JP2002033297A - Exhausting unit, manufacturing treatment equipment and exhaust system - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an exhausting unit which can automatically adjust the flow rate of gas in an exhaust path and can also adjust displacement, manufacturing treatment equipment and an exhaust system. SOLUTION: The exhauster 200 consists of a door part 116 for opening and closing the exhaust path 114 to the outside, a door-driving part 117 for opening and closing the door part, a detecting part 114a for detecting gas in the exhaust path, a measuring part 115 for measuring the displacement in the exhaust path, and a door-driving control part 118 which drives the door-driving part on the basis of signals from the detecting part and the measuring part.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an exhaust system used in a manufacturing apparatus using a gas such as a gas, a manufacturing apparatus having such an exhaust apparatus, and an exhaust system.

[0002]

2. Description of the Related Art An exhaust system 20 for a conventional etching apparatus 10 using a gas or the like has a structure as shown in FIG. As shown in FIG. 6, the exhaust system 20 is an exhaust system inside a factory or the like. Specifically, in the clean room of the factory,
An exhaust duct 21 is provided, and the exhaust duct 21 is connected to each device group and exhausts these device groups.
A fan 22 is provided in the vicinity of the outlet of the exhaust duct 21, and the fan 22 smoothly exhausts each device group so that the exhaust gas of each device group is not mixed into the clean room of the factory. Has become.

[0003] An etching apparatus 10 is arranged as one of such apparatuses. This etching apparatus 10
Has a vacuum device section 11 for etching. The vacuum processing unit 11 has an etching processing chamber 11a, and the etching processing chamber 11a
b.

The vacuum device 11b is arranged in a vacuum device housing 11c.

[0005] The casing for vacuum device 11 c communicates with an exhaust duct for vacuum device 11 d, and the exhaust duct for vacuum device 11 d is connected to the exhaust duct 21 of the exhaust system 20.

Then, the exhaust duct 11d for the vacuum device is used.
Is provided with a gas detector and a manual damper.

On the other hand, the etching apparatus 10 has a gas box section 12 for supplying various gases to the etching processing chamber 11a.

The gas box section 12 is provided with a gas box main body 12a and a gas box housing 12b so as to cover the gas box main body 12a. The gas box casing 12b communicates with a gas box exhaust duct 12c, and the gas box exhaust duct 12c is connected to an exhaust duct 21 of an exhaust system 20.

The gas box exhaust duct 1
The gas detector 2c is provided with a gas detector and a manual damper, similarly to the above-described vacuum device exhaust duct 11d.

The etching apparatus 10 has a vacuum pump section 13 for evacuating the etching processing chamber 11a in the vacuum apparatus 11b. In particular,
The vacuum pump unit 13 is provided with a vacuum pump main body 13a, and the vacuum pump main body 13a is connected to the etching processing chamber 11a so that the etching processing chamber 11a is evacuated.

The vacuum pump body 13a is covered by a vacuum pump housing 13b, and is connected to a vacuum pump body exhaust duct 13d.

The exhaust duct 13d for the vacuum pump body
Are connected to an exhaust duct 21 of an exhaust system 20. Since the vacuum pump main body exhaust duct 13d communicates with the etching processing chamber 11a into which various gases are introduced through the vacuum pump main body 13a, various gases are removed according to the general high-pressure gas law and released to the atmosphere. There is a need to. Therefore, the vacuum pump main body exhaust duct 13d includes:
An abatement device 14 is provided. A gas detector and a manual damper are provided in the vacuum pump main body exhaust duct 13d between the abatement apparatus 14 and the exhaust duct 21 of the exhaust system 20, similarly to the gas box exhaust duct 12c described above.

On the other hand, a vacuum pump casing exhaust duct 13c is connected to the vacuum pump casing 13b, similarly to the gas box exhaust duct 12c described above. It is connected to the exhaust duct 21 of the exhaust system 20.

A gas detector and a manual damper are also provided in the vacuum pump casing exhaust duct 13c.

As described above, the exhaust duct 11 for the vacuum device
d, gas detectors provided in the gas box exhaust duct 12c and the vacuum pump casing exhaust duct 13c are connected to a vacuum device controller as shown in FIG.

The vacuum device controller further includes a gas box body 12a, a vacuum device 11b, and a vacuum pump body 13
a is also connected.

The conventional exhaust system 20 is configured as described above, and its operation will be described below.

First, when etching is performed by the etching apparatus 10, which is a part of the exhaust system 20, a necessary gas species is supplied from the gas box main body 12a into the etching processing chamber 11a to perform the etching. .

At this time, since the gas box main body 12a is covered by the gas box housing 12b, even if gas leaks from the gas box main body 12a, the leaked gas is stored in the gas box housing 12b. Will stay.

Then, the leaked gas passes through the gas box exhaust duct 12c, is led to the exhaust duct 21 of the exhaust system 20, and is discharged outside the clean room of the factory by the fan 22 of the exhaust duct 21. .

At this time, depending on the amount of gas that can be detected,
Since it is necessary to adjust the exhaust amount, the gas box exhaust duct 12c is provided with a manual damper as described above.

In this manual damper, the operator operates an operation unit provided on the manual damper to move a valve, and the movement of the valve causes the gas box exhaust duct 1 to move.
The displacement in 2c is adjusted.

In the adjustment of the valve of the manual damper, the operator adjusts the valve of the manual damper so as to obtain an appropriate exhaust amount while measuring the exhaust amount. By the way, since a gas species is supplied into the etching processing chamber 11a, even if a gas leak occurs, the leaked gas is supplied to the vacuum device housing 1a.
1c, and is exhausted to the outside of the clean room via the exhaust duct 11d for vacuum device and the exhaust duct 21 and the like.

In this case, as in the case of the gas box section 12, it is necessary to adjust the exhaust amount according to the amount of gas that can be detected.
At d, a manual damper and a gas detector are provided.

The operator moves the valve by operating the manual damper while measuring the amount of exhaust, and adjusts the amount of exhaust in the vacuum device exhaust duct 11d by the movement of the valve.

On the other hand, the interior of the etching processing chamber 11a needs to be in a vacuum state for etching. Therefore, the vacuum pump body 13a is moved to evacuate the etching processing chamber 11a. At this time, since the atmosphere in the etching processing chamber 11a to which the gas species is supplied is in communication with the vacuum pump body 13a, the gas may leak into the clean room in the factory.

In order to prevent this gas leakage, the vacuum pump body 13a is evacuated to the outside of the clean room through the exhaust duct 21 via the vacuum pump body exhaust duct 13d as described above.

Since it is necessary to remove various gases from the vacuum pump main body 13a and release it to the atmosphere according to the general high-pressure gas law, the abatement device 14 is provided in the vacuum pump main body exhaust duct 13d. The gas used for the etching is removed by the abatement apparatus 14.

On the other hand, the vacuum pump body 13a is covered with the vacuum pump casing 13b as described above, and even if a gas species leaks from the vacuum pump body 13a, the leaked gas does not leak into the clean room. It has become.

Specifically, the gas leaking into the vacuum pump casing 13b is guided to the exhaust duct 21 through the vacuum pump casing exhaust duct 13c. Is a vacuum pump housing exhaust duct 13c
Is detected by a gas detector provided at

A manual damper is provided in the vacuum pump casing exhaust duct 13c. The operator moves the valve by adjusting the manual damper while measuring the amount of exhaust, and adjusts the amount of exhaust in the vacuum device casing exhaust duct 13c by the movement of the valve.

As described above, the operator of the evacuation system 20 measures the amount of evacuation while checking the evacuation duct 11 for the vacuum device.
d. The valves of the manual dampers provided in the gas box exhaust duct 12c and the vacuum pump casing exhaust duct 13c were adjusted to adjust the exhaust amount.

[0033]

By the way, in the etching apparatus 10 of the exhaust system 20, the exhaust amount of the vacuum exhaust duct 11d, the gas box exhaust duct 12c, the vacuum pump housing exhaust duct 13c, etc. is increased or decreased. Is adjusted by the operator adjusting the valve of the manual damper.

For this reason, when the exhaust balance of the entire factory is disrupted due to an increase or decrease in the number of devices connected to the exhaust duct 21 of the exhaust system 20, the exhaust duct for vacuum equipment 1
1d, it was difficult to optimally adjust the exhaust amount of the gas box exhaust duct 12c and the vacuum pump casing exhaust duct 13c.

Accordingly, an object of the present invention is to provide an exhaust device, a manufacturing processing apparatus, and an exhaust system capable of automatically adjusting the flow rate of gas in an exhaust passage and adjusting the exhaust amount.

[0036]

According to the first aspect of the present invention, a door portion for opening and closing an exhaust passage to the outside, a door driving portion for opening and closing the door portion, A detecting unit for detecting gas in the exhaust passage, a measuring unit for measuring the amount of exhaust gas in the exhaust passage, and driving the door driving unit based on signals from the detecting unit and the measuring unit. This is achieved by an exhaust device having a door drive control unit.

According to the above construction, a door driving section for opening and closing the door section, a detecting section for detecting gas in the exhaust passage, and a measuring section for measuring an exhaust amount in the exhaust passage. Based on signals from the detection unit and the measurement unit,
A door drive control unit that drives the door drive unit.

Therefore, the most suitable exhaust amount in the exhaust passage measured by the measuring unit is determined by the door drive control unit. Then, the door drive control unit moves and adjusts the door unit via the door drive unit so that the exhaust amount becomes the most suitable.

