JPS6398826A - Magnetic medium - Google Patents
Magnetic mediumInfo
- Publication number
- JPS6398826A JPS6398826A JP24380586A JP24380586A JPS6398826A JP S6398826 A JPS6398826 A JP S6398826A JP 24380586 A JP24380586 A JP 24380586A JP 24380586 A JP24380586 A JP 24380586A JP S6398826 A JPS6398826 A JP S6398826A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- electroless plating
- axis
- layer
- easy magnetization
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims abstract description 10
- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 claims 1
- 238000007772 electroless plating Methods 0.000 abstract description 10
- 229910052751 metal Inorganic materials 0.000 abstract description 9
- 239000002184 metal Substances 0.000 abstract description 9
- 230000005415 magnetization Effects 0.000 abstract description 7
- 238000000034 method Methods 0.000 abstract description 7
- 229910052725 zinc Inorganic materials 0.000 abstract description 2
- 239000010408 film Substances 0.000 description 7
- 238000007747 plating Methods 0.000 description 7
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- 239000011701 zinc Substances 0.000 description 3
- 230000004907 flux Effects 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 239000002253 acid Substances 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- QUCZBHXJAUTYHE-UHFFFAOYSA-N gold Chemical compound [Au].[Au] QUCZBHXJAUTYHE-UHFFFAOYSA-N 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 239000006249 magnetic particle Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 102000039446 nucleic acids Human genes 0.000 description 1
- 108020004707 nucleic acids Proteins 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 1
- 238000001637 plasma atomic emission spectroscopy Methods 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 230000007096 poisonous effect Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- -1 zinc nucleic acid Chemical class 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Landscapes
- Magnetic Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は%毒気ディスク装Wに用いられる磁性媒体に関
する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a magnetic medium used in a poisonous disk device W.
近年のコンピュータ装置の高性能化及び、l」1型化に
伴い、磁気記録媒体の線記録密度の高密度化が請求され
ている。そのため媒体の特性としては。2. Description of the Related Art With the recent increase in the performance of computer equipment and the trend toward 1" type, there is a demand for higher linear recording density of magnetic recording media. Therefore, as a characteristic of the medium.
(1) 保磁力が800工ルステツド以上であること
。(1) The coercive force must be 800 degrees or more.
(2)保磁力/残留磁束密度の比が小さいこと。(2) The ratio of coercive force/residual magnetic flux density is small.
(3) 磁性層膜厚が薄いこと。(3) Thin magnetic layer thickness.
などが必要であると云われている。そしてr−フェライ
ト(γ−F6,0. )のような磁性粒子を分散塗布し
た媒体よシも1以上の%性を満足しやすい薄膜媒体が小
型謁容警固定型磁気ディスク装置に用いられるようにな
った。又、薄膜媒体の製造方法には無電解めっき法とス
パッタリング法などがあるが、大量に均一特性で媒体が
製造できる点で無電解めっき法が主に用いられている。It is said that these are necessary. Furthermore, thin film media that easily satisfy a % property of 1 or more, such as media coated with dispersed magnetic particles such as r-ferrite (γ-F6, 0.), are being used in small fixed-type magnetic disk drives. Became. Further, methods for producing thin film media include electroless plating and sputtering, but electroless plating is mainly used because media can be produced in large quantities with uniform properties.
しかし無電解めっき法は、媒体表面に均一な磁性層を形
成することができるため、磁性金属の磁化容易軸が無秩
序になり、靭記録方向に明らかに配向された磁気記録媒
体に比べて出力が劣るという問題点がある。そして、無
電解めっき法で磁化容易軸を配向させるためには、基板
上に倣細な凹凸ft構成させる必要があるが、N1−P
のような自己触媒作用のある金属でも、表面に6& i
i’411な凹凸全構成させる工程を通すと、表面に酸
化金属層が形成される。However, since the electroless plating method can form a uniform magnetic layer on the medium surface, the axis of easy magnetization of the magnetic metal becomes disordered, resulting in a lower output compared to a magnetic recording medium that is clearly oriented in the tough recording direction. There is a problem that it is inferior. In order to orient the axis of easy magnetization using the electroless plating method, it is necessary to form fine irregularities ft on the substrate, but N1-P
Even metals with autocatalytic properties such as 6&i
A metal oxide layer is formed on the surface through the step of forming all i'411 irregularities.
この層は非常に触媒性が弱く、磁性めっき皮膜のように
自己触媒作用の弱い合金を析出させるためには、酸化金
属層をエツチングするか、その北に活性金属を形成させ
る心壁がある。しかしこの酸化層の耐食性が強いので、
均一にエツチングする方法がなく、エツチングできても
表面粗さが悪くなり、実際小型固定式EB勿ディスク装
置に搭載した場合、ヘッドが浮上しないという問題点が
ある。This layer has very weak catalytic properties, and in order to deposit a weakly autocatalytic alloy such as a magnetic plating film, the metal oxide layer must be etched or there is a core wall north of it on which the active metal is formed. However, since this oxide layer has strong corrosion resistance,
There is no method for uniformly etching, and even if it can be etched, the surface roughness will be poor, and when it is actually installed in a small fixed EB disk device, there is a problem that the head will not fly.
−万歳化層を除去せずその上にパラジウム(Pd)のよ
うな活性な金属を吸着析出させ、磁性層を形成させる場
合、活性な金属層の膜厚が厚くなると凹凸方向への配向
が見られなくなり、又、活性な金)J4層の膜厚を薄く
すると配向けするが、磁性めっきが均一に形成されず欠
陥が発生しミッシングビット数が増加するという問題点
を有する。- When forming a magnetic layer by adsorbing and precipitating an active metal such as palladium (Pd) on top of the Banzai layer without removing it, as the thickness of the active metal layer becomes thicker, the orientation in the uneven direction is observed. In addition, if the thickness of the active gold (gold) J4 layer is made thinner, the magnetic plating is not formed uniformly, causing defects and increasing the number of missing bits.
そこで本発明は以上の問題点を解決するものでその目的
は、磁性全縮の磁化容易軸を無電解めっき法で線記録方
向に配向させるこ上により再生両力をとげることである
。SUMMARY OF THE INVENTION The present invention is intended to solve the above-mentioned problems, and its purpose is to increase the reproducing power by orienting the axis of easy magnetization of fully compressed magnetic material in the linear recording direction by electroless plating.
本発明の磁性媒体は、非磁性基板上にznを3wt%以
上含有するu6−Z71−P層を形成させ。In the magnetic medium of the present invention, a u6-Z71-P layer containing 3 wt% or more of Zn is formed on a nonmagnetic substrate.
その上にRWZ が0.08〜0.20踊の微細な凹
凸を表面に構成したこと?特徴とする。On top of that, RWZ has formed minute irregularities of 0.08 to 0.20 degrees on the surface? Features.
u6−Zn−P膜に含まれるznの含有率は3wtチ以
とが望ましいが、これ以下の場合。磁性層を直接析出さ
せるためにRd活性化処顆が心安になる。The content of zn contained in the u6-Zn-P film is preferably 3 wt or more, but if it is less than this. Since the magnetic layer is directly deposited, Rd activation treatment is safe.
その結果、配向が見られなくな9.均一にm性層が析出
しなくなる。又、微細な凹凸をつけた基板OR’m1L
Zは0.08〜0.20μmが望ましいが、これ以下の
場合、基板は鏡面に近づき磁性金属の磁化容易軸の配向
が見られなくなる。As a result, no orientation can be seen9. The m-type layer no longer precipitates uniformly. In addition, the substrate OR'm1L with fine irregularities
Desirably, Z is 0.08 to 0.20 μm, but if it is less than this, the substrate approaches a mirror surface and the orientation of the axis of easy magnetization of the magnetic metal is no longer observed.
又%ktnuxzが0.20踊以上になると、小型IM
定式磁気ディスク装置に搭載したときに、ヘッドが浮上
しない1以上の理由で上述の範囲が望ましいのである。Also, when %ktnuxz becomes 0.20 or more, small IM
The above range is desirable for one or more reasons that the head will not fly when mounted on a formal magnetic disk drive.
鏡面仕とげ?した円形の非磁性基板上に第1表に示した
yz−Zn−P、無電解めっき液で100OAめっきし
た後、す1000.≠2000*す3000 、+60
00の研磨テープで微細な凹凸をつけ、その直後に第2
表に示した無電解C(、−N z −Pめっき液で磁性
媒体を製造したお第1表
めっき条件:pH9,0,浴温度85℃第 2
表
めりき条件: p H9,0、浴温度70℃〔比較列〕
鏡面仕とげをした非磁性基板上に、実施夕11の第1表
中の核酸亜鉛を除いためっき液でN4 p膜を100
01析出させ、ナ2000の研磨テープにより円周方向
に凹凸をつけた。それから塩化パラジウム溶液でPdを
100A、またはMイーPちに第2表のc(、−Nz−
p無電解めっき液でm性層を形成さぎ磁性媒体を装面し
た。Mirror finish? After plating yz-Zn-P shown in Table 1 on a circular non-magnetic substrate with an electroless plating solution of 100 OA, ≠2000*su3000, +60
00 abrasive tape, and immediately after that, the second
A magnetic medium was produced using the electroless C(-Nz-P) plating solution shown in Table 1. Plating conditions: pH 9.0, bath temperature 85°C.
