JPH01277319A - Magnetic memory body and production thereof and magnetic memory device - Google Patents

Magnetic memory body and production thereof and magnetic memory device

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Publication number
JPH01277319A
JPH01277319A JP10607188A JP10607188A JPH01277319A JP H01277319 A JPH01277319 A JP H01277319A JP 10607188 A JP10607188 A JP 10607188A JP 10607188 A JP10607188 A JP 10607188A JP H01277319 A JPH01277319 A JP H01277319A
Authority
JP
Japan
Prior art keywords
thin film
forming
magnetic
magnetic memory
carbon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10607188A
Other languages
Japanese (ja)
Inventor
Tetsuo Nakagawa
中川 哲男
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP10607188A priority Critical patent/JPH01277319A/en
Publication of JPH01277319A publication Critical patent/JPH01277319A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To obtain the memory body having excellent long-term mechanical reliability and preservation reliability by covering a thin film consisting of 1 kinds of materials selected from an oxide, nitride, carbide, and carbon formed on a metallic medium with a polyether fluoride polymer having an amino group. CONSTITUTION:The thin film consisting of at least 1 kinds of the materials selected from the oxide, nitride, carbide, and carbon is formed on the magnetic metallic medium. This thin film is coated with the polyether fluoride polymer having the amino group at the terminal of the molecule. The corrosion resistance of the metallic medium in environment of moisture and chlorine, etc., is thereby greatly improved and the coefft. of friction between the memory body and the head is greatly decreased; in addition, the memory body which can maintain such effect over a long period of time and has the excellent reliability is obtd.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は磁気記憶装置(磁気ディスク装置、磁気ドラム
装置及び磁気テープ装置)及び、該磁気記憶装置に用い
られる磁気記憶体(以下、記憶体と呼ぶ)及びその製造
方法に関する。
Detailed Description of the Invention [Field of Industrial Application] The present invention relates to magnetic storage devices (magnetic disk devices, magnetic drum devices, and magnetic tape devices) and magnetic storage bodies (hereinafter referred to as storage bodies) used in the magnetic storage devices. ) and its manufacturing method.

〔従来の技術〕[Conventional technology]

金属磁性媒体(以下、金属媒体と呼ぶ)を有する記憶体
に於いては、記録再生ヘッド(以下、ヘッドと呼ぶ)と
の接触に耐えるだけの充分な機械的信頼性と水分、塩素
等の大食環境に充分耐える耐食性が要求される。
A storage body with a metal magnetic medium (hereinafter referred to as a metal medium) must have sufficient mechanical reliability to withstand contact with a recording/reproducing head (hereinafter referred to as a head) and must be free from moisture, chlorine, etc. Corrosion resistance that can withstand food environments is required.

従来より基板はアルマイト処理やN1−Pメツキ等の非
磁性メツキ処理後、鏡面化やすし日付けのための研磨が
施こされたAj合金基板等が用いられ、次にN1−P、
N1−Cu−P等の非磁性メツキやCr、Bi等の被覆
の有無の後、強磁性金属媒体を被覆し、更に5102 
(ポリケイ酸を含む)、AjN、C,Si3 NaとA
JI 、 Oコの固溶体等の保護膜が被覆され、更にパ
ーフロロポリエーテルに代表される液体潤滑剤や高級ア
ルコールや脂肪酸に代表される固体潤滑剤の薄層が被覆
される。
Conventionally, the substrate used is an Aj alloy substrate, which has been subjected to alumite treatment or non-magnetic plating treatment such as N1-P plating, and then polished for mirror polishing or marking.
After non-magnetic plating such as N1-Cu-P and coating with Cr, Bi, etc., a ferromagnetic metal medium is coated, and then 5102
(including polysilicic acid), AjN, C, Si3 Na and A
A protective film such as a solid solution of JI and O is coated, and a thin layer of a liquid lubricant typified by perfluoropolyether or a solid lubricant typified by higher alcohol or fatty acid is further coated.

