稱軸線考慮時係為相當平坦,而仍於內側容納所有或某些必須機構,以使激勵、冷卻、密封、支承及旋轉目標。The present invention relates to an end block that is used to support a sputtering target in a sputtering apparatus. More particularly, the present invention relates to an end piece that is relatively flat when considered along the axis of symmetry of the target, while still accommodating all or some of the necessary mechanisms on the inside to energize, cool, seal, support, and rotate the target. .

濺射來自一目標的材料以覆蓋一基板已成為廣泛範圍技術領域中之習用方式,諸如積體電路製造、大面積玻璃塗層及近來越來越多之塗層平板顯示器。該濺射在降壓大氣下產生,其中濺射或反應氣體或二者之混合物,在受控方式中均係被允許的。自由電子在電磁限制電線槽板中跳動,離子化鄰近於目標表面的原子或分子。這些離子均順序地朝向負偏壓之目標加速,因而逐出目標原子且給予原子足夠動能以抵達基板並將之塗層。電線槽板的形狀係被相對於被濺射表面的目標表面之靜磁陣列所界定。由於存在磁性陣列,該一澱積過程通稱為"磁控管濺射"。Sputtering material from a target to cover a substrate has become a common practice in a wide range of technical fields, such as integrated circuit fabrication, large area glass coatings, and more and more coated flat panel displays. The sputtering is produced in a reduced pressure atmosphere wherein a sputtering or reactive gas or a mixture of the two is allowed in a controlled manner. Free electrons bouncate in the electromagnetically constrained wire slot plate, ionizing atoms or molecules adjacent to the target surface. These ions are sequentially accelerated toward the target of the negative bias, thus displacing the target atoms and giving the atoms sufficient kinetic energy to reach the substrate and coat it. The shape of the wire slot plate is defined by a magnetostatic array relative to the target surface of the sputtered surface. This deposition process is commonly referred to as "magnetron sputtering" due to the presence of a magnetic array.

已針對特定應用研發、設計及建造非常多之裝置。首先,較小磁控管濺射裝置使用初始主要為圓形形式之固定平面目標(即為,類似於被濺射上的矽晶圓)。而後,具有用以塗層通過目標下方之較大基板的伸長、矩形形狀(例如US 3878085)。該伸長平面目標現在通常被使用在精細'顯示塗料器'中,用以製造例如為液晶顯示器(LCD)及電漿螢幕的平板顯示器。這些平面目標通常被裝配在裝置的進入門中;目標表面係易於抵達(門開啟時)且擴展長度並甚至延伸在基板寬度上方。在一顯示塗料器中,將被塗層之基板係在直立的傾斜角(7°至15°)下被固持,且在一運送系統中前傾。由於目標必須平行於基板以使獲致統一的塗層,目標必須在實質上相同的角度被裝配。A large number of devices have been developed, designed and built for specific applications. First, the smaller magnetron sputtering apparatus uses a fixed planar target that is initially predominantly circular (i.e., similar to the tantalum wafer being sputtered). There is then an elongated, rectangular shape (e.g., US 3878085) for coating through a larger substrate below the target. The elongated planar target is now commonly used in fine 'display coaters' to make flat panel displays such as liquid crystal displays (LCDs) and plasma screens. These planar targets are typically assembled in the access door of the device; the target surface is easily accessible (when the door is open) and extends in length and even extends over the width of the substrate. In a display coater, the coated substrate is held at an upright tilt angle (7° to 15°) and is tilted forward in a transport system. Since the target must be parallel to the substrate to achieve a uniform coating, the targets must be assembled at substantially the same angle.

固定目標均易於被冷卻及激勵(由於其相關於裝置係靜止的),但其具有目標材料僅在電線槽板下方浸蝕掉的優點。目標之可使用壽命因而被限制於目標被首先穿透之前的時間點。經由導入相對於目標表面旋轉(諸如例如US 4995958中介紹之用於圓形平面磁控管)或相對於目標表面平移(諸如例如US 6322679中描述之用於伸長平面磁控管)的磁性陣列,必須處理不均勻腐蝕的問題。該種構造雖然可較大程度緩和不均勻腐蝕問題,但已使該系統更複雜。The fixed target is easily cooled and energized (since it is stationary with respect to the device), but it has the advantage that the target material is only etched under the wire slot. The useful life of the target is thus limited to the point in time before the target is first penetrated. Magnetic arrays that are rotated relative to the target surface (such as, for example, for a circular planar magnetron as described in US 4,995,958) or with respect to a target surface, such as, for example, the elongated planar magnetron described in US 6,322,679, The problem of uneven corrosion must be addressed. Although this type of construction can alleviate the problem of uneven corrosion to a large extent, the system has been made more complicated.

塗層例如為視窗玻璃所有種類之功能性塗層堆疊的大面積塗料器,通常設有旋轉管式濺射目標。在此一應用中,以低材料成本及良好品質生產經濟的驅動器。旋轉管式目標係理想之選擇,因為其可擴展大寬度且可長時期使用。所必須交換的是由於目標本身相對於裝置旋轉,故需要一複雜且佔據空間的'端塊'在固持被固定在內側之磁性陣列時,用以支承、旋轉、激勵、冷卻及隔離(冷卻劑、空氣及電力)旋轉目標。存在有二型配置:.諸如揭示在US 5096562(圖2、圖6)及US 2003/0136672 A1中之雙直角端塊,其中用以支承、旋轉、激勵、冷卻及隔離(冷卻劑、空氣及電力)之機構均被分在置於目標的每一端處之二端塊之間。直角係代表端塊均被裝配在平行於目標的旋轉軸線之壁。這些端塊通常被裝配在含有輔助設備的頂部盒底部處。設有端塊且裝配目標的頂部盒可被完全地提昇離開大面積塗料器,使易於更換及維護目標。The coating is, for example, a large area coater of all types of functional coating stacks of window glass, typically provided with a rotating tube sputtering target. In this application, economical drives are produced with low material costs and good quality. Rotating tubular targets are ideal because they can be extended to large widths and can be used for long periods of time. What must be exchanged is that because the target itself is rotated relative to the device, a complex and space-consuming 'end block' is required to support, rotate, energize, cool and isolate the coolant when it is held in the inner magnetic array. , air and electricity) rotate the target. There are two types of configurations: Such as the double right-angle end blocks disclosed in US 5096562 (Fig. 2, Fig. 6) and US 2003/0136672 A1, wherein the mechanisms for supporting, rotating, energizing, cooling and isolating (coolant, air and electricity) are divided. Between the two end blocks placed at each end of the target. The right angle system represents that the end blocks are all assembled on the wall parallel to the axis of rotation of the target. These end blocks are typically assembled at the bottom of the top box containing the auxiliary equipment. The top box with end blocks and assembly targets can be lifted completely away from the large area coater, making it easy to replace and maintain the target.

.諸如揭示在US 5200049(圖1)中的單一直線通過端塊,其中用以支承、旋轉、激勵、冷卻及隔離之機構均被結合在一端塊中,且目標被懸臂式固持在大面積塗料器內側。'直線通過'代表目標的旋轉軸線係垂直於端塊被裝配的壁。'半懸臂式'配置亦說明於US 5620577中,其中最遠離端塊之目標的末端係被一機械支撐件所固持(沒有任何功能性機構結合在該支撐件中)。. A single straight line, such as disclosed in US 5200049 (Fig. 1), passes through the end blocks, wherein the mechanisms for supporting, rotating, energizing, cooling, and isolating are combined in one end block, and the target is cantilevered to hold in a large area coater Inside. The 'straight line through' axis representing the target is perpendicular to the wall on which the end block is assembled. A 'semi-cantilever' configuration is also described in US 5,620,577, in which the end of the target furthest from the end block is held by a mechanical support (without any functional mechanism incorporated in the support).

雖然可旋轉目標使用在顯示塗料器時可具有許多優點(增加用盡時間,幾乎100%使用目標),但這些目標的裝配仍有問題:.任一單一或雙直角端塊的選擇係裝配至門。但在該情況中,門的大部份長度被端塊佔據,使得可使用目標長度不能擴展跨越基板寬度之全長。While rotatable targets can have many advantages when used to display painters (increasing exhaustion time, almost 100% use of targets), the assembly of these targets is still problematic: The choice of any single or double right end block is assembled to the door. In this case, however, most of the length of the door is occupied by the end blocks such that the target length can be used to not extend over the full length of the substrate width.

.或,一供一單一直線通過端塊之選擇,但在該情況中,由於導入該一端塊,需要徹底變異顯示塗料器。. Or, a choice of a single straight line through the end block, but in this case, due to the introduction of the one end block, it is necessary to completely variably display the coater.

因而必須面對尺寸限制問題。第一可能的解決方法述於WO2005/005682A1中,經由結合其之功能性機構在目標管內側而減少端塊之寬度。雖然該種解決方法是極為可能的,本發明人尋找進一步之尺寸減少的可能性且提出解決尺寸限制問題的如下說明之本發明。Therefore, it is necessary to face the size limitation problem. A first possible solution is described in WO 2005/005682 A1, by reducing the width of the end blocks by means of a functional mechanism incorporating them on the inside of the target tube. While this solution is highly probable, the inventors have sought a further possibility of size reduction and have proposed the invention as described below which addresses the size limitation problem.

本發明之一般性目的係減少或排除附屬於習知技術之問題。本發明之一目的係使可旋轉濺射目標以顯示塗料器,不論其為原始設備或既存裝備的重設。本發明之進一步目的係在目標旋轉軸線方向中減少端塊之長度,即為提供一'扁平'端塊。依據本發明之另一觀點,提供使用扁平端塊之濺射裝置。The general purpose of the present invention is to reduce or eliminate the problems associated with the prior art. One of the objects of the present invention is to enable a rotatable sputtering target to display a coater, whether it is a reset of an original equipment or an existing equipment. A further object of the invention is to reduce the length of the end blocks in the direction of the target axis of rotation, i.e. to provide a 'flat' end block. According to another aspect of the present invention, a sputtering apparatus using a flat end piece is provided.

在考慮解決問題時,令發明人驚訝的,諸如US 5096562、US 5200049、US 2003/0173217的所有習知技術,均沿一端塊內側之目標管的旋轉軸線良好地一個接一個的裝配用於支承、旋轉、激勵、冷卻及隔離(空氣、冷卻劑及電力)之不同機構。盒子外的想法將這些機構攜至實質上置於互相為徑向的基本原理,以使節省在旋轉軸線方向中之空間。此一設計端塊的新方式係述於所附之現在將詳細解釋的申請專利範圍中。In the interest of the inventors, all the prior art techniques such as US 5,096, 062, US 5,200, 049, and US 2003/0173217 are well assembled one after the other along the axis of rotation of the target tube inside the one end block. Different mechanisms for rotation, excitation, cooling, and isolation (air, coolant, and electricity). The idea outside the box carries these mechanisms to the basic principle of being placed radially in each other so that the space in the direction of the axis of rotation is saved. This new way of designing the end blocks is described in the appended claims, which are hereby incorporated by reference.

本發明之第一觀點係有關於具有申請專利範圍第1項的特色組合之端塊。本發明之端塊的較佳實施例之特色均陳述於相關申請專利範圍第2至21項中。The first aspect of the present invention relates to an end block having a characteristic combination of the first item of the patent application scope. The features of the preferred embodiment of the end block of the present invention are set forth in Sections 2 through 21 of the related claims.

揭示一端塊。該一端塊連結濺射裝置中的濺射目標至濺射裝置外側。該一端塊較佳為可裝配為在濺射裝置上的單一單位,但亦可應用與壁整合之端塊。在端塊內之壓力係高於在可排氣裝置中,較佳的,壓力係大氣壓力。可與目標管移除的機構或可移除電磁桿組件均被認為不屬於端塊。端塊之主要功能係支承且環繞旋轉軸線旋轉目標。在低氣體壓力下執行濺射時,端塊必須隨時均為氣密且當然在旋轉時亦然。由於濺射目標會在目標表面上產生許多熱,目標必須被冷卻,其通常以水或其他適合冷卻劑來完成。此一冷卻劑必須經由端塊進給及排出。而且,目標必須進給電流以使保持目標在某一電位之上。再次的,此一電流必須通過該端塊。為使結合所有這些功能,一端塊可包含不同機構:A)一使目標旋轉之驅動機構。較佳的,此係由蝸桿-齒輪系統、或圓筒形齒輪-齒輪系統或圓錐形齒輪-齒輪交叉軸線系統、或滑輪-皮帶系統、或任何習知之可旋轉目標的其他機構完成。任何型式之驅動機構均會佔據旋轉軸線上的某一區域。驅動機構範圍係被在垂直於旋轉軸線的二平面之二交點之間的旋轉軸線上之間距所界定,該平面局限以相同於目標之旋轉速率轉動的驅動齒輪或滑輪。在齒輪的情況中,這些平面界定齒輪的最大寬度。在滑輪的情況中,這些平面界定滑輪的寬度。Reveal one end block. The one end block connects the sputtering target in the sputtering apparatus to the outside of the sputtering apparatus. Preferably, the one end block can be assembled as a single unit on the sputtering apparatus, but end blocks integrated with the wall can also be applied. The pressure in the end block is higher than in the venting device, preferably, the pressure is atmospheric pressure. A mechanism that can be removed from the target tube or a removable magnetic rod assembly is considered to be not an end block. The primary function of the end block is to support and rotate the target about the axis of rotation. When sputtering is performed at low gas pressure, the end blocks must be airtight at all times and of course also when rotating. Since the sputtering target will generate a lot of heat on the target surface, the target must be cooled, which is usually done with water or other suitable coolant. This coolant must be fed and discharged via the end block. Moreover, the target must feed current to keep the target above a certain potential. Again, this current must pass through the end block. In order to combine all of these functions, one end block can contain different mechanisms: A) A drive mechanism that rotates the target. Preferably, this is accomplished by a worm-gear system, or a cylindrical gear-gear system or a conical gear-to-gear cross-axis system, or a pulley-belt system, or any other mechanism of conventional rotatable targets. Any type of drive mechanism will occupy an area on the axis of rotation. The range of drive mechanisms is defined by the distance between the axes of rotation between two intersections of two planes perpendicular to the axis of rotation that are limited to drive gears or pulleys that rotate at the same rate of rotation as the target. In the case of gears, these planes define the maximum width of the gear. In the case of a pulley, these planes define the width of the pulley.

B)一提供電流至目標之可旋轉電接點機構。此較佳的由配設有與整流子環滑動接觸之電刷的電整流子機構達成。除了電刷與環配置外,可使用滑向互相的二環,或可使用諸如金屬帶的電導帶型連接。後一解決方法方便地組合徑向於電接點機構之驅動機構。在任一情況中,此一可旋轉電接點機構會佔據旋轉軸線上的某一範圍,該範圍可再次由二平面與旋轉軸線之交點所界定,該平面係垂直於旋轉軸線。B) A rotatable electrical contact mechanism that supplies current to the target. This is preferably achieved by an electrical commutator mechanism provided with a brush in sliding contact with the commutator ring. In addition to the brush and ring configuration, two loops that slide toward each other can be used, or a conductive tape type connection such as a metal strip can be used. The latter solution conveniently combines the drive mechanisms radially to the electrical contact mechanism. In either case, the rotatable electrical contact mechanism can occupy a range on the axis of rotation that can again be defined by the intersection of the two planes and the axis of rotation that is perpendicular to the axis of rotation.

C)多數之軸承機構。根據目標之重量,會需要多於一之軸承機構。習於本技藝者可由不同已知型式的軸承選出適合型式之軸承,諸如滾珠軸承、軋輥軸承、平坦軸承、軸向軸承或任何其他習知型式之軸承。由於可能需要多數之軸承機構,其每一會在旋轉軸線上界定一軸承機構範圍。再次的,軸承機構範圍係被界定為限制軸承機構的在垂直於旋轉軸線之二平面的旋轉軸線上之交點之間的間距。C) Most bearing mechanisms. More than one bearing mechanism will be required depending on the weight of the target. Those skilled in the art can select bearings of a suitable type from bearings of different known types, such as ball bearings, roll bearings, flat bearings, axial bearings or any other conventional type of bearing. Since a large number of bearing mechanisms may be required, each will define a range of bearing mechanisms on the axis of rotation. Again, the range of bearing mechanisms is defined as the spacing between the intersections of the bearing mechanisms on the axes of rotation perpendicular to the plane of rotation.

D)多數之可旋轉冷卻劑密封機構。這些冷卻劑密封件確保在一端塊的固定及可旋轉部件互相相對轉動時,不會使冷卻劑洩漏進入端塊內、或更糟地進入真空裝置內。為使減少此一風險,多數之冷卻劑密封件被梯級地導入。有時在主與副密封件之間導入冷卻劑偵測器以使偵測洩漏,且允許機器的受控停產。習知之典型唇形密封件被使用為冷卻劑密封件。但未排除例如為機械面密封件或曲折軸封的其他型式密封件,使無遺漏。如前述的,每一冷卻劑密封機構界定一冷卻劑密封機構範圍在限制冷卻劑密封件且均垂直於旋轉軸線的二平行平面之旋轉軸線的交點之間。D) Most rotatable coolant sealing mechanisms. These coolant seals ensure that the coolant does not leak into the end block or worse into the vacuum device when the fixed and rotatable members of one end block are rotated relative to one another. In order to reduce this risk, most of the coolant seals are introduced step by step. A coolant detector is sometimes introduced between the primary and secondary seals to detect leakage and allow for controlled shutdown of the machine. A typical lip seal of the prior art is used as a coolant seal. However, other types of seals, such as mechanical face seals or meandering shaft seals, are not excluded, so that no omissions are made. As previously described, each coolant sealing mechanism defines a range of coolant sealing mechanisms between the intersections of the axes of rotation that limit the coolant seals and are perpendicular to the two parallel planes of the axis of rotation.

E)最後需要多數之可旋轉真空密封機構。這些真空密封件確保在端塊之固定與旋轉部件互相相對旋轉時的真空整體性。較佳為梯級系列真空密封件-逐漸地保護真空,以使減少真空洩漏之風險。再次的,多種不同已知密封件中唇形密封件係最常見的,雖然當然亦可使用諸如鐵流體密封件的其他型式新密封件。相同的,每一真空密封機構界定一真空密封機構範圍,該範圍覆蓋由垂直於旋轉軸線且限制真空密封件的二平行平面交叉所界定之二點之間的間距。E) Finally, a majority of rotatable vacuum sealing mechanisms are required. These vacuum seals ensure vacuum integrity when the end block is fixed and the rotating parts are rotated relative to each other. A step series vacuum seal is preferred - the vacuum is gradually protected to reduce the risk of vacuum leaks. Again, a variety of different known seals are the most common of the lip seals, although other types of new seals such as iron fluid seals may of course be used. Similarly, each vacuum sealing mechanism defines a range of vacuum sealing mechanisms that cover the spacing between two points defined by the intersection of two parallel planes that are perpendicular to the axis of rotation and that limit the vacuum seal.

除了前述之外,端塊亦可具有某些固持磁性陣列在一穩定位置中的機構,該陣列於裝配在端塊上之前被導入目標管內,而目標管環繞其旋轉。在磁性陣列的另一端處,一軸承機構通常固持相關於目標管定心之陣列。In addition to the foregoing, the end block can also have some mechanism for holding the magnetic array in a stable position, the array being introduced into the target tube before being assembled on the end block, with the target tube rotating therearound. At the other end of the magnetic array, a bearing mechanism typically holds an array of centerings associated with the target tube.

本發明之端塊包含至少二前述辨識出的五機構(A、B、C、D及E)。因而,本發明之端塊可包含那些機構的輔助組,只要其之二或更多之該機構係在輔助組中而其他機構結合在另一端塊中(如此增加達到14個技術性有意義的輔助組)。所有五機構之組亦被認為係一輔助組。The end block of the present invention comprises at least two of the aforementioned five mechanisms (A, B, C, D and E). Thus, the end blocks of the present invention may comprise auxiliary groups of those mechanisms, as long as two or more of the mechanisms are in the auxiliary group and the other units are combined in the other end block (so increasing to 14 technically meaningful aids) group). The group of all five institutions is also considered to be an auxiliary group.

