JPS6410169B2 - - Google Patents

Info

Publication number
JPS6410169B2
JPS6410169B2 JP16303983A JP16303983A JPS6410169B2 JP S6410169 B2 JPS6410169 B2 JP S6410169B2 JP 16303983 A JP16303983 A JP 16303983A JP 16303983 A JP16303983 A JP 16303983A JP S6410169 B2 JPS6410169 B2 JP S6410169B2
Authority
JP
Japan
Prior art keywords
mold
plating
thickness
protrusions
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP16303983A
Other languages
Japanese (ja)
Other versions
JPS6054819A (en
Inventor
Kyoto Hamamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP16303983A priority Critical patent/JPS6054819A/en
Publication of JPS6054819A publication Critical patent/JPS6054819A/en
Publication of JPS6410169B2 publication Critical patent/JPS6410169B2/ja
Granted legal-status Critical Current

Links

Description

【発明の詳細な説明】 〔発明の技術分野〕 この発明は、例えばカメラのピントグラスのよ
うな光学部材である透明樹脂の表面を微細凹凸表
面に成形する場合に使用して好適な樹脂成形金型
の製造方法に関する。
Detailed Description of the Invention [Technical Field of the Invention] The present invention provides a resin molding metal suitable for use in molding the surface of a transparent resin, which is an optical member such as a camera focusing glass, into a finely uneven surface. This invention relates to a mold manufacturing method.

〔発明の技術的背景とその問題点〕[Technical background of the invention and its problems]

一般にカメラのピントグラスのような光学部材
は、光の透過率及び解像度が高いことが最も重要
で、使用樹脂はその目的達成のため極めて透明度
の高い樹脂が選ばれるが、その表面形状又は構造
によつて左右されることが大であり、透明樹脂表
面を成形する金型の精度等の品質を向上させるこ
とが不可欠である。
In general, for optical components such as camera focusing glasses, high light transmittance and resolution are most important, and the resin used is selected to have extremely high transparency to achieve this purpose, but the surface shape or structure Therefore, it is essential to improve the precision and quality of the mold for molding the transparent resin surface.

次に、理想的金型及びその表面の形状、寸法を
図に従つて説明する。先ず第1図及び第2図は光
学的に示された金型例でそれぞれ球面オス型と同
メス型であり、いずれも光学的には同様効果を示
し、凸部1又は凹部2はそれぞれ矢印3,3′で
示された半径を有する半球面が滑らかに形成され
ていることが重要である。そして、これら半球面
は一定の間隔4,4′で連続した表面で半球面が
接した境界5,5′があり、一定の高さ又はくぼ
み6,6′を持つ表面が必要である。そして、上
記表面を寸法的に見ると、解像度を高めるため半
球面の間隔4,4′は例えば34μmとなり、その
半球面である凸部1又は凹部2の半掘径約30μm
とする微細表面であり、30mm×40mmという大面積
を均一に形成することが困難視されるのは容易に
想像されよう。
Next, an ideal mold and its surface shape and dimensions will be explained according to the drawings. First of all, FIGS. 1 and 2 are optically illustrated examples of the molds, which are a spherical male mold and a spherical female mold, respectively, and both have the same optical effect, and the convex part 1 or concave part 2 is indicated by the arrow, respectively. It is important that the hemispherical surface with radius designated 3,3' is formed smoothly. These hemispherical surfaces are continuous at regular intervals 4, 4' and have boundaries 5, 5' where the hemispherical surfaces are in contact, and surfaces with constant heights or depressions 6, 6' are required. Looking at the above surface dimensionally, in order to improve the resolution, the spacing 4, 4' between the hemispherical surfaces is, for example, 34 μm, and the half diameter of the hemispherical convex portion 1 or concave portion 2 is approximately 30 μm.
It is easy to imagine that it would be difficult to uniformly form a large area of 30 mm x 40 mm due to the fine surface.