上記記憶体は一応の耐久性能を有し、既に市場に出回り
始めているものの大きな欠点を有している。
Although the above-mentioned memory bodies have a certain level of durability and have already begun to appear on the market, they have major drawbacks.

上記記憶体を搭載した磁気記憶装置を40℃80%R,
H,の環境下に放置すると記憶体1枚の1〜2ケ所に方
食点が発生し、ディフェクトエラーに至る。又記憶体と
ヘッドとの接触を繰り返すことにより、両者間の摩擦係
数が増大し、スピンドルモーターがしばしば停止に至っ
た。
A magnetic storage device equipped with the above storage body was heated at 40℃80%R.
If left in an environment of H., galling points will occur in one or two places on one memory body, leading to a defect error. Furthermore, repeated contact between the storage body and the head increased the coefficient of friction between them, often causing the spindle motor to stop.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

従来の技術では、金属媒体の耐食性を充分に確保できず
、又記憶体とヘッド間の機械的信頼性を充分に確保でき
ないという課題を有していた。
Conventional techniques have had the problem of not being able to ensure sufficient corrosion resistance of the metal medium, and not being able to ensure sufficient mechanical reliability between the storage body and the head.

本発明は上記の課題を解決するものであり、その目的と
するところは、水分や塩素等の環境下に於ける金属媒体
の耐食性を飛躍的に向上させるとともに、記憶体とヘッ
ド間の摩擦係数を大幅に低減し、且つその効果を長期に
維持しうる信頼性に優れた記憶体の製造、提供と該記憶
体を用いた磁気記憶装置を提供することにある。
The present invention solves the above problems, and its purpose is to dramatically improve the corrosion resistance of metal media in environments containing moisture and chlorine, and to improve the coefficient of friction between the storage body and the head. It is an object of the present invention to manufacture and provide a highly reliable memory body that can significantly reduce the amount of water and maintain its effect for a long period of time, and to provide a magnetic memory device using the memory body.

〔課題を解決するための手段〕[Means to solve the problem]

本発明は、基体上に金属媒体を形成せしめ、該金属媒体
上に酸化物、窒化物、炭化物及び炭素から選ばれる少な
くとも1種の物質より成る薄膜を形成せしめ、次に加水
分解性基を有するSL、Tt、Zr、Hf、Nb、Ta
の有機金属化合物或いは、分子の一方の末端に加水分解
性基を他方の末端にグリシジル基を有する、Si、Ti
、Zr、Hf、Nb、Taの有機金属化合物或いは、上
述の有機金属化合物の混合物の硬化膜の形成の有無の後
、少なくとも末端にアミル基を有するフッ化ポリエーテ
ル重合体を形成せしめた事を特徴とする特 金属媒体は従来技術と同様の材料、製法によって形成す
る。
The present invention involves forming a metal medium on a substrate, forming a thin film made of at least one substance selected from oxides, nitrides, carbides, and carbon on the metal medium, and then forming a thin film containing a hydrolyzable group. SL, Tt, Zr, Hf, Nb, Ta
organometallic compounds, or Si, Ti, which have a hydrolyzable group at one end of the molecule and a glycidyl group at the other end.
, Zr, Hf, Nb, Ta, or a mixture of the above-mentioned organometallic compounds, after forming a cured film, a fluorinated polyether polymer having at least an amyl group at the end is formed. The characteristic special metal medium is formed using the same materials and manufacturing methods as in the prior art.

酸化物、窒化物、炭化物は、AI、B、Y、Si、’r
i、Zr、Hf、Nb、Ta、Cr、Mo、Wから選ば
れる元素との化合物であり、その混合層、積層は任意で
ある。炭素はグラファイト、ダイヤモンド、アモルファ
スの単独、混合、積層であり、いずれも100〜500
人の膜厚が適切である。
Oxides, nitrides, carbides include AI, B, Y, Si, 'r
It is a compound with an element selected from i, Zr, Hf, Nb, Ta, Cr, Mo, and W, and the mixed layer and lamination thereof are arbitrary. Carbon can be graphite, diamond, or amorphous, either alone, mixed, or laminated, all of which have a carbon content of 100 to 500.
The thickness of the person's skin is appropriate.

