JPS6260254U - - Google Patents

Info

Publication number
JPS6260254U
JPS6260254U JP15023385U JP15023385U JPS6260254U JP S6260254 U JPS6260254 U JP S6260254U JP 15023385 U JP15023385 U JP 15023385U JP 15023385 U JP15023385 U JP 15023385U JP S6260254 U JPS6260254 U JP S6260254U
Authority
JP
Japan
Prior art keywords
base plate
film forming
forming apparatus
substrate holder
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15023385U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP15023385U priority Critical patent/JPS6260254U/ja
Publication of JPS6260254U publication Critical patent/JPS6260254U/ja
Pending legal-status Critical Current

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  • Chemical Vapour Deposition (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はこの考案の1実施例である成膜装置の
基板ホルダーの平面図、第2図、第3図はそれぞ
れ前記とは別な実施例装置の平面図、第4図は成
膜装置の1つであるプラズマCVD装置の一般的
な構成を示す模式図、第5図は従来の成膜装置の
基板ホルダーの平面図である。 2′……被成膜基板、3……基板ホルダー、3
′……台板、7……ヒータ板、15……スリツト
、15′……補助スリツト、16……スリツト、
17……連結部材。
Fig. 1 is a plan view of a substrate holder of a film forming apparatus which is an embodiment of this invention, Figs. 2 and 3 are plan views of an embodiment of the apparatus different from the above, and Fig. 4 is a plan view of a film forming apparatus. FIG. 5 is a schematic diagram showing the general configuration of a plasma CVD apparatus, which is one of the conventional film forming apparatuses. 2'...Substrate to be film-formed, 3...Substrate holder, 3
'... Base plate, 7... Heater plate, 15... Slit, 15'... Auxiliary slit, 16... Slit,
17...Connecting member.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 表面に被成膜基板を載置する台板と、この台板
の背面側に付設されたヒータ板とからなる成膜装
置の基板ホルダーにおいて、少くとも前記台板の
周辺部にスリツトもしくは溝を配設したことを特
徴とする成膜装置の基板ホルダー。
In a substrate holder of a film forming apparatus consisting of a base plate on which a substrate to be film-formed is placed and a heater plate attached to the back side of the base plate, slits or grooves are formed at least in the peripheral area of the base plate. A substrate holder for a film forming apparatus characterized by the following:
JP15023385U 1985-09-30 1985-09-30 Pending JPS6260254U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15023385U JPS6260254U (en) 1985-09-30 1985-09-30

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15023385U JPS6260254U (en) 1985-09-30 1985-09-30

Publications (1)

Publication Number Publication Date
JPS6260254U true JPS6260254U (en) 1987-04-14

Family

ID=31066188

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15023385U Pending JPS6260254U (en) 1985-09-30 1985-09-30

Country Status (1)

Country Link
JP (1) JPS6260254U (en)

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