JPS6411968A - Manufacture of sputtering target - Google Patents
Manufacture of sputtering targetInfo
- Publication number
- JPS6411968A JPS6411968A JP16816587A JP16816587A JPS6411968A JP S6411968 A JPS6411968 A JP S6411968A JP 16816587 A JP16816587 A JP 16816587A JP 16816587 A JP16816587 A JP 16816587A JP S6411968 A JPS6411968 A JP S6411968A
- Authority
- JP
- Japan
- Prior art keywords
- molten metal
- mold
- solidification
- high frequency
- solidified
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
PURPOSE:To manufacture a target free from cavities by unidirectionally solidifying molten metal in a mold when the molten metal of rare earth transition metal alloy is cast into a sputtering target. CONSTITUTION:A matrix 1 manufactured of cast iron having a high frequency heating coil 6 on the outside fitted so that it can move vertically is put on a copper cooling plate 4 having a water cooling pipe 5. The molten metal 3 of rare earth transition metal alloy is cast from a melting crucible 2 into this mold 1. Since the mold is heated by the high frequency heating coil 6, the molten metal 3 is kept at a fixed temperature such as about 1350 deg.C and solidified by the cooling plate 4 from the bottom to the top in the mold 1. In this case, the high frequency heating coil 6 is lifted with the solidification of the molten metal 3 and the molten metal in the circumference flows, with the solidification and shrinkage, into the cavity in the central part which is not yet solidified and is solidified upward in one direction. Accordingly, the target free from cavities in the central part based on solidification and shrinkage can be manufactured stably by the casting method.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16816587A JPS6411968A (en) | 1987-07-06 | 1987-07-06 | Manufacture of sputtering target |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16816587A JPS6411968A (en) | 1987-07-06 | 1987-07-06 | Manufacture of sputtering target |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6411968A true JPS6411968A (en) | 1989-01-17 |
Family
ID=15863011
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16816587A Pending JPS6411968A (en) | 1987-07-06 | 1987-07-06 | Manufacture of sputtering target |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6411968A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2012108074A1 (en) * | 2011-02-09 | 2012-08-16 | Jx日鉱日石金属株式会社 | Indium target and method for producing same |
-
1987
- 1987-07-06 JP JP16816587A patent/JPS6411968A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2012108074A1 (en) * | 2011-02-09 | 2012-08-16 | Jx日鉱日石金属株式会社 | Indium target and method for producing same |
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