上記化合物及び炭素はスパッタリング法、イオンブレー
ティング法等のPVD法やCVD法で形成可能であり、
酸化物は有機金属化合物の塗布、焼成によっても得られ
る。
The above compound and carbon can be formed by a PVD method or a CVD method such as a sputtering method or an ion blating method,
Oxides can also be obtained by coating and firing an organometallic compound.

加水分解性基を有する有機金属化合物は、5t(OH)
a 、Si (OCHs )a 、Ti (OCaH9
)a 、Zr (OC4Hs )4 、Hf (OCa
H@)4 、Nb2  <QCs Hy )s 、Ta
2  (OC2H5)S等であり、又分子の一方の末端
に加水分解性基を他方の末端にグリシジル基を有する有
機金属化合物は ここでMはSi、Ti、Zr、Hf、Nb或いはTaで
あり、Rは炭素数が1〜4のアルキル基又は水素であり
そしてXはMの金属元素の価数である。
The organometallic compound having a hydrolyzable group is 5t(OH)
a, Si (OCHs) a, Ti (OCaH9
)a, Zr (OC4Hs)4, Hf (OCa
H@)4, Nb2 <QCs Hy)s, Ta
2 (OC2H5)S, etc., and an organometallic compound having a hydrolyzable group at one end of the molecule and a glycidyl group at the other end, where M is Si, Ti, Zr, Hf, Nb or Ta. , R is an alkyl group having 1 to 4 carbon atoms or hydrogen, and X is the valence of the metal element M.

に代表される。上述の有機金属化合物は単独或いは混合
され、特にケイ素化合物の場合は弱酸水溶液の添加の有
無の後、アルコール類等の可溶性溶媒に希釈した後、ス
プレー法、スピンナー法、ディッピング法や超音波噴霧
吹き付は法等の既知の製法で塗布し、必要に応じて焼成
する。溶媒希釈の割合は得ない膜厚に応じて適宜決定す
る。又焼成は、50〜200℃、1分〜30分で充分で
あり膜厚は単分子層レベルから100Aが適切である。
represented by. The above-mentioned organometallic compounds may be used alone or in combination, and in particular, in the case of silicon compounds, they may be used with or without the addition of a weak acid aqueous solution, diluted with a soluble solvent such as alcohol, and then subjected to a spray method, a spinner method, a dipping method, or an ultrasonic atomization method. The coating is applied by a known manufacturing method such as the method, and baked if necessary. The ratio of solvent dilution is appropriately determined depending on the desired film thickness. Further, baking at 50 to 200° C. for 1 to 30 minutes is sufficient, and the appropriate film thickness is from the monomolecular layer level to 100 Å.

アミノ基を有するフッ化ポリエーテル重合体はH2N 
 R’  Rf  R’  NH2CHs  R’  
Rf −R’  N H2、ここで、R′はアルキレン
、シクロアルキレン、アロマティックグループそして、
アミノ基、或いは1そしてイミノ基含有アルキレン、シ
クロアルキレン、アロマティックグループ等である。
Fluorinated polyether polymer with amino groups is H2N
R' Rf R' NH2CHs R'
Rf -R' N H2, where R' is alkylene, cycloalkylene, aromatic group, and
These include amino group or 1 and imino group-containing alkylene, cycloalkylene, aromatic group, etc.

又Rfは−CFI−0−(C2FtO)11−(CFI
O)l−CFt−或いCF。
Also, Rf is -CFI-0-(C2FtO)11-(CFI
O) l-CFt- or CF.