徑向而非縱向地(一個接一個)裝配這些不同機構的基本理念現在可方便地以申請專利範圍第1項之特徵部位表達。當相對應於那些機構的二範圍互相重疊在旋轉軸上時,該二機構被認為互相相對的徑向裝配。範圍之間的重疊可為局部的,即為當二範圍僅具有一部份共用時。或可為完整的,於此情況,一機構被其他機構徑向向內或徑向向外完全地覆蓋。在本發明端塊中,至少二機構互相重疊。其因而不排除存在多於一對之重疊機構,例如,二對重疊機構存在於一單一端塊內(其當然代表三機構必須存在於端塊內)。其亦不排除三機構互相重疊(相等於三對重疊)。習於本技藝者可輕易了解徑向建構更多機構(最多當然為五機構),可進一步減少端塊的/軸向長度。The basic idea of assembling these different mechanisms in a radial rather than a longitudinal direction (one after the other) can now be conveniently expressed in the characterizing part of claim 1 of the patent application. When the two ranges corresponding to those mechanisms overlap each other on the rotating shaft, the two mechanisms are considered to be radially assembled to each other. The overlap between the ranges can be local, that is, when the two ranges have only a part of the common. Or it may be complete, in which case a mechanism is completely covered radially inward or radially outward by other mechanisms. In the end block of the present invention, at least two mechanisms overlap each other. It thus does not exclude the existence of more than one pair of overlapping mechanisms, for example, two pairs of overlapping mechanisms are present in a single end block (which of course represents that the three mechanisms must be present in the end block). It also does not exclude that the three institutions overlap each other (equivalent to three pairs of overlaps). Those skilled in the art can easily understand that more mechanisms are radially constructed (up to five mechanisms, of course), which can further reduce the length/axial length of the end blocks.

在申請專利範圍附屬項第2至9項中,揭示特別有用之包含在一端塊中的機構之輔助組,其中每一次至少二不同機構被互相徑向地裝配。In the items 2 to 9 of the patent application scope, a particularly useful auxiliary group of mechanisms included in one end block is disclosed, wherein at least two different mechanisms are radially assembled to each other.

在第一較佳實施例中-申請專利範圍第2項-驅動機構(A)、電接點機構(B)與冷卻劑密封機構(D)均被組合在單一端塊中(其他機構係應用在例如目標之另一端處的端塊中)。以此一較佳組合,提供具有通過單一端塊之所有互連(冷卻劑、電力、運動)的最少機構。至少二前速提及之機構必須互相重疊。In the first preferred embodiment - the scope of claim 2 - the drive mechanism (A), the electrical contact mechanism (B) and the coolant sealing mechanism (D) are combined in a single end block (other mechanisms are applied In the end block at the other end of the target, for example). With this preferred combination, a minimum mechanism is provided with all interconnections (coolant, power, motion) through a single end block. At least two institutions mentioned in the previous speed must overlap each other.

第二較佳輔助組-申請專利範圍第3-包含驅動機構(A)、軸承機構(C)與真空密封機構(E)在單一端塊中(另一端塊必須容納剩餘機構)。該一端塊係描述於US 2003/0136672之圖3中。再次的,至少二機構必須重疊以使具有依據本發明之端塊。不排除更多對之重疊機構。The second preferred auxiliary group - Patent Application No. 3 - contains the drive mechanism (A), the bearing mechanism (C) and the vacuum sealing mechanism (E) in a single end block (the other end block must accommodate the remaining mechanism). This one end block is described in Figure 3 of US 2003/0136672. Again, at least two mechanisms must overlap to have an end block in accordance with the present invention. Do not rule out more overlapping institutions.

在第三輔助組中-申請專利範圍第4項-端塊密實地容納可旋轉電接點機構(B)、軸承機構(C)與真空密封機構(E)。至少二機構必須重疊,當然不排除更多之重疊。In the third auxiliary group - Patent Application No. 4 - the end block densely accommodates the rotatable electrical contact mechanism (B), the bearing mechanism (C) and the vacuum sealing mechanism (E). At least two institutions must overlap, and of course do not rule out more overlap.

第四輔助組-申請專利範圍第5項-結合軸承機構(C)、可旋轉冷卻劑密封機構(D)與可旋轉真空密封機構(E)在單一端塊中(例如示於US 5096562,圖6,左端塊)。本發明之概念需要至少二且可能更多的機構成對重疊。The fourth auxiliary group - patent application scope 5 - combined bearing mechanism (C), rotatable coolant sealing mechanism (D) and rotatable vacuum sealing mechanism (E) in a single end block (for example, shown in US 5096562, figure 6, the left end block). The concept of the invention requires at least two and possibly more machine pairs to overlap.

第五輔助組-申請專利範圍第6項-結合驅動機構(A)、軸承機構(C)、可旋轉冷卻劑密封機構(D)與可旋轉真空密封機構(E)的四機構進入單一端塊內(類似於US 5096562,圖2,左端塊)。本發明之端塊的四機構中具有至少二機構在重疊位置中,亦可能有更多重疊機構對。Fifth auxiliary group - patent application scope item 6 - combined drive mechanism (A), bearing mechanism (C), rotatable coolant sealing mechanism (D) and rotatable vacuum sealing mechanism (E) into a single end block Inside (similar to US 5096562, Figure 2, left end block). The four mechanisms of the end block of the present invention have at least two mechanisms in the overlapping position, and there may be more pairs of overlapping mechanisms.

第六輔助組-申請專利範圍第7項-應用驅動機構(A)、可旋轉電接點機構(B)、軸承機構(C)與可旋轉真空密封機構(E)在單一端塊中(US 5096562,圖6,右端塊)。再次的,在本發明端塊中,至少二該機構均被徑向裝配且重疊。相同的,可能有更多對之重疊機構。Sixth Auxiliary Group - Patent Application No. 7 - Application Drive Mechanism (A), Rotatable Electrical Contact Mechanism (B), Bearing Mechanism (C) and Rotatable Vacuum Sealing Mechanism (E) in Single End Block (US 5096562, Figure 6, right end block). Again, in the end blocks of the present invention, at least two of the mechanisms are radially assembled and overlapped. The same, there may be more overlapping institutions.

第七輔助組-申請專利範圍第8項-包含可旋轉電接點機構(B)、軸承機構(C)、可旋轉冷卻劑密封機構(D)與可旋轉真空密封機構(E)在一端塊中(如US 2003/0136672,圖6)。依據本發明概念,四機構中的至少二機構必須位於重疊位置中。但更多對重疊機構亦相等可能的,最多為六機構。The seventh auxiliary group - patent application scope 8 - includes a rotatable electrical contact mechanism (B), a bearing mechanism (C), a rotatable coolant sealing mechanism (D) and a rotatable vacuum sealing mechanism (E) at one end block Medium (eg US 2003/0136672, Figure 6). According to the inventive concept, at least two of the four mechanisms must be in an overlapping position. But more overlapping institutions are equally likely, up to six institutions.

最後,第八輔助組-申請專利範圍第9項-包含所有機構,驅動機構(A)、可旋轉電接點機構(B)、軸承機構(C)、冷卻劑密封機構(D)與真空密封機構(E)在單一端塊中(US 5200049之圖1)。其不排除另一末端被一軸承機構固持。依據本發明概念,至少二機構必須徑向配置,但其相等可能的存在更多對之重疊機構。Finally, the eighth auxiliary group - patent application scope 9 - contains all mechanisms, drive mechanism (A), rotatable electrical contact mechanism (B), bearing mechanism (C), coolant sealing mechanism (D) and vacuum seal The mechanism (E) is in a single end block (Figure 1 of US 5200049). It does not exclude that the other end is held by a bearing mechanism. In accordance with the teachings of the present invention, at least two mechanisms must be radially arranged, but equally likely there are more overlapping mechanisms.

二功能之重疊係進一步描述於申請專利範圍附屬項第10至19項。全部組合可附屬於申請專利範圍第1項中。對某些機構的輔助組,僅可能有數個重疊對。在第一較佳組合中,至少驅動機構範圍與電接點機構範圍重疊(申請專利範圍第10項)。在第二組合中(申請專利範圍第11項),驅動機構及軸承機構均被互相徑向地裝配。申請專利範圍第12項說明一較佳密實實施例,其之驅動機構係徑向相關於冷卻劑密封件。可選擇的,真空密封件可被徑向相關於驅動機構裝配(申請專利範圍第13項)。申請專利範圍第14、15及16項界定較佳組合,其中一群組係由軸承機構、被放置徑向於電接點機構的冷卻劑密封件與真空密封件所組成:易於應用之密實實施例。一徑向裝配軸承機構與冷卻劑機構(申請專利範圍第17項)或軸承機構與真空密封機構(申請專利範圍第18項)的組合係相當易於夜用,且因而較佳的密實端塊。前述亦可相同應用至冷卻劑密封機構與真空密封機構的徑向組合(申請專利範圍第19項。The overlap of the two functions is further described in items 10 to 19 of the scope of the patent application. All combinations can be attached to item 1 of the scope of the patent application. For auxiliary groups in some institutions, there may only be several overlapping pairs. In the first preferred combination, at least the range of the drive mechanism overlaps with the range of the electrical contact mechanism (item 10 of the patent application). In the second combination (article 11 of the patent application), the drive mechanism and the bearing mechanism are all radially assembled to each other. Patent Application Serial No. 12 describes a preferred compact embodiment in which the drive mechanism is radially related to the coolant seal. Alternatively, the vacuum seal can be radially associated with the drive mechanism (item 13 of the patent application). Patent Application Nos. 14, 15, and 16 define a preferred combination, one of which consists of a bearing mechanism, a coolant seal placed radially to the electrical contact mechanism, and a vacuum seal: an easy-to-use compact implementation example. The combination of a radially assembled bearing mechanism and a coolant mechanism (Patent No. 17) or a combination of a bearing mechanism and a vacuum sealing mechanism (Application No. 18) is relatively easy to use at night, and thus a preferred dense end block. The foregoing can also be applied to the radial combination of the coolant sealing mechanism and the vacuum sealing mechanism (Patent No. 19 of the patent application).