さて、従来試みられた樹脂成形金型の製造方法
は、第3図a〜dに示される例が代表的である。
これは一般にフオトエツチング方法として知られ
るが、その工程は主にフオトレジストコート、ベ
ーキング、露光a、現像b、エツチングc、レジ
ストdの順に行なわれ、フオトマスク7のパター
ン8をもとにパターン形成し、フオトレジスト9
−1〜9−6をマスクとし任意金属基板10−1
〜10−4を化学エツチングし、凹部11を形成
するが、一部平坦面12が残つたり、非球面のく
ぼみ13となり、光学的には不満足な表面形状の
金型であつた。
Now, the examples shown in FIGS. 3a to 3d are typical examples of methods of manufacturing resin molding molds that have been tried in the past.
This is generally known as a photoetching method, and the steps are mainly performed in the order of photoresist coating, baking, exposure a, development b, etching c, and resist d, and a pattern is formed based on the pattern 8 of the photomask 7. , Photoresist 9
-1 to 9-6 as masks, arbitrary metal substrate 10-1
10-4 was chemically etched to form a recess 11, but the mold had a surface shape that was optically unsatisfactory, with some flat surfaces 12 remaining and aspherical recesses 13.

〔発明の目的〕[Purpose of the invention]

この発明の目的は、理想的な半球面が部分的な
平坦面を生ずることなく連続した表面を有する樹
脂成形金型の製造方法を提供することである。
An object of the present invention is to provide a method for manufacturing a resin molding die having an ideal hemispherical surface that is continuous without producing a partially flat surface.

〔発明の概要〕[Summary of the invention]

この発明は、少なくとも平担基板の表面に機械
加工方法、フオトエツチング方法、電気めつき方
法のいずれかを利用して中心間が所定間隔離れ、
且つ所定の高さの多数の微細突起を有する突起基
板を形成する工程と、この突起基板の突起表面に
銅又はニツケルの電気光沢めつきを上記突起の中
心間寸法の1/2以上とする厚さ施し、このめつき
厚さと同等の半径で且つ連続した半球面を形成し
て球面オス型表面を形成する工程と、 を具備することを特徴とする樹脂成形金型の製造
方法である。
In the present invention, the surfaces of the flat substrates are spaced apart from each other by a predetermined distance by using one of a machining method, a photoetching method, and an electroplating method.
and a step of forming a protrusion substrate having a large number of fine protrusions of a predetermined height, and electrolytic gloss plating of copper or nickel on the protrusion surface of the protrusion substrate to a thickness of at least 1/2 of the center-to-center dimension of the protrusions. This method of manufacturing a resin molding mold comprises the steps of forming a continuous hemispherical surface with a radius equivalent to the plating thickness to form a spherical male surface.

〔発明の実施例〕[Embodiments of the invention]

この発明による樹脂成形金型の製造方法の第1
の実施例は、第4図乃至第11図に示すように構
成されている。
First method of manufacturing a resin molding mold according to the present invention
The embodiment is constructed as shown in FIGS. 4 to 11.

即ち、第4図はこの発明で用いられるクロム膜
付ガラス基板の斜視図であり、格子状パターンに
形成された蒸着クロム膜14は、強固に平坦なガ
ラス基板15に固着しており、従来のフオトエツ
チング方法にて形成している。この場合、上記蒸
着クロム膜14は線巾約2μmでピツチ34μmの格
子寸法に形成しておく。そして、洗浄後、電気光
沢銅又は光沢ニツケルめつきを約10μmの厚さ施
すと、第5図に示す断面を有する格子状金属パタ
ーン16が形成され、その巾は約12μmとなる。
That is, FIG. 4 is a perspective view of a glass substrate with a chromium film used in the present invention, and the vapor-deposited chromium film 14 formed in a grid pattern is firmly fixed to a flat glass substrate 15, unlike the conventional one. It is formed using a photoetching method. In this case, the vapor-deposited chromium film 14 is formed in a grid having a line width of about 2 μm and a pitch of 34 μm. After cleaning, electrolytic copper or bright nickel plating is applied to a thickness of about 10 .mu.m to form a lattice metal pattern 16 having a cross section shown in FIG. 5, and its width is about 12 .mu.m.

