JPS6391166A - Spinner coater - Google Patents
Spinner coaterInfo
- Publication number
- JPS6391166A JPS6391166A JP23647586A JP23647586A JPS6391166A JP S6391166 A JPS6391166 A JP S6391166A JP 23647586 A JP23647586 A JP 23647586A JP 23647586 A JP23647586 A JP 23647586A JP S6391166 A JPS6391166 A JP S6391166A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- peripheral wall
- spinner
- coating
- supporting base
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims abstract description 35
- 239000011248 coating agent Substances 0.000 claims abstract description 25
- 238000000576 coating method Methods 0.000 claims abstract description 24
- 230000002093 peripheral effect Effects 0.000 claims abstract description 18
- 239000011347 resin Substances 0.000 abstract description 7
- 229920005989 resin Polymers 0.000 abstract description 7
- 239000000463 material Substances 0.000 abstract description 3
- 239000007788 liquid Substances 0.000 abstract description 2
- 230000000694 effects Effects 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 210000003296 saliva Anatomy 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、フォトマスクやウェハー等の基板表面に感光
性樹脂を塗布するためのスピンナー塗布装置に関する。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a spinner coating device for coating a photosensitive resin onto the surface of a substrate such as a photomask or a wafer.
従来の技術
フォトマスク作製、あるいはウェハー加工等において感
光性樹脂をスピンナー塗布装置を用いて基板上に均一厚
に塗布する工程がある。第３図にその構造を示すと、ス
ピンナー塗布装置は基本的には回転軸１により高速回転
する基板支持台２を２７゜
中央にして被覆体４が周囲をとりまき、被覆体の下部か
ら空気を排気できる構造と々っており、均一な厚さに感
光性樹脂が塗布される。2. Description of the Related Art In the production of photomasks, wafer processing, etc., there is a step of applying a photosensitive resin to a uniform thickness on a substrate using a spinner coating device. The structure of the spinner coating device is shown in Fig. 3. Basically, a spinner coating device has a substrate support 2 rotated at high speed by a rotating shaft 1 at a 27° center, surrounded by a coating 4, and air is pumped from the bottom of the coating. It has a structure that allows for exhaust, and photosensitive resin is applied to a uniform thickness.
発明が解決しようとする問題点
しかしながら、従来のスピンナー塗布装置を用いて毎分
２０００回以上の高速回転によって感光性樹脂を塗布し
た場合には、刊気口５から排気しても基板支持台の周囲
に乱気流が生じ、遠心力によって飛散された液が基板上
に再付着するという問題点があった。Problems to be Solved by the Invention However, when a conventional spinner coating device is used to coat a photosensitive resin by rotating at a high speed of 2,000 times or more per minute, even if the air is exhausted from the air opening 5, the substrate support is There was a problem in that turbulent airflow occurred in the surrounding area, and the liquid scattered by centrifugal force re-adhered to the substrate.
問題点を解決するための手段
本発明は、スピンナー塗布装置の基板支持台」二の基板
のまわりに周壁を設け、且つその周壁が下方に向かって
拡がっている形状となっていることを特徴とするスピン
ナー塗布装置である。Means for Solving the Problems The present invention is characterized in that a peripheral wall is provided around the second substrate of the substrate support stand of the spinner coating device, and the peripheral wall is shaped to expand downward. This is a spinner coating device.
作 用
本発明によれば遠心力によって飛散した感光性樹脂は、
周壁の傾斜した側面に沿って周壁の下部に入り、基板支
持台より下方に排出される。よって液滴が基板上に再付
着することなく、良好な塗３ ペー。Effect According to the present invention, the photosensitive resin scattered by centrifugal force is
It enters the lower part of the peripheral wall along the inclined side surface of the peripheral wall and is discharged below the substrate support. Therefore, the droplets do not re-adhere to the substrate, resulting in good coating.
布膜が形成される。A cloth membrane is formed.
実施例 以下、本発明の実施例について説明する。Example Examples of the present invention will be described below.
〔第１実施例〕
本発明の第１実施例を図１を参照しながら説明する。図
１に示すように基板支持台２上に例えばＱ ＩＪングを
介して真空吸着された例えば円盤状の基板３の側面に近
接して周壁６を基板支持台との間に約１．５祁間隙をも
たせて設け、且つその周壁６は基板上面より約１嘔高く
、又基板に近接した側面は下向きに拡がっているような
形状となっている。[First Embodiment] A first embodiment of the present invention will be described with reference to FIG. As shown in FIG. 1, a distance of about 1.5 ku is placed between the peripheral wall 6 and the substrate support in close proximity to the side surface of a substrate 3, for example, in the form of a disk, which is vacuum-adsorbed onto the substrate support 2 via, for example, a QIJ. The peripheral wall 6 is approximately one inch higher than the upper surface of the substrate, and the side surface close to the substrate is shaped so as to expand downward.