再次的:界定在申請專利範圍第10至19項的組合不排除多於一對之機構重疊在單一端塊中的可能性。在單一端塊中可有甚至更多之重疊,例如互相徑向的三機構。確實,其完美地可能例如裝配互相徑向的軸承機構、電接點機構、及冷卻劑密封件,此將於實施例中示範。Again: the combination defined in clauses 10 to 19 of the patent application does not exclude the possibility that more than one pair of mechanisms overlap in a single end block. There can be even more overlap in a single end block, such as three mechanisms that are radially opposite each other. Indeed, it is perfectly possible to assemble, for example, mutually radial bearing mechanisms, electrical contact mechanisms, and coolant seals, as will be exemplified in the embodiments.

依據本發明之端塊可為直角型(申請專利範圍第20項),其中目標之旋轉軸線係平行於裝配端塊的壁。或其可為直線通過型(申請專利範圍第21項),即為,目標之旋轉軸線垂直於壁。The end block according to the invention may be of the right angle type (article 20 of the patent application), wherein the axis of rotation of the target is parallel to the wall of the mounting end block. Or it may be a straight-through type (Patent No. 21), that is, the axis of rotation of the target is perpendicular to the wall.

本發明之第二觀點係有關於使用依據申請專利範圍第22項之特色的本發明端塊之濺射裝置。供較佳裝配端塊在濺射裝置中的特定特色係均被界定在申請專利範圍附屬項第23至24中。The second aspect of the present invention relates to a sputtering apparatus using the end block of the present invention according to the feature of claim 22 of the patent application. Specific features for the preferred assembly end blocks in the sputtering apparatus are defined in claims 23 to 24 of the scope of the patent application.

如同在本發明之目的中所解釋的,依據本發明之端塊均特別希望但不侷限地被裝配在諸如顯示器塗料器的濺射裝置內側。該一濺射裝置具有由壁限制之可排氣空間。特別揭示(申請專利範圍第22項)設有本發明端塊或位於這些壁之一上的端塊之濺射裝置。更佳的,為易於提供服務,端塊係均被裝配在室之可移動壁上(申請專利範圍第23項)。最佳的端塊可裝配在一進入門上(申請專利範圍第24項)。As explained in the object of the invention, the end blocks according to the invention are particularly desirable, but not limited, to be mounted inside a sputtering device such as a display coater. The sputtering apparatus has an ventable space defined by walls. Particularly disclosed (Patent Application No. 22) is a sputtering apparatus provided with an end block of the present invention or an end block located on one of the walls. More preferably, for ease of service, the end blocks are assembled on the movable wall of the chamber (Patent No. 23). The best end block can be assembled on an access door (Patent No. 24).

圖1A與B均顯示出本發明解決之問題。圖1A概略地顯示一開敞之濺射裝置10,該裝置10實質上類似於一般之顯示器塗料器垂直地定向。圖1B顯示門關閉之相同裝置10的橫剖面。該裝置10包含一可排氣室100。該室100可為生產線的一部份,經由鎖101互連以允許室100自剩餘的生產線隔開。在室100中,由運送系統104依序地運送基板102。基板102在一系列軋輥105上於一傾斜角下傾斜。室100的門106固持一、二或更多可旋轉目標108、108'。在門封閉時(圖1B),目標108、108'成為平行於基板102、每一目標係由二端塊110、112(目標108)與110'、112'(目標108')固持在門上。端塊110、112係在可旋轉目標108與固定室之間的連接器。其之主要功能名為允許目標108環繞其之旋轉軸線111旋轉。在端塊內,沒有低壓環境,即為基準之大氣壓力。不同機構(A、B、C、D與E)必須被結合在單一端塊中(下部端塊110或上部端塊112)或被分配至目標的二末端處之二端塊110、112。結合在裝置之低壓部份的機構均不被認為是一端塊之機構部份。在例如單一端塊的情況中,在相對於被連接至端塊之目標末端的目標末端處被裝配至門106之定心銷,不被認為是一端塊。經由端塊,旋轉運動120、目標電流122及冷卻劑124被進給至目標。1A and B both show the problem solved by the present invention. Figure 1A schematically shows an open sputtering apparatus 10 that is oriented substantially perpendicular to a typical display coater. Figure 1B shows a cross section of the same device 10 with the door closed. The device 10 includes an exhaustable chamber 100. The chamber 100 can be part of a production line interconnected via a lock 101 to allow the chamber 100 to be separated from the remaining production line. In the chamber 100, the substrate 102 is sequentially transported by the transport system 104. The substrate 102 is tilted at a tilt angle on a series of rolls 105. The door 106 of the chamber 100 holds one, two or more rotatable targets 108, 108'. When the door is closed (Fig. 1B), the targets 108, 108' become parallel to the substrate 102, and each target is held by the two end blocks 110, 112 (target 108) and 110', 112' (target 108') on the door. . The end blocks 110, 112 are connectors between the rotatable target 108 and the fixed chamber. Its main function name is to allow the target 108 to rotate about its axis of rotation 111. In the end block, there is no low pressure environment, which is the baseline atmospheric pressure. The different mechanisms (A, B, C, D, and E) must be combined in a single end block (lower end block 110 or upper end block 112) or two end blocks 110, 112 that are assigned to the two ends of the target. The mechanism incorporated in the low voltage portion of the device is not considered to be the mechanical portion of the one end block. In the case of, for example, a single end block, the centering pin that is assembled to the door 106 at the target end that is connected to the target end of the end block is not considered to be an end block. Via the end block, the rotational motion 120, the target current 122, and the coolant 124 are fed to the target.

圖2顯示依據本發明之端塊的第一較佳實施例之略圖。端塊200結合所有機構(A、B、C、D與E)在單一外罩201內側。其係直角型且可被裝配至一塗料器的壁或門202,固持目標220的上部末端。目標220可環繞其之旋轉軸線222旋轉。目標220被連接器224連接至固持環226。支承未示於圖之電磁桿的目標冷卻劑管230經由連接器232連通冷卻劑進給管228。冷卻劑進給管228係緊密且固定地裝附至端塊外罩201。冷卻劑係經由冷卻劑進給器234進給至冷卻劑管228內。冷卻劑係被收集在固定冷卻劑收集器229中,該收集器與冷卻劑管228同軸且經由管236抽出。Figure 2 shows a schematic view of a first preferred embodiment of an end block in accordance with the present invention. End block 200 incorporates all of the mechanisms (A, B, C, D, and E) inside a single housing 201. It is a right angle type and can be assembled to a wall or door 202 of a coater to hold the upper end of the target 220. The target 220 is rotatable about its axis of rotation 222. Target 220 is coupled to retaining ring 226 by connector 224. The target coolant pipe 230 supporting the electromagnetic rod not shown in the drawing communicates with the coolant feed pipe 228 via the connector 232. The coolant feed pipe 228 is tightly and fixedly attached to the end block housing 201. The coolant is fed into the coolant tube 228 via the coolant feeder 234. The coolant is collected in a fixed coolant collector 229 that is coaxial with the coolant tube 228 and is withdrawn via tube 236.

目標220被齒輪204經由固持環226旋轉驅動,因而提供驅動機構(A)。輪齒之在轉動上與蝸桿軸205的結合,係例如由電動馬達(未示於圖)所驅動。裝配環207固持作用為一軸承機構(C)的軸向軸承208。The target 220 is rotationally driven by the gear 204 via the retaining ring 226, thus providing a drive mechanism (A). The combination of the teeth on the rotation and the worm shaft 205 is driven, for example, by an electric motor (not shown). The assembly ring 207 retains the axial bearing 208 acting as a bearing mechanism (C).

可旋轉電接點機構(B)係由一系列之同軸於旋轉軸線222被裝配為環形區段的電刷206所提供。這些電刷206均被彈性裝配在電導環290中且滑向滑動環203。電刷206在其之轉動上經由導電環290承接電引線209進給的電流。滑動環203經由齒輪204及固持環226與目標220電接觸。二可旋轉真空密封機構(E)均被唇形密封件212提供。可旋轉冷卻劑密封機構(D)係被一曲折軸封件的冷卻劑密封件210所結合。冷卻劑密封件210被裝配在固持環226與冷卻劑收集器229之間。The rotatable electrical contact mechanism (B) is provided by a series of brushes 206 that are assembled into an annular section coaxially with the axis of rotation 222. These brushes 206 are each elastically fitted in the conductance ring 290 and slid toward the slip ring 203. The brush 206 receives the current fed by the electrical leads 209 via the conductive ring 290 on its rotation. The slip ring 203 is in electrical contact with the target 220 via the gear 204 and the retaining ring 226. Both rotatable vacuum sealing mechanisms (E) are provided by lip seals 212. The rotatable coolant sealing mechanism (D) is combined by a coolant seal 210 of a meandering shaft seal. The coolant seal 210 is fitted between the retaining ring 226 and the coolant collector 229.

每一前述機構佔有沿著旋轉軸線的某些長度。例如,齒輪204的寬度佔有示於圖2中之範圍'a'。範圍'a'係被界定為由限制齒輪204且以相同旋轉軸線垂直於該旋轉軸線的二平面交點所形成之旋轉軸線上的間隔。相同的,其他機構會佔有在旋轉軸線上的某些範圍:.可旋轉電接點機構(B)佔有範圍'b',該範圍等寬於電刷206及環203、290的軸向寬度。Each of the aforementioned mechanisms occupies some length along the axis of rotation. For example, the width of the gear 204 occupies the range 'a' shown in FIG. The range 'a' is defined as the spacing on the axis of rotation formed by the limit gear 204 and the intersection of two planes perpendicular to the axis of rotation of the same axis of rotation. In the same way, other institutions will occupy certain ranges on the axis of rotation: The rotatable electrical contact mechanism (B) occupies a range 'b' which is equal to the axial width of the brush 206 and the rings 203, 290.

.軸承機構(C)佔有由軸承208覆蓋之範圍'c'。. The bearing mechanism (C) occupies a range 'c' covered by the bearing 208.

.冷卻劑密封機構(D)佔有相對應於冷卻劑密封件210之範圍'd'。. The coolant sealing mechanism (D) occupies a range 'd' corresponding to the coolant seal 210.

.真空密封機構(E),由於具有二真空密封件212,覆蓋在旋轉軸線上的二範圍'e1'與'e2'。. The vacuum sealing mechanism (E), with two vacuum seals 212, covers two ranges 'e1' and 'e2' on the axis of rotation.