次いで、第6図に示すように、例えばモリブデ
ンを含む水溶液から電着された酸化膜の薄膜17
を上記金属パターン16上に約0.1μm形成する。
この酸化膜17はニツケル、クロム等の酸化膜で
も代用でき、次の厚付めつき膜と上記格子状金属
パターンとを分離するのに役立つ。
Next, as shown in FIG. 6, a thin oxide film 17 is electrodeposited from an aqueous solution containing, for example, molybdenum.
is formed on the metal pattern 16 to a thickness of about 0.1 μm.
This oxide film 17 can be replaced with an oxide film of nickel, chromium, etc., and is useful for separating the next thick plating film from the grid metal pattern.

次に、第7図に示すように上記酸化膜の薄膜1
7上に電気光沢銅めつき又は光沢ニツケルめつき
をできるだけ厚くめつきする。この場合、厚い方
が以下の工程で変形等の不良品発生を少なくする
ので0.3mm以上の厚さが望ましい。図中、18が
厚付めつきである。尚、上記第4図乃至第7図の
工程は公知の技術である。
Next, as shown in FIG. 7, the thin oxide film 1
7. Plate electro-bright copper plating or bright nickel plating as thickly as possible on top of 7. In this case, a thickness of 0.3 mm or more is desirable because the thicker the material, the less defective products such as deformation will occur in the following steps. In the figure, 18 is thick plating. Incidentally, the steps shown in FIGS. 4 to 7 are known techniques.

その後、蒸着クロム膜14及びガラス基板15
を機械的に分離し、第8図に示すような複合金属
膜を得る。即ち、蒸着クロム膜14が分離したく
ぼみ45を有する平坦面が現われ、更にピンセツ
ト等で機械的に格子状金属パターン16を引き剥
がすと、金属メツシユ状に取れる。後に残つた厚
付めつき18には、第9図に示すように一部の酸
化膜の薄膜17が付着した状態で残り、平坦面を
有する突起19が多数存在するオス型突起基板と
なる。この突起19の中心間隔は34μmで均一に
形成され、約10μmの深さからなる格子状溝がで
きる。尚オス型突起基板を上方から見れば、第1
8図に示すように突起19は格子状の溝に囲まれ
ている。
After that, the vapor-deposited chromium film 14 and the glass substrate 15
is mechanically separated to obtain a composite metal membrane as shown in FIG. That is, a flat surface having recesses 45 separated from the vapor-deposited chromium film 14 appears, and when the lattice metal pattern 16 is mechanically peeled off using tweezers or the like, a metal mesh can be obtained. As shown in FIG. 9, the remaining thick plating 18 remains with a part of the thin oxide film 17 attached thereto, and becomes a male-type protrusion substrate having a large number of protrusions 19 having flat surfaces. The protrusions 19 are uniformly formed with a center spacing of 34 μm, creating a lattice-like groove with a depth of about 10 μm. If you look at the male protrusion board from above, the first
As shown in FIG. 8, the protrusion 19 is surrounded by a grid-like groove.

次に、電気めつき法により所定の半径を有する
半球面を形成するため、正確に制御された厚さめ
つきを施す。即ち、上記オス型突起基板の酸化膜
の薄膜17を塩酸等で化学的に溶解除去し、サツ
カリンや1.5ナフタリン、ジスルホン酸トナリウ
ム等のようなニツケルめつき膜の応力を減少させ
る。一般に1次光沢剤と呼ばれる光沢剤のみ添加
した電気光沢ニツケルめつき液にて30μmの厚さ
めつきすると、第10図に示すような半径20の
30μmの凸型半球面21を有する、いわゆる球面
オス型の表面を持つこの発明の金型26が完成す
る。尚、厚付めつき18の裏面は平坦に研磨して
仕上げる。第11図にその表面の斜視図を示す
が、34μm四方の正方形の境界22を有する微細
表面23が均一に形成されたのが確認された。
Next, electroplating is performed to form a hemispherical surface having a predetermined radius with a precisely controlled thickness. That is, the thin oxide film 17 of the male protrusion substrate is chemically dissolved and removed using hydrochloric acid or the like to reduce the stress of the nickel plating film made of saccharin, 1.5 naphthalene, tonalium disulfonate, or the like. When plating to a thickness of 30 μm with an electric bright nickel plating solution containing only a brightening agent, generally called a primary brightening agent, a radius of 20 mm as shown in Figure 10 is formed.
A mold 26 of the present invention having a so-called spherical male surface having a convex hemispherical surface 21 of 30 μm is completed. Note that the back surface of the thick plating 18 is polished and finished flat. FIG. 11 shows a perspective view of the surface, and it was confirmed that a fine surface 23 having a 34 μm square boundary 22 was uniformly formed.

