JPS6396725A - Magnetic memory body - Google Patents
Magnetic memory bodyInfo
- Publication number
- JPS6396725A JPS6396725A JP24239486A JP24239486A JPS6396725A JP S6396725 A JPS6396725 A JP S6396725A JP 24239486 A JP24239486 A JP 24239486A JP 24239486 A JP24239486 A JP 24239486A JP S6396725 A JPS6396725 A JP S6396725A
- Authority
- JP
- Japan
- Prior art keywords
- coated
- cured film
- film
- denotes
- formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 13
- 229910052751 metal Inorganic materials 0.000 claims abstract description 24
- 239000002184 metal Substances 0.000 claims abstract description 22
- 239000000203 mixture Substances 0.000 claims abstract description 10
- 150000003839 salts Chemical class 0.000 claims abstract description 10
- 239000000758 substrate Substances 0.000 claims abstract description 7
- 235000014113 dietary fatty acids Nutrition 0.000 claims abstract description 4
- 229930195729 fatty acid Natural products 0.000 claims abstract description 4
- 239000000194 fatty acid Substances 0.000 claims abstract description 4
- 150000004665 fatty acids Chemical class 0.000 claims abstract description 4
- 229910052735 hafnium Inorganic materials 0.000 claims abstract description 4
- 229910052758 niobium Inorganic materials 0.000 claims abstract description 4
- 229910052715 tantalum Inorganic materials 0.000 claims abstract description 4
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 3
- 239000001257 hydrogen Chemical group 0.000 claims abstract description 3
- 229910052739 hydrogen Chemical group 0.000 claims abstract description 3
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical group [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract 2
- 229910052726 zirconium Inorganic materials 0.000 claims abstract 2
- 239000010408 film Substances 0.000 claims description 19
- 239000000126 substance Substances 0.000 claims description 5
- 239000010409 thin film Substances 0.000 claims description 5
- 125000004432 carbon atom Chemical group C* 0.000 claims description 2
- 238000000576 coating method Methods 0.000 abstract description 8
- 239000011248 coating agent Substances 0.000 abstract description 5
- 230000007797 corrosion Effects 0.000 abstract description 5
- 238000005260 corrosion Methods 0.000 abstract description 5
- 238000010438 heat treatment Methods 0.000 abstract description 5
- 239000002904 solvent Substances 0.000 abstract description 3
- 238000000034 method Methods 0.000 description 7
- 238000007747 plating Methods 0.000 description 5
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 229910000037 hydrogen sulfide Inorganic materials 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 241000208140 Acer Species 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910000714 At alloy Inorganic materials 0.000 description 1
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 1
- 229910018104 Ni-P Inorganic materials 0.000 description 1
- 229910018536 Ni—P Inorganic materials 0.000 description 1
- 229910001096 P alloy Inorganic materials 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- PZPGRFITIJYNEJ-UHFFFAOYSA-N disilane Chemical compound [SiH3][SiH3] PZPGRFITIJYNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 230000005294 ferromagnetic effect Effects 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
Landscapes
- Magnetic Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は磁気記録装置(磁気ディスク装置、磁気ドラム
装置及び磁気テープ装置)に用いられる磁気記憶体C以
下、記憶体と呼ぶ)に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a magnetic storage body C (hereinafter referred to as a storage body) used in a magnetic recording device (a magnetic disk device, a magnetic drum device, and a magnetic tape device).
金属磁性薄膜媒体(以下、金属媒体と呼ぶ)を有する記
憶体に於いては、記録再生ヘッド(以下ヘッドと呼ぶ)
との接触に耐えるだけの充分な機械的信頼性と、水分、
塩素、硫化水素等の腐食環境に充分耐える耐食性が要求
される。In a storage body having a metal magnetic thin film medium (hereinafter referred to as a metal medium), a recording/reproducing head (hereinafter referred to as a head) is used.
sufficient mechanical reliability to withstand contact with moisture,
Corrosion resistance is required to withstand corrosive environments such as chlorine and hydrogen sulfide.