與本發明概念一致的,可得到下列之部份重疊範圍(表1): Consistent with the inventive concept, the following partial overlap ranges are available (Table 1):

其中,'P'代表局部重疊且'F'代表全部重疊。空格子代表完全未重疊。習於本技藝者可輕易了解前述配置引致一端塊不會佔據沿著縱向旋轉軸線的太多空間。Where 'P' represents partial overlap and 'F' represents full overlap. Empty grids represent no overlap at all. It will be readily apparent to those skilled in the art that the foregoing configuration results in one end block not occupying too much space along the longitudinal axis of rotation.

圖3顯示結合本發明端塊之特色的工程圖。該一詳圖可供習於本技藝者製造該端塊。為不使本說明太繁贅,功能明顯之部件將不加以辨識或說明。例如諸如螺釘、螺栓等之固定機構或諸如O型環的固定密封機構之部件對習於本技藝者而言,可輕易在圖式上辨識。Figure 3 shows an engineering drawing incorporating the features of the end blocks of the present invention. This detailed view can be used by those skilled in the art to make the end block. In order not to make this description too cumbersome, the functional parts will not be identified or explained. For example, a fixing mechanism such as a screw, a bolt, or the like, or a member of a fixed sealing mechanism such as an O-ring can be easily recognized in the drawings.

本發明之端塊300支承目標302(局部顯示)環繞旋轉軸線304。目標302係經由裝配環303可移除地固定至端塊。裝配環係被裝附至一可旋轉中間件311。端塊300被裝附至一濺射設備的壁306。端塊具有供進給用及抽出冷卻劑用之空穴305、307,箭頭指出冷卻劑的流動方向。電磁桿(未示於圖)經由一連接器309穩定地固持,連接器309切線地鎖入被固定地連接端塊300內側之內部管308內。The end block 300 of the present invention supports a target 302 (partially shown) about the axis of rotation 304. The target 302 is removably secured to the end block via the mounting ring 303. The assembly ring system is attached to a rotatable intermediate piece 311. End block 300 is attached to wall 306 of a sputtering apparatus. The end block has holes 305, 307 for feeding and extracting coolant, and the arrows indicate the flow direction of the coolant. A magnetic rod (not shown) is stably held via a connector 309, and the connector 309 is tangentially locked into the inner tube 308 that is fixedly coupled to the inner side of the end block 300.

目標302係由交叉軸線、錐形齒輪對310-312所驅動,使齒輪312係由電動馬達(未示於圖)經由軸線314引動。主要齒輪310被經由可旋轉中間件311固定至目標302。整流子環320亦被裝附至中間件311,該環320包含以扇形分佈在環320周邊上的六電刷322。電刷322滑向固定接觸環324內側。目標302因而經由引線(未示於圖)、接觸環324、電刷322、整流子環320及中間件311,自電流來源(未示於圖)接收其之電流。目標被二軸承旋轉地支承:滾珠軸承332及針輥軸承330。冷卻劑係由二旋轉唇形密封件所固持:主密封件342及副密封件340。端塊的真空整體性係經由二旋轉唇形密封件350、352所確保。Target 302 is driven by a cross-axis, bevel gear pair 310-312 such that gear 312 is actuated by an electric motor (not shown) via axis 314. The main gear 310 is fixed to the target 302 via the rotatable intermediate piece 311. The commutator ring 320 is also attached to the intermediate member 311, which includes six brushes 322 that are distributed in a fan shape on the periphery of the ring 320. The brush 322 slides toward the inside of the fixed contact ring 324. The target 302 thus receives its current from a source of current (not shown) via leads (not shown), contact ring 324, brush 322, commutator ring 320, and intermediate 311. The target is rotatably supported by two bearings: a ball bearing 332 and a needle roller bearing 330. The coolant is held by two rotating lip seals: a primary seal 342 and a secondary seal 340. The vacuum integrity of the end blocks is ensured by the two rotary lip seals 350,352.

再次的,附屬於這些機構的不同範圍可被辨識。其總結於表2中。小寫字母代表示於圖3中之範圍。Again, the different scopes attached to these institutions can be identified. It is summarized in Table 2. Lower case letters are represented in the range of Figure 3.

於此,字母P、F係與表1中使用之意義相同,且空格子相同地代表不重疊。雖然不同機構僅顯示小程度重疊,由表可清楚看出圖3之端塊仍然在互相徑向裝配機構的相同發明概念下。Here, the letters P and F have the same meanings as those used in Table 1, and the spaces are identically represented without overlapping. Although the different mechanisms show only a small degree of overlap, it is clear from the table that the end blocks of Figure 3 are still under the same inventive concept of mutually radial assembly mechanisms.

圖4顯示本發明之第三較佳實施例。端塊400係設有連接環403以使固定但可移除地連接目標管(未示於圖)與目標承接凸緣。目標管(未示於圖)係被凸緣401環繞旋轉軸線404旋轉。冷卻劑經由一電絕緣內本體408進給至目標(未示於圖)。內本體408之末端設有接頭409,該接頭與相關於旋轉目標穩定地固持電磁桿的電磁桿嵌件(未示於圖)配接。冷卻劑跟隨箭頭方向。端塊400將被裝配在濺射裝置之壁406上。Figure 4 shows a third preferred embodiment of the present invention. The end block 400 is provided with a connecting ring 403 to securely but removably connect the target tube (not shown) to the target receiving flange. The target tube (not shown) is rotated by the flange 401 about the axis of rotation 404. The coolant is fed to the target via an electrically insulating inner body 408 (not shown). The end of the inner body 408 is provided with a joint 409 which is mated with a magnetic rod insert (not shown) for stably holding the electromagnetic rod with respect to the rotating target. The coolant follows the direction of the arrow. End block 400 will be assembled on wall 406 of the sputtering apparatus.

目標(未示於圖)係由結合帶齒輪410之帶齒皮帶412驅動。此一帶齒輪經由中間件405連接至目標承接凸緣401。在帶齒輪410內側設有被固定至埋置於內本體408中的連接電極421的固定整流子420。整流子設有六電刷422,每一均覆蓋整流子420圓周的一扇形。電刷均被彈性裝配且滑向固定在帶齒輪410內側之內部環424。電流因而跟隨下述通路自電流來源(未示於圖)流至目標(未示於圖):電極421、固定整流子環420、固定電刷422、旋轉環424、帶齒輪410、中間件405、目標承接凸緣401。針輥軸承430及較大滾珠軸承432提供必須之軸承機構。機械密封暗盒443提供第一冷卻劑密封件。該一暗盒具有均被互相軸向地壓擠之相同直徑的二環。接觸面均被非常精確地拋光使得沒有冷卻劑可通過接觸面釋出。機械密封件暗盒443的一側係被銷441、441'切線地鎖定在定位。相對碳化鎢環444緊密配接旋轉中間件405,且由二固定O型環自冷卻劑流密封。副唇形密封件440進一步確保冷卻劑迴路整體性。經由主要真空唇形密封件450'及副唇形密封件450確保真空整體性。The target (not shown) is driven by a toothed belt 412 that incorporates a belt gear 410. This belt gear is connected to the target receiving flange 401 via the intermediate piece 405. A fixed commutator 420 fixed to the connection electrode 421 embedded in the inner body 408 is provided inside the belt gear 410. The commutator is provided with six brushes 422 each covering a sector of the circumference of the commutator 420. The brushes are all elastically assembled and slid toward the inner ring 424 that is secured to the inside of the belt gear 410. The current thus follows the path from the current source (not shown) to the target (not shown): electrode 421, fixed commutator ring 420, fixed brush 422, rotating ring 424, belt gear 410, middleware 405 The target receives the flange 401. Needle roller bearing 430 and larger ball bearing 432 provide the necessary bearing mechanism. The mechanical seal cassette 443 provides a first coolant seal. The cassette has two rings of the same diameter each being axially pressed against each other. The contact faces are all very precisely polished so that no coolant can be released through the contact faces. One side of the mechanical seal cassette 443 is tangentially locked by the pins 441, 441'. The rotating tungsten intermediate ring 405 is closely coupled to the rotating intermediate piece 405 and is sealed from the coolant flow by two fixed O-rings. The secondary lip seal 440 further ensures coolant circuit integrity. Vacuum integrity is ensured via the primary vacuum lip seal 450' and the secondary lip seal 450.

再次的,可繪出此一設計的重疊區域總結之表-表3。由不同機構在旋轉軸線上佔據的多數範圍係由圖4上之小寫字母-a、b、c1、c2、d1、d2、e1、e2-代表。Again, a table summarizing the overlapping regions of this design can be drawn - Table 3. The majority of the range occupied by the different mechanisms on the axis of rotation is represented by the lowercase letters -a, b, c1, c2, d1, d2, e1, e2 on Figure 4.

第三實施例因而清晰地具現本發明人前述之發明概念。The third embodiment thus clearly embodies the aforementioned inventive concept of the inventors.

前述實施例具有結合在單一端塊中的所有必要機構。端塊之另一端可因而自由立起或被定心銷定心固持,該銷被連接至相同於端塊被裝配上之壁的壁。The foregoing embodiments have all the necessary mechanisms incorporated in a single end block. The other end of the end block can thus be freely erected or centered by a centering pin that is connected to the same wall as the wall on which the end block is assembled.

習於本技藝者經由採用這些較佳實施例且自其排除特定機構來重分佈操作該裝置必要的機構至二端塊(個別在目標的每一末端處)僅會有小麻煩。可輕易了解,只要這些修正實施例顯示出重疊機構,即落於本發明範疇中。It is only a matter of skill for those skilled in the art to redistribute the mechanisms necessary to operate the device to the two end blocks (individually at each end of the target) by employing these preferred embodiments and excluding certain mechanisms therefrom. It will be readily understood that as long as these modified embodiments exhibit overlapping mechanisms, they fall within the scope of the present invention.

