JPS6399215A - Production of 4,4'-thiodiphenol type novolak - Google Patents
Production of 4,4'-thiodiphenol type novolakInfo
- Publication number
- JPS6399215A JPS6399215A JP13025386A JP13025386A JPS6399215A JP S6399215 A JPS6399215 A JP S6399215A JP 13025386 A JP13025386 A JP 13025386A JP 13025386 A JP13025386 A JP 13025386A JP S6399215 A JPS6399215 A JP S6399215A
- Authority
- JP
- Japan
- Prior art keywords
- thiodiphenol
- formaldehyde
- type novolak
- organic solvent
- novolak
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229920003986 novolac Polymers 0.000 title claims abstract description 24
- VWGKEVWFBOUAND-UHFFFAOYSA-N 4,4'-thiodiphenol Chemical compound C1=CC(O)=CC=C1SC1=CC=C(O)C=C1 VWGKEVWFBOUAND-UHFFFAOYSA-N 0.000 title claims abstract description 16
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 claims abstract description 56
- 239000003960 organic solvent Substances 0.000 claims abstract description 12
- 239000003054 catalyst Substances 0.000 claims abstract description 11
- 230000002378 acidificating effect Effects 0.000 claims abstract description 8
- 238000009835 boiling Methods 0.000 claims abstract description 5
- 238000006243 chemical reaction Methods 0.000 claims description 14
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 abstract description 12
- 239000003822 epoxy resin Substances 0.000 abstract description 4
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 abstract description 4
- 235000006408 oxalic acid Nutrition 0.000 abstract description 4
- 229920000647 polyepoxide Polymers 0.000 abstract description 4
- 239000007864 aqueous solution Substances 0.000 abstract description 3
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 abstract description 3
- 230000009257 reactivity Effects 0.000 abstract description 3
- 229940035429 isobutyl alcohol Drugs 0.000 abstract description 2
- VKYKSIONXSXAKP-UHFFFAOYSA-N hexamethylenetetramine Chemical compound C1N(C2)CN3CN1CN2C3 VKYKSIONXSXAKP-UHFFFAOYSA-N 0.000 abstract 2
- 239000004312 hexamethylene tetramine Substances 0.000 abstract 1
- 235000010299 hexamethylene tetramine Nutrition 0.000 abstract 1
- 239000002904 solvent Substances 0.000 description 10
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 6
- 238000005227 gel permeation chromatography Methods 0.000 description 6
- 238000010992 reflux Methods 0.000 description 6
- 229920005989 resin Polymers 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- BLDLRWQLBOJPEB-UHFFFAOYSA-N 2-(2-hydroxyphenyl)sulfanylphenol Chemical compound OC1=CC=CC=C1SC1=CC=CC=C1O BLDLRWQLBOJPEB-UHFFFAOYSA-N 0.000 description 4
- 238000001879 gelation Methods 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 2
- 238000005481 NMR spectroscopy Methods 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 2
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 2
- 150000002989 phenols Chemical class 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 229940018489 pronto Drugs 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- LLEASVZEQBICSN-UHFFFAOYSA-N 2-undecyl-1h-imidazole Chemical compound CCCCCCCCCCCC1=NC=CN1 LLEASVZEQBICSN-UHFFFAOYSA-N 0.000 description 1
- 229930040373 Paraformaldehyde Natural products 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 239000007810 chemical reaction solvent Substances 0.000 description 1
- 238000004587 chromatography analysis Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 125000004836 hexamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000012778 molding material Substances 0.000 description 1
- 210000003739 neck Anatomy 0.000 description 1
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 1
- 229920002866 paraformaldehyde Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000013076 target substance Substances 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- 125000002256 xylenyl group Chemical class C1(C(C=CC=C1)C)(C)* 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
Landscapes
- Phenolic Resins Or Amino Resins (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は4.4”−チオジフェノール型ノボラックの製
造法に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a method for producing a 4.4''-thiodiphenol type novolac.
一般にフェノール類とホルムアルデヒドを酸性触媒下に
反応させて得られるノボラック樹脂はへキサメチレンテ
とをミンを硬化剤に成形材料、各種結合剤として、ある
いはエポキシ樹脂の硬化剤として広く用いられている熱
硬化性樹脂である。Generally, novolac resins obtained by reacting phenols and formaldehyde under an acidic catalyst are thermosetting resins that are widely used as molding materials, various binders, or as curing agents for epoxy resins using hexamethylene and amine as a curing agent. It is resin.