そして、第12図に示すように実験的加温成形
で透明樹脂24を加圧体25に接着された上記球
面オス型の金型26により、約80℃で加圧成形し
たところ、忠実に金型表面形状が転写され、極め
て光学的に優れた成形品ができることが判明し
た。
Then, as shown in FIG. 12, the transparent resin 24 was pressure-molded at about 80°C using the above-mentioned spherical male mold 26 glued to the pressurizing body 25 in experimental heat molding, and the result was that the metal was faithfully molded. It was found that the mold surface shape was transferred and a molded product with extremely excellent optical properties was produced.

ところで、上記第1の実施例で得られた球面オ
ス型の金型から表面形状を反転した球面メス型の
金型が必要な場合は、上記第6図にて説明した方
法により、電鋳にて形成し得る。つまり、第13
図に示すように、球面オス型26の30μmの半径
27を持つ半球面上にモリブデンの酸化膜の薄膜
28を電着せしめ、更に電気光沢ニツケルめつき
29を厚く形成し、その後、引き剥がすと第14
図に示すようにほぼ同寸法に反転された半球面の
半径27′を持つ球面メス型の金型30が完成す
る。この方法は一般に電鋳と呼ばれ、精密な転写
を可能とする形成法である。
By the way, if a spherical female mold with the surface shape reversed from the spherical male mold obtained in the first embodiment is required, electroforming can be performed by the method explained in FIG. 6 above. It can be formed by In other words, the 13th
As shown in the figure, a thin molybdenum oxide film 28 is electrodeposited on a hemispherical surface with a radius 27 of 30 μm of a spherical male mold 26, and a thick electro-glossy nickel plating 29 is further formed, and then peeled off. 14th
As shown in the figure, a spherical female mold 30 having a hemispherical radius 27' inverted to approximately the same size is completed. This method is generally called electroforming, and is a forming method that enables precise transfer.

以上の実施結果から、均一に多数の微細突起を
有するオス型突起基板に電気めつきすれば任意の
半径を有する半球面の連続した表面の金型が形成
できることが判る。そして上記オス型突起基板の
突起は、完成後の金型表面の半球面の高さ又はく
ぼみの深さより高いことが必要であり、配置の位
置で正方形、六角形等の境界を生じる金型を設計
し得る。
The above results show that a mold having a continuous hemispherical surface having an arbitrary radius can be formed by electroplating a male protrusion substrate having a uniform number of fine protrusions. The protrusions on the male protrusion board need to be higher than the height of the hemisphere or the depth of the depression on the surface of the completed mold, and the protrusions on the male protrusion substrate must be higher than the height of the hemisphere or the depth of the recess on the surface of the completed mold. Can be designed.