従来より、基体はアルマイト処理やN1−Pメツキ等の
非磁性メッキ処理の後、鏡面化やすじ目面化のための研
摩が施こされたAt合金基板等が用いられ、該基体上に
N i−P 、 N 1−W−P等の非磁性メッキやO
r、Ti等の被覆の有無の後、強磁性金属媒体を被覆し
、更に5iOt(&!Jケイ酸を含む)、AtN、Ti
e、O,MoS。Conventionally, the substrate has been an At alloy substrate that has been subjected to non-magnetic plating treatment such as alumite treatment or N1-P plating, and then has been polished to a mirror or streaky surface. Non-magnetic plating such as i-P, N1-W-P and O
After coating with r, Ti, etc., a ferromagnetic metal medium is coated, and further 5iOt (including &!J silicic acid), AtN, Ti
e, O, MoS.
等の保護膜が被覆される。etc. is coated with a protective film.
上記の記憶体は一応の耐久特性を有し、既に市場に出回
り始めているものの大きな欠点を有している。Although the above-mentioned memory bodies have a certain degree of durability and are already on the market, they have major drawbacks.
上記記憶体を搭載したドライブを40℃、80%RHの
環境下に放置すると記憶体1枚に1.2箇所に腐食点が
発生し、ディフェクトエラーに至る。又記憶体とヘッド
の接触の繰り返しにより、両者間の摩擦係数が増大し、
ついには記憶体回転用スピンドルモーターが停止するス
ティッキング現象に至る。If a drive equipped with the above memory body is left in an environment of 40° C. and 80% RH, corrosion points will occur at 1.2 locations on each memory body, leading to defect errors. Also, due to repeated contact between the storage body and the head, the coefficient of friction between the two increases,
Eventually, a sticking phenomenon occurs in which the spindle motor for rotating the storage body stops.
又、従来の保護膜はスパッタリング法等の真空成膜法の
ため、製造コストが高かりた。Furthermore, since the conventional protective film is formed using a vacuum film forming method such as a sputtering method, the manufacturing cost is high.
従来の技術では、記憶体の金属媒体の耐食性を充分に確
保できず、又記憶体とヘッドとの接触による記憶体とヘ
ッドの物理的劣化及びスティッキング現象という信頼性
の問題点と、製造コストが高価であるという問題点を有
していた。With conventional technology, it is not possible to sufficiently ensure the corrosion resistance of the metal medium of the storage body, and there are reliability problems such as physical deterioration and sticking phenomenon of the storage body and head due to contact between the storage body and head, and manufacturing costs are high. The problem was that it was expensive.
本発明は上記の問題点を解決するものであり、その目的
とするところは、水分、塩素、硫化水素等の環境に対す
る金属媒体の耐食性を飛躍的に向上させるとともに、記
憶体とヘッド間の摩擦係数を大幅に低減させ、記憶体の
機械的信頼性を高めた記憶体を安価に提供するところに
ある。The present invention solves the above problems, and its purpose is to dramatically improve the corrosion resistance of metal media against environments containing moisture, chlorine, hydrogen sulfide, etc., and to reduce the friction between the storage body and the head. The purpose of this invention is to provide, at a low cost, a memory body with significantly reduced coefficients and improved mechanical reliability.
本発明の記憶体は、金属媒体が被覆された基体上に一般
式Aから選ばれる少なくとも1楓と一般式Bから選ばれ
る少なくとも1種との混合物の硬化膜を被覆せしめ、更
に該硬化膜上に脂肪酸と、Li 、NI!L、に、Mg
、Caかう成る少なくとも1種の金属塩が被覆せしめら
れた事を特徴とする〔一般式人〕
ここでRは炭素数が1〜5のアル中ル基或いは水素であ
り、kは2或いは5を、tは0或いは1を、虞は1.2
或いは3を、ルは0゜1或いは2を表わす。In the memory body of the present invention, a cured film of a mixture of at least one maple selected from general formula A and at least one selected from general formula B is coated on a substrate coated with a metal medium, and further on the cured film. fatty acids, Li, NI! L, Ni, Mg
, Ca [General formula] Here, R is an alkyl group having 1 to 5 carbon atoms or hydrogen, and k is 2 or 5. , t is 0 or 1, and t is 1.2
Or 3, le represents 0°1 or 2.
