JPS6411714B2 - - Google Patents

Info

Publication number
JPS6411714B2
JPS6411714B2 JP57086265A JP8626582A JPS6411714B2 JP S6411714 B2 JPS6411714 B2 JP S6411714B2 JP 57086265 A JP57086265 A JP 57086265A JP 8626582 A JP8626582 A JP 8626582A JP S6411714 B2 JPS6411714 B2 JP S6411714B2
Authority
JP
Japan
Prior art keywords
substrate
current
cathode
anode
filament
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57086265A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58204811A (ja
Inventor
Tadayoshi Otani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nihon Denshi KK filed Critical Nihon Denshi KK
Priority to JP57086265A priority Critical patent/JPS58204811A/ja
Publication of JPS58204811A publication Critical patent/JPS58204811A/ja
Publication of JPS6411714B2 publication Critical patent/JPS6411714B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26Deposition of carbon only

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Chemical Vapour Deposition (AREA)
JP57086265A 1982-05-20 1982-05-20 イオン化成膜装置 Granted JPS58204811A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57086265A JPS58204811A (ja) 1982-05-20 1982-05-20 イオン化成膜装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57086265A JPS58204811A (ja) 1982-05-20 1982-05-20 イオン化成膜装置

Publications (2)

Publication Number Publication Date
JPS58204811A JPS58204811A (ja) 1983-11-29
JPS6411714B2 true JPS6411714B2 (enrdf_load_stackoverflow) 1989-02-27

Family

ID=13881985

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57086265A Granted JPS58204811A (ja) 1982-05-20 1982-05-20 イオン化成膜装置

Country Status (1)

Country Link
JP (1) JPS58204811A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS58204811A (ja) 1983-11-29

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