Therefore, compared to the case where the operator makes manual adjustment, the door can be adjusted very accurately, and the adjustment allows the gas exhaust amount to be adjusted accurately and appropriately.

Preferably, according to the second aspect of the present invention, in the exhaust system according to the first aspect, a fan is provided in the vicinity of an outlet to the outside of the exhaust passage. .

According to the above configuration, since the fan is provided in the vicinity of the outlet to the outside of the exhaust passage, the exhaust in the exhaust passage is promoted.

According to a third aspect of the present invention, there is provided an exhaust passage connected to a casing of a manufacturing processing apparatus, a door for opening and closing the exhaust passage to the outside, and opening and closing of the door. A door driving unit, a detecting unit for detecting gas in the exhaust passage, a measuring unit for measuring the amount of exhaust in the exhaust passage, and a signal based on signals from the detecting unit and the measuring unit. And a door drive control unit that drives the door drive unit.

According to the above configuration, a door driving section for opening and closing the door section, a detecting section for detecting gas in the exhaust passage, and a measuring section for measuring the amount of exhaust in the exhaust passage. Based on signals from the detection unit and the measurement unit,
A door drive control unit that drives the door drive unit.

Therefore, the most suitable exhaust amount in the exhaust passage measured by the measuring section is determined by the door drive control section. Then, the door drive control unit moves and adjusts the door unit via the door drive unit so that the exhaust amount becomes the most suitable.

For this reason, compared with the case where the operator manually adjusts, the door can be adjusted very accurately, and by this adjustment, the amount of exhaust from the casing of the manufacturing processing apparatus can be adjusted accurately and appropriately. Can be.

Preferably, according to a fourth aspect of the present invention, in the configuration of the third aspect, a fan for promoting exhaust is provided near an outlet portion to the outside of the exhaust passage. It is a manufacturing processing apparatus.

According to the above configuration, since the fan is provided in the vicinity of the outlet to the outside of the exhaust passage, the exhaust in the exhaust passage is promoted.

Preferably, according to the fifth aspect of the present invention, in the configuration of the third or fourth aspect, the manufacturing processing apparatus main body has a vacuum device section, a gas supply section, and a vacuum pump section. Each of the vacuum device section, the gas supply section, and the vacuum pump section includes the exhaust passage, the door section, the door drive section, the detection section, the measurement section, and the door drive control section. A manufacturing processing apparatus.

According to the above configuration, the housings of the vacuum device, the gas supply unit, and the vacuum pump unit include the exhaust passage, the door, the door drive unit, the detection unit, the measurement unit, Since the door drive control unit is provided, it is possible to precisely exhaust the housings of the vacuum device, the gas supply unit, and the vacuum pump unit.

Preferably, according to a sixth aspect of the present invention, in the configuration of the fifth aspect, the vacuum device, the gas supply unit, and the vacuum pump unit are connected to a device control unit that controls them. A signal is input to the device control unit from each of the door drive control units provided in the respective housings of the vacuum device unit, the gas supply unit, and the vacuum pump unit. Is a manufacturing processing apparatus.

According to the above configuration, a signal is input to the device control unit from each of the door drive control units provided in the vacuum unit, the gas supply unit, and the vacuum pump unit. Therefore, when each of the door drive control units receives, for example, an abnormality signal from the detection unit connected to each of the door drive control units, the abnormality can be immediately output to the device control unit. .

The apparatus control section can stop, for example, the operation of each of the vacuum apparatus section, the gas supply section, and the vacuum pump section, and can smoothly perform so-called interlock, for example.

Preferably, according to the invention of claim 7, in the structure of claim 5 or claim 6, the vacuum device section,
The manufacturing processing apparatus is characterized in that the door drive control units provided in the respective housings of the gas supply unit and the vacuum pump unit are respectively connected to a central control unit.

According to the above configuration, the door drive controllers provided in the casings of the vacuum device, the gas supply unit, and the vacuum pump are respectively connected to the central controller. The information of each door drive control unit can be intensively monitored by the central control unit.

According to an eighth aspect of the present invention, there is provided an exhaust passage connected to a manufacturing processing apparatus housing, a door for opening and closing the exhaust passage to the outside, and opening and closing of the door. A door driving unit, a detecting unit for detecting gas in the exhaust passage, a measuring unit for measuring the amount of exhaust in the exhaust passage, and a signal based on signals from the detecting unit and the measuring unit. Having a door drive control unit for driving the door drive unit, a fan provided near an outlet to the outside of the exhaust passage, and a central control unit for controlling the door drive control unit. This is achieved by an exhaust system characterized by:

According to the above configuration, the exhaust of the manufacturing processing apparatus can be accurately performed, and the exhaust in a clean room in a factory, for example, having such a group of apparatuses can be efficiently and accurately performed. . Therefore,
There is no large load on the air conditioning equipment for clean rooms.