R6−M−(ou)jt
ここでMは、Ti、Ta、Nb、Hf或いはZrであり
、jは前記金属元素の価数を、tは前記同様0或いは1
を表わす。R6-M-(ou)jt Here, M is Ti, Ta, Nb, Hf, or Zr, j is the valence of the metal element, and t is 0 or 1 as above.
represents.
上記の混合物は一般的な有機溶媒、例えばアルコール類
、ケトン類、エステル類、ハロゲン化炭化水素類や芳香
族類に容易に溶解する。得たい膜厚や塗布方法によって
、溶媒、溶解濃度を決める。そして上記溶解液を用い、
スピンナー法、スプレー法、ディッピング法等の既知の
塗布法で記憶体上に塗膜を形成した後、加熱処理により
硬化膜にする。The above mixtures are easily soluble in common organic solvents such as alcohols, ketones, esters, halogenated hydrocarbons and aromatics. Decide the solvent and dissolution concentration depending on the desired film thickness and application method. Then, using the above solution,
A coating film is formed on the memory body by a known coating method such as a spinner method, a spray method, or a dipping method, and then a cured film is formed by heat treatment.
硬化膜の膜厚は2001〜8001が適切であり加熱条
件は、80℃〜230℃、10分〜60分である。混合
比は、一般式Bで表わされる物質をモル比で5%以上、
30%以下が適切である。The thickness of the cured film is preferably 2001 to 8001, and the heating conditions are 80°C to 230°C and 10 minutes to 60 minutes. The mixing ratio is 5% or more of the substance represented by general formula B in terms of molar ratio,
30% or less is appropriate.
次に金属塩も、上記の混合物同様に溶媒に希釈後、既知
の塗布法で被覆すればよいが、加熱処理は不用である。Next, the metal salt may be coated by a known coating method after being diluted in a solvent in the same manner as the above mixture, but heat treatment is not necessary.
又得たい膜厚は20〜2oomで充分である。Further, a desired film thickness of 20 to 2 oom is sufficient.
本発明の構成によれば、金属媒体上に、主骨格が三次元
構造のシ四キサン結合であり、且つ酸素原子を介してT
i、Ta、Nb、Hf原子がほぼ均一に分散した状態で
縮合した硬化膜が被覆される。According to the structure of the present invention, the main skeleton is a si-tetraxane bond with a three-dimensional structure, and T is formed on the metal medium via an oxygen atom.
A cured film in which i, Ta, Nb, and Hf atoms are condensed in a substantially uniformly dispersed state is coated.
該被膜は金属媒体表面の自然酸化層そして/j′戊いは
OH基と強く結合するので、その密着性は良好であり、
上記三次元構造縮合硬化膜の硬度は高く、水分、水蒸気
、塩素ガス等は透過しにくい。Since the coating strongly bonds with the natural oxide layer and /j' or OH groups on the surface of the metal medium, its adhesion is good.
The hardness of the three-dimensional condensation cured film is high, and it is difficult for moisture, water vapor, chlorine gas, etc. to permeate through it.
又該硬化膜と金属塩との親和力は大きく、長期に渡り該
硬化膜上に該金属塩が保持される。Furthermore, the affinity between the cured film and the metal salt is large, and the metal salt is retained on the cured film for a long period of time.
上記の作用を発揮するには、硬化膜形成のための混合物
原料で、一般式Bで表わされる物質がモル比で5%以上
、30%以下が適切である。前記モル比範囲外では、硬
度膜の緻密性、硬度とも不充分となり、耐摩耗性、耐湿
性が低下する。In order to exhibit the above effect, it is appropriate that the substance represented by the general formula B in the mixture raw material for forming a cured film has a molar ratio of 5% or more and 30% or less. Outside the above molar ratio range, both the density and hardness of the hardened film will be insufficient, resulting in decreased abrasion resistance and moisture resistance.