フェノール類として、フェノール、クレゾール、キシレ
ノール、ビスフェノールA等を原料とするノボツクの製
造法に関しては多くの技術が公知であるが、4.4’−
チオジフェノールを原料とするノボラックの製造法に関
しては文献も数少ない0例えば、J、Prakt、Ch
em、 19.303−308(1963)ではアルカ
リ触媒下における4、4°−チオジフェノールとホルム
アルデヒドとの反応性について論じられているが、4.
4′−チオジフェノール型ノボラックの製造法という観
点から見れば工業的技術には程遠い。Many techniques are known for the production of Novock using phenols such as phenol, cresol, xylenol, and bisphenol A, but 4.4'-
There are few documents regarding the production method of novolak using thiodiphenol as a raw material. For example, J. Prakt, Ch.
Em, 19.303-308 (1963) discusses the reactivity of 4,4°-thiodiphenol with formaldehyde under an alkali catalyst;
From the viewpoint of the production method of 4'-thiodiphenol type novolak, this method is far from an industrial technology.
本発明の目的は適度の分子量を持つ4,4°−チオジフ
ェノール型ノボラックをゲル化させることなく、効率よ
く製造することにある。An object of the present invention is to efficiently produce a 4,4°-thiodiphenol type novolac having an appropriate molecular weight without causing gelation.
C問題点を解決するための手段〕
本発明者らは、上記目的を達成するため鋭意検討し遂に
本発明に到つた。Means for Solving Problem C] In order to achieve the above object, the present inventors conducted extensive studies and finally arrived at the present invention.
すなわち、本発明は4,4゛−チオジフェノール(T口
P)とホルムアルデヒド(F) とをモル比 F/T
DPO95〜1.3の範囲で4,4゛−チオジフェノー
ルが可溶でかつ常圧において沸点が90℃以上160℃
以下の有機溶剤を用いて、酸性触媒下で反応を行わしめ
る4、4′−チオジフェノール型ノボラックを製造する
方法である。That is, the present invention uses 4,4'-thiodiphenol (T) and formaldehyde (F) at a molar ratio of F/T.
4,4゛-thiodiphenol is soluble in the DPO range of 95 to 1.3 and has a boiling point of 90°C or higher and 160°C at normal pressure.
This is a method for producing a 4,4'-thiodiphenol type novolak in which a reaction is carried out under an acidic catalyst using the following organic solvent.
本発明における4、4′−チオジフェノールはホルムア
ルデヒドに対して4官能であるので、反応中にゲル化を
起こしやすい、また−常温において粉末固体で水に対す
る溶解度が小さくホルムアルデヒド源にホルマリン水溶
液を用いたとしてもモル比F/TDP O,5〜1.3
の仕込み条件では何らかの反応溶媒が必要となってくる
。ホルムアルデヒドとしてはホルマリン水?g ’j(
1、固形のパラホルムアルデヒドいずれでも使用できる
が、後者は一般にを機溶剤に対する溶解度が小さいので
、前者の方が好ましい。Since the 4,4'-thiodiphenol used in the present invention is tetrafunctional with respect to formaldehyde, it tends to gel during the reaction. Also, it is a powder solid at room temperature and has low solubility in water, so an aqueous formalin solution is used as the formaldehyde source. Even if the molar ratio F/TDP O, 5 to 1.3
The preparation conditions require some kind of reaction solvent. Is formaldehyde formalin water? g'j(
1. Although any solid paraformaldehyde can be used, the former is preferred because the latter generally has low solubility in organic solvents.
本発明に用いる酸性溶媒としては通常のノボラックの合
成に用いられる蓚酸、塩酸、硫酸、パラトルエンスルホ
ン酸、塩化亜鉛等を例示することができ、使用量は触媒
の酸強度によって適宜決定される。Examples of the acidic solvent used in the present invention include oxalic acid, hydrochloric acid, sulfuric acid, para-toluenesulfonic acid, zinc chloride, etc., which are commonly used in the synthesis of novolacs, and the amount used is appropriately determined depending on the acid strength of the catalyst.
