JPS6413152A - Fitting method for photomask pellicle - Google Patents
Fitting method for photomask pellicleInfo
- Publication number
- JPS6413152A JPS6413152A JP16909087A JP16909087A JPS6413152A JP S6413152 A JPS6413152 A JP S6413152A JP 16909087 A JP16909087 A JP 16909087A JP 16909087 A JP16909087 A JP 16909087A JP S6413152 A JPS6413152 A JP S6413152A
- Authority
- JP
- Japan
- Prior art keywords
- photomask
- photomask substrate
- heater
- heated
- pellicle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
PURPOSE:To prevent the generation of a defect of a photomask pattern by press-contacting a photomask pellicle against a photomask substrate in a state that a part to be attached is heated. CONSTITUTION:A photomask substrate 2 on which a photomask pattern 5 has been formed is set vertically to a photomask substrate positioning and fixing jig 7 provided with a built-in heater 8. Subsequently, by the heater 8, the photomask substrate 2 is heated to, for instance, about 40 deg., and in its heating state, a pellicle frame 4 to which for instance, an adhesive agent 6 of a rubber compound is applied is held by a pellicle holder, pressed against the photomask substrate 2, and welded by pressure by holding a prescribed time. In such a way, since the photomask substrate 2 containing the installation part is heated by the heater 8, the adhesive agent 6 is softened and comes to apt to flow uniformly, and without necessitating large pressure, the adhesive agent 6 spreads uniformly on the whole surface of the abutting surface, and press-contacted surely. Also, the generation of a defect of the photomask pattern can be prevented.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16909087A JPS6413152A (en) | 1987-07-06 | 1987-07-06 | Fitting method for photomask pellicle |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16909087A JPS6413152A (en) | 1987-07-06 | 1987-07-06 | Fitting method for photomask pellicle |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6413152A true JPS6413152A (en) | 1989-01-18 |
Family
ID=15880139
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16909087A Pending JPS6413152A (en) | 1987-07-06 | 1987-07-06 | Fitting method for photomask pellicle |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6413152A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63155812U (en) * | 1987-03-31 | 1988-10-13 | ||
WO1991002294A1 (en) * | 1989-08-10 | 1991-02-21 | Daicel Chemical Industries, Ltd. | Dust-preventing film |
JP2015094800A (en) * | 2013-11-11 | 2015-05-18 | 信越化学工業株式会社 | Method of pasting pellicle and pasting device used in the same |
-
1987
- 1987-07-06 JP JP16909087A patent/JPS6413152A/en active Pending
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63155812U (en) * | 1987-03-31 | 1988-10-13 | ||
WO1991002294A1 (en) * | 1989-08-10 | 1991-02-21 | Daicel Chemical Industries, Ltd. | Dust-preventing film |
JPH0371134A (en) * | 1989-08-10 | 1991-03-26 | Daicel Chem Ind Ltd | Dustproof film |
JP2015094800A (en) * | 2013-11-11 | 2015-05-18 | 信越化学工業株式会社 | Method of pasting pellicle and pasting device used in the same |
US9645487B2 (en) | 2013-11-11 | 2017-05-09 | Shin-Etsu Chemical Co., Ltd. | Method for bonding a pellicle, and a bonding apparatus used in this method |
KR20210128984A (en) * | 2013-11-11 | 2021-10-27 | 신에쓰 가가꾸 고교 가부시끼가이샤 | A method for bonding a pellicle, and a bonding apparatus used in this method |
EP2871521B1 (en) * | 2013-11-11 | 2023-06-07 | Shin-Etsu Chemical Co., Ltd | Method for bonding a pellicle to a stencil |
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