JPS6420722U - - Google Patents
Info
- Publication number
- JPS6420722U JPS6420722U JP11483787U JP11483787U JPS6420722U JP S6420722 U JPS6420722 U JP S6420722U JP 11483787 U JP11483787 U JP 11483787U JP 11483787 U JP11483787 U JP 11483787U JP S6420722 U JPS6420722 U JP S6420722U
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- gas
- substrate holder
- blow
- carrier gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims description 9
- 239000007789 gas Substances 0.000 claims 3
- 239000012159 carrier gas Substances 0.000 claims 2
- 238000007664 blowing Methods 0.000 claims 1
- 230000002093 peripheral effect Effects 0.000 claims 1
- 239000012495 reaction gas Substances 0.000 claims 1
- 238000001947 vapour-phase growth Methods 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 description 1
Description
第１図ａ，ｂは、本考案の基板ホルダーの正面
断面図と平面断面図。第２図ａ，ｂ、第３図ａ，
ｂはともに、従来の基板ホルダーの第１図と同様
の図である。
１…基板ホルダー、２…基板、３…ガス吹き出
し穴、４…加熱ヒーター基板。
FIGS. 1a and 1b are a front sectional view and a plan sectional view of the substrate holder of the present invention. Figure 2 a, b, Figure 3 a,
Both figures are similar to FIG. 1 of the conventional substrate holder. 1...Substrate holder, 2...Substrate, 3...Gas blowout hole, 4...Heating heater board.
Claims (1)
ヤリアガスを、加熱しながら通過させるガス通路
と、保持した基板の周縁部にて該基板の裏側に向
かつて前記ガス通路からガスを吹き出す複数の吹
き出し穴とを備え、該吹き出し穴は、基板ホルダ
ーの中央の基板保持用台地の周りに設けられた段
差の底部で開口させたことを特徴とする減圧気相
成長装置の基体ホルダー。 A gas passage through which a carrier gas or a carrier gas containing a part of a reaction gas is passed through while being heated, and a plurality of blow-off holes which blow out gas from the gas passage toward the back side of the substrate at the peripheral edge of the held substrate. A substrate holder for a reduced pressure vapor phase growth apparatus, characterized in that the blowing hole is opened at the bottom of a step provided around a substrate holding plateau at the center of the substrate holder.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987114837U JPH0521866Y2 (en) | 1987-07-27 | 1987-07-27 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987114837U JPH0521866Y2 (en) | 1987-07-27 | 1987-07-27 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6420722U true JPS6420722U (en) | 1989-02-01 |
| JPH0521866Y2 JPH0521866Y2 (en) | 1993-06-04 |
Family
ID=31355947
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1987114837U Expired - Lifetime JPH0521866Y2 (en) | 1987-07-27 | 1987-07-27 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0521866Y2 (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61292913A (en) * | 1985-06-21 | 1986-12-23 | Oki Electric Ind Co Ltd | Heat treatment device for semiconductor article |
-
1987
- 1987-07-27 JP JP1987114837U patent/JPH0521866Y2/ja not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61292913A (en) * | 1985-06-21 | 1986-12-23 | Oki Electric Ind Co Ltd | Heat treatment device for semiconductor article |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0521866Y2 (en) | 1993-06-04 |
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