相同地,所有前述之端塊均為直角型,即為,旋轉軸線平行於端塊所裝配上之壁。習於本技藝者在轉換這些直角型成為直線通過型(即為旋轉軸線垂直於端塊所裝配上之壁的端塊)僅會有小麻煩。例如,圖4之實施例可輕易地經由伸長中間件405而被採用,使得可具有足夠空間來裝配端塊,並以目標定向面向濺射裝置之壁(導入必要的O型環及固定機構)。Similarly, all of the aforementioned end blocks are of a right angle type, i.e., the axis of rotation is parallel to the wall on which the end blocks are assembled. It is only a small problem for those skilled in the art to convert these right-angle types into a straight-through type (i.e., an end block whose axis of rotation is perpendicular to the wall on which the end block is assembled). For example, the embodiment of Figure 4 can be readily employed via the elongated intermediate member 405 such that there is sufficient space to fit the end block and face the wall of the sputter device with the target orientation (importing the necessary O-rings and securing mechanisms) .

依此,所有該修正及改變均落入本發明之實際精神及範疇內,且由申請專利範圍所涵括。Accordingly, all such modifications and changes are intended to be included within the scope of the invention and the scope of the invention.

10...濺射裝置10. . . Sputtering device

100...可排氣室100. . . Exhaust chamber

101...鎖101. . . lock

102...基板102. . . Substrate

104...運送系統104. . . Shipping system

105...軋輥105. . . Roll

106...壁106. . . wall

108...可旋轉目標108. . . Rotatable target

108'...可旋轉目標108'. . . Rotatable target

110...端塊110. . . End block

110'...端塊110'. . . End block

111...旋轉軸線111. . . Rotation axis

111'...旋轉軸線111'. . . Rotation axis

112...端塊112. . . End block

112'...端塊112'. . . End block

120...旋轉運動120. . . Rotational motion

122...目標電流122. . . Target current

124...冷卻劑124. . . Coolant

200...端塊200. . . End block

201...外罩201. . . Cover

202...門202. . . door

203...滑動澴203. . . Slide 澴

204...齒輪204. . . gear

205...蝸桿軸205. . . Worm shaft

206...電刷206. . . Brush

207...裝配環207. . . Assembly ring

208...軸向軸承208. . . Axial bearing

209...電引線209. . . Electrical lead

210...冷卻劑密封件210. . . Coolant seal

212...唇形密封件212. . . Lip seal

220...目標220. . . aims

222...旋轉軸線222. . . Rotation axis

224...連接器224. . . Connector

226...固持環226. . . Holding ring

228...冷卻劑進給管228. . . Coolant feed tube

229...固定冷卻劑收集器229. . . Fixed coolant collector

230...目標冷卻劑管230. . . Target coolant tube

232...連接器232. . . Connector

234...冷卻劑進給器234. . . Coolant feeder

236...管236. . . tube

290...導電環290. . . Conductive ring

300...端塊300. . . End block

302...目標302. . . aims

303...裝配環303. . . Assembly ring

304...旋轉軸線304. . . Rotation axis

305...空穴305. . . Hole

306...壁306. . . wall

307...空穴307. . . Hole

308...內管308. . . Inner tube

309...連接器309. . . Connector

310...主齒輪310. . . Main gear

311...可旋轉中間件311. . . Rotatable middleware

312...齒輪312. . . gear

314...軸線314. . . Axis

320...整流子環320. . . Commutator ring

322...電刷322. . . Brush

324...接觸環324. . . Contact ring

330...針輥軸承330. . . Needle roller bearing

332...滾珠軸承332. . . Ball bearing

340...副密封件340. . . Secondary seal

342...主密封件342. . . Main seal

350...旋轉唇形密封件350. . . Rotating lip seal

352...旋轉針輥密封件352. . . Rotating needle roller seal

400...端塊400. . . End block

401...目標承接凸緣401. . . Target bearing flange

403...連接環403. . . Connecting ring

404...旋轉軸線404. . . Rotation axis

405...中間件405. . . Middleware

406...壁406. . . wall

408...內本體408. . . Internal ontology

409...接頭409. . . Connector

410...帶齒輪410. . . With gear

412...帶齒皮帶412. . . Toothed belt

420...固定整流子420. . . Fixed commutator

421...連接電極421. . . Connecting electrode

422...電刷422. . . Brush

424...內環424. . . Inner ring

430...針輥軸承430. . . Needle roller bearing

432...滾珠軸承432. . . Ball bearing

440...副唇形密封件440. . . Secondary lip seal

441...銷441. . . pin

441'...銷441'. . . pin

442...接觸面442. . . Contact surfaces

443...機械密封暗盒443. . . Mechanical seal cassette

444...相對碳化鎢環444. . . Relative tungsten carbide ring

450...副唇形密封件450. . . Secondary lip seal

450'...主真空唇形密封件450'. . . Main vacuum lip seal

a...範圍a. . . range

b...範圍b. . . range

c...範圍c. . . range

c1...範圍C1. . . range

c2...範圍C2. . . range

d...範圍d. . . range

d1...範圍D1. . . range

d2...範圍D2. . . range

e1...範圍E1. . . range

e2...範圍E2. . . range

(A)...驅動機構(A). . . Drive mechanism

(B)...可旋轉電接點機構(B). . . Rotatable electrical contact mechanism

(C)...軸承機構(C). . . Bearing mechanism

(D)...冷卻劑密封機構(D). . . Coolant sealing mechanism

(E)...可旋轉真空密封機構(E). . . Rotatable vacuum sealing mechanism

本發明現在將參照所附圖式更詳細說明,其中:The invention will now be described in more detail with reference to the accompanying drawings in which:

圖1A係顯示一顯示器塗料器之概略立體圖。Figure 1A is a schematic perspective view showing a display coater.

圖1B係顯示垂直於基板行進方向之顯示器塗料器的概略橫剖面圖。Figure 1B is a schematic cross-sectional view showing the display coater perpendicular to the direction of travel of the substrate.

圖2顯示結合所有必須機構且具有大重疊程度之端塊的概略實施例。Figure 2 shows a schematic embodiment of an end block incorporating all necessary mechanisms and having a large degree of overlap.

圖3顯示一設計橫剖面,其中可旋轉電接點機構重疊冷卻劑密封機構且局部地重疊軸承機構。Figure 3 shows a design cross section in which the rotatable electrical contact mechanism overlaps the coolant sealing mechanism and partially overlaps the bearing mechanism.

圖4顯示一設計橫剖面,其中驅動機構重疊在其之轉動上重疊主要冷卻劑密封機構的可旋轉電接點機構,驅動機構亦重疊軸承機構。Figure 4 shows a design cross section in which the drive mechanism overlaps a rotatable electrical contact mechanism that overlaps the primary coolant sealing mechanism in its rotation, and the drive mechanism also overlaps the bearing mechanism.

200...端塊200. . . End block

201...外罩201. . . Cover

202...門202. . . door

203...滑動澴203. . . Slide 澴

204...齒輪204. . . gear

205...蝸桿軸205. . . Worm shaft

206...電刷206. . . Brush

207...裝配環207. . . Assembly ring

208...軸向軸承208. . . Axial bearing

209...電引線209. . . Electrical lead

210...冷卻劑密封件210. . . Coolant seal

212...唇形密封件212. . . Lip seal

220...目標220. . . aims

222...旋轉軸線222. . . Rotation axis

224...連接器224. . . Connector

226...固持環226. . . Holding ring

228...冷卻劑進給管228. . . Coolant feed tube

229...固定冷卻劑收集器229. . . Fixed coolant collector

230...目標冷卻劑管230. . . Target coolant tube

232...連接器232. . . Connector

234...冷卻劑進給器234. . . Coolant feeder

236...管236. . . tube

290...導電環290. . . Conductive ring

a、b、c、d、e1、e2...範圍a, b, c, d, e1, e2. . . range

Claims (24)

