JPS6399201A - Photopolymerization initiator - Google Patents
Photopolymerization initiatorInfo
- Publication number
- JPS6399201A JPS6399201A JP24813986A JP24813986A JPS6399201A JP S6399201 A JPS6399201 A JP S6399201A JP 24813986 A JP24813986 A JP 24813986A JP 24813986 A JP24813986 A JP 24813986A JP S6399201 A JPS6399201 A JP S6399201A
- Authority
- JP
- Japan
- Prior art keywords
- formula
- photopolymerization initiator
- halogen
- photopolymerization
- phenyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000003999 initiator Substances 0.000 title claims abstract description 20
- 239000000203 mixture Substances 0.000 claims abstract description 17
- 150000001875 compounds Chemical class 0.000 claims abstract description 13
- 229910052736 halogen Inorganic materials 0.000 claims abstract description 10
- 150000002367 halogens Chemical class 0.000 claims abstract description 10
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 8
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 claims abstract description 4
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 claims abstract description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims description 6
- 239000001257 hydrogen Substances 0.000 claims description 6
- 150000002431 hydrogen Chemical class 0.000 claims 4
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims 2
- 229910052794 bromium Inorganic materials 0.000 claims 2
- 229910052801 chlorine Inorganic materials 0.000 claims 2
- 239000000460 chlorine Substances 0.000 claims 2
- 239000000126 substance Substances 0.000 claims 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 abstract description 18
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 abstract description 9
- 239000002904 solvent Substances 0.000 abstract description 8
- 229920000642 polymer Polymers 0.000 abstract description 5
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 abstract description 4
- 239000000463 material Substances 0.000 abstract description 4
- VCQYDZJGTXAFRL-UHFFFAOYSA-N s-phenyl benzenecarbothioate Chemical class C=1C=CC=CC=1C(=O)SC1=CC=CC=C1 VCQYDZJGTXAFRL-UHFFFAOYSA-N 0.000 abstract description 3
- SCEICQWBUFWUMP-UHFFFAOYSA-N 2,4,7-trimethylocta-2,6-dienediamide Chemical compound NC(=O)C(C)=CC(C)CC=C(C)C(N)=O SCEICQWBUFWUMP-UHFFFAOYSA-N 0.000 abstract description 2
- 239000011248 coating agent Substances 0.000 abstract description 2
- 238000000576 coating method Methods 0.000 abstract description 2
- 238000010438 heat treatment Methods 0.000 abstract description 2
- 230000000704 physical effect Effects 0.000 abstract description 2
- 230000015572 biosynthetic process Effects 0.000 description 16
- 238000003786 synthesis reaction Methods 0.000 description 16
- GUUVPOWQJOLRAS-UHFFFAOYSA-N Diphenyl disulfide Chemical compound C=1C=CC=CC=1SSC1=CC=CC=C1 GUUVPOWQJOLRAS-UHFFFAOYSA-N 0.000 description 10
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- -1 ketone compound Chemical class 0.000 description 6
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 5
- 238000002844 melting Methods 0.000 description 5
- 230000008018 melting Effects 0.000 description 5
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 4
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 4
- 239000002202 Polyethylene glycol Substances 0.000 description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 4
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 4
- 229910052753 mercury Inorganic materials 0.000 description 4
- 239000000178 monomer Substances 0.000 description 4
- 229920001223 polyethylene glycol Polymers 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 125000005907 alkyl ester group Chemical group 0.000 description 3
- 239000000741 silica gel Substances 0.000 description 3
- 229910002027 silica gel Inorganic materials 0.000 description 3
- RMVRSNDYEFQCLF-UHFFFAOYSA-N thiophenol Chemical compound SC1=CC=CC=C1 RMVRSNDYEFQCLF-UHFFFAOYSA-N 0.000 description 3
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 description 2
- FJFVXUURYJTNOJ-UHFFFAOYSA-N 2-(2-hydroxyethoxy)-1-phenylethanol;prop-2-enoic acid Chemical compound OC(=O)C=C.OCCOCC(O)C1=CC=CC=C1 FJFVXUURYJTNOJ-UHFFFAOYSA-N 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 2
- 239000005711 Benzoic acid Substances 0.000 description 2
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- 238000003848 UV Light-Curing Methods 0.000 description 2
- 235000010233 benzoic acid Nutrition 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 238000001723 curing Methods 0.000 description 2