本発明の反応に用いる有機溶剤は4.4°−チオジフェ
ノールが可溶でかつ常圧における沸点(b、p、)が9
0℃以上160℃以下のイソブチルアルコール(b、p
、los℃)、n−ブタノール(b、p、117.5℃
)、n−ペンタノール(b、p、 138.3℃)、n
−ヘキサノール(b、p、157.9℃)等のアルコー
ル頚、ジエチルケトン(b、p、101.7℃)、メチ
ルイソブチルケトン(b、p、115.9℃)、アセチ
ルアセトン(b、p、 137℃)、シクロヘキサノン
(b、p、156℃)等のケトン類を例示することがで
きる。有機溶剤の沸点が90℃以下では充分な反応温度
が得られず、160℃以上では溶剤の除去が困難となる
。また、有機溶剤の使用量は4゜4′−チオジフェノー
ルを溶解するのに充分であればよい。The organic solvent used in the reaction of the present invention is soluble in 4.4°-thiodiphenol and has a boiling point (b, p,) of 9 at normal pressure.
Isobutyl alcohol (b, p
, los °C), n-butanol (b, p, 117.5 °C
), n-pentanol (b, p, 138.3°C), n
-Alcohol necks such as hexanol (b, p, 157.9°C), diethyl ketone (b, p, 101.7°C), methyl isobutyl ketone (b, p, 115.9°C), acetylacetone (b, p, 137°C) and cyclohexanone (b, p, 156°C). If the boiling point of the organic solvent is below 90°C, a sufficient reaction temperature cannot be obtained, and if it is above 160°C, it becomes difficult to remove the solvent. Further, the amount of organic solvent used may be sufficient to dissolve 4°4'-thiodiphenol.
以下、本発明の製造法の詳細について記す。Details of the manufacturing method of the present invention will be described below.
まず、4,4°−チオジフェノール、ホルムアルデヒド
、酸性触媒、有機溶剤を所定量反応器内に一括に仕込む
。ここで、モル比F/TCPは0.5〜1.3であり、
0.5以下であると未反応の4.4゛−チオジフェノー
ルが多量に残り適度の分子量を持つノボラックを得るこ
とができず、1.3以上であると反応中にゲル化する恐
れがある。6i性触媒は前述した通り、通常のノボラッ
クの合成に用いられるもので、その仕込み量は酸性触媒
の種類によって決められる。有機溶剤の仕込み量は4.
4゛−チオジフェノールを溶解するのに充分であればよ
く、仕込み条件及び有機溶剤の種類によっても異なるが
、414゛−チオジフェノールに対して30〜100P
HRが好ましい。First, a predetermined amount of 4,4°-thiodiphenol, formaldehyde, an acidic catalyst, and an organic solvent are charged into a reactor all at once. Here, the molar ratio F/TCP is 0.5 to 1.3,
If it is less than 0.5, a large amount of unreacted 4.4゛-thiodiphenol remains and it is impossible to obtain a novolak with an appropriate molecular weight, and if it is more than 1.3, there is a risk of gelation during the reaction. be. As mentioned above, the 6i catalyst is commonly used in the synthesis of novolak, and the amount of the catalyst to be charged is determined depending on the type of acidic catalyst. The amount of organic solvent charged is 4.
It is sufficient to dissolve 4゛-thiodiphenol, and it varies depending on the preparation conditions and the type of organic solvent, but it is 30 to 100P for 414゛-thiodiphenol.
HR is preferred.
続いて、攪拌しながら徐りに昇温して還流反応を3〜6
時間行なわしめる。連流温度は90〜105℃が好まし
く、ホルムアルデヒド反応率が50〜90%程度になる
まで還流反応を行う、、誘いて、常圧において脱水、脱
溶剤しながら、反応器内の温度が150〜170℃に達
するまで徐々に昇温する。最後に、内湯を150〜17
0℃に保ち、減圧度5〜201IIllI)1gで反応
器内の有機溶剤を完全にな(なるまで脱溶剤を行い、そ
の後冷却固化させ所望むする4゜4°−チオジフェノー
ル型ノボラックをえる。Next, the temperature is gradually raised while stirring to carry out the reflux reaction for 3 to 6 hours.
Make time work. The continuous flow temperature is preferably 90 to 105°C, and the reflux reaction is carried out until the formaldehyde reaction rate is about 50 to 90%. While dehydrating and removing solvent at normal pressure, the temperature inside the reactor is 150 to 105°C. Gradually raise the temperature until it reaches 170°C. Finally, the indoor bath is 150~17
Maintain the temperature at 0°C and remove the organic solvent in the reactor with 1 g of reduced pressure until it is completely removed, then cool and solidify to obtain the desired 4°4°-thiodiphenol type novolac. .