[0057]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Preferred embodiments of the present invention will be described below with reference to the drawings.

FIG. 1 is a schematic diagram showing an exhaust system 200 having an etching apparatus 100 which is a manufacturing processing apparatus according to an embodiment of the present invention.

As shown in FIG. 1, the exhaust system 200
Is a clean room exhaust system 200 in which a clean room is provided in a factory and a plurality of device groups are arranged in the clean room.

The exhaust system 200 has an exhaust duct 210 as an exhaust passage for exhausting each device group. The exhaust duct 210 has an exhaust port, which is an outlet, formed outside the clean room, which is the outside, and is provided with a fan 220.

The exhaust duct 21 is
The exhaust by 0 is performed more smoothly.
In the clean room, ventilation and the like are performed by air conditioning equipment.

On the other hand, the exhaust duct 210 is connected to an exhaust passage of each device group in the clean room. FIG. 1 illustrates, for example, an etching apparatus 100 in detail in a group of apparatuses.

The etching apparatus 100 is a so-called plasma dry etching apparatus, and is roughly divided into a vacuum device section 110, a gas box section 120 serving as a gas supply section,
Since it has a vacuum pump unit 130, a device control unit 140, a host computer 150 as a central control unit, and the like,
Hereinafter, each of them will be described in order.

(Regarding Vacuum Apparatus Section 110 and the Like) First, the vacuum apparatus section 110 has an etching processing chamber 111 provided with a chamber for mounting an object to be subjected to the plasma dry etching. The inside of this chamber is maintained in a vacuum atmosphere, and electrodes and the like are provided outside the chamber. When a high-frequency electric field is applied to this electrode, plasma is generated, and a highly activated reactive species (radical) is generated.

This reactive species is, for example, SF as a reactive gas.
If 6 (sulfur hexafluoride) is used, it becomes a fluorine radical, and the fluorine radical etches silicon or the like as an object.

Since the inside of the chamber needs to be maintained in a vacuum atmosphere, a vacuum device 112 is provided outside the etching processing chamber 111. Outside the vacuum device 112, a vacuum device housing 113 is provided.

The housing 113 for the vacuum device is arranged so that even if the reaction gas introduced into the etching processing chamber 111 leaks out, the gas does not leak out into the clean room. 1, a vacuum device exhaust duct 114 is connected to the vacuum device casing 113, and the vacuum device exhaust duct 114 is connected to an exhaust duct 210 of the exhaust system 200. I have.

Therefore, the gas leaked from the etching processing chamber 111 does not leak into the clean room, and the exhaust duct 114 for the vacuum device and the exhaust duct 210 do not leak.
After that, it is discharged outside the clean room.

The exhaust duct 114 for the vacuum device is provided with a gas detector 114a as a detecting unit. The gas detector 114a is, for example, of a pyrolysis / constant potential electrolysis type, and as shown in FIG.
Inside, a gas detection sensor 114c is arranged.

That is, the gas in the vacuum device exhaust duct 114 is drawn into the pump unit 114b by the pump in the pump unit 114b as shown by an arrow, and the drawn gas comes into contact with the gas detection sensor 114c. To measure the gas concentration.

Further, the exhaust duct 114 for the vacuum device is provided with a measuring unit, for example, a flow meter 115. The current meter 115 is connected to an exhaust duct 114 for a vacuum device.
The flow rate in the inside is measured, and the displacement is measured based on the diameter data of the exhaust duct 114 for the vacuum device which is input in advance.

The exhaust duct 114 for the vacuum device has
As shown in FIG. 1, a damper 116 serving as a door and a damper opening / closing unit 117 serving as a door driving unit are provided.

This damper 116 is, as shown in FIG.
The rotary valve 116a rotates around the rotary shaft 116b. Therefore, when the rotary valve 116a is located at the position A shown in FIG.
Exhaust is fully opened, and conversely, the rotary valve 116
When a is located, the exhaust of the vacuum device exhaust duct 114 is closed.

The rotation angle of the rotary valve 116a is controlled to an arbitrary angle by the movement of the central shaft 116b. The central axis 116b is the central axis 1
The damper opening / closing section 117 connected to the motor 16b is rotated by a required amount by, for example, a motor.

The rotation is accurately controlled by the damper control unit 118 for the vacuum apparatus connected to the damper opening / closing unit 117 and a signal cable or the like.

The vacuum device damper control unit 118 is composed of a computer or the like, and is connected to the gas detector 114a, the flow velocity meter 115, and the damper opening / closing unit 117 by a signal cable or the like as shown in FIG. .

Therefore, when the gas detector 114a detects a certain amount of gas, for example, SF6, data of the detected amount is input to the vacuum device damper controller 118. At the same time, data on the amount of exhaust in the vacuum device exhaust duct 114 is input from the flow meter 115 to the vacuum device damper control unit 118.