- 239000000975 dye Substances 0.000 description 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- 239000000976 ink Substances 0.000 description 2
- 238000001393 microlithography Methods 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 229920001451 polypropylene glycol Polymers 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- LGPAKRMZNPYPMG-UHFFFAOYSA-N (3-hydroxy-2-prop-2-enoyloxypropyl) prop-2-enoate Chemical compound C=CC(=O)OC(CO)COC(=O)C=C LGPAKRMZNPYPMG-UHFFFAOYSA-N 0.000 description 1
- KQDKVVOIQYQWRQ-UHFFFAOYSA-N 1-octyl-4-[(4-octylphenyl)disulfanyl]benzene Chemical compound C1=CC(CCCCCCCC)=CC=C1SSC1=CC=C(CCCCCCCC)C=C1 KQDKVVOIQYQWRQ-UHFFFAOYSA-N 0.000 description 1
- HXYORIGKNOKFTR-UHFFFAOYSA-N 2,6-dimethylhepta-2,5-dienediamide Chemical compound NC(=O)C(C)=CCC=C(C)C(N)=O HXYORIGKNOKFTR-UHFFFAOYSA-N 0.000 description 1
- ARKDCHXUGNPHJU-UHFFFAOYSA-N 2,7-dimethylocta-2,6-dienediamide Chemical compound NC(=O)C(C)=CCCC=C(C)C(N)=O ARKDCHXUGNPHJU-UHFFFAOYSA-N 0.000 description 1
- UIBWITKNFSWPFA-UHFFFAOYSA-N 2-(2-methylpropoxy)prop-2-enamide Chemical compound CC(C)COC(=C)C(N)=O UIBWITKNFSWPFA-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- VHSHLMUCYSAUQU-UHFFFAOYSA-N 2-hydroxypropyl methacrylate Chemical compound CC(O)COC(=O)C(C)=C VHSHLMUCYSAUQU-UHFFFAOYSA-N 0.000 description 1
- GWZMWHWAWHPNHN-UHFFFAOYSA-N 2-hydroxypropyl prop-2-enoate Chemical compound CC(O)COC(=O)C=C GWZMWHWAWHPNHN-UHFFFAOYSA-N 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- FZHYLXLEEBXHEG-UHFFFAOYSA-N 2-methyl-3-(2-methylpropoxy)prop-2-enamide Chemical compound CC(C)COC=C(C)C(N)=O FZHYLXLEEBXHEG-UHFFFAOYSA-N 0.000 description 1
- GASMGDMKGYYAHY-UHFFFAOYSA-N 2-methylidenehexanamide Chemical compound CCCCC(=C)C(N)=O GASMGDMKGYYAHY-UHFFFAOYSA-N 0.000 description 1
- RBTBFTRPCNLSDE-UHFFFAOYSA-N 3,7-bis(dimethylamino)phenothiazin-5-ium Chemical compound C1=CC(N(C)C)=CC2=[S+]C3=CC(N(C)C)=CC=C3N=C21 RBTBFTRPCNLSDE-UHFFFAOYSA-N 0.000 description 1
- IICCLYANAQEHCI-UHFFFAOYSA-N 4,5,6,7-tetrachloro-3',6'-dihydroxy-2',4',5',7'-tetraiodospiro[2-benzofuran-3,9'-xanthene]-1-one Chemical compound O1C(=O)C(C(=C(Cl)C(Cl)=C2Cl)Cl)=C2C21C1=CC(I)=C(O)C(I)=C1OC1=C(I)C(O)=C(I)C=C21 IICCLYANAQEHCI-UHFFFAOYSA-N 0.000 description 1
- IFQUPKAISSPFTE-UHFFFAOYSA-N 4-benzoylbenzoic acid Chemical compound C1=CC(C(=O)O)=CC=C1C(=O)C1=CC=CC=C1 IFQUPKAISSPFTE-UHFFFAOYSA-N 0.000 description 1
- TUXYZHVUPGXXQG-UHFFFAOYSA-N 4-bromobenzoic acid Chemical compound OC(=O)C1=CC=C(Br)C=C1 TUXYZHVUPGXXQG-UHFFFAOYSA-N 0.000 description 1
- OQAOQXNFYZLMNJ-UHFFFAOYSA-N 4-methylocta-2,6-dienediamide Chemical compound NC(=O)C=CC(C)CC=CC(N)=O OQAOQXNFYZLMNJ-UHFFFAOYSA-N 0.000 description 1
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- UPIYXCQZCKSJJX-UHFFFAOYSA-N CCCCOCC=C(C)C(N)=O Chemical compound CCCCOCC=C(C)C(N)=O UPIYXCQZCKSJJX-UHFFFAOYSA-N 0.000 description 1
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- BWGNESOTFCXPMA-UHFFFAOYSA-N Dihydrogen disulfide Chemical compound SS BWGNESOTFCXPMA-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 229920002845 Poly(methacrylic acid) Polymers 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- VOERVJPUXVEQIG-UHFFFAOYSA-N S-phenyl 4-acetylbenzenecarbothioate Chemical compound C(C)(=O)C1=CC=C(C(SC2=CC=CC=C2)=O)C=C1 VOERVJPUXVEQIG-UHFFFAOYSA-N 0.000 description 1
- 229920002125 Sokalan® Polymers 0.000 description 1
- 235000002597 Solanum melongena Nutrition 0.000 description 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
- OKKRPWIIYQTPQF-UHFFFAOYSA-N Trimethylolpropane trimethacrylate Chemical compound CC(=C)C(=O)OCC(CC)(COC(=O)C(C)=C)COC(=O)C(C)=C OKKRPWIIYQTPQF-UHFFFAOYSA-N 0.000 description 1
- GQPVFBDWIUVLHG-UHFFFAOYSA-N [2,2-bis(hydroxymethyl)-3-(2-methylprop-2-enoyloxy)propyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(CO)(CO)COC(=O)C(C)=C GQPVFBDWIUVLHG-UHFFFAOYSA-N 0.000 description 1
- CQHKDHVZYZUZMJ-UHFFFAOYSA-N [2,2-bis(hydroxymethyl)-3-prop-2-enoyloxypropyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(CO)COC(=O)C=C CQHKDHVZYZUZMJ-UHFFFAOYSA-N 0.000 description 1
- UKMBKKFLJMFCSA-UHFFFAOYSA-N [3-hydroxy-2-(2-methylprop-2-enoyloxy)propyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(CO)OC(=O)C(C)=C UKMBKKFLJMFCSA-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000001110 calcium chloride Substances 0.000 description 1
- 229910001628 calcium chloride Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 125000004386 diacrylate group Chemical group 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- YQGOJNYOYNNSMM-UHFFFAOYSA-N eosin Chemical compound [Na+].OC(=O)C1=CC=CC=C1C1=C2C=C(Br)C(=O)C(Br)=C2OC2=C(Br)C(O)=C(Br)C=C21 YQGOJNYOYNNSMM-UHFFFAOYSA-N 0.000 description 1
