JPS62167318A - Curing of epoxy resin - Google Patents
Curing of epoxy resinInfo
- Publication number
- JPS62167318A JPS62167318A JP787286A JP787286A JPS62167318A JP S62167318 A JPS62167318 A JP S62167318A JP 787286 A JP787286 A JP 787286A JP 787286 A JP787286 A JP 787286A JP S62167318 A JPS62167318 A JP S62167318A
- Authority
- JP
- Japan
- Prior art keywords
- naphthol
- curing
- epoxy resin
- epoxy
- molecule
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000003822 epoxy resin Substances 0.000 title claims abstract description 24
- 229920000647 polyepoxide Polymers 0.000 title claims abstract description 24
- 150000001875 compounds Chemical class 0.000 claims abstract description 16
- 150000004780 naphthols Chemical class 0.000 claims abstract description 15
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 10
- 125000003700 epoxy group Chemical group 0.000 claims abstract description 8
- 239000004593 Epoxy Substances 0.000 claims abstract description 7
- 125000001624 naphthyl group Chemical group 0.000 claims description 2
- 239000003795 chemical substances by application Substances 0.000 abstract description 35
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 abstract description 28
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical compound C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 abstract description 10
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 abstract description 10
- 238000000034 method Methods 0.000 abstract description 7
- 238000003860 storage Methods 0.000 abstract description 4
- TVZQDMRKJSXJPZ-UHFFFAOYSA-N 1,2-dihydronaphthalen-1-ol Chemical compound C1=CC=C2C(O)CC=CC2=C1 TVZQDMRKJSXJPZ-UHFFFAOYSA-N 0.000 abstract description 3
- 125000005647 linker group Chemical group 0.000 abstract description 3
- 229950011260 betanaphthol Drugs 0.000 abstract description 2
- 125000001424 substituent group Chemical group 0.000 abstract 1
- 238000001723 curing Methods 0.000 description 51
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 33
- 229920005989 resin Polymers 0.000 description 16
- 239000011347 resin Substances 0.000 description 16
- 229920003986 novolac Polymers 0.000 description 15
- 239000000047 product Substances 0.000 description 14
- 238000006243 chemical reaction Methods 0.000 description 13
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 13
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 12
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 8
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 8
- -1 fromphenol Chemical compound 0.000 description 8
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 8
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 7
- 238000010521 absorption reaction Methods 0.000 description 7
- 239000002253 acid Substances 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 7
- 238000003786 synthesis reaction Methods 0.000 description 7
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 230000008018 melting Effects 0.000 description 6
- 238000002844 melting Methods 0.000 description 6
- RGHHSNMVTDWUBI-UHFFFAOYSA-N 4-hydroxybenzaldehyde Chemical compound OC1=CC=C(C=O)C=C1 RGHHSNMVTDWUBI-UHFFFAOYSA-N 0.000 description 5
- 150000001299 aldehydes Chemical class 0.000 description 5
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical class C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 4
- 150000002170 ethers Chemical class 0.000 description 4
- 235000006408 oxalic acid Nutrition 0.000 description 4
- 235000013824 polyphenols Nutrition 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- SXRSQZLOMIGNAQ-UHFFFAOYSA-N Glutaraldehyde Chemical compound O=CCCCC=O SXRSQZLOMIGNAQ-UHFFFAOYSA-N 0.000 description 3
- 125000000129 anionic group Chemical group 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 229930003836 cresol Natural products 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 3
- 150000008442 polyphenolic compounds Chemical class 0.000 description 3
- 239000011541 reaction mixture Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 230000000930 thermomechanical effect Effects 0.000 description 3
- NCIAGQNZQHYKGR-UHFFFAOYSA-N 1,2,3-Naphthalenetriol Natural products C1=CC=C2C(O)=C(O)C(O)=CC2=C1 NCIAGQNZQHYKGR-UHFFFAOYSA-N 0.000 description 2
- LBLYYCQCTBFVLH-UHFFFAOYSA-N 2-Methylbenzenesulfonic acid Chemical compound CC1=CC=CC=C1S(O)(=O)=O LBLYYCQCTBFVLH-UHFFFAOYSA-N 0.000 description 2
- 229910015900 BF3 Inorganic materials 0.000 description 2
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 229920001665 Poly-4-vinylphenol Polymers 0.000 description 2
- NBBJYMSMWIIQGU-UHFFFAOYSA-N Propionic aldehyde Chemical compound CCC=O NBBJYMSMWIIQGU-UHFFFAOYSA-N 0.000 description 2
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical compound ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 2
- 150000008065 acid anhydrides Chemical class 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 150000001244 carboxylic acid anhydrides Chemical group 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 2
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- LEQAOMBKQFMDFZ-UHFFFAOYSA-N glyoxal Chemical compound O=CC=O LEQAOMBKQFMDFZ-UHFFFAOYSA-N 0.000 description 2
- 150000002430 hydrocarbons Chemical group 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229940098779 methanesulfonic acid Drugs 0.000 description 2
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- FZZQNEVOYIYFPF-UHFFFAOYSA-N naphthalene-1,6-diol Chemical compound OC1=CC=CC2=CC(O)=CC=C21 FZZQNEVOYIYFPF-UHFFFAOYSA-N 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- 150000002989 phenols Chemical group 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 2
- 238000001308 synthesis method Methods 0.000 description 2
- 150000003512 tertiary amines Chemical class 0.000 description 2
- 238000001721 transfer moulding Methods 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 1
- FRASJONUBLZVQX-UHFFFAOYSA-N 1,4-dioxonaphthalene Natural products C1=CC=C2C(=O)C=CC(=O)C2=C1 FRASJONUBLZVQX-UHFFFAOYSA-N 0.000 description 1
- BOKGTLAJQHTOKE-UHFFFAOYSA-N 1,5-dihydroxynaphthalene Chemical compound C1=CC=C2C(O)=CC=CC2=C1O BOKGTLAJQHTOKE-UHFFFAOYSA-N 0.000 description 1