以下、実施例により本発明を説明する。 The present invention will be explained below with reference to Examples.
〈実施例1〉
4.4゛−チオジフェノール218g、37%ホルマリ
ン水溶液89.3g <モル比1.1)、蓚酸2.18
g 、 n−ブタノール87.2gを還流下100℃で
5時間反応させた、この時点でのホルムアルデヒドの反
応率は59.2%であった9次いで、常圧において脱水
、脱溶剤を行いながら、内温が160℃になるまで昇温
し、さらに内温を160〜165℃に保ちながら、減圧
度7 mmHgにおいて2時間脱溶剤を行い、冷却間化
させた。得られた樹脂は暗紫色固形で収量は227.4
gであった。JIS K2531による軟化点は94.
9℃であった。<Example 1> 4.4゛-thiodiphenol 218g, 37% formalin aqueous solution 89.3g <molar ratio 1.1), oxalic acid 2.18g
g, 87.2 g of n-butanol was reacted under reflux at 100°C for 5 hours, and the reaction rate of formaldehyde at this point was 59.2%.9 Next, while dehydrating and removing solvent at normal pressure, The temperature was raised until the internal temperature reached 160° C., and while the internal temperature was maintained at 160 to 165° C., the solvent was removed at a reduced pressure of 7 mmHg for 2 hours to allow cooling. The resulting resin was a dark purple solid with a yield of 227.4
It was g. The softening point according to JIS K2531 is 94.
The temperature was 9°C.
ゲル浸透クロマトグラフィー(GPC)のクロマトグラ
ムを第1図に、核磁気共鳴吸収(NMR)スペクトルを
第2図に示した。A gel permeation chromatography (GPC) chromatogram is shown in FIG. 1, and a nuclear magnetic resonance absorption (NMR) spectrum is shown in FIG. 2.
第1図に示す数字はノボラック樹脂の同族体の核体数を
示したちであり、未反応4,4゛−チオジフェノールを
示すピークは他のピークに比較して相対的に低(ノボラ
ック樹脂が製造されていることを示している。The numbers shown in Figure 1 indicate the number of nuclei of novolac resin homologs, and the peak indicating unreacted 4,4゛-thiodiphenol is relatively low compared to other peaks (novolac resin indicates that it is manufactured.
第2図に示すA、BSCはそれぞれフェノール性水酸基
、芳香族プロント、メチレン結合のシグナルを示し、8
.6ppm付近にフェノール性水酸基、7.3〜6.8
ppm付近に芳香族プロント、3.qppm付近にメチ
レン結合のシグナルが観測され、目的物質の4.4°−
チオジフェノール型ノボラックであると断定できる。ま
た、GPCクロマトグラムより数平均分子量を計算する
と826、平均縮合度は3.64であった。A and BSC shown in Figure 2 indicate signals of phenolic hydroxyl group, aromatic pronto, and methylene bond, respectively, and 8
.. Phenolic hydroxyl group around 6ppm, 7.3-6.8
Aromatic pronto near ppm, 3. A methylene bond signal was observed near qppm, and the target substance was 4.4°-
It can be determined that it is a thiodiphenol type novolac. Further, the number average molecular weight calculated from the GPC chromatogram was 826, and the average degree of condensation was 3.64.
〈実施例2〉
4.4°−チオジフェノール218g、 37%ホルマ
リン水W液56.8g(モル比0.7)、パラトルエン
スルホン酸1.09g−メチルイソブチルケトン109
gを還流下100℃で3時間反応させた。この時点での
ホルムアルデヒドの反応率は84.6%であった0次い
で、常圧において脱水、脱溶剤を行いながら、内温が1
60℃になるまで昇温し、さらに内温を160〜165
℃に保ちながら減圧度10mmHgにおいて2時間脱溶
剤を行い、冷却固化させた。得られた樹脂は暗紫色固形
で、収量は213.6gであった。JIS K2531
による軟化点は97.4℃であった。<Example 2> 218 g of 4.4°-thiodiphenol, 56.8 g of 37% formalin water W solution (molar ratio 0.7), 1.09 g of para-toluenesulfonic acid-methyl isobutyl ketone 109
g was reacted under reflux at 100° C. for 3 hours. The reaction rate of formaldehyde at this point was 84.6%.Next, while dehydration and solvent removal were carried out at normal pressure, the internal temperature was reduced to 1.