Then, the angle of the rotary valve 116a of the damper 116 corresponding to the detected amount data and the exhaust amount data is calculated by the vacuum device damper control unit 118.

That is, the degree of opening and closing of the vacuum device exhaust duct 114 is recognized by a preset table.
The damper opening / closing section 117 is driven to reach the angle, and the rotary valve 116a of the damper 116 is rotated.

Incidentally, the exhaust amount measured by the flow meter 115 provided in the exhaust duct 114 for the vacuum device is predetermined to be a constant exhaust amount, specifically, for example, about 1.0 mm 3 / min. is there.

Therefore, the displacement measured by the flow meter 115 is the predetermined value of 1.0 mm 3 / mi.
n, and if the value is lower than this value, a signal is input from the vacuum device damper control unit 118 to the damper opening / closing unit 117 so as to further increase the exhaust amount.

With this signal, the damper opening / closing section 117 moves the rotary valve 116a of the damper 116 in a more open direction.

Further, a damper control section 118 for the vacuum device section
Is a vacuum device 112, a gas box main body 121 described later.
A signal cable or the like is connected to the above-described device control unit 140 that controls each device of the vacuum pump main body 131 described later with a computer or the like.

For this reason, the above reaction gas SF6
If there is a possibility that the concentration of the gas exceeds the alarm value, the data of the vacuum device section damper control section 118 is transmitted to the apparatus control section 14.
When the value is input to 0, the device control unit 140 causes the vacuum device 112, the gas box main body 121, and the vacuum pump main body 131 to stop urgently to perform so-called interlock.

(Regarding Gas Supply Section 120 and the Like) The gas box section 120 is disposed on the left side of the vacuum apparatus section 110 in FIG. 1 as described above. The gas box unit 120 is provided with SF6, Cl2 or CHF3 in the etching chamber 111 of the vacuum unit 110.
Gas box body 121 for supplying a reaction gas such as
have. In FIG. 1, for example, gas 1 is SF6
And gas 2 is Cl 2 and gas 3 is CH 2
F3.

The gas box main body 121 is supplied with reactant gases 1 to 3 from a gas cylinder (not shown), so that the gas box main body 121 is provided with a gas box casing in case the reactant gases leak. Body 12
2 is covered.

The gas box casing 122 is connected to a gas box exhaust duct 123, which is an exhaust passage, similarly to the vacuum apparatus casing 113 described above. It is connected to a duct 210.

Therefore, the reaction gas leaked from the gas box main body 121 is exhausted to the outside of the clean room without leaking into the clean room. Further, the gas box exhaust duct 123 includes a damper 116, a damper opening / closing unit 117, and a gas detector 114 similar to the vacuum device duct 114 of the above-described vacuum device unit 110.
a and an anemometer 115 are provided.

For this reason, the damper opening / closing section 1 of the damper 116
With the rotation by 17, the exhaust amount of the gas box exhaust duct 123 can be adjusted.

The damper opening / closing section 117 is controlled by a gas box damper control section 124 composed of, for example, a computer as shown in FIG.

Further, similarly to the exhaust duct 114 for the vacuum device, the gas detector 1 is provided in the exhaust duct 123 for the gas box.
14a and an anemometer 115 are provided. Therefore,
Based on the data of the gas concentration detected by the gas detector 114a and the data of the displacement of the current meter 115, the damper control unit 124 for the gas box performs the same operation as the damper control unit 118 for the vacuum device described above. , The angle of the rotary valve 116a of the damper 116 is adjusted.

The preset table used in this case is the same as that of the vacuum device damper control unit 118 described above. Therefore, when the gas concentration becomes an alarm value, a signal is input to the above-described device control unit 140 which is connected to the gas box damper control unit 124 by a signal cable or the like, and is interlocked.

By the way, the gas box exhaust duct 12
As for the exhaust amount measured by the flow meter 115 provided in the unit 3, a constant exhaust amount is determined in advance, and specifically,
For example, it is about 0.5 mm3 / min.

Therefore, the exhaust amount measured by the flow meter 115 is the predetermined value of 0.5 mm3 / mi.
n, and when the value falls below this value, a signal is input from the gas box damper control unit 124 to the damper opening / closing unit 117 so as to further increase the displacement.

This signal causes the damper opening / closing section 117 to move the rotary valve 116a of the damper 116 in a more open direction.

(Vacuum Pump Section 130, etc.) As shown in FIG. 1, a vacuum pump section 130 is provided to evacuate the vacuum device 112 of the vacuum device section 110 described above. The vacuum pump unit 130 includes a vacuum device 112, specifically, a vacuum pump body 131 for evacuating the etching processing chamber 111.

The vacuum pump body 131 evacuates the atmosphere of the etching processing chamber 111 into which the reaction gas flows, so that the reaction gas is supplied to the vacuum pump body 13.
1 is exhausting.