は、−CF、−0−(CF−CF、−0h−(CF、O
) 1−CF、−であり、n、mは10以上の整数を表
わす。
are -CF, -0-(CF-CF, -0h-(CF, O
) 1-CF, -, where n and m represent integers of 10 or more.

で表わされる重合体等である。上述のフッ化ポリエーテ
ル重合体は、単独或いは混合し、更には、他の極性基(
−OH基、−COOCHs基、−C00H基、−NCO
基)を有するフッ化ポリエーテル重合体や、無極性基(
7オンブリンz−25、同Z−AM2001等・・・フ
ォンプリンはモンテフルオス社製)を有する7ツ化ポリ
工−テル重合体と混合し、フロン113等の可溶性溶媒
に希釈した後、スプレー法、スピンナー法、ディッピン
グ法や超音波噴霧吹き付は法等の既知の製法で塗布し、
必要に応じて焼成する。
These are polymers represented by: The above-mentioned fluorinated polyether polymers may be used alone or in combination, and may also contain other polar groups (
-OH group, -COOCHs group, -C00H group, -NCO
fluorinated polyether polymers having non-polar groups (
7 Ombrin Z-25, Ombrin Z-AM2001, etc. (Fonpurin is manufactured by Montefluos Co., Ltd.) is mixed with a heptadated polyester polymer, diluted in a soluble solvent such as Freon 113, and then sprayed. Apply using known manufacturing methods such as the spinner method, dipping method, and ultrasonic spraying method.
Bake if necessary.

溶媒希釈の割合は得ない膜厚に応じて適宜決定する。The ratio of solvent dilution is appropriately determined depending on the desired film thickness.

又焼成は50〜150℃、1分〜20分で充分であり、
膜厚は20〜150人が適切である。
Also, baking at 50 to 150°C for 1 to 20 minutes is sufficient.
The appropriate film thickness is 20 to 150 people.

〔作 用〕[For production]

本発明によれば、金属媒体に、硬度、緻密性に優れる酸
化物、窒化物、炭化物及び炭素から選ばれる少なくとも
1種の物質より成る膜厚を形成することにより、ヘッド
の衝撃牽耗からそして環境中の水分や塩素等から金属媒
体を保護する。
According to the present invention, by forming a film thickness of at least one substance selected from oxides, nitrides, carbides, and carbon that is excellent in hardness and density on the metal medium, it is possible to prevent the impact and abrasion of the head. Protects metal media from moisture, chlorine, etc. in the environment.

しかし、上記薄膜は、数100人前後と薄く、ピンホー
ルレスにすることは困難である。又上記薄膜のうち炭素
以外は潤滑性に乏しく、最も優れる炭素膜に於いても、
潤滑性が不十分なため、各種の潤滑剤を薄膜上に積層化
せしめるのが一般的であった。しかしながら、上記の薄
膜と潤滑剤との固着力が弱いため、長期間に及ぶヘッド
と記憶体の接触摩耗により、潤滑剤が徐々に記憶体上か
ら除去され、初期の優れた潤滑効果が失われてしまった
However, the above-mentioned thin film is thin, about several hundred layers, and it is difficult to make it pinhole-free. Also, among the above thin films, materials other than carbon have poor lubricity, and even the most excellent carbon film has
Due to insufficient lubricity, it has been common practice to layer various lubricants on a thin film. However, because the adhesion between the thin film and the lubricant is weak, the lubricant is gradually removed from the memory element due to contact wear between the head and the memory element over a long period of time, and the initial excellent lubrication effect is lost. It happened.