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Chemical compound CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000000499 gel Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229940107698 malachite green Drugs 0.000 description 1
- FDZZZRQASAIRJF-UHFFFAOYSA-M malachite green Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC=CC=1)=C1C=CC(=[N+](C)C)C=C1 FDZZZRQASAIRJF-UHFFFAOYSA-M 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- 229920003145 methacrylic acid copolymer Polymers 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 229960000907 methylthioninium chloride Drugs 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- ZIUHHBKFKCYYJD-UHFFFAOYSA-N n,n'-methylenebisacrylamide Chemical compound C=CC(=O)NCNC(=O)C=C ZIUHHBKFKCYYJD-UHFFFAOYSA-N 0.000 description 1
- UTSYWKJYFPPRAP-UHFFFAOYSA-N n-(butoxymethyl)prop-2-enamide Chemical compound CCCCOCNC(=O)C=C UTSYWKJYFPPRAP-UHFFFAOYSA-N 0.000 description 1
- DNTMQTKDNSEIFO-UHFFFAOYSA-N n-(hydroxymethyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NCO DNTMQTKDNSEIFO-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- MSYFVTLZGPOXGM-UHFFFAOYSA-N octa-2,6-dienediamide Chemical compound NC(=O)C=CCCC=CC(N)=O MSYFVTLZGPOXGM-UHFFFAOYSA-N 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- YMZBNSJYRHGXNX-UHFFFAOYSA-N phenyl 2-thiophen-2-ylbenzoate Chemical compound C=1C=CC=C(C=2SC=CC=2)C=1C(=O)OC1=CC=CC=C1 YMZBNSJYRHGXNX-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 238000000016 photochemical curing Methods 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920001495 poly(sodium acrylate) polymer Polymers 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920005650 polypropylene glycol diacrylate Polymers 0.000 description 1
- 229920005651 polypropylene glycol dimethacrylate Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- 239000005297 pyrex Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229930187593 rose bengal Natural products 0.000 description 1
- 229940081623 rose bengal Drugs 0.000 description 1
- STRXNPAVPKGJQR-UHFFFAOYSA-N rose bengal A Natural products O1C(=O)C(C(=CC=C2Cl)Cl)=C2C21C1=CC(I)=C(O)C(I)=C1OC1=C(I)C(O)=C(I)C=C21 STRXNPAVPKGJQR-UHFFFAOYSA-N 0.000 description 1
- CNQPAWYPGVRINI-UHFFFAOYSA-N s-phenyl 4-benzoylbenzenecarbothioate Chemical compound C=1C=C(C(=O)C=2C=CC=CC=2)C=CC=1C(=O)SC1=CC=CC=C1 CNQPAWYPGVRINI-UHFFFAOYSA-N 0.000 description 1
- NNMHYFLPFNGQFZ-UHFFFAOYSA-M sodium polyacrylate Chemical compound [Na+].[O-]C(=O)C=C NNMHYFLPFNGQFZ-UHFFFAOYSA-M 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Polymerisation Methods In General (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用針l!P)
本発明は新規な光重合開始剤およびこれを配合した光重
合性組成物に関する。DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Needle I!P) The present invention relates to a novel photopolymerization initiator and a photopolymerizable composition containing the same.
(従来の技術)
光重合性の組成物は、光照射により重合・便化し、水ま
たは種々の溶媒に不溶化するという性質をaしているた
めに、樹脂凸版、平版印刷板等の印刷製版材料をはじめ
、ドライフィルムレジスト、マイクロリソグラフィー用
レジスト、UV硬化塗料、UV硬化インキ等に広く利用
されている。これらの光重合性組成物は光重合開始剤と
重合性モノマーとの組合せにより得られる。(Prior Art) Photopolymerizable compositions have the property of polymerizing and faecesizing when irradiated with light and becoming insoluble in water or various solvents, so they are used as printing plate-making materials such as resin letterpress plates and lithographic printing plates. It is widely used in dry film resists, microlithography resists, UV curing paints, UV curing inks, etc. These photopolymerizable compositions are obtained by combining a photopolymerization initiator and a polymerizable monomer.
(発明が解決しようとする問題点)
実用価値の高い光重合性組成物を得るための課題として
は、光重合収率の向上が挙げられる。この課題を解決す
るためには、種々のアプローチが考えられるが光重合開
始剤の性能を向上させることによって、光重合収率の向
上を図るのが適している。(Problems to be Solved by the Invention) An issue to be solved in order to obtain a photopolymerizable composition with high practical value is to improve the photopolymerization yield. In order to solve this problem, various approaches can be considered, but it is suitable to improve the photopolymerization yield by improving the performance of the photopolymerization initiator.
(問題点を解決するための手段)
従来の光重合開始剤よりも高い光重合収率を示す光重合
開始剤であるチオ安息香酸S−フェニル誘導体および/
あるいはそれを配合した光重合性組成物によって解決し
ようとするものである。(Means for solving the problem) S-phenyl thiobenzoate derivatives and/or photopolymerization initiators exhibiting a higher photopolymerization yield than conventional photopolymerization initiators.
