JPS6418148U - - Google Patents

Info

Publication number
JPS6418148U
JPS6418148U JP11326587U JP11326587U JPS6418148U JP S6418148 U JPS6418148 U JP S6418148U JP 11326587 U JP11326587 U JP 11326587U JP 11326587 U JP11326587 U JP 11326587U JP S6418148 U JPS6418148 U JP S6418148U
Authority
JP
Japan
Prior art keywords
cylindrical
targets
vacuum chamber
sputtering device
sputtering
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11326587U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP11326587U priority Critical patent/JPS6418148U/ja
Publication of JPS6418148U publication Critical patent/JPS6418148U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP11326587U 1987-07-23 1987-07-23 Pending JPS6418148U (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11326587U JPS6418148U (zh) 1987-07-23 1987-07-23

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11326587U JPS6418148U (zh) 1987-07-23 1987-07-23

Publications (1)

Publication Number Publication Date
JPS6418148U true JPS6418148U (zh) 1989-01-30

Family

ID=31352942

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11326587U Pending JPS6418148U (zh) 1987-07-23 1987-07-23

Country Status (1)

Country Link
JP (1) JPS6418148U (zh)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS607191A (ja) * 1983-06-24 1985-01-14 三容真空工業株式会社 回路基板の製造方法及びその装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS607191A (ja) * 1983-06-24 1985-01-14 三容真空工業株式会社 回路基板の製造方法及びその装置

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