本発明では、上記薄膜上に、少なくともアミノ基を有す
るフッ化ポリエーテル重合体を被覆せしめ°るものであ
る。アミノ基は、酸化物、窒化物、炭化物及び炭素の最
表面の活性基(−OH1−C00H)との親和力が強く
、記憶体上に強く固定化されヘッドの衝撃摩耗によって
記憶体上から除去される事を防ぐ作用がある。
In the present invention, the thin film is coated with a fluorinated polyether polymer having at least an amino group. Amino groups have a strong affinity with the active group (-OH1-C00H) on the outermost surface of oxides, nitrides, carbides, and carbon, and are strongly fixed on the memory body and removed from the memory body by impact abrasion of the head. It has the effect of preventing

更に酸化物、窒化物、炭化物そして炭素から選ばれる少
なくとも1種の物質より成る薄膜上に、加水分解性基や
加水分解性基とグリシジル基を有する有機金属化合物の
硬化膜を形成後、少なくともアミノ基を有するフッ化ポ
リエーテル重合体を被覆せしめるものである。加水分解
性基は、上記薄膜の最表面の活性基と化学結合し、強く
固着するととともに、グリシジル基も同様であるが、ア
ミノ基との化学結合により、上記フッ化ポリエーテル重
合体を記憶体上に更に強く固定化し、ヘッドの衝撃摩耗
によって記憶体上から除去される事を防ぐ。
Furthermore, after forming a cured film of an organometallic compound having a hydrolyzable group or a hydrolyzable group and a glycidyl group on the thin film made of at least one substance selected from oxides, nitrides, carbides, and carbon, at least an amino acid It is coated with a fluorinated polyether polymer having groups. The hydrolyzable group chemically bonds with the active group on the outermost surface of the thin film and firmly adheres to it, and the same goes for the glycidyl group, but due to the chemical bond with the amino group, the fluorinated polyether polymer becomes a memory material. It is more strongly fixed on the top of the memory body to prevent it from being removed from the top of the memory body due to impact wear of the head.

又フッ化ポリエーテル重合体は優れた碗水性を示し、防
錆作用を高める効果があり、上記の理由により、その効
果は長期間に亘り維持される。
In addition, the fluorinated polyether polymer exhibits excellent potability and has the effect of enhancing the rust prevention effect, and for the above-mentioned reasons, this effect is maintained for a long period of time.

以上により長期機械的信頼性及び保存信頼性に優れた記
憶体の製造、提供が可能になり、更に該記憶体を用いる
ことにより磁気記憶装置の信頼性は著るしく向上した。
As described above, it has become possible to manufacture and provide a memory body with excellent long-term mechanical reliability and storage reliability, and furthermore, by using this memory body, the reliability of a magnetic memory device has been significantly improved.

〔実 施 例〕〔Example〕

鏡面仕上げされたディスク状アルミニウム合金基板上に
非磁性N1−P合金メツキを約15μm厚に施こした後
、研磨により表面粗度Ra=70〜120A、Rmex
=700へ1500Aに表面すし目付は加工し、更にC
o−N1−P合金メツキを約0.05μm厚に施こした
After applying non-magnetic N1-P alloy plating to a thickness of about 15 μm on a mirror-finished disk-shaped aluminum alloy substrate, polishing it to a surface roughness of Ra = 70 to 120A, Rmex
= 700 to 1500A, the surface weight is processed, and further C
o-N1-P alloy plating was applied to a thickness of about 0.05 μm.

次にマグネトロンスパッタ装置に上記基板をセットし、
5X10−’torr以下まで排気した後、基板を80
℃まで加熱し、吸着水分の除去後、Arガスを導入し、
5X10−’torrにした後、第1表に示した材料を
ターゲットとして、パワー密度4 W/aaで成膜した
Next, set the above substrate in a magnetron sputtering device,
After evacuation to below 5X10-'torr, the board was
After heating to ℃ and removing adsorbed water, Ar gas was introduced,
After setting the pressure to 5×10 −′ torr, film formation was performed using the materials shown in Table 1 as targets at a power density of 4 W/aa.