Alternatively, the problem is to be solved by a photopolymerizable composition containing the same.
即ち、本発明の要旨は
^
1<2
5式中、RIは水素、アルキル基(好ましくは炭素数1
〜20)、ハロゲン、ベンゾイル基またはアセチル基を
示し、R2、RoおよびR4は同一または異なって、水
素、アルキル基(好ましくは炭素数1〜20)またはハ
ロゲンを示す。]で表わされる光重合開始剤を提供する
。That is, the gist of the present invention is ^ 1 < 2 In the formula 5, RI is hydrogen, an alkyl group (preferably a carbon number of 1
~20) represents a halogen, a benzoyl group or an acetyl group, and R2, Ro and R4 are the same or different and represent hydrogen, an alkyl group (preferably having 1 to 20 carbon atoms) or a halogen. ] A photopolymerization initiator is provided.
また、本発明は前記光重合開始剤とエチレン性不飽和二
重結合を少なくとも1gI有する化合物とを組合せた光
重合性組成物を提供する。The present invention also provides a photopolymerizable composition comprising a combination of the photopolymerization initiator and a compound having at least 1 gI of ethylenically unsaturated double bonds.
本発明の光重合開始剤(1)は通常以下の反応式に従っ
て得られる:
[式中、R8−R4は前記と同意義、Phはフェニル基
を示す。]
もちろん、上記反応に限定されない。The photopolymerization initiator (1) of the present invention is usually obtained according to the following reaction formula: [In the formula, R8-R4 have the same meanings as above, and Ph represents a phenyl group. ] Of course, the reaction is not limited to the above reaction.
反応は溶媒の存在下、加熱下に行なわれる。溶媒として
は無水アセトニトリルが好適である。得られた生成物は
適当な方法で分離、精製する。The reaction is carried out in the presence of a solvent and under heating. Anhydrous acetonitrile is suitable as the solvent. The obtained product is separated and purified by an appropriate method.
本発明の光重合開始剤は既知のエチレン性不飽和二重結
合を少なくとも1個有する化合物と配合して光重合性組
成物を形成する。The photopolymerization initiator of the present invention is blended with a known compound having at least one ethylenically unsaturated double bond to form a photopolymerizable composition.
エチレン性不飽和二重結合を少なくとも1個有する化合
物としては、メチルアクリレート、エチルアクリレート
、n−プロピルアクリレート、β−ヒドロキシエチルア
クリレート、β−ヒドロキシプロピルアクリレート、ポ
リエチレングリコールモノアクリレート、ポリプロピレ
ングリコールモノアクリレート、フェニルジエチレング
リコールモノアクリレート、ポリこチレングリコールジ
アクリレート、ポリプロピレングリコールジアクリレー
ト、メトキシポリエチレングリコールモノアクリレート
、エトキシポリエチレングリコールモノアクリレート、
グリセロールジアクリレート、ペンタエリスリトールジ
アクリレート、トリメチロールプロパントリアクリレー
ト、テトラメチロールメタンテトラアクリレート、メチ
ルメタクリレート、エチルアクリレート、n−プロピル
メタクリレート、β−ヒドロキシエチルメタクリレート
、β−ヒドロキシプロピルメタクリレート、ポリエチレ
ングリコールモノメタクリレート、ポリプロピレングリ
コールモノメタクリレート、ポリエチレングリコールジ
メタクリレート、ポリプロピレングリコールジメタクリ
レート、メトキシポリエチレングリコールモノメタクリ
レート、エトキシポリエチレングリコールモノメタクリ
レート、グリセロールジメタクリレート、ペンタエリス
リトールジメタクリレート、トリメチロールプロパント
リメタクリレート、テトラメチロールメタンテトラメタ
クリレート、アクリルアミド、N−メヂロールアクリル
アミド、n−ブトキシメチルアクリルアミド、イソブト
キシアクリルアミド、n−p〜ブチルアクリルアミド、
メチレンビス(アクリルアミド)、エチレンビス(アク
リルアミド)、プロピレンビス(アクリルアミド)、メ
タクリルアミド、N−メチロールメタクリルアミド、n
−ブトキシメチルメタクリルアミド、イソブトキシメタ
クリルアミド、n−p−ブチルメタクリルアミド、メチ
レンビス(メタクリルアミド)、エチレンビス(メタク
リルアミド)、プロピレンビス(メタクリルアミド)な
どを挙げることができる。Examples of compounds having at least one ethylenically unsaturated double bond include methyl acrylate, ethyl acrylate, n-propyl acrylate, β-hydroxyethyl acrylate, β-hydroxypropyl acrylate, polyethylene glycol monoacrylate, polypropylene glycol monoacrylate, phenyl Diethylene glycol monoacrylate, polyethylene glycol diacrylate, polypropylene glycol diacrylate, methoxypolyethylene glycol monoacrylate, ethoxypolyethylene glycol monoacrylate,
Glycerol diacrylate, pentaerythritol diacrylate, trimethylolpropane triacrylate, tetramethylolmethanetetraacrylate, methyl methacrylate, ethyl acrylate, n-propyl methacrylate, β-hydroxyethyl methacrylate, β-hydroxypropyl methacrylate, polyethylene glycol monomethacrylate, polypropylene Glycol monomethacrylate, polyethylene glycol dimethacrylate, polypropylene glycol dimethacrylate, methoxypolyethylene glycol monomethacrylate, ethoxypolyethylene glycol monomethacrylate, glycerol dimethacrylate, pentaerythritol dimethacrylate, trimethylolpropane trimethacrylate, tetramethylolmethanetetramethacrylate, acrylamide, N - medirollacrylamide, n-butoxymethylacrylamide, isobutoxyacrylamide, n-p~butylacrylamide,
Methylenebis(acrylamide), ethylenebis(acrylamide), propylenebis(acrylamide), methacrylamide, N-methylolmethacrylamide, n
-butoxymethylmethacrylamide, isobutoxymethacrylamide, n-p-butylmethacrylamide, methylenebis(methacrylamide), ethylenebis(methacrylamide), propylenebis(methacrylamide), and the like.
本発明光重合性組成物中の前記光重合開始剤の使用割合
は、前記エチレン性不飽和モノマー100重量部に対し
て0.1〜20重量部、好ましくは0.5〜5重量部で
ある。0,1重量部以下であると、光硬化が十分でなく
、20重量部を越えると、重合体が見掛は上代分子量に
なるので、例えば、十分な硬度が得られなくなる等の欠
点になる。The proportion of the photopolymerization initiator used in the photopolymerizable composition of the present invention is 0.1 to 20 parts by weight, preferably 0.5 to 5 parts by weight, based on 100 parts by weight of the ethylenically unsaturated monomer. . If it is less than 0.1 part by weight, photocuring will not be sufficient, and if it exceeds 20 parts by weight, the polymer will have an apparent upper molecular weight, resulting in disadvantages such as not being able to obtain sufficient hardness. .
上記必須成分に加えて必要に応じて他のポリマー成分、
例えば部分ケン化ポリ酢酸ビニルセルロース誘導体、ポ
リエチレンオキシド、ポリアクリル酸ナトリウム、ポリ
アミドなどを、本発明組成物に加えてもよい。さらに、
ポリアクリル酸アルキルエステル、アクリル酸アルキル
エステルとアクリル酸、メタクリル酸、アクリロニトリ
ル、ブタジェン、スチレン等との共重合体;ポリメタク
リル酸アルキルエステル、メタクリル酸アルキルエステ
ルとアクリル酸、メタクリル酸、アクリロニトリル、ブ
タジェン、スチレン等との共重合体等を加えてもよい。In addition to the above essential components, other polymer components may be added as necessary.
For example, partially saponified polyvinyl acetate cellulose derivatives, polyethylene oxide, sodium polyacrylate, polyamides, etc. may be added to the composition of the invention. moreover,
Polyacrylic acid alkyl ester, copolymer of acrylic acid alkyl ester and acrylic acid, methacrylic acid, acrylonitrile, butadiene, styrene, etc.; polymethacrylic acid alkyl ester, copolymer of methacrylic acid alkyl ester and acrylic acid, methacrylic acid, acrylonitrile, butadiene, A copolymer with styrene or the like may also be added.
これらのポリマー成分は上記エチレン性不飽和モノマー
100重量部に対し0〜1000重量部、好ましくは0
〜200重量部である。These polymer components are contained in an amount of 0 to 1000 parts by weight, preferably 0 to 100 parts by weight of the ethylenically unsaturated monomer.
~200 parts by weight.
さらに、必要に応じ重合禁止剤(例えば2.6−ジーt
−ブチル−p−クレゾール、ハイドロキノン、p−メト
キシフェノール)、染料(例えばローズベンガル、エオ
シン、メチレンブルー、マラカイトグリーン)などが配
合されてもよい。重合禁止剤の配合量は上記エチレン性
不飽和モノマー100重9部に対して0〜5重量部、好
ましくは0〜2重量部であり、染料もしくは顔料の配合
量0〜50重量部、好ましくは0〜20重量部である。Furthermore, if necessary, a polymerization inhibitor (e.g. 2,6-jet
-butyl-p-cresol, hydroquinone, p-methoxyphenol), dyes (for example, rose bengal, eosin, methylene blue, malachite green), etc. may be blended. The blending amount of the polymerization inhibitor is 0 to 5 parts by weight, preferably 0 to 2 parts by weight, based on 100 parts by weight of the above ethylenically unsaturated monomer, and the blending amount of the dye or pigment is 0 to 50 parts by weight, preferably It is 0 to 20 parts by weight.
上記必須成分および任意成分を必要に応じ水や有機溶剤
のような適宜の液体を添加して混和し、光重合性組成物
を得る。The above-mentioned essential components and optional components are mixed by adding an appropriate liquid such as water or an organic solvent as necessary to obtain a photopolymerizable composition.
ここに得られた光重合性組成物はそのまま、または任意
の形状に成形し、UV硬化インキ、UV硬化塗料、印刷
製版材料、ドライフィルムレジスト、マイクロリソグラ
フィー用レジストなどとして使用され得る。The photopolymerizable composition obtained here can be used as it is or after being molded into any shape and used as UV curable ink, UV curable coating material, printing plate material, dry film resist, resist for microlithography, and the like.
本発明の光重合性組成物に適用できる露光光源としては
、高圧水銀灯、中圧水銀灯、キセノンランプ、メタルハ
ライドランプ等の汎用の光源を使用し得る。As an exposure light source that can be applied to the photopolymerizable composition of the present invention, general-purpose light sources such as high-pressure mercury lamps, medium-pressure mercury lamps, xenon lamps, and metal halide lamps can be used.
なお特開昭60−70444号公報には光照射により遊
離ラジカルを放出するものとしてスルホニル基を有する
ケトン化合物が提案されているがこれは着色画像を得る
ことを目的としており、生産性の向上とは無関係である
。Note that JP-A-60-70444 proposes a ketone compound having a sulfonyl group that releases free radicals when irradiated with light, but the purpose of this is to obtain colored images and to improve productivity. is irrelevant.
(実施例) 本発明を実施例により更に詳細に説明する。(Example) The present invention will be explained in more detail with reference to Examples.
合成例1 乾燥した50mQナス形フラスコに安息香酸I。Synthesis example 1 Benzoic acid I in a dry 50 mQ eggplant flask.
224!(0,01mol)、ジフェニルジスルフィド
2゜189(0,01mol)、トリフェニルホスフィ
ン2゜629(0,01mol)を順次加え、続いて無
水アセトニトリル20mQを加える。磁器撹拌子を入れ
、塩化カルシウム乾燥管を付した還流冷却器をとりつけ
、油浴上で一昼夜撹拌還流する。反応後人部分の溶媒を
減圧留去したのち、クロロホルム5xQを加え溶解し、
少量のシリカゲル(約2g)を加える。混合物を減圧に
てクロロホルムを留去しミシリカゲルに吸着させる。シ
リカゲル吸着相をシリカゲルカラム(直径2CIX長さ
25cm)にのせ、石油エーテル(bp40〜60℃)
エチルエーテル(95:5)混合溶媒で展開する。最初
にチオフェノールと未反応のジスルフィド、続いて未反
応のトリフェニルホスフィンが留出する。この時点でエ
チルエーテルの割合を15%まで徐々に増加し、生成物
のフラクションを分取する。溶媒を減圧で留去するとフ
ェニルチオールベンゾエートが得られる。生成物はチオ
安息香酸S−フェニルであった[収量t、03y(理論
値の48%)、融点52〜54℃]。NMRCCDCQ
2.δ):8.0〜7.9(m。224! (0.01 mol), diphenyl disulfide 2°189 (0.01 mol), and triphenylphosphine 2°629 (0.01 mol) were added in this order, followed by 20 mQ of anhydrous acetonitrile. Insert a magnetic stirrer, attach a reflux condenser with a calcium chloride drying tube, and stir and reflux all day and night on an oil bath. After the reaction, the solvent of the human part was distilled off under reduced pressure, and chloroform 5xQ was added and dissolved.
Add a small amount of silica gel (approximately 2 g). Chloroform was distilled off from the mixture under reduced pressure and adsorbed onto Mysilica gel. The silica gel adsorption phase was placed on a silica gel column (diameter 2CIX length 25cm), and petroleum ether (bp 40-60℃) was added.
Develop with a mixed solvent of ethyl ether (95:5). First, thiophenol and unreacted disulfide are distilled off, followed by unreacted triphenylphosphine. At this point, the proportion of ethyl ether is gradually increased to 15% and a fraction of the product is separated. The solvent is distilled off under reduced pressure to obtain phenylthiol benzoate. The product was S-phenyl thiobenzoate [yield t, 03y (48% of theory), mp 52-54°C]. NMRCCDCQ
2. δ): 8.0 to 7.9 (m.
2H)、7.5〜7.2(m、8H)
合成例2
合成例1と同様にして4−ブロモ安息香酸2゜029(
0,01moり、ジフェニルジスルフィド2゜189(
0、01mol)、トリフェニルホスフィン2゜62g
(0,01mol)を用いて4−ブロモチオ安い、呑酸
S−フェニルを製造した[収Ei10.46g(理論値
の16%)、融点96〜98°C]。NMR(CDCQ
3、δ)+ 7 、65 (dd、 4 If)、7.
35(bs、 5合成例3
合成例1と同様にして3.4−ジクロロ安息香酸1.9
2g(0,01mol)、ジフェニルジスルフィド2.
181?(0,01mol)、トリフェニルホスフィン
2.G 29(0,01mol)を用いて3.4−ジク
ロロチオ安息香酸S−フェニルを製造した[収量1゜5
0g(’、理論値の53%)、融点88〜9.1’C]
。2H), 7.5-7.2 (m, 8H) Synthesis Example 2 In the same manner as in Synthesis Example 1, 4-bromobenzoic acid 2°029(
0.01mol, diphenyl disulfide 2゜189(
0.01mol), triphenylphosphine 2゜62g
(0.01 mol) was used to produce 4-bromothio-cheap S-phenyl phosphate [Yield Ei 10.46 g (16% of theory), melting point 96-98°C]. NMR (CDCQ
3, δ) + 7, 65 (dd, 4 If), 7.
35 (bs, 5 Synthesis Example 3 3.4-dichlorobenzoic acid 1.9 in the same manner as Synthesis Example 1)
2g (0.01 mol), diphenyl disulfide 2.
181? (0.01 mol), triphenylphosphine 2. S-phenyl 3,4-dichlorothiobenzoate was produced using G29 (0.01 mol) [yield 1°5
0g (', 53% of theory), melting point 88-9.1'C]
.
NMR(CDC(!3.δ): 8.0〜7.53(m
、3■)、7 、li O(bs、 5 F−1)合
成例4
合成例Iと同様にして4−ベンゾイル安息香酸2.26
g(0,01mol)、ジフェニルジスルフィド2.1
8g(0,01moL)、トリフェニルホスフィン2
、629(0,01mol)を用いて4−ベンゾイルチ
オ安息香酸S−フェニルを製造した[収ff11.of
3g(理論値の33%)、融点tot、o〜I O2,
5℃]。N M n (CD CQ 3.δ); 7.