Raise the temperature to 60℃, then increase the internal temperature to 160-165℃
The solvent was removed for 2 hours at a reduced pressure of 10 mmHg while maintaining the temperature at °C, and the mixture was cooled and solidified. The resulting resin was a dark purple solid, and the yield was 213.6 g. JIS K2531
The softening point was 97.4°C.
ゲル?l+3クロマトグラフィー([;PC)のクロマ
トグラムを第3図に示した。第3図よりノボラック樹脂
が製造されていることを示している。gel? The chromatogram of l+3 chromatography ([;PC) is shown in FIG. FIG. 3 shows that novolac resin is produced.
〈比較例1〉
4.4゛−チオジフェノール218g、 37%ホルマ
リン水溶液109.6g(モル比1.35)、蓚酸2.
18g 、 n−ブタノール87.2gを還流下100
℃で5時間反応させた。この時点でのホルムアルデヒド
の反応率は57.5%であった。次いで、常圧において
脱水、脱溶剤しながら、徐々に昇温していったところ、
内温が158℃になった時点でゲル化した。<Comparative Example 1> 4.4゛-thiodiphenol 218 g, 37% formalin aqueous solution 109.6 g (molar ratio 1.35), oxalic acid 2.
18g, n-butanol 87.2g under reflux
The reaction was carried out at ℃ for 5 hours. The formaldehyde reaction rate at this point was 57.5%. Next, while dehydrating and removing solvent at normal pressure, the temperature was gradually increased.
Gelation occurred when the internal temperature reached 158°C.
〈比較例2〉
4.4′−チオジフェノール218g、 37%ホルマ
リン水?g t& 32 、5 g (モル比0.4)
、パラトルエンスルホンM1.09g 、メチルイソ
ブチルケトン109gを還流下100℃で5時間反応さ
せた。この時点でのホルムアルデヒドの反応率は88.
2%であつた0次いで、常圧において脱水、脱溶剤を行
いながら、内温か160℃になるまで昇温し、さらに内
温を160〜165℃に保ちながら減圧度8 mmHg
において2時間脱溶剤を行った。その後冷却固化させて
行ったところ、内温か140℃になったところで4,4
°、チオジフェノールの結晶が析出してきた。GPCク
ロマトグラムより樹脂中には40%以上の4.4゛−チ
オジフェノールが未反応のままで残っていた。<Comparative Example 2> 218 g of 4.4'-thiodiphenol, 37% formalin water? g t&32, 5 g (molar ratio 0.4)
, paratoluenesulfone M (1.09 g), and methyl isobutyl ketone (109 g) were reacted under reflux at 100° C. for 5 hours. The formaldehyde reaction rate at this point was 88.
Next, while dehydrating and removing solvent at normal pressure, the temperature was increased until the internal temperature reached 160°C, and the degree of vacuum was reduced to 8 mmHg while maintaining the internal temperature at 160 to 165°C.
The solvent was removed for 2 hours. After that, when it was cooled and solidified, when the internal temperature reached 140℃, 4.4
°, thiodiphenol crystals began to precipitate. The GPC chromatogram revealed that more than 40% of 4.4'-thiodiphenol remained unreacted in the resin.
本発明は上記した構成をとるので、適度の分子量を持つ
4,4゛−チオジフェノール型ノボラックをゲル化する
ことなく、効率よく製造することができる。また、4,
4°〜チオジフエノール型ノボラツクは通常のフェノー
ル型ノボラックにくらベヘキサメチレンテとをミン、各
種エポキシ樹脂との反応性に富み、工業上有用である。Since the present invention has the above-described configuration, it is possible to efficiently produce a 4,4'-thiodiphenol type novolak having an appropriate molecular weight without gelation. Also, 4,
Thiodiphenol-type novolacs have a high reactivity with behexamethylene and various epoxy resins compared to ordinary phenol-type novolacs, and are industrially useful.
第1表にJIS K6910に準じたゲルタイムを示し
た。Table 1 shows the gel time according to JIS K6910.