一種端塊,用於環繞在一可排氣濺射裝置中的旋轉軸線可旋轉地支承一目標,該端塊包含由一至少二下述機構組成的輔助組:. 一覆蓋該軸線上之驅動機構範圍的驅動機構,該驅動機構範圍係被界定為該軸線上的該驅動機構之垂直突起,. 一覆蓋該軸線上之接點機構範圍的可旋轉電接點機構,該接點機構範圍係被界定為該軸線上的該接點機構之垂直突起,. 多數之軸承機構,該等軸承機構覆蓋該軸線上之軸承機構範圍,該軸承機構範圍係被界定為該軸線上的該等軸承機構之垂直突起,. 多數之可旋轉冷卻劑密封機構,該等冷卻劑密封機構覆蓋該軸線上之冷卻劑密封機構範圍,該冷卻劑密封機構範圍係被界定為該軸線上的該等冷卻劑密封機構之垂直突起,. 多數之可旋轉真空密封機構,該等真空密封機構覆蓋該軸線上之真空密封機構範圍,該真空密封機構範圍係被界定為該軸線上的該等真空密封機構之垂直突起,其特徵在於,在該些機構的輔助組之內的至少二機構均被互相徑向 地安排,因此對應於該至少二機構之至少二範圍均在該軸線上互相重疊。An end block for rotatably supporting a target about an axis of rotation in an exhaust gas sputter device, the end block comprising an auxiliary group consisting of at least two of the following mechanisms: a drive mechanism covering a range of the drive mechanism on the axis, the drive mechanism range being defined as a vertical protrusion of the drive mechanism on the axis. a rotatable electrical contact mechanism covering a range of contact mechanisms on the axis, the contact mechanism range being defined as a vertical protrusion of the contact mechanism on the axis. a plurality of bearing mechanisms covering a range of bearing mechanisms on the axis, the range of bearing mechanisms being defined as vertical protrusions of the bearing mechanisms on the axis. a plurality of rotatable coolant sealing mechanisms that cover a range of coolant sealing mechanisms on the axis, the range of coolant sealing mechanisms being defined as vertical protrusions of the coolant sealing mechanisms on the axis, . a plurality of rotatable vacuum sealing mechanisms covering a range of vacuum sealing mechanisms on the axis, the vacuum sealing mechanism range being defined as vertical protrusions of the vacuum sealing mechanisms on the axis, characterized in that At least two of the auxiliary groups within the mechanisms are radially oriented to each other Arranged so that at least two ranges corresponding to the at least two mechanisms overlap each other on the axis. 如申請專利範圍第1項之端塊,其中該輔助組包含下述機構:. 一覆蓋在該軸線上之驅動機構範圍的驅動機構,該驅動機構範圍係被界定為該軸線上的該驅動機構之垂直突起,. 一覆蓋在該軸線上之接點機構範圍的可旋轉電接點機構,該接點機構範圍係被界定為該軸線上的該接點機構之垂直突起,. 多數之可旋轉冷卻劑密封機構,該等冷卻劑密封機構覆蓋該軸線上之冷卻劑密封機構範圍,該冷卻劑密封機構範圍係被界定為該軸線上的該等冷卻劑密封機構之垂直突起。For example, in the end block of claim 1, the auxiliary group includes the following institutions: a drive mechanism covering a range of the drive mechanism on the axis, the drive mechanism range being defined as a vertical protrusion of the drive mechanism on the axis. a rotatable electrical contact mechanism covering a range of contact mechanisms on the axis, the contact mechanism range being defined as a vertical protrusion of the contact mechanism on the axis. A plurality of rotatable coolant sealing mechanisms cover a range of coolant sealing mechanisms on the axis, the range of coolant sealing mechanisms being defined as vertical protrusions of the coolant sealing mechanisms on the axis. 如申請專利範圍第1項之端塊,其中該輔助組包含下述機構:. 一覆蓋該軸線上之驅動機構範圍的驅動機構,該驅動機構範圍係被界定為該軸線上的該驅動機構之垂直突起,. 多數之軸承機構,該等軸承機構覆蓋該軸線上之軸承機構範圍,該軸承機構範圍係被界定為該軸線上的該等軸承機構之垂直突起,. 多數之可旋轉真空密封機構,該等真空密封機構覆蓋該軸線上之真空密封機構範圍,該真空密封機構範圍係 被界定為該軸線上的該等真空密封機構之垂直突起。For example, in the end block of claim 1, the auxiliary group includes the following institutions: a drive mechanism covering a range of the drive mechanism on the axis, the drive mechanism range being defined as a vertical protrusion of the drive mechanism on the axis. a plurality of bearing mechanisms covering a range of bearing mechanisms on the axis, the range of bearing mechanisms being defined as vertical protrusions of the bearing mechanisms on the axis. a plurality of rotatable vacuum sealing mechanisms covering a range of vacuum sealing mechanisms on the axis, the vacuum sealing mechanism range Defined as vertical projections of the vacuum sealing mechanisms on the axis. 如申請專利範圍第1項之端塊,其中該輔助組包含下述機構:. 一覆蓋該軸線上之接點機構範圍的可旋轉電接點機構,該接點機構範圍係被界定為該軸線上的該接點機構之垂直突起,. 多數之軸承機構,該等軸承機構覆蓋該軸線上之軸承機構範圍,該軸承機構範圍係被界定為該軸線上的該等軸承機構之垂直突起,. 多數之可旋轉真空密封機構,該等真空密封機構覆蓋該軸線上之真空密封機構範圍,該真空密封機構範圍係被界定為該軸線上的該等真空密封機構之垂直突起。For example, in the end block of claim 1, the auxiliary group includes the following institutions: a rotatable electrical contact mechanism covering a range of contact mechanisms on the axis, the contact mechanism range being defined as a vertical protrusion of the contact mechanism on the axis. a plurality of bearing mechanisms covering a range of bearing mechanisms on the axis, the range of bearing mechanisms being defined as vertical protrusions of the bearing mechanisms on the axis. A plurality of rotatable vacuum sealing mechanisms cover a range of vacuum sealing mechanisms on the axis, the vacuum sealing mechanism range being defined as vertical projections of the vacuum sealing mechanisms on the axis. 如申請專利範圍第1項之端塊,其中該輔助組包含下述機構:. 一覆蓋該軸線上之驅動機構範圍的驅動機構,該驅動機構範圍係被界定為該軸線上的該驅動機構之垂直突起,. 多數之可旋轉冷卻劑密封機構,該等冷卻劑密封機構覆蓋該軸線上之冷卻劑密封機構範圍,該冷卻劑密封機構範圍係被界定為該軸線上的該等冷卻劑密封機構之垂直突起,. 多數之可旋轉真空密封機構,該等真空密封機構覆蓋該軸線上之真空密封機構範圍,該真空密封機構範圍係被界定為該軸線上的該等真空密封機構之垂直突起。For example, in the end block of claim 1, the auxiliary group includes the following institutions: a drive mechanism covering a range of the drive mechanism on the axis, the drive mechanism range being defined as a vertical protrusion of the drive mechanism on the axis. a plurality of rotatable coolant sealing mechanisms that cover a range of coolant sealing mechanisms on the axis, the range of coolant sealing mechanisms being defined as vertical protrusions of the coolant sealing mechanisms on the axis, . A plurality of rotatable vacuum sealing mechanisms cover a range of vacuum sealing mechanisms on the axis, the vacuum sealing mechanism range being defined as vertical projections of the vacuum sealing mechanisms on the axis. 如申請專利範圍第1項之端塊,其中該輔助組包含下述機構:. 一覆蓋該軸線上之驅動機構範圍的驅動機構,該驅動機構範圍係被界定為該軸線上的該驅動機構之垂直突起,. 多數之軸承機構,該等軸承機構覆蓋該軸線上之軸承機構範圍,該軸承機構範圍係被界定為該軸線上的該等軸承機構之垂直突起,. 多數之可旋轉冷卻劑密封機構,該等冷卻劑密封機構覆蓋該軸線上之冷卻劑密封機構範圍,該冷卻劑密封機構範圍係被界定為該軸線上的該等冷卻劑密封機構之垂直突起,. 多數之可旋轉真空密封機構,該等真空密封機構覆蓋該軸線上之真空密封機構範圍,該真空密封機構範圍係被界定為該軸線上的該等真空密封機構之垂直突起。For example, in the end block of claim 1, the auxiliary group includes the following institutions: a drive mechanism covering a range of the drive mechanism on the axis, the drive mechanism range being defined as a vertical protrusion of the drive mechanism on the axis. a plurality of bearing mechanisms covering a range of bearing mechanisms on the axis, the range of bearing mechanisms being defined as vertical protrusions of the bearing mechanisms on the axis. a plurality of rotatable coolant sealing mechanisms that cover a range of coolant sealing mechanisms on the axis, the range of coolant sealing mechanisms being defined as vertical protrusions of the coolant sealing mechanisms on the axis, . A plurality of rotatable vacuum sealing mechanisms cover a range of vacuum sealing mechanisms on the axis, the vacuum sealing mechanism range being defined as vertical projections of the vacuum sealing mechanisms on the axis. 如申請專利範圍第1項之端塊,其中該輔助組包含下述機構:. 一覆蓋該軸線上之驅動機構範圍的驅動機構,該驅動機構範圍係被界定為該軸線上的該驅動機構之垂直突起,. 一覆蓋該軸線上之接點機構範圍的可旋轉電接點機構,該接點機構範圍係被界定為該軸線上的該接點機構之垂直突起,. 多數之軸承機構,該等軸承機構覆蓋該軸線上之軸 承機構範圍,該軸承機構範圍係被界定為該軸線上的該等軸承機構之垂直突起,. 多數之可旋轉真空密封機構,該等真空密封機構覆蓋該軸線上之真空密封機構範圍,該真空密封機構範圍係被界定為該軸線上的該等真空密封機構之垂直突起。For example, in the end block of claim 1, the auxiliary group includes the following institutions: a drive mechanism covering a range of the drive mechanism on the axis, the drive mechanism range being defined as a vertical protrusion of the drive mechanism on the axis. a rotatable electrical contact mechanism covering a range of contact mechanisms on the axis, the contact mechanism range being defined as a vertical protrusion of the contact mechanism on the axis. Most bearing mechanisms that cover the axis on the axis The range of the bearing mechanism is defined as the vertical protrusion of the bearing mechanism on the axis. A plurality of rotatable vacuum sealing mechanisms cover a range of vacuum sealing mechanisms on the axis, the vacuum sealing mechanism range being defined as vertical projections of the vacuum sealing mechanisms on the axis. 如申請專利範圍第1項之端塊,其中該輔助組包含下述機構:. 一覆蓋該軸線上之接點機構範圍的可旋轉電接點機構,該接點機構範圍係被界定為該軸線上的該接點機構之垂直突起,. 多數之軸承機構,該等軸承機構覆蓋該軸線上之軸承機構範圍,該軸承機構範圍係被界定為該軸線上的該等軸承機構之垂直突起,. 多數之可旋轉冷卻劑密封機構,該等冷卻劑密封機構覆蓋該軸線上之冷卻劑密封機構範圍,該冷卻劑密封機構範圍係被界定為該軸線上的該等冷卻劑密封機構之垂直突起,. 多數之可旋轉真空密封機構,該等真空密封機構覆蓋該軸線上之真空密封機構範圍,該真空密封機構範圍係被界定為該軸線上的該等真空密封機構之垂直突起。For example, in the end block of claim 1, the auxiliary group includes the following institutions: a rotatable electrical contact mechanism covering a range of contact mechanisms on the axis, the contact mechanism range being defined as a vertical protrusion of the contact mechanism on the axis. a plurality of bearing mechanisms covering a range of bearing mechanisms on the axis, the range of bearing mechanisms being defined as vertical protrusions of the bearing mechanisms on the axis. a plurality of rotatable coolant sealing mechanisms that cover a range of coolant sealing mechanisms on the axis, the range of coolant sealing mechanisms being defined as vertical protrusions of the coolant sealing mechanisms on the axis, . A plurality of rotatable vacuum sealing mechanisms cover a range of vacuum sealing mechanisms on the axis, the vacuum sealing mechanism range being defined as vertical projections of the vacuum sealing mechanisms on the axis. 如申請專利範圍第1項之端塊,其中該輔助組包含下述機構:. 一覆蓋該軸線上之驅動機構範圍的驅動機構,該驅動機構範圍係被界定為該軸線上的該驅動機構之垂直突 起,. 一覆蓋該軸線上之接點機構範圍的可旋轉電接點機構,該接點機構範圍係被界定為該軸線上的該接點機構之垂直突起,. 多數之軸承機構,該等軸承機構覆蓋該軸線上之軸承機構範圍,該軸承機構範圍係被界定為該軸線上的該等軸承機構之垂直突起,. 多數之可旋轉冷卻劑密封機構,該等冷卻劑密封機構覆蓋該軸線上之冷卻劑密封機構範圍,該冷卻劑密封機構範圍係被界定為該軸線上的該等冷卻劑密封機構之垂直突起,. 多數之可旋轉真空密封機構,該等真空密封機構覆蓋該軸線上之真空密封機構範圍,該真空密封機構範圍係被界定為該軸線上的該等真空密封機構之垂直突起。For example, in the end block of claim 1, the auxiliary group includes the following institutions: a drive mechanism covering a range of drive mechanisms on the axis, the range of drive mechanisms being defined as a vertical projection of the drive mechanism on the axis Up, a rotatable electrical contact mechanism covering a range of contact mechanisms on the axis, the contact mechanism range being defined as a vertical protrusion of the contact mechanism on the axis. a plurality of bearing mechanisms covering a range of bearing mechanisms on the axis, the range of bearing mechanisms being defined as vertical protrusions of the bearing mechanisms on the axis. a plurality of rotatable coolant sealing mechanisms that cover a range of coolant sealing mechanisms on the axis, the range of coolant sealing mechanisms being defined as vertical protrusions of the coolant sealing mechanisms on the axis, . A plurality of rotatable vacuum sealing mechanisms cover a range of vacuum sealing mechanisms on the axis, the vacuum sealing mechanism range being defined as vertical projections of the vacuum sealing mechanisms on the axis. 如申請專利範圍第1、2、7或9項的任一項之端塊,其中該驅動機構範圍與該接點機構範圍重疊。The end block of any one of claims 1, 2, 7 or 9 wherein the range of the drive mechanism overlaps with the range of the contact mechanism. 如申請專利範圍第1、3、6、7或9項的任一項之端塊,其中該驅動機構範圍與至少一該軸承機構範圍重疊。The end block of any one of claims 1, 3, 6, 7, or 9, wherein the range of the drive mechanism overlaps with at least one of the bearing mechanism ranges. 如申請專利範圍第1、2、6或9項的任一項之端塊,其中該驅動機構範圍與至少一該冷卻劑密封機構範圍重疊。The end block of any one of claims 1, 2, 6 or 9 wherein the range of the drive mechanism overlaps with at least one of the coolant sealing mechanisms. 如申請專利範圍第1、3、6、7或9項的任一項之端塊,其中該驅動機構範圍與至少一該真空密封機構範圍 重疊。The end block of any one of claims 1, 3, 6, 7, or 9, wherein the range of the drive mechanism is at least one of the range of the vacuum sealing mechanism overlapping. 如申請專利範圍第1、4、7、8或9項的任一項之端塊,其中該接點機構範圍與至少一該軸承機構範圍重疊。The end block of any one of claims 1, 4, 7, 8, or 9, wherein the range of the contact mechanism overlaps with at least one of the bearing mechanism ranges. 如申請專利範圍第1、2、8或9項的任一項之端塊,其中該接點機構範圍與至少一該冷卻劑密封機構範圍重疊。The end block of any one of claims 1, 2, 8 or 9 wherein the range of the contact mechanism overlaps with at least one of the coolant sealing mechanisms. 如申請專利範圍第1、4、7、8或9項的任一項之端塊,其中該接點機構範圍與至少一該真空密封機構範圍重疊。The end block of any one of claims 1, 4, 7, 8, or 9, wherein the range of the contact mechanism overlaps with at least one of the vacuum sealing mechanisms. 如申請專利範圍第1、5、6、8或9項的任一項之端塊,其中至少一該軸承機構範圍至少一該冷卻劑密封機構範圍重疊。The end block of any one of claims 1, 5, 6, 8, or 9, wherein at least one of the bearing mechanisms ranges from at least one of the coolant sealing mechanisms. 如申請專利範圍第如申請專利範圍第1、3、4、5、6、7、8或9項的任一項之端塊,其中至少一該軸承機構範圍與至少一該真空密封機構範圍重疊。An end block of any one of claims 1, 3, 4, 5, 6, 7, 8, or 9 of the patent application, wherein at least one of the bearing mechanism ranges overlaps at least one of the vacuum sealing mechanisms . 如申請專利範圍第1、3、4、5、7或8項的任一項之端塊,其中至少一該冷卻劑密封機構範圍與至少一該真空密封機構範圍重疊。The end block of any one of claims 1, 3, 4, 5, 7 or 8 wherein at least one of the coolant sealing mechanisms overlaps at least one of the vacuum sealing mechanisms. 如申請專利範圍第1項之端塊,其中該端塊係用於支承一目標,該目標具有一旋轉軸線,該端塊用於裝配在一濺射裝置的一壁上,該端塊之進一步特徵在於該旋轉軸線平行於該壁。The end block of claim 1, wherein the end block is for supporting a target, the target having an axis of rotation for assembling a wall of a sputtering apparatus, the end block further It is characterized in that the axis of rotation is parallel to the wall. 如申請專利範圍第1項之端塊,其中該端塊係用 於支承一目標,該目標具有一旋轉軸線,該端塊用於裝配在一濺射裝置的一壁上,該端塊之進一步特徵在於該旋轉軸線垂直於該壁。For example, the end block of claim 1 of the patent scope, wherein the end block is used To support a target, the target has an axis of rotation for assembly on a wall of a sputtering apparatus, the end block being further characterized in that the axis of rotation is perpendicular to the wall. 一種濺射裝置,包含用於提供一可排氣空間之壁,該裝置進一步包含一可裝配至該等壁之一的端塊,該端塊具有申請專利範圍第1至21項的任一項之特徵。A sputtering apparatus comprising a wall for providing an ventable space, the apparatus further comprising an end block mountable to one of the walls, the end block having any one of claims 1 to 21 Characteristics. 如申請專利範圍第22項之濺射裝置,其中該端塊所裝配至其上的該壁係為可移除的。A sputtering apparatus according to claim 22, wherein the wall to which the end block is fitted is removable. 如申請專利範圍第23項之濺射裝置,其中該可移除的壁係被鉸接接合至該裝置。A sputtering apparatus according to claim 23, wherein the removable wall system is hingedly joined to the apparatus.
TW095100457A 2005-03-11 2006-01-05 Flat end-block for carrying a rotatable sputtering target TWI396766B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP05101905 2005-03-11