9(dd、 41−D、7.7Cm、2H)、7.48
(m、 3 H)、7.38(bs。NMR (CDC(!3.δ): 8.0-7.53(m
,3■),7,liO(bs,5F-1) Synthesis Example 4 4-benzoylbenzoic acid 2.26 was prepared in the same manner as in Synthesis Example I.
g (0.01 mol), diphenyl disulfide 2.1
8g (0.01mol), triphenylphosphine 2
, 629 (0.01 mol) was used to produce S-phenyl 4-benzoylthiobenzoate [Collection ff11. of
3 g (33% of theory), melting point tot, o~I O2,
5℃]. N M n (CD CQ 3.δ); 7.
9 (dd, 41-D, 7.7Cm, 2H), 7.48
(m, 3H), 7.38 (bs.
5t() 合成例5 合成例1と同様にして4−アセチル安ロ、呑酸!。5t() Synthesis example 5 In the same manner as in Synthesis Example 1, 4-acetyl ammonium, nitric acid! .
64g(0,01mol)、ジフェニルジスルフィド2
゜18g(0,01mol)、トリフェニルホスフィン
2゜62g(0,01mol)を用いて4−アセチルチ
オ安息香酸S−フェニルを製造した[収ff10.99
(理論値の35%)、融点114.5〜115.5tコ
。NMR(CDCQ3.δ); 7 、95 (bs、
4 H)、7.45(bs、5H)、2.60(s、
3H)合成例6
合成例1と同様にして安息香酸1.22g(0,Olm
ol)、ビス(4−オクチルフェニル)ジスルフィド4
.42g(0,01mol)、トリフェニルホスフィン
2.62g(0,01mol)を用いて4−オクチルフ
ェニルチオベンゾエートを製造した[収f11.31g
(理論値の’40%)、融点43〜44℃]。NMR(
CDCffs、δ); 0,9(t、3H)、1.2〜
1.8(m。64g (0.01mol), diphenyl disulfide 2
S-phenyl 4-acetylthiobenzoate was produced using 18 g (0.01 mol) of triphenylphosphine and 2.62 g (0.01 mol) of triphenylphosphine [yield 10.99
(35% of theoretical value), melting point 114.5-115.5t. NMR (CDCQ3.δ); 7, 95 (bs,
4 H), 7.45 (bs, 5H), 2.60 (s,
3H) Synthesis Example 6 In the same manner as in Synthesis Example 1, 1.22 g of benzoic acid (0, Olm
ol), bis(4-octylphenyl) disulfide 4
.. 42 g (0.01 mol) and triphenylphosphine 2.62 g (0.01 mol) were used to produce 4-octylphenylthiobenzoate [Yield: 11.31 g
('40% of theory), melting point 43-44°C]. NMR (
CDCffs, δ); 0,9(t,3H), 1.2~
1.8 (m.
120)、2.64(t、2T、I)、7.2〜7.6
(m。120), 2.64 (t, 2T, I), 7.2-7.6
(m.
7tl)、s、o(a、2rO
実施例1〜5
合成例1〜5で得たそれぞれの化合物について、2−ヒ
ドロキンエチルメタクリレート(三菱レーヨン社製、商
品名ニアクリエステルHO)の5×10−2mo110
.溶液を調製した。次に、この溶液を、それぞれ円筒状
の金属容器(直i15 、5 cm)に3.02入れ、
(30cmの距離から3KW高圧水銀灯で光照射しt二
。被照射物の表面を、幅7x、wのスパーチルで軽く押
さえて、その跡がつかなくなるまで時間(ei化に要す
る時間)を71111定した。その結果を表−1に示す
。7tl), s, o(a, 2rO Examples 1 to 5) For each compound obtained in Synthesis Examples 1 to 5, 5× 10-2mo110
.. A solution was prepared. Next, 3.02 ml of this solution was placed in each cylindrical metal container (vertical i15, 5 cm),
(Irradiate light with a 3KW high-pressure mercury lamp from a distance of 30cm. Lightly press the surface of the object to be irradiated with a spaticle of width 7x, w, and wait for 71111 seconds until no trace remains (time required for EI conversion). The results are shown in Table 1.
表−1
及皇鯉1
合成例6で得た4−n−オクチルフェニルチオベンゾエ
ートを用いて実施例1〜5と同様の方法で硬化時間を測
定したところ60秒であった。なお、硬化物は白濁して
いた。Table 1 Koi Koi 1 Using 4-n-octylphenylthiobenzoate obtained in Synthesis Example 6, the curing time was measured in the same manner as in Examples 1 to 5, and it was 60 seconds. Note that the cured product was cloudy.
実施例7
4−n−ブチルフェニルチオベンゾエートを用いて実施
例1〜5と同様の方法で硬化時間を測定したところ60
秒であった。Example 7 Curing time was measured in the same manner as Examples 1 to 5 using 4-n-butylphenylthiobenzoate, and the result was 60
It was seconds.