次に同じく第1表に示す有機金属化合物をメタノールと
フロン113(混合比1対3体積比)に0.005w/
vχの濃度で溶解し、ディッピング法(10cm/1l
in )で塗布し、その後、110℃で10分間焼成し
た。
Next, the organometallic compound shown in Table 1 was added to methanol and Freon 113 (mixing ratio 1:3 by volume) at 0.005w/
Dissolve at a concentration of vχ and dipping method (10cm/1l)
in) and then baked at 110° C. for 10 minutes.

次に同じく第1表に示すフッ化ポリエーテル重合体をフ
ロン113に0.2w/v%の濃度で溶解し、ディッピ
ング法(10cm/1ain )で塗布し、その後、1
10℃で10分間焼成しな。
Next, the fluorinated polyether polymer shown in Table 1 was dissolved in Freon 113 at a concentration of 0.2 w/v%, and applied by dipping (10 cm/1 ain).
Bake at 10°C for 10 minutes.

第   1   表 A−1:H,N−R’−Rf−R’NH,R’はアルキ
レン分子量 1ifJ200OA−2:  CH,−R
’−Rf−R″−NH,R’はアルキレン分子量 は約
2000B−2:  CHs−R’−Rf−R’−C−
NHI R’はアルキレン分子量 は豹3000尚Rf
は−CF 2 0  (C2F a O)−一(CFO
)、−CF2−である。
1st Table A-1: H,NR'-Rf-R'NH,R' is alkylene molecular weight 1ifJ200OA-2: CH,-R
'-Rf-R''-NH, R' is alkylene molecular weight is approximately 2000B-2: CHs-R'-Rf-R'-C-
NHI R' is alkylene molecular weight is 3000 Rf
-CF20(C2F a O)-1(CFO
), -CF2-.

上記製造方法により作製した記憶体と、3370タイプ
の薄膜ヘッド(フライバイト0.15μm、91/se
c )を用い磁気記憶装置を作製し、下記試験によって
評価した。結果は第2表に示す。
A memory body manufactured by the above manufacturing method and a 3370 type thin film head (fly bite 0.15 μm, 91/se
A magnetic storage device was fabricated using (c) and evaluated by the following tests. The results are shown in Table 2.

(1)C3S耐久試験 C8S動作(立ち上がり、立ち下がり時間10SeC)
前後の外観変化、静摩擦係数と出力の低下率を求める。
(1) C3S durability test C8S operation (rise and fall time 10SeC)
Determine the change in appearance before and after, the coefficient of static friction, and the rate of decrease in output.

(2)耐食性試験 80℃、90%R,H,の環境下に放置して、放置時間
の経過をおって、ミックシングピット数を測定し、その
増加が認められた時点を寿命と判断した。
(2) Corrosion resistance test The product was left in an environment of 80°C and 90% R, H, and after the time had passed, the number of mixing pits was measured, and the time when the number of mixing pits increased was determined to be the end of its service life. .

第     2    表 〔発明の効果〕 高記録密度対応の記憶体としての薄膜型記憶体を用いた
磁気記憶装置が登場して久しいが、長期信頼性に対する
不安からその使用は一部に限られていた。
Table 2 [Effects of the invention] Magnetic storage devices using thin-film storage as a storage medium compatible with high recording densities have been on the market for some time, but their use has been limited to some due to concerns about long-term reliability. .

本発明によれば、加温浮下で記憶体が用いられても金属
媒体は実用的に何等の影響を受けず、又増々硬質化、低
フライハイド化するヘッドを用いての機械的信頼性が高
いので、更に小型化し、厳しい環境下で用いられる磁気
記憶装置に搭載されても、記憶体、ヘッドはともに特性
劣化は、はとんど認められない。
According to the present invention, even if a storage medium is used under heated floating conditions, the metal medium will not be affected in any way in practical terms, and the mechanical reliability will be improved even when using heads that are becoming increasingly hard and have low fly-hide. Because of the high resistance, even if the magnetic storage device is further miniaturized and installed in a magnetic storage device used in harsh environments, no deterioration in the characteristics of either the storage body or the head will be observed.