実際に図３に示す従来のスピンナーと図１に示した本発
明のスピンナーを用いて毎分２０００回転で感光性樹脂
を塗布した結果を比較してみると、従来方法においては
、飛散しだ液滴が基板支持台の周囲に発生した乱気流に
よって吹き上げられ被覆体の上蓋に当だって基板上に落
下したり、舞い上がった液滴が再付着してレジストパタ
ーンの欠陥を生じたのに対し、本実施例に示すスピンナ
ーにおいては液滴の再付着は見られなかった。Comparing the results of actually applying photosensitive resin at 2000 revolutions per minute using the conventional spinner shown in Figure 3 and the spinner of the present invention shown in Figure 1, it was found that the conventional method did not produce any scattered saliva. In contrast to cases where droplets were blown up by the turbulence generated around the substrate support, hit the top cover of the coating and fell onto the substrate, or the blown up droplets reattached and caused resist pattern defects, this implementation No redeposition of droplets was observed in the spinner shown in the example.
〔第２実施例〕 本発明の第２実施例を、図２を参照しながら説明する。[Second example] A second embodiment of the present invention will be described with reference to FIG.
本実施例では、基板支持台２０周辺部に周壁６を基板３
の上面よりも約１ ｍｍ高くなるように設け、且つその
周壁６は下向きに拡がっているような構造をもつスピナ
ー塗布装置を用いた。基板と周壁との距離は約２咽とし
、周壁６には基板３の脱着を容易に行うために例えば３
ケ所の切欠部を設けるなど本発明の主旨を損わない範囲
で種々の変形があることはいうまでもない。本実施例の
場合も第１実施例と同様に飛散したレジストは基板上に
再付着することはなかった。In this embodiment, a peripheral wall 6 is provided around the substrate support 20 to support the substrate 3.
A spinner coating device was used which had a structure in which the coating material was installed at a height of about 1 mm higher than the upper surface of the coating device, and the peripheral wall 6 of the coating device was configured to expand downward. The distance between the substrate and the peripheral wall is about 2 mm, and the peripheral wall 6 has, for example, 3 mm in order to easily attach and detach the substrate 3.
It goes without saying that various modifications may be made without departing from the spirit of the present invention, such as providing cutouts at several locations. In the case of this example as well, the scattered resist did not re-adhere on the substrate as in the first example.
発明の効果
以上のように本発明によって、スピナー塗布に起こりが
ちな液滴の基板」二への再付着を防止することができ、
製品の歩留１りを向上させる方法を提供できる。Effects of the Invention As described above, the present invention can prevent droplets from re-adhering to the substrate, which tends to occur during spinner coating.
A method for improving product yield can be provided.
５、−ノ
第１図および第２図は本発明のスピナー塗布装置の実施
例を示す断面図、第３図はスピナー塗布装置の基本的な
形態を示す図面である。
１・・・・・・回転軸、２・・・・・・基板支持台、３
・・・・・・基板、４・・・・・・被覆体、５・・・・
・・排気口、６・・・・・・周壁、７・・・・・・０リ
ング。
代理人の氏名 弁理士 中 尾 敏 男 ほか１名１−
ｍ−回転軸
２−一一基核支符台
計−°Ｘ核
４−−−ヲしダ己アー、イイ（5.- FIGS. 1 and 2 are sectional views showing an embodiment of the spinner coating device of the present invention, and FIG. 3 is a drawing showing the basic form of the spinner coating device. 1... Rotating shaft, 2... Board support stand, 3
... Substrate, 4 ... Covering body, 5 ...
...Exhaust port, 6...Peripheral wall, 7...0 ring. Name of agent: Patent attorney Toshio Nakao and 1 other person1-
m-rotation axis 2-11 base support stand meter-°X core 4--
Claims (1)
壁を設け、且つ遠心力によって飛散した塗布剤が前記基
板に再付着することなく前記周壁と前記基板支持台との
間隙を通って排出される構成とすることを特徴とするス
ピンナー塗布装置。A peripheral wall is provided close to a substrate on a substrate support of a spinner coating device, and the coating agent scattered by centrifugal force is discharged through a gap between the peripheral wall and the substrate support without re-adhering to the substrate. A spinner coating device characterized by having a configuration.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23647586A JPS6391166A (en) | 1986-10-03 | 1986-10-03 | Spinner coater |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23647586A JPS6391166A (en) | 1986-10-03 | 1986-10-03 | Spinner coater |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6391166A true JPS6391166A (en) | 1988-04-21 |
Family
ID=17001289
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP23647586A Pending JPS6391166A (en) | 1986-10-03 | 1986-10-03 | Spinner coater |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6391166A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100696855B1 (en) | 2004-12-10 | 2007-03-20 | 주식회사 엘지화학 | Spin-coating apparatus and coated substrates prepared using the same |
-
1986
- 1986-10-03 JP JP23647586A patent/JPS6391166A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100696855B1 (en) | 2004-12-10 | 2007-03-20 | 주식회사 엘지화학 | Spin-coating apparatus and coated substrates prepared using the same |
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