Surface plating conditions: pH 9.0, bath temperature 70°C [Comparison row] On a non-magnetic substrate with a mirror finish, an N4p film was formed using the plating solution listed in Table 1 of Example 11 except for the zinc nucleic acid. 100
01 was deposited, and irregularities were made in the circumferential direction using a polishing tape of Na2000. Then, add Pd to 100A with palladium chloride solution, or MieP, c(, -Nz-
A m-type layer was formed using a p-electroless plating solution, and then a magnetic medium was mounted.
以上の方法で製造したHa媒体のN5−Zn−P皮膜中
のZ n含有率は、酸に溶解した皮膜をプラズマ発光分
析法により分析L/%又、表面粗さは触針径2.5βr
ルのメリサーフにより円心方向に測定した。配向性は円
周方向と円心方向のm性1時性を振動試料既−力計によ
り残留磁束密度(Bτ)と膜厚(δ)の積であるBr、
δと保磁力(HC)?へ1]定した。又、置注媒体の浮
上特注及び出力は、サーテイファイヤ−を用い、ギャッ
プ幅19μm、ギャップ長I A m 、ターン故22
ターンのヘッドによ#)%半径2.5−の位置に2,5
MI(zの周波数の信号を古き込み、その出力を読み
取り、又、ミッシングビット数も測定した。The Zn content in the N5-Zn-P film of the Ha medium produced by the above method was determined by analyzing the film dissolved in acid by plasma emission spectrometry (L/%), and the surface roughness was determined using a stylus diameter of 2.5βr.
Measurements were made in the direction of the center of the circle using Merisurf. The orientation is determined by measuring the monochronicity in the circumferential direction and the center direction using a vibrating sample force meter, which is the product of the residual magnetic flux density (Bτ) and the film thickness (δ).
δ and coercive force (HC)? 1] was established. In addition, for the floating customization and output of the placed medium, a certifier is used, with a gap width of 19 μm, a gap length I A m, and a turn width of 22 μm.
At the head of the turn #)% radius 2.5 - 2,5
The signal at the frequency of MI (z) was read and the output was read, and the number of missing bits was also measured.
以上の方法で測定し7た結果を第3表及び第4表に示す
。The results measured using the above method are shown in Tables 3 and 4.
以上のように%Z x f 3 w t%以主1含有る
Ni−23−Pを用いれば微細な凹凸を溝成した麦でも
、その土に磁性めっきが容易に析出し、又、その表面粗
さのR用xが0.01〜0.05μmの範囲内で浮と特
性が安定で配向aがある再生出力の高い媒体が!8!造
できた。As mentioned above, if Ni-23-P containing % Z If the roughness R x is within the range of 0.01 to 0.05 μm, there is a medium with stable characteristics and orientation a that has high reproduction output! 8! I was able to build it.
本発明はN1−Z%−P皮膜と微細な凹凸を非磁性基板
上に構成したので、再生出力の高い媒体が製造すること
が可能になった。In the present invention, since the N1-Z%-P film and fine irregularities are formed on a nonmagnetic substrate, it is possible to manufacture a medium with high reproduction output.
以 上 出願人 セイコーエプソン株式会社 代理人 弁理士最 上 に務他1名 (・that's all Applicant: Seiko Epson Corporation Agent: Patent attorney Mogami and 1 other person (・
Claims (1)
%)以上含有するニッケル−亜鉛−リン(Ni−Zn−
P)層を形成させ、その上に最大粗さ、(R_m_a_
x)0.08〜0.20μmの微細な凹凸を表面に構成
したことを特徴とする磁性媒体。3 weight percent (Wt) of zinc (Zn) on a non-magnetic substrate
%) or more of nickel-zinc-phosphorous (Ni-Zn-
P) form a layer on which the maximum roughness, (R_m_a_
x) A magnetic medium characterized by having fine irregularities of 0.08 to 0.20 μm formed on its surface.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24380586A JPS6398826A (en) | 1986-10-14 | 1986-10-14 | Magnetic medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24380586A JPS6398826A (en) | 1986-10-14 | 1986-10-14 | Magnetic medium |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6398826A true JPS6398826A (en) | 1988-04-30 |
Family
ID=17109200
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP24380586A Pending JPS6398826A (en) | 1986-10-14 | 1986-10-14 | Magnetic medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6398826A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5280401A (en) * | 1990-11-26 | 1994-01-18 | Hitachi, Ltd. | Magnetic recording medium, method for producing same and magnetic recording apparatus |
-
1986
- 1986-10-14 JP JP24380586A patent/JPS6398826A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5280401A (en) * | 1990-11-26 | 1994-01-18 | Hitachi, Ltd. | Magnetic recording medium, method for producing same and magnetic recording apparatus |
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