JPS6413438A - Measuring instrument for absolute reflection factor in ultraviolet range - Google Patents

Measuring instrument for absolute reflection factor in ultraviolet range

Info

Publication number
JPS6413438A
JPS6413438A JP17080987A JP17080987A JPS6413438A JP S6413438 A JPS6413438 A JP S6413438A JP 17080987 A JP17080987 A JP 17080987A JP 17080987 A JP17080987 A JP 17080987A JP S6413438 A JPS6413438 A JP S6413438A
Authority
JP
Japan
Prior art keywords
sample
detector
ultraviolet
incident
holder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17080987A
Other languages
Japanese (ja)
Inventor
Sadao Minagawa
Tadashi Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP17080987A priority Critical patent/JPS6413438A/en
Publication of JPS6413438A publication Critical patent/JPS6413438A/en
Pending legal-status Critical Current

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  • Investigating Or Analysing Materials By Optical Means (AREA)

Abstract

PURPOSE:To take an accurate measurement by arranging a quartz diffusing plate right before a head-on detector which detects reflected light in a device which makes luminous flux from an ultraviolet-ray source incident on a measurement surface and detects the reflected light from the measurement surface, and diffusing the ultraviolet ray. CONSTITUTION:The device is equipped with a sample holder 3 where a sample to be measured is fitted, the head-on detector 1, and the quartz diffusing plate 9. Then the incident ultraviolet-ray sample beam is reflected by a plane mirror 2, passed through the blank part of the holder 3, and reflected by plane mirrors 5 and 7 to reach the plate 9, which diffuses and makes the light incident on the detector 1. Then a mirror 7 is turned by 270 deg. to the positions of the mirrors 5 and 6 and switched to a position 8, the sample 4 is set in the holder 3, and the ultraviolet ray beam is made incident on the detector 1. Then the absolute reflection factor is found from the ratio of light intensity values when the sample 4 is resent and absent, but the plate 9 is made of quartz glass, so the ultraviolet ray is sufficiently diffused to display integral effect. The measurement is therefore performed with accuracy.
JP17080987A 1987-07-08 1987-07-08 Measuring instrument for absolute reflection factor in ultraviolet range Pending JPS6413438A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17080987A JPS6413438A (en) 1987-07-08 1987-07-08 Measuring instrument for absolute reflection factor in ultraviolet range

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17080987A JPS6413438A (en) 1987-07-08 1987-07-08 Measuring instrument for absolute reflection factor in ultraviolet range

Publications (1)

Publication Number Publication Date
JPS6413438A true JPS6413438A (en) 1989-01-18

Family

ID=15911740

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17080987A Pending JPS6413438A (en) 1987-07-08 1987-07-08 Measuring instrument for absolute reflection factor in ultraviolet range

Country Status (1)

Country Link
JP (1) JPS6413438A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5045704A (en) * 1990-02-01 1991-09-03 Nanometrics Incorporated Method for determining absolute reflectance of a material in the ultraviolet range
JPH0420845A (en) * 1990-05-15 1992-01-24 Jujo Paper Co Ltd Method for measuring gloss irregularity
WO2002010717A3 (en) * 2000-07-28 2002-04-18 Otsuka Denshi Kk Automatic optical measurement method
JP2018048980A (en) * 2016-09-23 2018-03-29 大塚電子株式会社 Spectrometry device

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52146681A (en) * 1976-05-28 1977-12-06 Nasa Reflection measuring apparatus
JPS57179646A (en) * 1981-04-28 1982-11-05 Shimadzu Corp Multiple light fluxes mixer
JPS61126502A (en) * 1984-11-24 1986-06-14 Komatsugawa Kakoki Kk Optically diffusive material

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52146681A (en) * 1976-05-28 1977-12-06 Nasa Reflection measuring apparatus
JPS57179646A (en) * 1981-04-28 1982-11-05 Shimadzu Corp Multiple light fluxes mixer
JPS61126502A (en) * 1984-11-24 1986-06-14 Komatsugawa Kakoki Kk Optically diffusive material

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5045704A (en) * 1990-02-01 1991-09-03 Nanometrics Incorporated Method for determining absolute reflectance of a material in the ultraviolet range
USRE34783E (en) * 1990-02-01 1994-11-08 Nanometrics Incorporated Method for determining absolute reflectance of a material in the ultraviolet range
JPH0420845A (en) * 1990-05-15 1992-01-24 Jujo Paper Co Ltd Method for measuring gloss irregularity
WO2002010717A3 (en) * 2000-07-28 2002-04-18 Otsuka Denshi Kk Automatic optical measurement method
JP2018048980A (en) * 2016-09-23 2018-03-29 大塚電子株式会社 Spectrometry device
CN107870037A (en) * 2016-09-23 2018-04-03 大塚电子株式会社 spectroscopic measurement device
TWI728177B (en) * 2016-09-23 2021-05-21 日商大塚電子股份有限公司 Spectrophotometer
CN107870037B (en) * 2016-09-23 2021-06-29 大塚电子株式会社 Spectrometry device

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