Publications (2)

Publication Number Publication Date
TW200643205A TW200643205A (en) 2006-12-16
TWI396766B true TWI396766B (en) 2013-05-21

Family

ID=34938949

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095100457A TWI396766B (en) 2005-03-11 2006-01-05 Flat end-block for carrying a rotatable sputtering target

Country Status (1)

Country Link
TW (1) TWI396766B (en)

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4519885A (en) * 1983-12-27 1985-05-28 Shatterproof Glass Corp. Method and apparatus for changing sputtering targets in a magnetron sputtering system
US4575102A (en) * 1984-11-20 1986-03-11 Ferrofluidics Corporation Coaxial, multiple-shaft ferrofluid seal apparatus
US5445721A (en) * 1994-08-25 1995-08-29 The Boc Group, Inc. Rotatable magnetron including a replacement target structure
TW332222B (en) * 1990-10-31 1998-05-21 Materials Res Corporation Sputtering apparatus with isolated coolant and sputtering target therefor the invention relates to a replaceable sputtering target device comprising a round target unit, a recessed rim having an annular rim, an annular rim rear face, tension members and annular waterproof surface.
US6263542B1 (en) * 1999-06-22 2001-07-24 Lam Research Corporation Tolerance resistant and vacuum compliant door hinge with open-assist feature
TW520403B (en) * 1997-07-18 2003-02-11 Shibaura Mechatronics Corp Magnetron sputtering apparatus for single substrate processing
TW200306357A (en) * 2002-04-04 2003-11-16 Tdk Corp Sputtering device, method of forming thin film by sputtering, and method of manufacturing disk-like recording medium using the device

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4519885A (en) * 1983-12-27 1985-05-28 Shatterproof Glass Corp. Method and apparatus for changing sputtering targets in a magnetron sputtering system
US4575102A (en) * 1984-11-20 1986-03-11 Ferrofluidics Corporation Coaxial, multiple-shaft ferrofluid seal apparatus
TW332222B (en) * 1990-10-31 1998-05-21 Materials Res Corporation Sputtering apparatus with isolated coolant and sputtering target therefor the invention relates to a replaceable sputtering target device comprising a round target unit, a recessed rim having an annular rim, an annular rim rear face, tension members and annular waterproof surface.
US5445721A (en) * 1994-08-25 1995-08-29 The Boc Group, Inc. Rotatable magnetron including a replacement target structure
TW520403B (en) * 1997-07-18 2003-02-11 Shibaura Mechatronics Corp Magnetron sputtering apparatus for single substrate processing
US6263542B1 (en) * 1999-06-22 2001-07-24 Lam Research Corporation Tolerance resistant and vacuum compliant door hinge with open-assist feature
TW200306357A (en) * 2002-04-04 2003-11-16 Tdk Corp Sputtering device, method of forming thin film by sputtering, and method of manufacturing disk-like recording medium using the device

Also Published As

Publication number Publication date
TW200643205A (en) 2006-12-16

Similar Documents

Publication Publication Date Title
JP6034830B2 (en) Planar end block supporting a rotatable sputtering target
CN100564580C (en) A kind of flat end block that is used to carry rotating sputtering target material
AU2019200183B2 (en) Inverted cylindrical magnetron (icm) system and methods of use
US5200049A (en) Cantilever mount for rotating cylindrical magnetrons
JP3323495B2 (en) Rotating magnetron with removable cathode
TWI508167B (en) A power inlet device and a vacuum processing device using a power inlet device
CN106133877A (en) There is depositing system and the manufacture method thereof of many negative electrodes
JPS59179785A (en) Magnetron cathode sputtering device
US4014779A (en) Sputtering apparatus
KR20070108907A (en) Single, right-angled end-block
US20120097526A1 (en) Rotary magnetron
TWI396766B (en) Flat end-block for carrying a rotatable sputtering target
CN109423629B (en) Workpiece driving device for one-time full-surface deposition of disc parts and vapor deposition furnace
JP7179000B2 (en) universal mount end block
KR101780945B1 (en) In-line sputtering system
CN115466930B (en) Coating equipment and target bearing device thereof
KR200410865Y1 (en) Sealing rotary unit and thin film deposition apparatus
JP2006077308A (en) Vacuum deposition apparatus
GB2281448A (en) Electric motor assembly in a sealed vessel