従つて第2の実施例として、フオトレジストな
利用したオス型突起基板の形成方法及び金型の製
造工程を第15図に示す。先ず、第15図aに示
すように、所望のパターン31を形成したガラス
基板32からなるフオトマスクと、フオトレジス
ト33を塗布した平坦な金属板34を用意し、紫
外線光35による露光を行なう。そして同図bに
示すように一部の金属面が露出した被めつき部3
6を得て、次に電気光沢ニツケルめつきを金型に
必要な半球面の高さよりやや高い寸法の厚さめつ
きし、同図cに示すニツケルめつきの突起37を
形成する。その後、フオトレジストをアセトン等
で溶解除去すると、同図dに示すように、一部の
フオトレジスト38が残るかも知れないが、オス
型の突起基板が完成する。次に、金型に必要な半
球面の半径と同じ厚さ電気ニツケルめつきを第1
の実施例と同様に行なうと、同図eに示されるよ
うに所望の半径39を有する半球面40の連続し
た表面が形成され、球面オス型の金型が完成す
る。
Therefore, as a second embodiment, a method for forming a male protrusion substrate using photoresist and a manufacturing process for a mold are shown in FIG. First, as shown in FIG. 15A, a photomask made of a glass substrate 32 on which a desired pattern 31 is formed and a flat metal plate 34 coated with a photoresist 33 are prepared, and exposed to ultraviolet light 35. Then, as shown in FIG.
6 is obtained, and then electro-gloss nickel plating is applied to the mold to a thickness slightly higher than the height of the hemispherical surface required for the mold, thereby forming the nickel-plated protrusions 37 shown in FIG. Thereafter, when the photoresist is dissolved and removed using acetone or the like, a male-shaped protrusion substrate is completed, although some of the photoresist 38 may remain, as shown in d of the same figure. Next, apply electric nickel plating to the same thickness as the radius of the hemisphere required for the mold.
If the process is carried out in the same manner as in the embodiment, a continuous surface of a hemispherical surface 40 having a desired radius 39 is formed as shown in FIG.

次に、第3の実施例として、第16図に示すよ
うにニツケルや銅等の平坦な金属基板にV字形の
溝41を格子状に機械加工し、上記実施例と同様
な寸法高さのオス型の突起42を形成する。更に
上記実施例と同様にニツケルめつきを施すと、第
17図に示すように任意の半径43を有する半球
面44の連続した表面が形成される。
Next, as a third embodiment, as shown in FIG. 16, V-shaped grooves 41 are machined in a lattice pattern on a flat metal substrate such as nickel or copper. A male protrusion 42 is formed. Further, when nickel plating is applied in the same manner as in the above embodiment, a continuous surface of a hemispherical surface 44 having an arbitrary radius 43 is formed as shown in FIG.

尚、上記実施例では、オス型突起基板における
突起19を有する基盤は第18図に示すように格
子状パターンであつたが、必要に応じ第19図乃
至第22図に示すような形状に突起パターンを形
成してもよい。
In the above embodiment, the base having the protrusions 19 in the male protrusion substrate had a lattice pattern as shown in FIG. A pattern may also be formed.

又、上記実施例では突起基板は平坦であつた
が、必要に応じプレス成形加工等して彎曲させた
金型としても利用できる。
Further, in the above embodiment, the protruding substrate was flat, but if necessary, it can be used as a curved mold by press molding or the like.

〔発明の効果〕〔Effect of the invention〕

この発明によれば、電気めつきにより理想的な
半球面が部分的な平坦面を生ずることなく連続し
た表面を形成することが容易であり、光学用樹脂
部材の成形用金型として工業的に応用する効果は
大である。そして、この発明の金型を用いれば、
光学用樹脂部材に忠実に金型表面形状が転写さ
れ、極めて光学的に優れた成形品が得られる。
According to this invention, it is easy to form a continuous ideal hemispherical surface without producing a partially flat surface by electroplating, and it can be used industrially as a mold for molding optical resin members. The effect of applying it is great. And, if you use the mold of this invention,
The surface shape of the mold is faithfully transferred to the optical resin member, resulting in a molded product with extremely excellent optical properties.

尚、この発明の樹脂成形金型により成形された
樹脂部品の用途としては、カメラのピントグラス
のほかに、フイルタ、レーザ部品、印刷用厚板、
スクリーン(プロジエクタのスクリーン)、装飾
品などが考えられる。
The resin parts molded by the resin molding mold of the present invention can be used not only for camera focus glasses, but also for filters, laser parts, printing plates,
Possible examples include screens (projector screens), decorations, etc.