尚、一般式人で表わされる物質の代わりに、5i−(O
R)4や R1−8i −(OR) j−1に代表され
るアルコラード類そして、一般式Bで表わされる物質に
於いて、本発明以外の金属元素のアルコラード類を用い
た場合、得られる硬化膜の硬度、緻密性そして密着性が
いずれも劣り、耐摩耗性、耐湿性が不充分であった。In addition, instead of the substance represented by the general formula, 5i-(O
When using alcoholades represented by R)4 and R1-8i-(OR)j-1, and alcoholades of metal elements other than those of the present invention in the substance represented by general formula B, the resulting hardening The hardness, density, and adhesion of the film were poor, and the abrasion resistance and moisture resistance were insufficient.
本発明の金属塩は、塑性変形流動性に優れる事から、ヘ
ッドと記憶体間の摩擦係数を大幅に低減化する。又−ず
れも融点が100℃以上と高く、ヘッドと記憶体間の摩
擦熱にも、そしてドライブが80℃以上の高温下に放置
された場合でも、特性は侮辱劣化しない。これにより記
憶体の機械的信頼性は大幅に向上した。Since the metal salt of the present invention has excellent plastic deformation fluidity, it significantly reduces the coefficient of friction between the head and the storage body. Furthermore, both have high melting points of 100° C. or higher, and their characteristics do not deteriorate significantly even when subjected to frictional heat between the head and the storage body, or even when the drive is left at a high temperature of 80° C. or higher. This greatly improved the mechanical reliability of the memory.
鏡面仕上げされたディスク状アルミニウム合金基板上に
非磁性N1−P合金メッキを約15μm厚に施こした後
、研摩により表面粗度で[LO2μm以下に表面加工し
、更に0o−Ni−P合金メッキを約0.07μm厚に
施こした。After applying non-magnetic N1-P alloy plating to a thickness of approximately 15 μm on a mirror-finished disk-shaped aluminum alloy substrate, the surface was polished to a surface roughness of 2 μm or less, and further 0o-Ni-P alloy plating was applied. was applied to a thickness of approximately 0.07 μm.
次に第1表に示す材料をダイア0ンE6にα5W/v%
の濃度で溶解した処理液を用い、上・記記憶体を等速引
き上げ法(5〜15 cm / m )によって処理し
た後、180℃で30分間の加温処理により硬化膜を被
覆せしめた。Next, add the materials shown in Table 1 to Diamond E6 at α5W/v%.
The above-described memory body was treated by a constant velocity pulling method (5 to 15 cm/m) using a treatment liquid dissolved at a concentration of , and then coated with a cured film by heating at 180° C. for 30 minutes.
次に同じく第1表に示す金属塩をメタノールとダイアo
ンS −3(Mol比1;1)に、Q、05W/’7%
の濃度で溶解した処理液を用い、上記同様に等速引き上
げ法によって、該金属塩の薄膜を被覆せしめた。Next, mix the metal salts shown in Table 1 with methanol and diaphragm.
In S-3 (Mol ratio 1; 1), Q, 05W/'7%
A thin film of the metal salt was coated using a treatment solution dissolved at a concentration of , using the same speed pulling method as described above.
上記の記憶体の品質評価は下記の方法で行ないその結果
を第2表に示す。The quality of the above-mentioned memory bodies was evaluated by the following method, and the results are shown in Table 2.
aSS耐久試験
aSS動炸前後の外観変化、静摩擦と出力低下率を求め
る。aSS Durability Test Determine the appearance change, static friction, and output reduction rate before and after the aSS explosion.
尚ヘッドは3370ミニモノリシツク、ミニコンポ、薄
膜タイプの3種類を用いた。Three types of heads were used: 3370 mini monolithic, mini component, and thin film type.