Therefore, as shown in FIG. 1, a vacuum pump main body exhaust duct 132 is connected to the vacuum pump main body 131. This vacuum pump body exhaust duct 13
2 is connected to the exhaust duct 210 of the exhaust system 200.

The exhaust duct 1 for the vacuum pump body
32 is provided with an abatement device 160 as shown in FIG. Specifically, the abatement apparatus 160 is an apparatus that burns a reactive gas, for example, a fluorine-based gas to make it harmless.

Therefore, the reaction gas exhausted from the vacuum pump main body 131 is removed by the abatement apparatus 160 and then exhausted to the outside of the clean room via the exhaust duct 210. For this reason, the gas exhausted from the vacuum pump main body 131 does not leak into the clean room.

Incidentally, the vacuum pump body 131 is
As shown in FIG. 1, it is covered by a vacuum pump casing 134. A vacuum pump housing exhaust duct 135 is connected to the vacuum pump housing 134. The vacuum pump housing exhaust duct 135 is connected to the exhaust system 200.
The exhaust duct 210 is connected to the

Therefore, the gas leaked from the vacuum pump body 131 is exhausted to the outside of the clean room via the exhaust duct 210 without leaking into the clean room.

Also, the vacuum exhaust casing exhaust duct 135
The same damper 1 as the above-described vacuum device duct 114 is provided.
16, a damper opening / closing section 117, a gas detector 114a, and a flow velocity meter 115 are provided. Therefore, the damper 116
Is rotated by the damper opening / closing section 117 so that the exhaust amount of the vacuum exhaust casing exhaust duct 135 can be adjusted.

This damper opening / closing section 117 is controlled by a vacuum pump damper control section 136 constituted by a computer or the like as shown in FIG. Further, based on the data of the gas concentration detected by the gas detector 114a and the data of the displacement of the anemometer 115, the damper opening / closing unit 117 is operated in the same manner as the vacuum pump damper control unit 136 and the above-described vacuum device damper control unit 118. Through this, the angle of the rotary valve 116a of the damper 116 is adjusted.

The preset table used in this case is the same as that provided in the vacuum device damper control unit 118 described above. Therefore, when the gas concentration becomes an alarm value, a signal is input to the above-described device control unit 140 which is connected to the vacuum pump damper control unit 136 by a signal cable or the like, and interlocked.

Incidentally, the housing exhaust duct 1 for the vacuum pump
The exhaust amount measured by the flow meter 115 provided in the unit 35 is predetermined to be a constant exhaust amount, specifically, for example, about 0.5 mm 3 / min.

Therefore, the displacement measured by the flow meter 115 is the predetermined value of 0.5 mm 3 / mi.
n, and if the value falls below this value, a signal is input from the vacuum pump damper control unit 136 to the damper opening / closing unit 117 so as to further increase the exhaust amount.

With this signal, the damper opening / closing section 117 moves the rotary valve 116a of the damper 116 in a more open direction.

(Regarding Device Control Unit 140 and Host Computer 150) The device control unit 140 is composed of a computer or the like, and is connected to the vacuum device 112, the gas box main body 121, and the vacuum pump main body 131 by a signal cable or the like as described above. Therefore, the operation of these devices and the like is constantly controlled.

The apparatus control section 140 includes a vacuum apparatus damper control section 118 and a gas box damper control section 1.
24 and the vacuum pump damper control unit 136 via a signal cable or the like.
4. If the reaction gas concentration in the gas box exhaust duct 123 or the vacuum pump casing exhaust duct 135 becomes an alarm value, the signal is immediately input to the apparatus control unit 140. Then, in response to the signal, the device control unit 140 is configured to immediately stop the etching device 100 such as an interlock immediately.

On the other hand, the host computer 150
As shown in FIG. 7, since the vacuum device damper control unit 118, the gas box damper control unit 124, and the vacuum pump damper control unit 136 are connected by signal cables or the like, the vacuum device damper control unit 118 is constantly in operation. The information input to the gas box damper control unit 124 and the vacuum pump damper control unit 136 can be monitored.

(Regarding the Operation and the Like of the Present Embodiment) The exhaust system 200 having the etching apparatus 100 according to the present embodiment is configured as described above. Hereinafter, the exhaust system 200 having the etching apparatus 100 will be described. The operation and the like will be described.

First, the operator sets the processing chamber 111 for etching.
An object to be etched is arranged in a chamber inside the chamber, and a required amount of a reactive gas, for example, SF6, required for plasma dry etching is allowed to flow from the gas box main body 121 into the etching processing chamber 111 via the apparatus control unit 140, A voltage is applied, a high-frequency electric field is applied to generate plasma, and etching is performed using fluorine radicals or the like.