【図面の簡単な説明】[Brief explanation of drawings]

第1図及び第2図は樹脂成形金型表面の理想的
形状を拡大して示す断面図で、第1図が球面オス
型、第2図が同メス型、第3図a〜dは従来来の
樹脂成形金型の製造方法(フオトエツチングによ
る金型表面の形成工程)を示す断面図、第4図乃
至第10図はこの発明の一実施例に係る樹脂成形
金型の製造方法を示す断面図、第11図はこの発
明の一実施例に係る樹脂成形金型(球面オス型)
を示す斜視図、第12図はこの発明の金型により
実験的に樹脂表面を成形する装置の説明図、第1
3図は第11図の金型表面に電気めつきを施した
場合を示す断面図、第14図は第13図における
めつき膜を分離し完成した球面メス型金型を示す
断面図、第15図a〜eははこの発明の製造方法
の第2の実施例を示す断面図、第16図はこの発
明の製造方法の第3の実施例に用いられるオス型
突起基板を示す断面図、第17図は第3の実施例
における球面オス型の金型を示す断面図、第18
図乃至第22図はオス型突起基板における突起の
各種形状の例を示す概略平面図である。 14……蒸着クロム膜、15……ガラス基板、
16……金属パターン、17……酸化膜の薄膜、
18……厚付めつき、19……突起、20……金
型(球面オス型)、30……金型(球面メス型)。
Figures 1 and 2 are enlarged cross-sectional views showing the ideal shape of the resin mold surface. Figure 1 is a spherical male mold, Figure 2 is a female mold, and Figures a to d are conventional molds. 4 to 10 are cross-sectional views showing a conventional method for manufacturing a resin molding mold (a step of forming a mold surface by photoetching), and FIGS. 4 to 10 show a method for manufacturing a resin molding mold according to an embodiment of the present invention. A cross-sectional view and FIG. 11 are resin molding molds (spherical male mold) according to an embodiment of the present invention.
FIG. 12 is an explanatory diagram of an apparatus for experimentally molding a resin surface using the mold of the present invention.
Figure 3 is a cross-sectional view showing the case where electroplating is applied to the mold surface in Figure 11, Figure 14 is a cross-sectional view showing the completed spherical female mold after separating the plating film in Figure 13, 15A to 15E are cross-sectional views showing a second embodiment of the manufacturing method of the present invention, and FIG. 16 is a cross-sectional view showing a male protrusion substrate used in the third example of the manufacturing method of the present invention. FIG. 17 is a sectional view showing a spherical male mold in the third embodiment;
22 are schematic plan views showing examples of various shapes of protrusions on a male protrusion substrate. 14... Vapor deposited chromium film, 15... Glass substrate,
16...Metal pattern, 17...Thin oxide film,
18... Thick plating, 19... Protrusion, 20... Mold (spherical male type), 30... Mold (spherical female type).

Claims (1)

【特許請求の範囲】 1 少なくとも平坦基板の表面に機械加工方法、
フオトエツチング方法、電気めつき方法のいずれ
かを利用して中心間が所定間隔離れ、且つ所定の
高さの多数の微細突起を有する突起基板を形成す
る工程と、 この突起基板の突起表面に銅又はニツケルの電
気光沢めつきを上記突起の中心間寸法の1/2以上
とする厚さを施し、このめつき厚さと同等の半径
で且つ連続した半球面を形成して球面オス型表面
を形成する工程と を具備することを特徴とする樹脂成形金型の製造
方法。 2 少なくとも平坦基板の表面に機械加工方法、
フオトエツチング方法、電気めつき方法のいずれ
かを利用して中心間が所定間隔離れ、且つ所定の
高さの多数の微細突起を有する突起基板を形成す
る工程と、 この突起基板の突起表面に銅又はニツケルの電
気光沢めつきを上記突起の中心間寸法の1/2以上
とする厚さ施し、このめつき厚さと同等の半径で
且つ連続した半球面を形成して球面オス型表面を
形成する工程と、 上記球面オス型表面に酸化膜の薄膜を形成して
銅又はニツケルの電気光沢めつきを施す工程と、 上記電気光沢めつきを剥離して電鋳体に球面メ
ス型表面を転写する工程とを具備することを特徴
とする樹脂成形金型の製造方法。
[Claims] 1. A method of machining at least the surface of a flat substrate;
A step of forming a protrusion substrate having a large number of fine protrusions with a predetermined distance between the centers and a predetermined height using either a photo-etching method or an electroplating method; Or apply nickel electro-gloss plating to a thickness that is at least 1/2 of the center-to-center dimension of the protrusions, and form a continuous hemispherical surface with a radius equal to the plating thickness to form a spherical male surface. A method for manufacturing a resin molding die, comprising the steps of: 2. A machining method on the surface of at least a flat substrate;
A step of forming a protrusion substrate having a large number of fine protrusions with a predetermined distance between the centers and a predetermined height using either a photo-etching method or an electroplating method; Or, apply nickel electro-gloss plating to a thickness that is at least 1/2 of the center-to-center dimension of the protrusions, and form a continuous hemispherical surface with a radius equivalent to this plating thickness to form a spherical male surface. a step of forming a thin oxide film on the surface of the spherical male mold and applying electro-bright plating of copper or nickel, and peeling off the electro-bright plating to transfer the surface of the spherical female mold to the electroformed body. A method for manufacturing a resin molding die, comprising the steps of:
JP16303983A 1983-09-05 1983-09-05 Resin molding die and manufacture thereof Granted JPS6054819A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16303983A JPS6054819A (en) 1983-09-05 1983-09-05 Resin molding die and manufacture thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16303983A JPS6054819A (en) 1983-09-05 1983-09-05 Resin molding die and manufacture thereof