以上の如く、高記録密度対応の高耐久性記憶体の製造、
提供そして該記憶体を用いることにより信頼性の高い磁
気記憶装置の提供が可能になった。
As described above, manufacturing of highly durable memory bodies compatible with high recording density,
By providing and using the storage body, it has become possible to provide a highly reliable magnetic storage device.

以上 出願人 セイコーエプソン株式会社that's all Applicant: Seiko Epson Corporation

Claims (12)

【特許請求の範囲】[Claims] (1)基体上に金属磁性媒体が被覆され、この金属磁性
媒体上に、酸化物、窒化物、炭化物及び炭素から選ばれ
る少なくとも1種の物質より成る薄膜が被覆され、次に
少なくとも分子の末端にアミノ基を有するフッ化ポリエ
ーテル重合体を被覆せしめた事を特徴とする磁気記憶体
(1) A metal magnetic medium is coated on a substrate, a thin film made of at least one substance selected from oxides, nitrides, carbides, and carbon is coated on the metal magnetic medium, and then at least the terminal ends of molecules are coated. 1. A magnetic memory comprising a fluorinated polyether polymer having an amino group.
(2)酸化物、窒化物、炭化物及び炭素から選ばれる少
なくとも1種の物質より成る薄膜と少なくとも分子の末
端にアミノ基を有するフッ化ポリエーテル重合体の被膜
との間に加水分解性基を有するSi、Ti、Zr、Hf
、Nb、Taの有機金属化合物の少なくとも1種の硬化
膜を形成せしめた事を特徴とする請求項1記載の磁気記
憶体。
(2) A hydrolyzable group is provided between a thin film made of at least one substance selected from oxides, nitrides, carbides, and carbon and a coating of a fluorinated polyether polymer having at least an amino group at the end of the molecule. Si, Ti, Zr, Hf
2. The magnetic memory according to claim 1, further comprising a cured film of at least one of organometallic compounds of , Nb, and Ta.
(3)酸化物、窒化物、炭化物及び炭素から選ばれる少
なくとも1種の物質より成る薄膜と少なくとも分子の末
端にアミノ基を有するフッ化ポリエーテル重合体の被膜
との間に、分子の一方の末端に加水分解性基を他方の末
端にグリシジル基を有するSi、Ti、Zr、Hf、N
b、Taの有機金属化合物の少なくとも1種の硬化膜を
形成せしめた事を特徴とする請求項1記載の磁気記憶体
(3) Between a thin film made of at least one substance selected from oxides, nitrides, carbides, and carbon and a coating of a fluorinated polyether polymer having at least an amino group at the end of the molecule, one of the molecules is Si, Ti, Zr, Hf, N having a hydrolyzable group at one end and a glycidyl group at the other end
2. The magnetic memory according to claim 1, further comprising a cured film of at least one organometallic compound of Ta.
(4)酸化物、窒化物、炭化物及び炭素から選ばれる少
なくとも1種の物質より成る薄膜と少なくとも分子の末
端にアミノ基を有するフッ化ポリエーテル重合体の被膜
との間に、請求項2記載の有機金属化合物と請求項3記
載の有機金属化合物の混合物の硬化膜を形成せしめた事
を特徴とする請求項1記載の磁気記憶体。
(4) between a thin film made of at least one substance selected from oxides, nitrides, carbides, and carbon and a coating of a fluorinated polyether polymer having at least an amino group at the end of the molecule; 4. The magnetic memory according to claim 1, wherein a cured film is formed of a mixture of the organometallic compound and the organometallic compound according to claim 3.
(5)基体上に金属磁性媒体の被膜を形成させる工程、
金属磁性媒体上に酸化物、窒化物、炭化物及び炭素から
選ばれる少なくとも1種の物質より成る薄膜を形成させ
る工程、そして該薄膜上に、少なくとも分子の末端にア
ミノ基を有するフッ化ポリエーテル重合体の被膜を形成
させる工程による事を特徴とする磁気記憶体の製造方法
(5) forming a film of metal magnetic medium on the substrate;
A step of forming a thin film made of at least one substance selected from oxides, nitrides, carbides, and carbon on a metal magnetic medium, and adding a fluorinated polyether polymer having an amino group at least at the end of the molecule on the thin film. A method for producing a magnetic memory, characterized by a step of forming a coalescing film.