At this time, the rotary valve 116a of the damper 116 of the vacuum apparatus exhaust duct 114 connected to the vacuum apparatus casing 113 having the etching processing chamber 111
At first, as shown in FIG. 1, the open state is about 5%. Further, the gas box exhaust duct 123 connected to the gas box casing 122 and the vacuum pump casing 1
Vacuum pump casing exhaust duct 13 connected to
Similarly, the damper 116 provided in the 5 is in an open state of about 5%.

Therefore, the vacuum device exhaust duct 11
4. The exhaust volume in the gas box exhaust duct 123 and the vacuum pump casing exhaust duct 135 is maintained at a constant exhaust volume.
The air is discharged to the outside of the clean room via the air outlet 10.

The manual damper 133 provided in the vacuum pump main body exhaust duct 132 connected to the vacuum pump main body 131 is also manually maintained in an open state of about 5%. As a result, a constant exhaust amount is maintained, and the exhaust air is exhausted out of the clean room via the exhaust duct 210.

[0117] Such exhaust gas is more smoothly exhausted by the fan 220 provided near the outlet of the exhaust duct 210.

When the etching is performed in the etching apparatus 100, the casing 113 for the vacuum device, the casing 122 for the gas box, or the casing 134 for the vacuum pump.
Gas may leak inside.

In this case, the exhaust duct 114 for the vacuum device and the exhaust duct 1 for the gas box connected to each housing are provided.
23 or the gas detector 114a provided in the vacuum pump casing exhaust duct 135 detects the gas concentration,
The detection data is transmitted to the vacuum device damper control unit 118, the gas box damper control unit 124, or the vacuum pump damper control unit 136.

Further, the amount of exhaust gas is measured by the flow velocity meter 115 provided in each exhaust duct, and the data is transmitted to each of the damper control units 118, 124, and 136.

Each of the damper control units 118, 124, and 136, which have obtained such data, operates the rotary valve 116 of each damper 116 so that the amount of exhaust gas corresponds to the amount of gas that can be detected.
In order to move a, each damper opening / closing section 117 is operated.

As described above, according to the present embodiment, each damper 116 is automatically adjusted so that the amount of exhaust in each of the exhaust ducts 114, 123, and 135 is always an appropriate amount. Clean air is not consumed unnecessarily, and no extra burden is placed on the air conditioning equipment in the clean room.

In the case where the exhaust air amount is manually adjusted as in the conventional case, the exhaust air amount may be excessively large and the clean air in the clean room may be unnecessarily exhausted to the outside of the clean room. In the embodiment, since the amount of exhaust is an appropriate amount, unnecessary exhaust of clean air can be prevented, and an unnecessary load on the air conditioning equipment can be prevented. Therefore, it is possible to reduce the energy related to the exhaust.

The exhaust ducts 114, 12
3, 135 are the exhaust ducts 210 of the exhaust system 200.
Therefore, when an exhaust duct of another device group is connected to the exhaust duct 210, the exhaust amount fluctuates. However, in the present embodiment, each exhaust duct 114, 123, 1 of the etching apparatus 100 is used.
Since the amount of exhaust in 35 is automatically adjusted so as to be an appropriate amount, the appropriate amount of exhaust can always be maintained even in such a case.

Further, each exhaust duct 114, 123, 1
When the concentration of the reaction gas in 35 becomes an alarm value, the rotary valve 116a of each damper 116 is opened as shown in FIG. 3A, and the respective damper control units 118, 124, 136 When the signal is input, the apparatus control unit 140 performs an interlock for urgently stopping the operation of the etching apparatus 100, thereby ensuring safety.

Further, such a state can be obtained by the operator by the host computer 150 connected to each of the damper control units 118, 124, 136. Can always be accurately grasped.

As described above, according to the exhaust system 200 having the etching apparatus 100 according to the present embodiment, when the reaction gas reaches the alarm value in any of the exhaust ducts 114, 123, and 135, immediately Since the ventilation of the duct which has reached the alarm value is opened and the etching apparatus 100 is interlocked, the extremely safe exhaust system 2 is provided.
00.

Further, since each damper control section is monitored by the host computer 150, the etching apparatus 1 is constantly monitored.
00 can be easily grasped, and the operator can make an accurate determination even when an abnormality occurs. Further, since the host computer 150 is also connected to a damper control unit of another device group, it is possible to optimally control the exhaust of the other device group.

(Modification of this Embodiment) FIGS. 4 and 5
FIG. 9 is a diagram showing a modification of the exhaust system 200 according to the present embodiment.

As shown in FIG. 4, a flow meter may be provided instead of the flow meter 115 of the above embodiment. Further, a differential pressure gauge may be provided as shown in FIG. In this case, the differential pressure gauge measures the pressure difference between the left and right exhaust ducts in the diagram of the damper 116, as shown in FIG. Then, the flow rate is measured by converting the difference between the pressures using a table provided in advance.