実施例8
フェニルジエチレングリコールモノアクリレート(東亜
合成社製、商品名 アロエックスM−101)2.0+
σをベンゼンlx(!に溶解し、これに合成例4で得た
化合物を溶解して、この化合物のlx 10−’mat
/C溶液を得た。次にこの溶液をパイレックス照射管に
入れ、300W水銀灯によるノリゴーランド光照射器に
よって3分間光照射した。Example 8 Phenyldiethylene glycol monoacrylate (manufactured by Toagosei Co., Ltd., trade name Aroex M-101) 2.0+
Dissolve σ in benzene lx (!) and dissolve the compound obtained in Synthesis Example 4 in this to obtain lx 10-'mat of this compound.
/C solution was obtained. Next, this solution was placed in a Pyrex irradiation tube and irradiated with light for 3 minutes using a Nori-Go-Rand light irradiator using a 300W mercury lamp.
光照射後、メタノールによって硬化物を洗浄し、真空乾
燥した後、硬化物の重量を測定して収率を求めた。同様
にして6分、10分、15分、20分の光照射を行なっ
て収率を求めた。その結果を第1図にΔ点で示す。また
、同条件で、市販の光重合開始剤であるベンゾインモノ
メチルエーテルを用いた場合の結果も第1図に一点で示
す。After light irradiation, the cured product was washed with methanol and vacuum dried, and then the weight of the cured product was measured to determine the yield. Light irradiation was performed for 6 minutes, 10 minutes, 15 minutes, and 20 minutes in the same manner, and the yield was determined. The results are shown in FIG. 1 by points Δ. Furthermore, the results obtained when benzoin monomethyl ether, a commercially available photopolymerization initiator, was used under the same conditions are also shown at one point in FIG.
第1図から明らかなように、本発明による合成例4で得
た化合物は、市販の光重合開始剤と同等の感度を持ち、
さらに高い光重合収率を示すことがわかる。As is clear from FIG. 1, the compound obtained in Synthesis Example 4 according to the present invention has a sensitivity equivalent to that of a commercially available photoinitiator,
It can be seen that the photopolymerization yield is even higher.
(発明の効果)
本発明の光重合開始剤は、市販の開始剤と同等もしくは
それ以上の感度を有し、高い光重合収率を示す。従って
、得られるポリマーの物性値、対溶媒性等を向上さける
ことがてきる。(Effects of the Invention) The photopolymerization initiator of the present invention has a sensitivity equal to or higher than that of commercially available initiators, and exhibits a high photopolymerization yield. Therefore, it is possible to improve the physical properties, solvent resistance, etc. of the obtained polymer.
第1図は実施例8の結果を示すグラフであり、合成例4
の化合物の結果はへ点て、市販のベンゾインモノメチル
エーテルの化合物の結果は一点て示す。FIG. 1 is a graph showing the results of Example 8, and shows the results of Synthesis Example 4.
The results for the compound are shown below, and the results for the commercially available benzoin monomethyl ether compound are shown below.
Claims (1)
イル基またはアセチル基を示し、R_2、R_3および
R_4は同一または異なって、水素、アルキル基または
ハロゲンを示す。]で表わされる光重合開始剤。 2、ハロゲンが塩素または臭素である第1項記載の光重
合開始剤。 3、(a)一般式 ▲数式、化学式、表等があります▼( I ) [式中、R_1は水素、アルキル基、ハロゲン、ベンゾ
イル基またはアセチル基を示し、R_2、R_3および
R_4は同一または異なって、水素、アルキル基または
ハロゲンを示す。]で表わされる光重合開始剤、および (b)エチレン性不飽和二重結合を少なくとも1個を有
する化合物を含有する光重合性組成物。 4、光重合開始剤(a)のハロゲンが塩素または臭素で
ある第3項記載の光重合性組成物。[Claims] 1. General formula ▲ Numerical formula, chemical formula, table, etc. ▼ (I) [In the formula, R_1 represents hydrogen, an alkyl group, a halogen, a benzoyl group, or an acetyl group, and R_2, R_3 and R_4 are Same or different and represent hydrogen, alkyl group or halogen. ] A photopolymerization initiator represented by: 2. The photopolymerization initiator according to item 1, wherein the halogen is chlorine or bromine. 3. (a) General formula ▲ Numerical formula, chemical formula, table, etc. ▼ (I) [In the formula, R_1 represents hydrogen, an alkyl group, a halogen, a benzoyl group, or an acetyl group, and R_2, R_3, and R_4 are the same or different. represents hydrogen, an alkyl group, or a halogen. ]; and (b) a photopolymerizable composition containing a compound having at least one ethylenically unsaturated double bond. 4. The photopolymerizable composition according to item 3, wherein the halogen of the photopolymerization initiator (a) is chlorine or bromine.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61-144296 | 1986-06-19 | ||
JP14429686 | 1986-06-19 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6399201A true JPS6399201A (en) | 1988-04-30 |
JPH0649728B2 JPH0649728B2 (en) | 1994-06-29 |
Family
ID=15358768
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61248139A Expired - Lifetime JPH0649728B2 (en) | 1986-06-19 | 1986-10-17 | Photopolymerization initiator |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0649728B2 (en) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5298789A (en) * | 1976-02-17 | 1977-08-18 | Eastman Kodak Co | Photo curable composition |
-
1986
- 1986-10-17 JP JP61248139A patent/JPH0649728B2/en not_active Expired - Lifetime
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5298789A (en) * | 1976-02-17 | 1977-08-18 | Eastman Kodak Co | Photo curable composition |
Also Published As
Publication number | Publication date |
---|---|
JPH0649728B2 (en) | 1994-06-29 |
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