耐湿性試験
85℃、80%RHの環境下放置に於いて、放置時間の
経過を追い、ミッシングビット数を測定し、その増加が
認められた時点を寿命と判断した演 2 裏
〔発明の効果〕
高密度記録対応の記憶体として薄膜型記憶体が登場して
久しいが、長期信頼性に対する不安とコスト高であるた
め、その使用は一部に限られていた。Moisture resistance test When the product was left in an environment of 85°C and 80% RH, the number of missing bits was measured as the time passed, and the time when the number of missing bits increased was determined to be the end of the service life. ] Thin-film memory has been around for a long time as a memory compatible with high-density recording, but its use has been limited to some areas due to concerns about long-term reliability and high cost.
本発明によれば、加温湯上で記憶体が用いられても金属
媒体が実用レベルで何等の影響を受けず、又ヘッド材質
を選ぶことなく、−ずれのヘッドに於いても優れた機械
的信頼性を示すので、増々小型化し厳しい環境下でドラ
イブが使用されても記憶体、ヘッドはともに特性が劣下
しない。According to the present invention, the metal medium is not affected in any way at a practical level even when the memory body is used above heated water, and excellent mechanical properties can be achieved even with a misaligned head without having to choose the head material. Since it shows reliability, the characteristics of both the storage body and the head will not deteriorate even if the drive is used in harsh environments as it becomes smaller and smaller.
この様な高密度、高耐久化記憶体を、安価なジシランと
特定金4アルコラード材料及び、金属塩を用いて提供す
る事が可能になった。It has become possible to provide such a high-density, highly durable memory body using inexpensive disilane, a specific gold-4-alcolade material, and a metal salt.
尚本発明は、スパッタディスク、光磁気ディスク、フロ
ッピーディスク及び磁気テープへの適用も可能である。The present invention can also be applied to sputter disks, magneto-optical disks, floppy disks, and magnetic tapes.
Claims (1)
り、kは2或いは3を、lは0或いは1を、mは1、2
或いは3を、nは0、1或いは2を表わす。 〔一般式B〕 Rl−M−(OR)_j_−_l ここでMは、Ti、Ta、Nb、Hf或いはZrであり
、jは前記金属元素の価数を、lは前記同様0或いは1
を表わす。 一般式Aから選ばれる少なくとも1種と、一般式Bから
選ばれる少なくとも1種との混合物の硬化膜を被覆せし
め、更に該硬化膜上に、脂肪酸とLi、Na、K、Mg
、Caから成る少なくとも1種の金属塩が被覆せしめら
れた事を特徴とする磁気記憶体。[Claims] On a substrate coated with a metal magnetic thin film medium, [General formula A] ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ Here, R is an alkyl group having 1 to 3 carbon atoms or hydrogen; , k is 2 or 3, l is 0 or 1, m is 1, 2
Alternatively, n represents 0, 1 or 2. [General formula B] Rl-M-(OR)_j_-_l Here, M is Ti, Ta, Nb, Hf or Zr, j is the valence of the metal element, and l is 0 or 1 as above.
represents. A cured film of a mixture of at least one selected from general formula A and at least one selected from general formula B is coated, and further a fatty acid and Li, Na, K, Mg
, a magnetic memory body coated with at least one kind of metal salt consisting of Ca.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24239486A JPS6396725A (en) | 1986-10-13 | 1986-10-13 | Magnetic memory body |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24239486A JPS6396725A (en) | 1986-10-13 | 1986-10-13 | Magnetic memory body |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6396725A true JPS6396725A (en) | 1988-04-27 |
Family
ID=17088498
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP24239486A Pending JPS6396725A (en) | 1986-10-13 | 1986-10-13 | Magnetic memory body |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6396725A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7379275B2 (en) | 2003-06-27 | 2008-05-27 | Sony Corporation | Magneto-resistive head having a thermally conductive layer |
-
1986
- 1986-10-13 JP JP24239486A patent/JPS6396725A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7379275B2 (en) | 2003-06-27 | 2008-05-27 | Sony Corporation | Magneto-resistive head having a thermally conductive layer |
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