- SRJCJJKWVSSELL-UHFFFAOYSA-N 2-methylnaphthalen-1-ol Chemical compound C1=CC=CC2=C(O)C(C)=CC=C21 SRJCJJKWVSSELL-UHFFFAOYSA-N 0.000 description 1
- BNCADMBVWNPPIZ-UHFFFAOYSA-N 2-n,2-n,4-n,4-n,6-n,6-n-hexakis(methoxymethyl)-1,3,5-triazine-2,4,6-triamine Chemical compound COCN(COC)C1=NC(N(COC)COC)=NC(N(COC)COC)=N1 BNCADMBVWNPPIZ-UHFFFAOYSA-N 0.000 description 1
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- ZNZYKNKBJPZETN-WELNAUFTSA-N Dialdehyde 11678 Chemical compound N1C2=CC=CC=C2C2=C1[C@H](C[C@H](/C(=C/O)C(=O)OC)[C@@H](C=C)C=O)NCC2 ZNZYKNKBJPZETN-WELNAUFTSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 240000007594 Oryza sativa Species 0.000 description 1
- 235000007164 Oryza sativa Nutrition 0.000 description 1
- FQYUMYWMJTYZTK-UHFFFAOYSA-N Phenyl glycidyl ether Chemical group C1OC1COC1=CC=CC=C1 FQYUMYWMJTYZTK-UHFFFAOYSA-N 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 241001092391 Sorbus Species 0.000 description 1
- 241000270666 Testudines Species 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 150000001334 alicyclic compounds Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- 229920006231 aramid fiber Polymers 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- ZTQSAGDEMFDKMZ-UHFFFAOYSA-N butyric aldehyde Natural products CCCC=O ZTQSAGDEMFDKMZ-UHFFFAOYSA-N 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 125000003262 carboxylic acid ester group Chemical group [H]C([H])([*:2])OC(=O)C([H])([H])[*:1] 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 238000010908 decantation Methods 0.000 description 1
- 229940117389 dichlorobenzene Drugs 0.000 description 1
- BVURNMLGDQYNAF-UHFFFAOYSA-N dimethyl(1-phenylethyl)amine Chemical compound CN(C)C(C)C1=CC=CC=C1 BVURNMLGDQYNAF-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 239000008393 encapsulating agent Substances 0.000 description 1
- 239000003733 fiber-reinforced composite Substances 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- UMUKSOFZUAPNLY-UHFFFAOYSA-N formaldehyde;naphthalen-2-ol Chemical compound O=C.C1=CC=CC2=CC(O)=CC=C21 UMUKSOFZUAPNLY-UHFFFAOYSA-N 0.000 description 1
- SLGWESQGEUXWJQ-UHFFFAOYSA-N formaldehyde;phenol Chemical compound O=C.OC1=CC=CC=C1 SLGWESQGEUXWJQ-UHFFFAOYSA-N 0.000 description 1
- DYDNPESBYVVLBO-UHFFFAOYSA-N formanilide Chemical compound O=CNC1=CC=CC=C1 DYDNPESBYVVLBO-UHFFFAOYSA-N 0.000 description 1
- 238000007710 freezing Methods 0.000 description 1
- 230000008014 freezing Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229940015043 glyoxal Drugs 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- FBAFATDZDUQKNH-UHFFFAOYSA-M iron chloride Chemical compound [Cl-].[Fe] FBAFATDZDUQKNH-UHFFFAOYSA-M 0.000 description 1
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 238000013035 low temperature curing Methods 0.000 description 1
- 239000002075 main ingredient Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- UJZXIGKNPLTUOZ-UHFFFAOYSA-N n,n-dimethyl-1-phenylmethanamine oxide Chemical compound C[N+](C)([O-])CC1=CC=CC=C1 UJZXIGKNPLTUOZ-UHFFFAOYSA-N 0.000 description 1
- RCHKEJKUUXXBSM-UHFFFAOYSA-N n-benzyl-2-(3-formylindol-1-yl)acetamide Chemical compound C12=CC=CC=C2C(C=O)=CN1CC(=O)NCC1=CC=CC=C1 RCHKEJKUUXXBSM-UHFFFAOYSA-N 0.000 description 1
- 150000004002 naphthaldehydes Chemical class 0.000 description 1
- QKCAWPZWWHAZBB-UHFFFAOYSA-N naphthalene-1,2,5-triol Chemical compound OC1=CC=CC2=C(O)C(O)=CC=C21 QKCAWPZWWHAZBB-UHFFFAOYSA-N 0.000 description 1
- IIWBVDVWHAWKQW-UHFFFAOYSA-N naphthalene-1,2,8-triol Chemical compound C1=CC=C(O)C2=C(O)C(O)=CC=C21 IIWBVDVWHAWKQW-UHFFFAOYSA-N 0.000 description 1
- ZYSYRRIEEWFGPI-UHFFFAOYSA-N naphthalene-1,3,7-triol Chemical compound C1=C(O)C=C(O)C2=CC(O)=CC=C21 ZYSYRRIEEWFGPI-UHFFFAOYSA-N 0.000 description 1
- XOOMNEFVDUTJPP-UHFFFAOYSA-N naphthalene-1,3-diol Chemical compound C1=CC=CC2=CC(O)=CC(O)=C21 XOOMNEFVDUTJPP-UHFFFAOYSA-N 0.000 description 1
- PCILLCXFKWDRMK-UHFFFAOYSA-N naphthalene-1,4-diol Chemical compound C1=CC=C2C(O)=CC=C(O)C2=C1 PCILLCXFKWDRMK-UHFFFAOYSA-N 0.000 description 1
- DFQICHCWIIJABH-UHFFFAOYSA-N naphthalene-2,7-diol Chemical compound C1=CC(O)=CC2=CC(O)=CC=C21 DFQICHCWIIJABH-UHFFFAOYSA-N 0.000 description 1
- 150000002790 naphthalenes Chemical class 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- IGALFTFNPPBUDN-UHFFFAOYSA-N phenyl-[2,3,4,5-tetrakis(oxiran-2-ylmethyl)phenyl]methanediamine Chemical compound C=1C(CC2OC2)=C(CC2OC2)C(CC2OC2)=C(CC2OC2)C=1C(N)(N)C1=CC=CC=C1 IGALFTFNPPBUDN-UHFFFAOYSA-N 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 235000009566 rice Nutrition 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- NQRYJNQNLNOLGT-UHFFFAOYSA-N tetrahydropyridine hydrochloride Natural products C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
- 239000004034 viscosity adjusting agent Substances 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
- 150000003739 xylenols Chemical class 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
Landscapes
- Epoxy Resins (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
【発明の詳細な説明】
a、産業上の利用分野
本発明はエポキシ樹脂の硬化方法に関し、特に従来エポ
キシ樹脂硬化剤として用いられることのなかった特定の
ナフトール誘導体を硬化剤として用いるエポキシ樹脂の
硬化方法に関する。Detailed Description of the Invention: a. Industrial Application Field The present invention relates to a method for curing epoxy resin, and in particular to curing of epoxy resin using a specific naphthol derivative as a curing agent, which has not been conventionally used as an epoxy resin curing agent. Regarding the method.
b、従来技術
従来からエポキシ系樹脂は、アミン系硬化剤、酸無水物
系硬化剤、ポリフェノール系硬化剤、アニオン系硬化剤
等の各種硬化剤を使いわける事によシ、各種用途に応じ
た広範な硬化特性9機械特性、m気特性を有する硬化物
を得ることができる為、各種塗料、接着剤。b. Conventional technology Epoxy resins have traditionally been developed to suit various uses by using various curing agents such as amine curing agents, acid anhydride curing agents, polyphenol curing agents, and anionic curing agents. It is possible to obtain cured products with a wide range of curing properties9 mechanical properties and mechanical properties, making it suitable for various paints and adhesives.
繊維強化複合材料用樹脂(プリント基板用。Resin for fiber reinforced composite materials (for printed circuit boards).
航空・宇宙用)、封止用樹脂(特に電子部品用)、金型
用樹脂等広範な用途に利用されている。It is used in a wide range of applications, including (for aviation and space), sealing resins (especially for electronic parts), and resins for molds.