Further, the present invention is not limited to the above embodiment, and various changes can be made without departing from the scope of the claims. Further, each configuration of the embodiment is
Some of them may be omitted or changed to other arbitrary combinations not described above.

[0132]

As described above, according to the present invention, there are provided an exhaust device, a manufacturing processing apparatus, and an exhaust system capable of automatically adjusting the flow rate of gas in an exhaust passage and adjusting the exhaust amount. can do.

[Brief description of the drawings]

FIG. 1 is a schematic diagram showing an exhaust system having an etching apparatus according to an embodiment of the present invention.

FIG. 2 is a schematic sectional view showing the gas detector of FIG.

FIG. 3 is a schematic sectional view showing the damper of FIG. 1;

FIG. 4 is a schematic diagram showing a modification of the present embodiment.

FIG. 5 is a schematic diagram showing another modification of the present embodiment.

FIG. 6 is a schematic view showing an exhaust system having a conventional etching apparatus.

[Explanation of symbols]

 REFERENCE SIGNS LIST 100 etching apparatus 110 vacuum apparatus section 111 etching processing chamber 112 vacuum apparatus 113 vacuum apparatus casing 114 vacuum apparatus exhaust duct 114 a gas Detector 114b Pump unit 114c Gas detection sensor 115 Flow meter 116 Damper 116a Rotary valve 116b Central shaft 117 Damper opening / closing unit 118 Vacuum Device damper control unit 120 ... gas box unit 121 ... gas box main body 122 ... gas box housing 123 ... gas box exhaust duct 124 ... gas box damper control unit 130 ...・ Vacuum pump section 131 ・ ・ ・ Vacuum pump body 132 ・ ・ ・ Evacuation duct for vacuum pump body 133 ・ ・ ・ Manual damper 134 ・ ・ ・Empty pump housing 135 ・ ・ ・ Vacuum pump housing exhaust duct 136 ・ ・ ・ Vacuum pump damper control unit 140 ・ ・ ・ Device control unit 150 ・ ・ ・ Host computer 160 ・ ・ ・ Elimination device 200 ・ ・ ・Exhaust system 210 ・ ・ ・ Exhaust duct 220 ・ ・ ・ Fan

 ────────────────────────────────────────────────── ─── Continued on the front page (72) Inventor Takashi Fujimura 3-3-5 Yamato, Suwa-shi, Nagano F-term in Seiko Epson Corporation (reference) 3L058 BE02 BF03 BG01 BG04 5F004 BC02 BC08 CA02 CB01

Claims (8)

[Claims] A door for opening and closing an exhaust passage with respect to the outside; a door driving unit for opening and closing the door; a detection unit for detecting gas in the exhaust passage; An exhaust device, comprising: a measurement unit that measures an exhaust amount in a passage; and a door drive control unit that drives the door drive unit based on signals from the detection unit and the measurement unit. 2. The exhaust device according to claim 1, wherein a fan is provided near an outlet of the exhaust passage to the outside. 3. An exhaust passage connected to the manufacturing processing apparatus housing; a door for opening and closing the exhaust passage to the outside; a door driving unit for opening and closing the door; and an exhaust passage. A detection unit for detecting gas in the chamber, a measurement unit for measuring an exhaust amount in the exhaust passage, and a door drive control for driving the door drive unit based on a signal from the detection unit and the measurement unit. A manufacturing processing apparatus, comprising: 4. The manufacturing processing apparatus according to claim 3, wherein a fan for promoting exhaust is provided near an outlet portion to the outside of the exhaust passage. 5. The manufacturing processing apparatus main body includes a vacuum device, a gas supply unit, and a vacuum pump unit, and respective housings of the vacuum device, the gas supply unit, and the vacuum pump unit. Are the exhaust passage, the door section, the door drive section,
The manufacturing apparatus according to claim 3, further comprising the detection unit, the measurement unit, and the door drive control unit. 6. The vacuum device, the gas supply, and the vacuum pump are connected to a device controller that controls the vacuum device, the vacuum device, the gas supply, and the vacuum pump. The manufacturing processing apparatus according to claim 5, wherein a signal is input from each of the door drive control sections provided in the housing to the apparatus control section. 7. The door drive control section provided in each housing of the vacuum device section, the gas supply section and the vacuum pump section is connected to a central control section. The manufacturing processing apparatus according to claim 5. 8. An exhaust passage connected to the manufacturing processing apparatus housing, a door for opening and closing the exhaust passage to the outside, a door driving unit for opening and closing the door, and an exhaust passage. A detection unit for detecting gas in the chamber, a measurement unit for measuring an exhaust amount in the exhaust passage, and a door drive control for driving the door drive unit based on a signal from the detection unit and the measurement unit. And a central control unit for controlling the door drive control unit, the fan being provided near an outlet to the outside of the exhaust passage.