JPS6412112B2 - - Google Patents

Info

Publication number
JPS6412112B2
JPS6412112B2 JP57135650A JP13565082A JPS6412112B2 JP S6412112 B2 JPS6412112 B2 JP S6412112B2 JP 57135650 A JP57135650 A JP 57135650A JP 13565082 A JP13565082 A JP 13565082A JP S6412112 B2 JPS6412112 B2 JP S6412112B2
Authority
JP
Japan
Prior art keywords
effect
thin film
vacuum
film
annealing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57135650A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5927587A (ja
Inventor
Akimitsu Morisako
Mitsunori Matsumoto
Hidetoshi Tsucha
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Akai Electric Co Ltd
Original Assignee
Akai Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Akai Electric Co Ltd filed Critical Akai Electric Co Ltd
Priority to JP57135650A priority Critical patent/JPS5927587A/ja
Publication of JPS5927587A publication Critical patent/JPS5927587A/ja
Publication of JPS6412112B2 publication Critical patent/JPS6412112B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N50/00—Galvanomagnetic devices
    • H10N50/01—Manufacture or treatment

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Hall/Mr Elements (AREA)
JP57135650A 1982-08-05 1982-08-05 磁気抵抗素子用磁性薄膜の製造方法 Granted JPS5927587A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57135650A JPS5927587A (ja) 1982-08-05 1982-08-05 磁気抵抗素子用磁性薄膜の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57135650A JPS5927587A (ja) 1982-08-05 1982-08-05 磁気抵抗素子用磁性薄膜の製造方法

Publications (2)

Publication Number Publication Date
JPS5927587A JPS5927587A (ja) 1984-02-14
JPS6412112B2 true JPS6412112B2 (cs) 1989-02-28

Family

ID=15156748

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57135650A Granted JPS5927587A (ja) 1982-08-05 1982-08-05 磁気抵抗素子用磁性薄膜の製造方法

Country Status (1)

Country Link
JP (1) JPS5927587A (cs)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61144893A (ja) * 1984-12-18 1986-07-02 Aichi Tokei Denki Co Ltd 磁気抵抗素子
JP2545935B2 (ja) * 1988-07-12 1996-10-23 日本電気株式会社 磁気抵抗効果薄膜およびその製造方法
DE19941046C1 (de) * 1999-08-28 2001-01-11 Bosch Gmbh Robert Magnetisch sensitive Schichtanordnung mit GMR-Effekt und Verfahren zu deren Herstellung

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58135688A (ja) * 1982-02-08 1983-08-12 Nippon Denso Co Ltd 磁気抵抗素子の製造方法

Also Published As

Publication number Publication date
JPS5927587A (ja) 1984-02-14

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