就中、ポリフェノール系硬化剤での硬化物はアミン系硬
化剤での硬化物に比して一般に達成される架橋密度が小
さいために、Tg で代表される短期耐熱性はアニオ
系硬化剤硬化物に及ばないが、低吸湿性であり、且つ電
気特性にすぐれておシ、さらにBステージにおける貯蔵
安定性及び硬化速度が早い等の特徴があシ、半導体のト
ランスファー成型による封止樹脂用途を中心にした電気
関係での伸長が著るしいと伝えられる。しかし、半導体
等の高密度化等に伴い、更に低吸湿性であシ且つ、電気
特性・耐熱性に優れた硬化物が要求されてきている。In particular, products cured with polyphenol curing agents generally achieve a lower crosslinking density than those cured with amine curing agents, so the short-term heat resistance represented by Tg is lower than that of products cured with anionic curing agents. However, it has low moisture absorption and excellent electrical properties, and has other characteristics such as storage stability and fast curing speed in the B stage, and is mainly used as a sealing resin for semiconductor transfer molding. It is reported that there has been significant growth in the electrical field. However, with the increasing density of semiconductors and the like, there has been a demand for cured products that have even lower hygroscopicity and excellent electrical properties and heat resistance.
C0発明の目的
本発明の目的は、良好な貯蔵安定性と、良好な硬化特性
を兼備したエポキシ樹脂を与え、且つ、その硬化物は寸
法安定性・電気特性に優れ、更に、低吸湿性、耐熱性、
&I燃性等も改良されたエポキシ硬化樹脂を与えるエポ
キシ樹脂の硬化方法を提供することにある。C0 Object of the Invention The object of the present invention is to provide an epoxy resin that has both good storage stability and good curing properties, and the cured product thereof has excellent dimensional stability and electrical properties, and furthermore, has low moisture absorption, Heat-resistant,
&I It is an object of the present invention to provide a method for curing an epoxy resin which provides a cured epoxy resin with improved flammability.
d1発明の構成
かかる本発明の目的は、エポキシ基を1分子中に2個以
上有するエポキシ化合物を硬化するに際し、ナフタレン
核に結合するヒドロキシル基を1分子中に少くとも2個
有するナフトール誘導体を用いることによシ達成される
。本発明においては、上記ナフトール誘導体に加えて更
に硬化促進剤を用いても良い。d1 Structure of the Invention The object of the present invention is to use a naphthol derivative having at least two hydroxyl groups in one molecule that binds to a naphthalene nucleus when curing an epoxy compound having two or more epoxy groups in one molecule. Especially achieved. In the present invention, a curing accelerator may be used in addition to the above naphthol derivative.
本発明において、ナフタレン核に結合するヒドロキシル
基を1分子中に少くとも2個有するナフトール誘導体と
は、一般に次のものを好適に包含する。In the present invention, naphthol derivatives having at least two hydroxyl groups bonded to a naphthalene nucleus in one molecule generally preferably include the following.
(1) モノヒドリックナフトール(α−ナフトール
又はβ−す7トール)及び又はジヒドリツクナフトール
を2個以上、結合鎖によって結合した一般に分子量50
00以下の下記式−囚で表される如き可融性及び又は可
溶性化合物。(1) Two or more monohydric naphthols (α-naphthol or β-naphthol) and/or dihydric naphthols linked by a linking chain, generally with a molecular weight of 50
Fusible and/or soluble compounds as represented by the following formula below.
ts、R/としては炭素数10以下の炭化水素基。ts and R/ are hydrocarbon groups having 10 or less carbon atoms.
ハロゲン原子、カルボキシル基、カルボン酸無水物基、
カルボン酸エステル基等をあげる事が出来る。但し、上
記炭化水素基はアルコール性水酸基、カルボキシル基等
のエポキシ基に対する活性基を含有していてもよい。halogen atom, carboxyl group, carboxylic acid anhydride group,
Examples include carboxylic acid ester groups. However, the hydrocarbon group may contain an active group for epoxy groups, such as an alcoholic hydroxyl group or a carboxyl group.
Rとしては、一般に炭素数10以下の有機基であって、
2〜4価の結合鎖を持つものである。この結合基はカル
ボキシル基、カルボン酸無水物基、フェノール性水酸基
等のエポキシ基に対する活性基を含有していても差支え
ない。R is generally an organic group having 10 or less carbon atoms,
It has a divalent to tetravalent bonding chain. This bonding group may contain an active group for an epoxy group such as a carboxyl group, a carboxylic acid anhydride group, or a phenolic hydroxyl group.
より具体的な例をあげると以下の通シとなる。A more specific example is as follows.
*−G−ナフトールホルムアルデヒド縮合物米メチル−
α−す7トールホルムアルデヒド(β−ナフトールは2
量体が結晶化しやすく、それでとまシやすいので、β−
ナフトールノボラックはその殆んどが2f体展となる。*-G-naphthol formaldehyde condensate rice methyl-
α-naphthol is 7 toll formaldehyde (β-naphthol is 2
β-
Most of the naphthol novolacs will be exhibited in 2F format.
)
る物
米ジヒドロキ7ナフタレンホルムアルデヒド縮合物
等、及びそれらの核ハロゲン置換体、例えばブロム化体
及びこれらのす7トール類の好ましくは50モルチ以下
をフェノール、クレゾール、キシレノール、フロムフェ
ノール、レゾルシノール等のフェノール類におきかえた
ノボラック型化合物等が非常に好ましく用いることが出
来る。) Dihydroxnaphthalene formaldehyde condensates, etc., and nuclear halogen-substituted products thereof, such as brominated products, and preferably not more than 50 mol of these tols, etc., are mixed with phenol, cresol, xylenol, fromphenol, resorcinol, etc. Novolak type compounds substituted with phenols can be used very preferably.
ホルムアルデヒドに加えて他のモノアルデヒド、モノケ
トンとの縮合物も、好適に用いる事が出来る。この場合
は、ホルムアルデヒドに対し、反応性が下がるので一般
には2址体の形のものが特に好ましく用いられる。勿論
反応条件によってさらに縮合の進んだものも得られ、同
様に用いる事が出来る。In addition to formaldehyde, condensates with other monoaldehydes and monoketones can also be suitably used. In this case, a two-body type is particularly preferably used since the reactivity toward formaldehyde is reduced. Of course, depending on the reaction conditions, products with even more advanced condensation can be obtained and can be used in the same way.
かかる縮合に用いられるモノアルデヒド。Monoaldehydes used in such condensations.
ベンズアルデヒド、p−ヒドロキシベンツアルデヒド、
ナフトアルデヒド、アセトン、シクロヘキサノン、シク
ロペンタノン、メチルエチルケトン等をあげる事が出来
る。benzaldehyde, p-hydroxybenzaldehyde,
Examples include naphthaldehyde, acetone, cyclohexanone, cyclopentanone, and methyl ethyl ketone.
さらに、ジアルデヒド類、例えばグリオキザール、グル
タルアルデヒド、テレ7タルアルデヒド、イン7タルア
ルデヒド類を用いる事によシ結合基が、基本結合基が1
個人る事によりナフタレン核を4個有するポリナフトー
ル化合物も好適に用いる事が出来る。Furthermore, by using dialdehydes such as glyoxal, glutaraldehyde, tele-7-taraldehyde, and in-7-taraldehyde, the basic binding group can be
Depending on the individual, a polynaphthol compound having four naphthalene nuclei can also be suitably used.
例えば、グルタルアルデヒドを用いると下記式の如きゼ
リナフトール化合物になる事になさらに1アルデヒドや
ケトンから形成される以外の結合基、例えばスルホニル
基、カルボニル基も用いる事が出来る。例えばスルホニ
ル基の場合は、フェノールの場合のとスフエノールSに
対応するジオキシシナ7チルスルホンがこれにあたる。For example, when glutaraldehyde is used, a gelinaphthol compound as shown in the following formula is obtained, and bonding groups other than those formed from aldehydes and ketones, such as sulfonyl groups and carbonyl groups, can also be used. For example, in the case of a sulfonyl group, this is dioxycin-7-tylsulfone, which corresponds to suphenol S in the case of phenol.
また、フェノールの場合のポリビニルフェノールに対応
するポリビニルナフトールも用いる事が出来る。Furthermore, polyvinylnaphthol, which corresponds to polyvinylphenol in the case of phenol, can also be used.
一般にかかるナフトール誘導体は、ナフタレン核の数が
2〜20、よシ好ましくは2〜12、さらに好ましくは
2〜10.特に好ましくは2〜7の範囲のものが用いら
れる。Generally, such naphthol derivatives have a number of naphthalene nuclei of from 2 to 20, more preferably from 2 to 12, more preferably from 2 to 10. Particularly preferably, those in the range of 2 to 7 are used.
本発明の上記ナフトール誘導体のうち特に好ましいノボ
ラックタイプ硬化剤の好ましい製造法としては、ナフト
ール成分とアルデヒド成分とを酸性触媒のもと縮合反応
させる方法があげられる。ここでナフトール成分に対す
るアルデヒド成分の仕込み割合は目的とするノボラック
の重合度によって調整される。Among the above-mentioned naphthol derivatives of the present invention, a particularly preferred method for producing the novolak type curing agent is a method in which a naphthol component and an aldehyde component are subjected to a condensation reaction in the presence of an acidic catalyst. Here, the ratio of the aldehyde component to the naphthol component is adjusted depending on the desired degree of polymerization of the novolak.
また酸性触媒としては具体的には硝酸、硫酸、塩酸、リ
ン醒、メタンスルホン酸、トルエンスルホン酸などのプ
ロトン酸、三弗化ホウ素、三弗化ホウ素エーテル錯体、
塩化アルミニウム、塩化スズ、塩化亜鉛、塩化鉄、塩化
チタンなどのルイス酸、シュウ酸などを用いることがで
きる。Specific examples of acidic catalysts include protonic acids such as nitric acid, sulfuric acid, hydrochloric acid, phosphoric acid, methanesulfonic acid, toluenesulfonic acid, boron trifluoride, boron trifluoride ether complex,
Lewis acids such as aluminum chloride, tin chloride, zinc chloride, iron chloride, titanium chloride, oxalic acid, and the like can be used.
これらのうちでもプロトン酸を用いることが好ましく、
特に塩酸、硫酸、メタンスルホン酸、トルエンスルホン
酸などが好ましく用いられる。Among these, it is preferable to use protonic acids,
In particular, hydrochloric acid, sulfuric acid, methanesulfonic acid, toluenesulfonic acid, etc. are preferably used.
これら触媒の使用量は原料ナフトール成分(T)に対し
て0.001〜0.05モル倍の間で選定される。The amount of these catalysts to be used is selected between 0.001 and 0.05 mole times the raw material naphthol component (T).
またこの反応温度は通常80〜250℃であるが、初期
段階は80〜150℃の間で行なわれ、必要に応じて反
応温度を更に上昇させる。また反応時間は、1時間〜1
0時間の範囲で選定できる。The reaction temperature is usually 80 to 250°C, but the initial stage is carried out at 80 to 150°C, and the reaction temperature is further raised as necessary. The reaction time is 1 hour to 1 hour.
It can be selected within the range of 0 hours.
本発明の上記反応を溶媒なしで行う場合には重合度の上
昇にともなってノボラック型ナットール樹脂の融点が上
昇してくるので昇温することが望ましい。When the above-mentioned reaction of the present invention is carried out without a solvent, it is desirable to raise the temperature because the melting point of the novolak-type Nuttall resin increases as the degree of polymerization increases.
また上記反応位トルエン、クロルベンゼン。Also, the above reaction positions are toluene and chlorobenzene.
ジクロルベンゼン、ニトロベンゼン、ジフェニルエーテ
ルなどの芳香族炭化水素、エチレンクリコール、ジエチ
レングリコールナトのジメチルエーテルの如きエーテル
などを溶媒として用いることもできる。Aromatic hydrocarbons such as dichlorobenzene, nitrobenzene and diphenyl ether, ethers such as ethylene glycol and dimethyl ether of diethylene glycol, etc. can also be used as the solvent.
以上に本発明のノボラックタイプのエポキシ樹脂硬化剤
の好ましい合成法を示したが、合成法に関しては必らず
しもこれに限定されるものではない。Although the preferred synthesis method for the novolac type epoxy resin curing agent of the present invention has been described above, the synthesis method is not necessarily limited to this.
+21dlヒドロキシナフタレン
本発明で述べるポリヒドロキシナフタレンとは具体的に
は、
1.6−シヒドロキシナフタレ/、2.7−シヒドロキ
シナフタレ/、1.5−ジヒドロキシナフタレン、ス3
−ジヒドロキシナフタレン。+21dl Hydroxynaphthalene Specifically, the polyhydroxynaphthalene described in the present invention is 1,6-dihydroxynaphthalene/, 2,7-dihydroxynaphthalene/, 1,5-dihydroxynaphthalene, S3
-dihydroxynaphthalene.
1.7−ジヒドロキシナフタレン、2.6−ジヒドロキ
シナフタレン、1.8−ジヒドロキシナフタレン、1.
2−ジヒドロキシナフタレン。1.7-dihydroxynaphthalene, 2.6-dihydroxynaphthalene, 1.8-dihydroxynaphthalene, 1.
2-dihydroxynaphthalene.
1、3−ジヒドロキシナフタレン、1.4−ジヒドロキ
シナフタレン、1,2.3−ナフタレントリオール、1
,2.4−す7タレントリオール。1,3-dihydroxynaphthalene, 1,4-dihydroxynaphthalene, 1,2,3-naphthalenetriol, 1
, 2.4-s7 talent trio.
1、2.5−ナフタレントリオールl 11λ6−す7
タレントリオール、1,2.7−す7タレントリオール
、1,2.8−ナフタレントリオール。1,2.5-naphthalene triol 11λ6-su7
Talent triol, 1,2.7-s7talent triol, 1,2.8-naphthalene triol.
1、亀5−す7タレントリオール、1.&6−ナフタレ
ンドリオール、1,3.7−す7タレントリオール、1
,3.8−す7タレントリオール。1. Turtle 5-7 talent trio; 1. &6-naphthalenetriol, 1,3.7-naphthalenetriol, 1
, 3.8-s7 talent trio.
1、4.5−す7タレントリオール、1.46−ナフタ
レントリオール、 1.6.7−ナフタレントリオール
+ 2−3= 6−ナフタレントリオールτあるが、好
ましくは1,6−ジヒドロキシナフタレン、2.7−ジ
ヒドロキシナフタレンである。1,4.5-7-naphthalenetriol, 1.46-naphthalenetriol, 1.6.7-naphthalenetriol+2-3=6-naphthalenetriol τ, preferably 1,6-dihydroxynaphthalene, 2. 7-dihydroxynaphthalene.
ところで、上述した如きナフトール誘導体を主成分とし
てなるエポキシ樹脂硬化剤をエポキシ樹脂に所定量配合
したものは貯蔵安定性が良好であシ、かつ80℃〜24
0℃の温度で硬化し、緒特性に優れた硬化物が得られる
。By the way, an epoxy resin containing a predetermined amount of an epoxy resin curing agent mainly composed of a naphthol derivative as described above has good storage stability, and has a temperature of 80°C to 24°C.
It cures at a temperature of 0°C, yielding a cured product with excellent properties.
本発明のナフトール誘導体を主成分としてなるエポキシ
樹脂硬化剤の配合量は、エポキシ樹脂のエポキシ基1当
量に対し、硬化剤の活性水素当量として0.4〜1.6
、好ましくは0.6〜1.4、特に好ましくは0.7〜
1.2の範囲である。The amount of the epoxy resin curing agent containing the naphthol derivative of the present invention as a main component is 0.4 to 1.6 as active hydrogen equivalent of the curing agent per 1 equivalent of epoxy group of the epoxy resin.
, preferably 0.6 to 1.4, particularly preferably 0.7 to
The range is 1.2.
本発明のナフトール誘導体を主成分としてなる硬化剤に
適用されるエポキシ化合物としては1分子中にエポ午シ
基が2個以上あるものの少なくとも一種を主剤として用
いられ、周知の種々のものを挙げることができるが、例
えば多価フェノールや多価ナフトールのグリシジルエー
テル類、特にビスフェノールAタイプのグリシジルエー
テル類、ビスフェノールFタイプのグリシジルエーテル
類、フェノールホルムアルデヒド、す7トールホルムア
ルデヒド、樹脂のポリグリシジルエーテル類、フェノー
ルやナフトールと他のアルデヒド類とのノボラックタイ
プ樹脂のポリグリシジルエーテル類、)lJフェニロー
ルメタントリグリジルエーテル、芳香族カルボン酸から
のフェニルグリシジルエステル類、脂環化合物からのエ
ポキシ化合物など、さらにトリグシシジルイソシアヌレ
ート、トリグリジル−p−アミンフェノール、テトラグ
リシジルジアミノジフェニルメタン、含窒素エポキシ化
合物も用いる事が出来る。Epoxy compounds to be applied to the curing agent containing a naphthol derivative as a main component of the present invention include various well-known epoxy compounds in which at least one type of epoxy group having two or more epoxy groups in one molecule is used as the main ingredient. However, for example, glycidyl ethers of polyhydric phenols and polyhydric naphthols, especially glycidyl ethers of bisphenol A type, glycidyl ethers of bisphenol F type, phenol formaldehyde, 7-toll formaldehyde, polyglycidyl ethers of resins, and phenol. Polyglycidyl ethers of novolak-type resins of esters and naphthol with other aldehydes, phenylolmethane triglydyl ether, phenylglycidyl esters from aromatic carboxylic acids, epoxy compounds from alicyclic compounds, etc. Sidyl isocyanurate, triglylyl-p-amine phenol, tetraglycidyldiaminodiphenylmethane, and nitrogen-containing epoxy compounds can also be used.
また、これらのポリエポキシ化合物の一部Kかえて、モ
ノエポキシ化合物、例えばフェニルクリシジルエーテル
、ノニルフェニルクリシジルエーテル、yl−=y’チ
ルクリシジルエーテル等を粘度調節剤等に用いる事が出
来る。In addition, instead of some of these polyepoxy compounds, monoepoxy compounds such as phenylcricidyl ether, nonylphenylcricidyl ether, yl-=y' tylcidyl ether, etc. can be used as a viscosity modifier. .
本発明の硬化剤の有する特徴を考慮するとフェノール及
び/又はクレゾールノボラックグリシジルエーテル類、
α−ナフトールノボラックグリシジルエーテル類、ビス
フェノール−A−ジグリシジルエーテル類が、特に好適
である。Considering the characteristics of the curing agent of the present invention, phenol and/or cresol novolac glycidyl ethers,
α-Naphthol novolak glycidyl ethers and bisphenol-A-diglycidyl ethers are particularly suitable.
又、本発明のエポキシ樹脂組成物には必要に応じて、そ
の他の硬化剤、硬化促進剤、充填剤等を添加してもよい
。特に硬化促進剤は本発明のノボラックタイプのエポキ
シ樹脂用硬化剤に使用直前に添加する事で、さらに低温
硬化性を飛躊的に向上させうる。好ましい硬化促進剤と
しては、N、N−ジメチルベンジルアミン、α−メチル
ベンジルジメチルアミン、 2.4.6−トリス(ジメ
チルアミノメチル)フェノールへキサメトキシメチルメ
ラミンの如き3級アミン類、N、N−ジメチルベンジル
アミンオキサイドの如きアミンオキサイド類、BF3−
ピペリジン、トリエタノールアミンポレートの如きホウ
素アミンコンプレックス類、ポリツクアシドエステル誘
導体。Further, other curing agents, curing accelerators, fillers, etc. may be added to the epoxy resin composition of the present invention, if necessary. In particular, by adding a curing accelerator to the novolak type epoxy resin curing agent of the present invention immediately before use, the low-temperature curing properties can be further improved dramatically. Preferred curing accelerators include tertiary amines such as N,N-dimethylbenzylamine, α-methylbenzyldimethylamine, 2.4.6-tris(dimethylaminomethyl)phenol hexamethoxymethylmelamine, N,N -Amine oxides such as dimethylbenzylamine oxide, BF3-
Piperidine, boron amine complexes such as triethanolamine porate, polyacid ester derivatives.
アニリン−ホルムアルデヒド樹脂であるが、特に好まし
くはN、N−ジメチルベンジルアミン、a−メチルベン
ジルジメチルアミン。Aniline-formaldehyde resins, particularly preferably N,N-dimethylbenzylamine and a-methylbenzyldimethylamine.
2、4.6− トリス(ジメチルアミノメチル)7エノ
ールの如き3級アミン類である。硬化促進剤の添加量は
0.05〜5%、好ましくは0.1〜1%、特に好まし
くは0.2〜0.8チである。These are tertiary amines such as 2,4,6-tris(dimethylaminomethyl)7enol. The amount of curing accelerator added is 0.05 to 5%, preferably 0.1 to 1%, particularly preferably 0.2 to 0.8%.
上述の如き、ナフトール誘導体、ポリエポキシ化合物及
び必要に応じて上記した如き硬化促進剤を混合し、その
まま或は、一部反応を起させていわゆるB−ステージの
樹脂として賦形時に硬化反応を進め硬化物を得る事にな
る。The above-mentioned naphthol derivative, polyepoxy compound, and if necessary, the above-mentioned curing accelerator are mixed, and the curing reaction is proceeded at the time of shaping as a so-called B-stage resin, either as it is or by causing a partial reaction. You will get a cured product.
上記成分以外に、硬化剤の一部を他の硬化剤、例えばフ
ェノールノボラック、クレゾールノボラック、ポリビニ
ルフェノール等のポリフェノール頌、トリメリド酸、フ
タル酸無水物等の無水物系硬化剤にかえて用いる事も可
能である。In addition to the above ingredients, some of the curing agents may be replaced with other curing agents, such as polyphenols such as phenol novolac, cresol novolak, polyvinylphenol, and anhydride curing agents such as trimellidic acid and phthalic anhydride. It is possible.
友
さらに他の添加剤、アルミナ粉末、つ7ストナイト等の
無機粉末、アルミ、銅、銀等の金属粉末、色素、顔料等
硬化物の必要とする機能に応じて適当量添加する事が出
来る。In addition, other additives such as alumina powder, inorganic powders such as stonite, metal powders such as aluminum, copper, and silver, dyes, and pigments can be added in appropriate amounts depending on the functions required of the cured product.
硬化前の樹脂混合物は、粉末や7レーク状としてトラン
スファー成型や圧縮成型して用いる事が出来る。The resin mixture before curing can be used in powder or lake form by transfer molding or compression molding.
また、ワ4ス等の溶液のかたちで、表面に塗布乾燥硬化
させる事によシ、塗料、接着剤として用いる事も出来る
。It can also be used as a paint or adhesive by applying it to a surface in the form of a solution such as wax, drying, and hardening.
また、かかるワニスをガラス織布やカーボン繊維、アラ
ミド繊維等に含浸、いわゆるプリプレグを調整し、該プ
リプレグをプレス成型、オートクレーブ成型によって構
造物に成型する事が出来る。Further, it is possible to prepare a so-called prepreg by impregnating such a varnish into a glass woven fabric, carbon fiber, aramid fiber, etc., and mold the prepreg into a structure by press molding or autoclave molding.
本発明による硬化剤を用いたエポキシ樹脂硬化物は低吸
湿性、電気特性、耐熱性にすぐれており、半導体封止剤
用をはじめとする電気電子用途、航空宇宙用等、先端技
術分野に好適に用いる事が出来る。The cured epoxy resin using the curing agent of the present invention has low moisture absorption, excellent electrical properties, and heat resistance, and is suitable for advanced technology fields such as electrical and electronic applications such as semiconductor encapsulants, and aerospace applications. It can be used for.
以下に実施例をあげて本発明を詳述する。The present invention will be explained in detail with reference to Examples below.
実施例は説明であって、それに限定されるものではない
。The examples are illustrative and not limiting.
実施例中の物性測定 分子量ニ ジオキサンを用いた凝固点降下法によシ測定。Measurement of physical properties in Examples Molecular weight Measured by freezing point depression method using dioxane.
融 潰 :
YANAGIMOTOMFG CoのMICROMEL
TING POINTAPPARATUSを用い昇温速
度2℃/―で測定した。Melting: MICROMEL by YANAGIMOTO MFG Co
Measurement was performed using TING POINT APPARATUS at a temperature increase rate of 2°C/-.
熱機械分析装置(Du Pant社101090)Dで
昇温速度10℃/分で測定。Measured using a thermomechanical analyzer (Du Pant 101090) D at a heating rate of 10°C/min.
熱機械分析装置(Du Pont社1090)TGAで
昇温速度20℃/分で測定。Measured using a thermomechanical analyzer (Du Pont 1090) TGA at a heating rate of 20°C/min.
熱機械分析装置(Du Pont 1090 ) D
S Cで昇温速度10℃/分で測定。Thermomechanical analyzer (Du Pont 1090) D
Measured in SC at a heating rate of 10°C/min.
硬化温度:
ホットプレート上で加熱した場合、8分以内で硬化する
温度。Curing temperature: Temperature at which it cures within 8 minutes when heated on a hot plate.
吸水率:
成形片を12 ws X 50 ws X 5 xxに
切削加工した物を沸水に浸漬して1週間処理し、下記式
に従って吸水率を求めた。Water absorption rate: A molded piece cut to a size of 12 ws x 50 ws x 5 xx was immersed in boiling water for one week, and the water absorption rate was determined according to the following formula.
d
合成例1
くα−す7トールーホルムアルデヒドノボラツク樹脂の
合成〉
α−ナフトール40部、ホルムアルデヒド35%水溶液
19部、シュウ酸0.1部を水4部に溶かした溶液を攪
拌下1時間環流し、そこに36%塩酸1.4部を加え、
さらに35分間反応を継続する。その後加熱をやめ、反
応混合物に多葉の水を加え、さらに30分間攪拌を続け
た後、水をデカンテーションで除き、残シの樹脂を減圧
乾燥する。得られたノボラック歴す7トール樹脂は39
部で融点は130〜145℃9分子量は521(分子中
にナフトール成分を平均3.4個、ホルムアルデヒド成
分を平均24個含み、かつ分子中にヒドロキシル基を3
.4個含む)であった。d Synthesis Example 1 Synthesis of alpha-su7thol-formaldehyde novolac resin> A solution of 40 parts of alpha-naphthol, 19 parts of a 35% formaldehyde aqueous solution, and 0.1 part of oxalic acid in 4 parts of water was stirred for 1 hour. Reflux, add 1.4 parts of 36% hydrochloric acid,
Continue the reaction for an additional 35 minutes. Thereafter, the heating was stopped, a large amount of water was added to the reaction mixture, and stirring was continued for an additional 30 minutes. The water was then removed by decantation, and the remaining resin was dried under reduced pressure. The resulting novolak-based 7-tall resin was 39
The melting point is 130-145°C, the molecular weight is 521 (the molecule contains an average of 3.4 naphthol components, an average of 24 formaldehyde components, and 3 hydroxyl groups in the molecule).
.. (including 4 pieces).
