JPS6417399A - Plasma processing equipment - Google Patents

Plasma processing equipment

Info

Publication number
JPS6417399A
JPS6417399A JP62172635A JP17263587A JPS6417399A JP S6417399 A JPS6417399 A JP S6417399A JP 62172635 A JP62172635 A JP 62172635A JP 17263587 A JP17263587 A JP 17263587A JP S6417399 A JPS6417399 A JP S6417399A
Authority
JP
Japan
Prior art keywords
microwave
state
plasma generating
passage length
transfer device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62172635A
Other languages
English (en)
Other versions
JP2515810B2 (ja
Inventor
Yuuki Hamada
Susumu Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Sagami Ltd
Original Assignee
Tokyo Electron Sagami Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Sagami Ltd filed Critical Tokyo Electron Sagami Ltd
Priority to JP62172635A priority Critical patent/JP2515810B2/ja
Publication of JPS6417399A publication Critical patent/JPS6417399A/ja
Application granted granted Critical
Publication of JP2515810B2 publication Critical patent/JP2515810B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
JP62172635A 1987-07-10 1987-07-10 プラズマ処理装置 Expired - Fee Related JP2515810B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62172635A JP2515810B2 (ja) 1987-07-10 1987-07-10 プラズマ処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62172635A JP2515810B2 (ja) 1987-07-10 1987-07-10 プラズマ処理装置

Publications (2)

Publication Number Publication Date
JPS6417399A true JPS6417399A (en) 1989-01-20
JP2515810B2 JP2515810B2 (ja) 1996-07-10

Family

ID=15945534

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62172635A Expired - Fee Related JP2515810B2 (ja) 1987-07-10 1987-07-10 プラズマ処理装置

Country Status (1)

Country Link
JP (1) JP2515810B2 (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2676593A1 (fr) * 1991-05-14 1992-11-20 Commissariat Energie Atomique Source d'ions a resonance cyclotronique electronique.
JPH08293397A (ja) * 1996-04-22 1996-11-05 Hitachi Ltd マイクロ波プラズマ処理装置
JP2014194220A (ja) * 2014-06-12 2014-10-09 Elwing Llc スラスタ及び推進発生方法
JP2015076253A (ja) * 2013-10-08 2015-04-20 国立大学法人 東京大学 小型マイクロ波プラズマ源における誘電体保護機構

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6162201A (ja) * 1984-09-03 1986-03-31 Hitachi Ltd 高周波用ｕリンク伝送路

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6162201A (ja) * 1984-09-03 1986-03-31 Hitachi Ltd 高周波用ｕリンク伝送路

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2676593A1 (fr) * 1991-05-14 1992-11-20 Commissariat Energie Atomique Source d'ions a resonance cyclotronique electronique.
US5336961A (en) * 1991-05-14 1994-08-09 Commissariat A L'energie Atomique Source of ions with electronic cyclotronic resonance
JPH08293397A (ja) * 1996-04-22 1996-11-05 Hitachi Ltd マイクロ波プラズマ処理装置
JP2015076253A (ja) * 2013-10-08 2015-04-20 国立大学法人 東京大学 小型マイクロ波プラズマ源における誘電体保護機構
JP2014194220A (ja) * 2014-06-12 2014-10-09 Elwing Llc スラスタ及び推進発生方法

Also Published As

Publication number Publication date
JP2515810B2 (ja) 1996-07-10

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees