JPS6415373A - Ventilation method for semiconductor vapor growth system - Google Patents

Ventilation method for semiconductor vapor growth system

Info

Publication number
JPS6415373A
JPS6415373A JP16988887A JP16988887A JPS6415373A JP S6415373 A JPS6415373 A JP S6415373A JP 16988887 A JP16988887 A JP 16988887A JP 16988887 A JP16988887 A JP 16988887A JP S6415373 A JPS6415373 A JP S6415373A
Authority
JP
Japan
Prior art keywords
air
emergency
clean room
blower
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16988887A
Other languages
Japanese (ja)
Other versions
JPH07116604B2 (en
Inventor
Yukio Komura
Hisashi Koaizawa
Shoji Yoshihama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Furukawa Electric Co Ltd
Original Assignee
Furukawa Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Furukawa Electric Co Ltd filed Critical Furukawa Electric Co Ltd
Priority to JP16988887A priority Critical patent/JPH07116604B2/en
Publication of JPS6415373A publication Critical patent/JPS6415373A/en
Publication of JPH07116604B2 publication Critical patent/JPH07116604B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

PURPOSE:To assure safety in the event of an accident and to prevent air pollution by stopping, in the event of emergency of a titled system, the taking-in of the air from a clean room to an air conditioner, making emergency supply of the no-polluted air into the clean room and increasing the discharge rate from a force discharge duct. CONSTITUTION:The air conditioner 9 is operated to feed the air into the clean room where cabinets 3-5 contg. a reaction furnace, gas supply source and gas control apparatus are housed in the normal time or at the time of exchanging the gas supply system. Poisonous gases are then treated by a waste gas treating machine 16 via the force discharge duct 7 and thereafter the gas are released into the atm. by a ventilation blower 17 for use in the normal time or a ventilation blower 20 for use at the time of exchanging the gas supply source. On the other hand, the air conditioner 9 and blower 17 are stopped by the signals from respective sensors and an emergency ventilation blower 18 and an emergency air supply blower 22 are driven to supply the clean air through a filter 23 into the clean room 2 in the vent of emergency. The air in the clean room is simultaneously introduced through a flour surface 2A, a spacer 12 under the floor in the room 2 to the inside of the cabinets 3-5 and after the air is cleaned up with the waste gas treating machine 16 through the duct 7, the air is released from the blower 18 into the atm.
JP16988887A 1987-07-09 1987-07-09 Ventilation method of semiconductor vapor phase growth system Expired - Fee Related JPH07116604B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16988887A JPH07116604B2 (en) 1987-07-09 1987-07-09 Ventilation method of semiconductor vapor phase growth system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16988887A JPH07116604B2 (en) 1987-07-09 1987-07-09 Ventilation method of semiconductor vapor phase growth system

Publications (2)

Publication Number Publication Date
JPS6415373A true JPS6415373A (en) 1989-01-19
JPH07116604B2 JPH07116604B2 (en) 1995-12-13

Family

ID=15894817

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16988887A Expired - Fee Related JPH07116604B2 (en) 1987-07-09 1987-07-09 Ventilation method of semiconductor vapor phase growth system

Country Status (1)

Country Link
JP (1) JPH07116604B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002033297A (en) * 2000-07-17 2002-01-31 Seiko Epson Corp Exhausting unit, manufacturing treatment equipment and exhaust system
US8128792B2 (en) 2002-09-20 2012-03-06 Toyo Tanso Co., Ltd. Fluorine gas generator

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002033297A (en) * 2000-07-17 2002-01-31 Seiko Epson Corp Exhausting unit, manufacturing treatment equipment and exhaust system
US8128792B2 (en) 2002-09-20 2012-03-06 Toyo Tanso Co., Ltd. Fluorine gas generator

Also Published As

Publication number Publication date
JPH07116604B2 (en) 1995-12-13

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees