JPS6417501A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPS6417501A
JPS6417501A JP17442287A JP17442287A JPS6417501A JP S6417501 A JPS6417501 A JP S6417501A JP 17442287 A JP17442287 A JP 17442287A JP 17442287 A JP17442287 A JP 17442287A JP S6417501 A JPS6417501 A JP S6417501A
Authority
JP
Japan
Prior art keywords
electrodes
fets
gate electrodes
substrate
constitution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17442287A
Other languages
Japanese (ja)
Inventor
Akira Inoue
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP17442287A priority Critical patent/JPS6417501A/en
Publication of JPS6417501A publication Critical patent/JPS6417501A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To improve characteristics and to miniaturize chip size by forming the gate electrodes of FETs at an angle included within 25-65 deg. range from input and output lines which are parallel with each other. CONSTITUTION:An active layer is formed on a semiconductor substrate 1 among gate electrodes 4, drain electrodes 5 and source electrodes 6 to constitute FETs. In said constitution, the angle theta of respective electrodes 4-6 are constituted so as to be set up to 25 deg.<=theta<=65 deg. from the input and output lines 2, 3 which are parallel with each other. Thereby, a phase difference between signals passing the gate electrodes on the center part and on the end parts is removed and the characteristics of the FETs can be improved. Since distributing lines can be formed in the oblique direction of the substrate 1, useless spaces are not generated on the four corner of the substrate and the chip size can be reduced.
JP17442287A 1987-07-13 1987-07-13 Semiconductor device Pending JPS6417501A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17442287A JPS6417501A (en) 1987-07-13 1987-07-13 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17442287A JPS6417501A (en) 1987-07-13 1987-07-13 Semiconductor device

Publications (1)

Publication Number Publication Date
JPS6417501A true JPS6417501A (en) 1989-01-20

Family

ID=15978271

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17442287A Pending JPS6417501A (en) 1987-07-13 1987-07-13 Semiconductor device

Country Status (1)

Country Link
JP (1) JPS6417501A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5159294A (en) * 1990-03-01 1992-10-27 Murata Manufacturing Co., Ltd. Non-reciprocal circuit element
JPH09312534A (en) * 1996-05-20 1997-12-02 Mitsubishi Electric Corp Microwave amplifier
US6180701B1 (en) 1998-04-03 2001-01-30 Kawasaki Steel Corporation Resin composition and resin molding therefrom
JP2011166358A (en) * 2010-02-08 2011-08-25 Mitsubishi Electric Corp High frequency attenuator

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5159294A (en) * 1990-03-01 1992-10-27 Murata Manufacturing Co., Ltd. Non-reciprocal circuit element
JPH09312534A (en) * 1996-05-20 1997-12-02 Mitsubishi Electric Corp Microwave amplifier
US6180701B1 (en) 1998-04-03 2001-01-30 Kawasaki Steel Corporation Resin composition and resin molding therefrom
JP2011166358A (en) * 2010-02-08 2011-08-25 Mitsubishi Electric Corp High frequency attenuator

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