Publications (2)

Publication Number Publication Date
JPS6054819A JPS6054819A (en) 1985-03-29
JPS6410169B2 true JPS6410169B2 (en) 1989-02-21

Family

ID=15766017

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16303983A Granted JPS6054819A (en) 1983-09-05 1983-09-05 Resin molding die and manufacture thereof

Country Status (1)

Country Link
JP (1) JPS6054819A (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11179736A (en) * 1997-12-19 1999-07-06 Taiyo Manufacturing Co Ltd Resin molding die, manufacturing thereof and molding
JP3524425B2 (en) * 1999-04-01 2004-05-10 キヤノン株式会社 Method for manufacturing mold or mold master for micro structure array, method for fabricating micro structure array manufactured using the mold or mold master
US8115920B2 (en) * 2007-11-14 2012-02-14 3M Innovative Properties Company Method of making microarrays
JPWO2015194608A1 (en) * 2014-06-18 2017-04-20 コニカミノルタ株式会社 Molded product, mold and method for producing mold

Also Published As

Publication number Publication date
JPS6054819A (en) 1985-03-29

Similar Documents

Publication Publication Date Title
TW408231B (en) Erecting life-size resin lens array and the manufacturing method thereof
TWI290125B (en) Manufacturing structured elements
US9452571B2 (en) Optical element molding die and method for molding optical element
US20070116934A1 (en) Antireflective surfaces, methods of manufacture thereof and articles comprising the same
US20050147925A1 (en) System and method for analog replication of microdevices having a desired surface contour
CA2056307A1 (en) Method of manufacturing a stamper
US3703450A (en) Method of making precision conductive mesh patterns
US3548041A (en) Lens mold making by plating lenticulations on a masked conductive support
CA1095311A (en) Fabrication of diffractive subtractive filter embossing master
JPS6410169B2 (en)
JPH0783196B2 (en) Electromagnetic wave shielding metal grid, electromagnetic wave shielding transparent article, and method for manufacturing electromagnetic wave shielding metal grid
JP4394108B2 (en) Resin erecting equal-magnification lens array and manufacturing method thereof
JPH1034870A (en) Production of electroforming product
JPH05150103A (en) Production of aspherical microlens array
JPS5860642A (en) Preparation of focusing glass
JPH07108536A (en) Manufacture of mold for forming reticle
JP2005349596A (en) Mold manufacturing method and part manufacturing method
JP2006028604A (en) Method for transferring minute shape, method for manufacturing casting mold, surface treatment method for casting mold, and casting mold
JPH0627302A (en) Matrix for optical element and its production
SU626968A1 (en) Female doe for manufacturing single-step phase optical elements
JPS63155445A (en) Production of information recording master disk
JPS589414B2 (en) How to make masks for photofabrication
JPH05150102A (en) Production of microlens array
KR100280312B1 (en) Kenoform device manufacturing method
JP2006022365A (en) Method for producing aluminum foil for electrode of electrolytic capacitor