第 1 表 単位(sec)1)ノボ
ラックに対して12PHR
2)水酸基/エポキシ基−1/1、硬化促進剤として四
国ファインケミカッ叫2−ウンデシルイミダゾールをエ
ポキシ樹脂に対してI PHR使用。
第1図は実施例1で得た4、4゛−チオジフェノール型
ノボラフクのGPCクロマトグラム図である。
第2図は実施例1で得た4、4゛−チオジフェノール型
ノボラフクのNMRスペクトル図である。
第3図は実施例2で得た4、4″−チオジフェノール型
ノボラフクのGPCクロマトグラム図である。
特許出願人 三井東圧化学株式会社
第1図
÷−m−カウント 高分子量−一。
第 2 図
化学シフト(P Pm)
第 3 図
←−−−カウント 高分子量 −
〉1、事件の表示
4,4”−チオジフェノール型ノボラックの製造法
3、補正をする者
事件との関係 特許出願人
住所 東京都千代田区霞が関三丁目2番5号名称(31
2) 三井東圧化学株式会社4、補正により増加する
発明の数 雰5、補正命令の日付
7、補正の内容
明」の項を削除し、11頁の1行目に「4、図面の簡単
な説明」の項を挿入する。Table 1 Unit (sec) 1) 12 PHR for novolak 2) Hydroxyl group/epoxy group -1/1, Shikoku Fine Chemical Co., Ltd.'s 2-undecylimidazole as a curing accelerator was used for IPHR for epoxy resin. FIG. 1 is a GPC chromatogram of the 4,4'-thiodiphenol type novolafuku obtained in Example 1. FIG. 2 is an NMR spectrum diagram of the 4,4'-thiodiphenol type novolafuku obtained in Example 1. FIG. 3 is a GPC chromatogram of the 4,4″-thiodiphenol type Novolafuku obtained in Example 2. Patent applicant: Mitsui Toatsu Chemical Co., Ltd. FIG. 1 ÷-m-count High molecular weight-1. Figure 2 Chemical shift (P Pm) Figure 3 ←---Count High molecular weight -
〉1. Indication of the case 4,4"-Production method of thiodiphenol type novolak 3. Person making the amendment Relationship with the case Patent applicant address 3-2-5 Kasumigaseki, Chiyoda-ku, Tokyo Name (31
2) Mitsui Toatsu Kagaku Co., Ltd. 4. The number of inventions increased by the amendment 5. Date of the amendment order 7. Explanation of the contents of the amendment” section was deleted, and the first line of page 11 added “4. Insert a section titled “Explanation”.
Claims (1)
ヒド(F)とをモル比F/TDP0.5〜1.3の範囲
で4,4′−チオジフェノールが可溶で、かつ常圧にお
いて沸点が90℃以上160℃以下の有機溶剤を用いて
、酸性触媒下で反応を行わしめることを特徴とする4,
4′−チオジフェノール型ノボラックの製造法。4,4'-thiodiphenol (TDP) and formaldehyde (F) are mixed at a molar ratio F/TDP in the range of 0.5 to 1.3 so that 4,4'-thiodiphenol is soluble and has a boiling point at normal pressure. 4, characterized in that the reaction is carried out under an acidic catalyst using an organic solvent with a temperature of 90°C or more and 160°C or less;
Method for producing 4'-thiodiphenol type novolak.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13025386A JPS6399215A (en) | 1986-06-06 | 1986-06-06 | Production of 4,4'-thiodiphenol type novolak |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13025386A JPS6399215A (en) | 1986-06-06 | 1986-06-06 | Production of 4,4'-thiodiphenol type novolak |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6399215A true JPS6399215A (en) | 1988-04-30 |
Family
ID=15029827
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13025386A Pending JPS6399215A (en) | 1986-06-06 | 1986-06-06 | Production of 4,4'-thiodiphenol type novolak |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6399215A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2008114766A1 (en) * | 2007-03-12 | 2008-09-25 | Tohto Kasei Co., Ltd. | Novel polyvalent hydroxy compound, method for producing the compound, epoxy resin and epoxy resin composition each using the compound, and cured product of the composition |
-
1986
- 1986-06-06 JP JP13025386A patent/JPS6399215A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2008114766A1 (en) * | 2007-03-12 | 2008-09-25 | Tohto Kasei Co., Ltd. | Novel polyvalent hydroxy compound, method for producing the compound, epoxy resin and epoxy resin composition each using the compound, and cured product of the composition |
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