(6)該薄膜を形成させる工程と、該フッ化ポリエーテ
ル重合体の被膜を形成させる工程との間に、第2項記載
の有機金属化合物の硬化膜を形成させる工程を有する事
を特徴とする請求項5記載の磁気記憶体の製造方法。
(6) A step of forming a cured film of the organometallic compound according to item 2 between the step of forming the thin film and the step of forming the film of the fluorinated polyether polymer. The method for manufacturing a magnetic memory body according to claim 5.
(7)該薄膜を形成させる工程と、該フッ化ポリエーテ
ル重合体の被膜を形成させる工程との間に、第3項記載
の有機金属化合物の硬化膜を形成させる工程を有する事
を特徴とする請求項5記載の磁気記憶体の製造方法。
(7) A step of forming a cured film of the organometallic compound according to item 3 between the step of forming the thin film and the step of forming the film of the fluorinated polyether polymer. The method for manufacturing a magnetic memory body according to claim 5.
(8)該薄膜を形成させる工程と、該フッ化ポリエーテ
ル重合体の被膜を形成させる工程との間に、第4項記載
の有機金属化合物の硬化膜を形成させる工程を有する事
を特徴とする請求項5記載の磁気記憶体の製造方法。
(8) A step of forming a cured film of the organometallic compound according to item 4 between the step of forming the thin film and the step of forming the film of the fluorinated polyether polymer. The method for manufacturing a magnetic memory body according to claim 5.
(9)請求項1記載の磁気記憶体を用いた事を特徴とす
る磁気記憶装置。
(9) A magnetic storage device characterized by using the magnetic storage body according to claim 1.
(10)請求項2記載の磁気記憶体を用いた事を特徴と
する磁気記憶装置。
(10) A magnetic storage device characterized by using the magnetic storage body according to claim 2.
(11)請求項3記載の磁気記憶体を用いた事を特徴と
する磁気記憶装置。
(11) A magnetic storage device characterized by using the magnetic storage body according to claim 3.
(12)請求項4記載の磁気記憶体を用いた事を特徴と
する磁気記憶装置。
(12) A magnetic storage device characterized by using the magnetic storage body according to claim 4.
JP10607188A 1988-04-28 1988-04-28 Magnetic memory body and production thereof and magnetic memory device Pending JPH01277319A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10607188A JPH01277319A (en) 1988-04-28 1988-04-28 Magnetic memory body and production thereof and magnetic memory device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10607188A JPH01277319A (en) 1988-04-28 1988-04-28 Magnetic memory body and production thereof and magnetic memory device

Publications (1)

Publication Number Publication Date
JPH01277319A true JPH01277319A (en) 1989-11-07

Family

ID=14424368

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10607188A Pending JPH01277319A (en) 1988-04-28 1988-04-28 Magnetic memory body and production thereof and magnetic memory device

Country Status (1)

Country Link
JP (1) JPH01277319A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03160618A (en) * 1989-11-20 1991-07-10 Fuji Electric Co Ltd Production of magnetic recording medium
JPH03252921A (en) * 1990-03-02 1991-11-12 Sony Corp Magnetic recording medium

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03160618A (en) * 1989-11-20 1991-07-10 Fuji Electric Co Ltd Production of magnetic recording medium
JPH03252921A (en) * 1990-03-02 1991-11-12 Sony Corp Magnetic recording medium

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