合成例2
〈β−ナフトール−ホルムアルデヒドノボラック樹脂の
合成〉
β−ナフトール284部、トルエン154部、シュウ酸
22部を水22部にとかした溶液を120℃に加熱溶融
し、この中に35q6ホルムアルデヒド水溶液84部を
105℃で攪拌下1.5時間で滴下し、さらに25時間
反応を継続した。反応混合物よシ水を留去した後、熱時
!濾過て!戸別した固体を熱水で洗滌し、減圧乾燥する
。得られたナフトール樹脂は280部で融点は199〜
202℃1分子量は300(分子中にナフトール成分を
2個。Synthesis Example 2 <Synthesis of β-naphthol-formaldehyde novolac resin> A solution of 284 parts of β-naphthol, 154 parts of toluene, and 22 parts of oxalic acid dissolved in 22 parts of water was heated to 120°C and melted, and 35q6 formaldehyde aqueous solution was added thereto. 84 parts were added dropwise at 105° C. over 1.5 hours while stirring, and the reaction was continued for an additional 25 hours. After distilling off the water from the reaction mixture, heat it! Filter it! The separated solids are washed with hot water and dried under reduced pressure. The resulting naphthol resin was 280 parts with a melting point of 199~
The molecular weight at 202°C is 300 (2 naphthol components in the molecule.
ホルムアルデヒド成分を1個含み、かつ分子中にヒドロ
キシル基を2個含む)であった。(contains one formaldehyde component and two hydroxyl groups in the molecule).
合成例3
(1,1,5,5−テトラキス(1−ヒドロキシナフチ
ル)ペンタン(TONP)の合成〉
α−ナフトール288部をグルタルアルデヒドの25%
水溶液200部KIIO℃で加熱溶解した後、この中に
塩fi 0.4部、p−)ルエンスルホン酸0.6部を
加え攪拌下1時間反応し、さらに温度を160℃まで上
げて2時間反応を継続した。反応混合物より160℃に
て脱水を行い、さらに減圧丁未反応のα−す7トールを
留去した。得られた化合物は260部で融点は160〜
175℃2分子量は651(分子中にナフトール成分を
4個。Synthesis Example 3 (Synthesis of 1,1,5,5-tetrakis(1-hydroxynaphthyl)pentane (TONP)) 288 parts of α-naphthol was added to 25% of glutaraldehyde.
After heating and dissolving 200 parts of an aqueous solution at KIIO°C, 0.4 part of salt fi and 0.6 part of p-)luenesulfonic acid were added to the solution and reacted for 1 hour with stirring, and the temperature was further raised to 160°C for 2 hours. The reaction continued. The reaction mixture was dehydrated at 160°C, and unreacted α-7 torr was distilled off under reduced pressure. The obtained compound was 260 parts with a melting point of 160~
175℃2 molecular weight is 651 (4 naphthol components in the molecule.
ジアルデヒド成分を1個含み、かつ分子中にヒドロキシ
ル基を4個含む)であった。(contains one dialdehyde component and four hydroxyl groups in the molecule).
合成例4
G−ナフトール144 部I P−オキシベンズアルデ
ヒド82部を130℃に加熱溶融し、こO中IC36%
塩酸0.2部とp−)ルエンスルホンl!!!0.3部
を加え100℃で1時間、つづいて190〜200℃で
反応によって生成する水を反応系外に留去しつつ8時間
加熱反応させた。Synthesis Example 4 144 parts of G-naphthol 82 parts of I P-oxybenzaldehyde were heated and melted at 130°C, and the IC in O was 36%.
0.2 parts of hydrochloric acid and p-) luenesulfone l! ! ! 0.3 part was added thereto, and the reaction was heated at 100°C for 1 hour, and then heated at 190 to 200°C for 8 hours while distilling water produced by the reaction out of the reaction system.
反応物を粉砕し、熱水で洗浄後乾燥した。The reaction product was crushed, washed with hot water, and then dried.
得られた樹脂は209部で、融点は300℃以上、分子
量は529であった。これは分子中にナフトール成分を
平均25個、p−ヒドロキシベンズアルデヒド成分を平
均1.5個含み、且つ分子中にヒドロキシル基を4.0
個含むノボラック型す7トール樹脂(ONB)である。The resulting resin weighed 209 parts, had a melting point of 300°C or higher, and a molecular weight of 529. It contains an average of 25 naphthol components and an average of 1.5 p-hydroxybenzaldehyde components in the molecule, and 4.0 hydroxyl groups in the molecule.
It is a novolac-type 7-tall resin (ONB) containing
実施例1 エポキシ樹脂(エピフート154)100部。Example 1 100 parts of epoxy resin (Epifuto 154).
硬化剤としてα−ナフトールホルマリyノボ2ツク86
部、硬化促進剤としてベンジルジメチルアミン0.35
部をアセトン300部に溶解し均一に混合した後35℃
で減圧下アセトンを除去した。得られた組成物の硬化開
始温度は99℃、ホットグレートを用いて8分以内で硬
化する温度は185℃であった。次いで該組成物を金製
中で150℃で1時間1次いで180〜220℃で徐々
に昇温しながら4時間熱処理することによシ硬化した成
形片を得た。成形品のTg は185℃で、Td
は330℃、吸水率は1.8チであった。α-naphthol formalyynovo2tsuku86 as a curing agent
0.35 parts, benzyldimethylamine as curing accelerator
Dissolve 1 part in 300 parts of acetone and mix uniformly at 35°C.
Acetone was removed under reduced pressure. The curing initiation temperature of the obtained composition was 99°C, and the temperature at which it was cured within 8 minutes using a hot grate was 185°C. Next, the composition was heat-treated in a metal mold at 150°C for 1 hour and then at 180-220°C for 4 hours while gradually increasing the temperature to obtain a hardened molded piece. The Tg of the molded product is 185°C, and the Td
The temperature was 330°C, and the water absorption rate was 1.8°C.
実施例2〜7及び比較例1〜4
実施例1に於てエポキシ樹脂(エピコート154)10
0部、α−ナフトールホルマリンノボラツク86部の代
)に下表に示したエポキシ樹脂及び硬化剤の所定量を用
い、他は実施例1と同様にして硬化性及び硬化成形物の
物性を測定し下表にまとめた。Examples 2 to 7 and Comparative Examples 1 to 4 In Example 1, epoxy resin (Epicoat 154) 10
The curability and physical properties of the cured molded product were measured in the same manner as in Example 1 except that the predetermined amounts of the epoxy resin and curing agent shown in the table below were used for 86 parts of α-naphthol formalin novolak). The results are summarized in the table below.
尚、比較として硬化剤としてフェノールホルマリンノボ
ラックを使用した場合(比較例1.2)及び硬化剤とし
てジアミノジフェニルスルホンを使用し、かつ硬化促進
剤を使用しない場合(比較例3.4)の例を示した。For comparison, examples are shown in which phenol-formalin novolac is used as a curing agent (Comparative Example 1.2) and when diaminodiphenylsulfone is used as a curing agent and no curing accelerator is used (Comparative Example 3.4). Indicated.
本発明の硬化剤を用いたものは他種硬化剤を用いたもの
に比べ吸水率が小さく優れた硬化性。Products using the curing agent of the present invention have a lower water absorption rate and superior curing properties than those using other types of curing agents.
耐熱性を有していることがわかった。It was found that it has heat resistance.
