JPS6398628U - - Google Patents
Info
- Publication number
- JPS6398628U JPS6398628U JP19370986U JP19370986U JPS6398628U JP S6398628 U JPS6398628 U JP S6398628U JP 19370986 U JP19370986 U JP 19370986U JP 19370986 U JP19370986 U JP 19370986U JP S6398628 U JPS6398628 U JP S6398628U
- Authority
- JP
- Japan
- Prior art keywords
- slit
- substrate
- electron beam
- apertures
- beam lithography
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims description 9
- 238000000609 electron-beam lithography Methods 0.000 claims description 3
- 238000010586 diagram Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
Landscapes
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986193709U JPH0644092Y2 (ja) | 1986-12-18 | 1986-12-18 | 電子ビ−ム描画装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986193709U JPH0644092Y2 (ja) | 1986-12-18 | 1986-12-18 | 電子ビ−ム描画装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6398628U true JPS6398628U (en, 2012) | 1988-06-25 |
| JPH0644092Y2 JPH0644092Y2 (ja) | 1994-11-14 |
Family
ID=31149987
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1986193709U Expired - Lifetime JPH0644092Y2 (ja) | 1986-12-18 | 1986-12-18 | 電子ビ−ム描画装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0644092Y2 (en, 2012) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53143175A (en) * | 1977-05-20 | 1978-12-13 | Hitachi Ltd | Electron beam drawing apparatus |
| JPS59111326A (ja) * | 1982-12-17 | 1984-06-27 | Hitachi Ltd | 電子ビ−ム整形用アパ−チヤマスク |
-
1986
- 1986-12-18 JP JP1986193709U patent/JPH0644092Y2/ja not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53143175A (en) * | 1977-05-20 | 1978-12-13 | Hitachi Ltd | Electron beam drawing apparatus |
| JPS59111326A (ja) * | 1982-12-17 | 1984-06-27 | Hitachi Ltd | 電子ビ−ム整形用アパ−チヤマスク |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0644092Y2 (ja) | 1994-11-14 |