JPS6411968A - Manufacture of sputtering target - Google Patents

Manufacture of sputtering target

Info

Publication number
JPS6411968A
JPS6411968A JP16816587A JP16816587A JPS6411968A JP S6411968 A JPS6411968 A JP S6411968A JP 16816587 A JP16816587 A JP 16816587A JP 16816587 A JP16816587 A JP 16816587A JP S6411968 A JPS6411968 A JP S6411968A
Authority
JP
Japan
Prior art keywords
molten metal
mold
solidification
high frequency
solidified
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16816587A
Other languages
Japanese (ja)
Inventor
Akira Aoyama
Toshihiko Yamagishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP16816587A priority Critical patent/JPS6411968A/en
Publication of JPS6411968A publication Critical patent/JPS6411968A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To manufacture a target free from cavities by unidirectionally solidifying molten metal in a mold when the molten metal of rare earth transition metal alloy is cast into a sputtering target. CONSTITUTION:A matrix 1 manufactured of cast iron having a high frequency heating coil 6 on the outside fitted so that it can move vertically is put on a copper cooling plate 4 having a water cooling pipe 5. The molten metal 3 of rare earth transition metal alloy is cast from a melting crucible 2 into this mold 1. Since the mold is heated by the high frequency heating coil 6, the molten metal 3 is kept at a fixed temperature such as about 1350 deg.C and solidified by the cooling plate 4 from the bottom to the top in the mold 1. In this case, the high frequency heating coil 6 is lifted with the solidification of the molten metal 3 and the molten metal in the circumference flows, with the solidification and shrinkage, into the cavity in the central part which is not yet solidified and is solidified upward in one direction. Accordingly, the target free from cavities in the central part based on solidification and shrinkage can be manufactured stably by the casting method.
JP16816587A 1987-07-06 1987-07-06 Manufacture of sputtering target Pending JPS6411968A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16816587A JPS6411968A (en) 1987-07-06 1987-07-06 Manufacture of sputtering target

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16816587A JPS6411968A (en) 1987-07-06 1987-07-06 Manufacture of sputtering target

Publications (1)

Publication Number Publication Date
JPS6411968A true JPS6411968A (en) 1989-01-17

Family

ID=15863011

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16816587A Pending JPS6411968A (en) 1987-07-06 1987-07-06 Manufacture of sputtering target

Country Status (1)

Country Link
JP (1) JPS6411968A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012108074A1 (en) * 2011-02-09 2012-08-16 Jx日鉱日石金属株式会社 Indium target and method for producing same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012108074A1 (en) * 2011-02-09 2012-08-16 Jx日鉱日石金属株式会社 Indium target and method for producing same

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