手 続 補 正 書
昭和61年3月9日
特肝庁長冨 戚
1、 φ件の表示
特Jtljl@61−7872号
2、 発明の名称
エポキシ樹脂の硬化方法
3、 補正をする者
φ件との関係 特許出願人
大阪市東区南本町1丁目11査地
(300)帝人株式会社
代衣省岡本佐四部
4、 代 理 人 東京都千代田区内幸町2丁
目l査1号(威野ビル)
常人株式公社内
明II[14の「発明の詳細な説明」の掴+1) 明
細書第4頁第7行の式囚を以下の如く訂正する。Procedural amendment Written March 9, 1986 by Tokihiro Tomi, Director General of the Tokugawa Bureau 1, Indication of φ No. 61-7872 2, Name of the invention Method for curing epoxy resin 3, Person making the amendment φ Related: Patent applicant: 1-11 Minamihonmachi, Higashi-ku, Osaka (300), Teijin Co., Ltd., Okamoto Sashibe 4, Daigoi Ministry, Agent: No. 1, 2-1, Uchisaiwai-cho, Chiyoda-ku, Tokyo (Iino Building), Jojin Co., Ltd. Uchimei II [Understanding 14 "Detailed Description of the Invention" + 1) The formula in line 7 of page 4 of the specification is corrected as follows.
」
(2) 明細書第5頁第11行〜末行迄を以下の如く
訂正する。(2) Page 5, line 11 to the last line of the specification are corrected as follows.
*ナフトールホルムアルデヒド縮合物
*メチルナフトールホルムアルデヒド縮合物
(上記の中でもα−ナフトール製が好ましい。β−す7
トール盤は2菫体物が
結晶化しやすく、それでとまりやすい
ので、β−す7 」(3) 明細
−V第2頁第1行の1化剤、アニオン系」を「化剤、カ
チオン系硬化剤、アニτン系」と訂正する。*Naphthol formaldehyde condensate *Methylnaphthol formaldehyde condensate (among the above, α-naphthol is preferred.β-su7
In the case of tall disks, the diphthalmium substances tend to crystallize and are easily fixed, so β-su7'' (3) Change the ``monizing agent, anionic type'' in the first line of page 2 of Specification-V to ``monizing agent, cationic curing agent''. I corrected it to ``agent, anitan type''.
(4) 明細im?頁′d44行の1モノアルデヒド
、」1に+−七ノアルデヒド、モノケトン類としては、
アセトアルデヒド、プロピオンアルデヒド」と4正する
。(4) Details im? 1 monoaldehyde on page 'd line 44, 1 +- heptanoaldehyde, as monoketones,
"Acetaldehyde, propionaldehyde," 4 Correct.
(5) 明細書第9頁第8行の「プロトン酸を用いる
ことが好ましく、」を「シュウ酸やプロトン酸を用いる
ことが好ましく、プロトン酸とし℃は」と訂正する。(5) In page 9, line 8 of the specification, "it is preferable to use a protonic acid" is corrected to "it is preferable to use oxalic acid or a protonic acid, and the protonic acid is used at °C."
(6) 明細書%12貞末竹の「アルデヒド、樹脂」
を「アルデしド樹脂」と訂正する。(6) Specification %12 Sadasuetake's "aldehyde, resin"
is corrected to "aldehyde resin".
以 上that's all
Claims (1)
るヒドロキシル基を1分子中に少くとも2個有するナフ
トール誘導体を用いることを特徴とするエポキシ樹脂の
硬化方法。[Claims] When curing an epoxy compound having two or more epoxy groups in one molecule, a naphthol derivative having at least two hydroxyl groups in one molecule bonded to a naphthalene nucleus is used. How to cure epoxy resin.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP787286A JPS62167318A (en) | 1986-01-20 | 1986-01-20 | Curing of epoxy resin |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP787286A JPS62167318A (en) | 1986-01-20 | 1986-01-20 | Curing of epoxy resin |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62167318A true JPS62167318A (en) | 1987-07-23 |
JPH0436175B2 JPH0436175B2 (en) | 1992-06-15 |
Family
ID=11677719
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP787286A Granted JPS62167318A (en) | 1986-01-20 | 1986-01-20 | Curing of epoxy resin |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62167318A (en) |
Cited By (8)
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JPH0450223A (en) * | 1990-06-18 | 1992-02-19 | Shin Etsu Chem Co Ltd | Epoxy resin composition and semiconductor device |
JPH04214714A (en) * | 1990-12-11 | 1992-08-05 | Shin Etsu Chem Co Ltd | Epoxy resin composition and semiconductor device |
US5166228A (en) * | 1990-08-14 | 1992-11-24 | Shin-Etsu Chemical Co., Ltd. | Epoxy resin compositions containing polysubstituted novolac epoxy resins and naphthylene based phenolic resin curing agents and semiconductor devices encapsulated therewith |
US5302673A (en) * | 1991-06-21 | 1994-04-12 | Dai-Ichi Kogyo Seiyaku Co., Ltd. | Poly-hydroxynaphthalene compounds and epoxy resin composition |
US5478871A (en) * | 1991-10-11 | 1995-12-26 | Sumitomo Chemical Company, Limited | Polyhydric phenol from naphthaldehyde and epoxy resin obtained using the same |
US5578660A (en) * | 1992-09-21 | 1996-11-26 | Sumitomo Bakelite Company Limited | Epoxy resin composition |
US5597876A (en) * | 1993-09-24 | 1997-01-28 | Shell Oil Company | Epoxy resin composition containing novolac with adjacent hydroxyl groups |
KR20160031257A (en) * | 2014-09-12 | 2016-03-22 | 엘지이노텍 주식회사 | Inorganic filler and epoxy resin composition comprising the same |
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JP2541015B2 (en) * | 1990-12-11 | 1996-10-09 | 信越化学工業株式会社 | Epoxy resin composition for semiconductor device encapsulation and semiconductor device |
US5302673A (en) * | 1991-06-21 | 1994-04-12 | Dai-Ichi Kogyo Seiyaku Co., Ltd. | Poly-hydroxynaphthalene compounds and epoxy resin composition |
US5478871A (en) * | 1991-10-11 | 1995-12-26 | Sumitomo Chemical Company, Limited | Polyhydric phenol from naphthaldehyde and epoxy resin obtained using the same |
US5578660A (en) * | 1992-09-21 | 1996-11-26 | Sumitomo Bakelite Company Limited | Epoxy resin composition |
US5597876A (en) * | 1993-09-24 | 1997-01-28 | Shell Oil Company | Epoxy resin composition containing novolac with adjacent hydroxyl groups |
KR20160031257A (en) * | 2014-09-12 | 2016-03-22 | 엘지이노텍 주식회사 | Inorganic filler and epoxy resin composition comprising the same |
CN105418970A (en) * | 2014-09-12 | 2016-03-23 | Lg伊诺特有限公司 | Inorganic Filler And Epoxy Resin Composition Including The Same |
US10231332B2 (en) * | 2014-09-12 | 2019-03-12 | Lg Innotek Co., Ltd. | Inorganic filler and epoxy resin composition including the same |
Also Published As
Publication number | Publication date |
---|---|
JPH0436175B2 (en) | 1992-06-15 |
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