JPS638975B2 - - Google Patents

Info

Publication number
JPS638975B2
JPS638975B2 JP55087356A JP8735680A JPS638975B2 JP S638975 B2 JPS638975 B2 JP S638975B2 JP 55087356 A JP55087356 A JP 55087356A JP 8735680 A JP8735680 A JP 8735680A JP S638975 B2 JPS638975 B2 JP S638975B2
Authority
JP
Japan
Prior art keywords
gas
activated
injection port
reactor
gas injection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55087356A
Other languages
Japanese (ja)
Other versions
JPS5712032A (en
Inventor
Eiichi Yamamoto
Kazuhiko Kamyoshi
Yasumasa Kashima
Rikizo Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sekisui Chemical Co Ltd
Original Assignee
Sekisui Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sekisui Chemical Co Ltd filed Critical Sekisui Chemical Co Ltd
Priority to JP8735680A priority Critical patent/JPS5712032A/en
Publication of JPS5712032A publication Critical patent/JPS5712032A/en
Publication of JPS638975B2 publication Critical patent/JPS638975B2/ja
Granted legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/14Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Physical Vapour Deposition (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)

Description

【発明の詳細な説明】 本発明は活性化ガスによる処理装置に関し、詳
細には減圧下に放電によつて活性化されたガスを
用いて各種の材料、例えば合成樹脂の成形品の表
面処理を行なうための装置に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a treatment device using an activated gas, and more particularly, the present invention relates to a treatment device using an activated gas, and more specifically, a treatment device for treating the surface of molded articles made of various materials, such as synthetic resins, using a gas activated by electric discharge under reduced pressure. The invention relates to a device for carrying out the process.

近年、真空放電によるプラズマ、所謂低温プラ
ズマを利用して活性化されたガスを合成樹脂成形
品等に接触させる表面処理が、種々の目的のため
に行なわれている。従来、このような表面処理が
なされる材料はほとんどの場合、フイルムやシー
ト状であり、従つて従来から知られている装置に
よれば、容器や管等の形状の材料の内側表面に活
性化ガスを均一に接触させて、一様に表面処理す
ることが困難であつた。
In recent years, surface treatment in which a synthetic resin molded article or the like is brought into contact with a gas activated using plasma generated by vacuum discharge, so-called low-temperature plasma, has been carried out for various purposes. Traditionally, the materials to which such surface treatments have been applied have mostly been in the form of films or sheets, and therefore conventionally known equipment has been used to apply activation to the inner surface of materials in the form of containers, tubes, etc. It has been difficult to uniformly contact the gas and uniformly treat the surface.

本発明は上記に鑑みてなされたものであつて、
特に容器や管等の内側表面の処理に好適に用いる
ことのできる活性化ガスによる処理装置を提供す
ることを目的とする。
The present invention has been made in view of the above, and includes:
It is an object of the present invention to provide a treatment device using activated gas that can be particularly suitably used for treating the inner surfaces of containers, pipes, and the like.

本発明の活性化ガスによる処理装置は、反応器
と、ガス活性化室で活性化されたガスをこの反応
器内に導いて端部のガス噴射口から噴出させるガ
ス輸送管と、反応器内に支持された回転軸から放
射状に形成されたアームと、被処理材料の処理す
べき開口端に活性化ガスが一様に噴射されるよう
に上記ガス噴射口に近接した位置で上記開口端を
ガス噴射口に臨ませて所定の位置関係で保持する
ために上記アームに取り付けられた被処理材料保
持部材とから構成されている。
The activated gas treatment apparatus of the present invention includes a reactor, a gas transport pipe for guiding the gas activated in the gas activation chamber into the reactor and ejecting it from the gas injection port at the end, and the inside of the reactor. an arm formed radially from a rotating shaft supported by a rotary shaft; and a material holding member attached to the arm to hold the material in a predetermined position facing the gas injection port.

以下にマイクロ波プラズマにより合成樹脂成形
品の表面処理を行なうための装置を例として、図
面に基づいて本発明を説明する。なお、ガス活性
化の手段は上記マイクロ波電力に限定されるもの
ではなく、高周波電力、直流電力等であつてもよ
いことはいうまでもない。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below with reference to the drawings, taking as an example an apparatus for surface-treating synthetic resin molded products using microwave plasma. Note that the means for activating the gas is not limited to the microwave power described above, and it goes without saying that high frequency power, direct current power, etc. may be used.

マイクロ波電力はマイクロ波電力発生装置1に
て発生され、保護装置(アイソレータ)2、パワ
ーモニター3級び整合器4を経てプラズマ発生炉
5へ接続導波管6により導かれる。プラズマ発生
炉には、これを貫通して石英製円筒状のガス活性
化室7が配設されている。ガス化発生室はマイク
ロ波の照射を受けて高温になるので、例えば二重
管構造として(図示せず)、内側円筒内には酸素、
窒素、アルゴン、ヘリウム、、空気等の活性化さ
れるガスをガス供給管8から導入し、所定の真空
下に置くと共に、内側円筒と外側円筒との間の環
状空隙には冷却媒体を流通させる等して、有効な
冷却を行なうのが望ましい。
Microwave power is generated in a microwave power generation device 1, passed through a protection device (isolator) 2, a power monitor class 3, and a matching device 4, and then guided to a plasma generation furnace 5 through a connecting waveguide 6. A cylindrical gas activation chamber 7 made of quartz is provided in the plasma generating furnace so as to pass through the plasma generating furnace. Since the gasification chamber becomes high temperature due to microwave irradiation, for example, a double pipe structure (not shown) may be used to store oxygen and oxygen in the inner cylinder.
A gas to be activated such as nitrogen, argon, helium, or air is introduced from the gas supply pipe 8 and placed under a predetermined vacuum, and a cooling medium is passed through the annular gap between the inner cylinder and the outer cylinder. It is desirable to perform effective cooling by doing the same.

ガス活性化室は、活性化ガスを反応器9に送る
ためのガス輸送管10に連通され、この輸送管は
反応器内でガス噴射口11として開口する。
The gas activation chamber is communicated with a gas transport pipe 10 for delivering the activation gas to the reactor 9, which transport pipe opens as a gas injection port 11 within the reactor.

反応器内には連続回転又は断続回転し得る回転
軸12が支持され、この回転軸には通常、複数の
アーム13が相互に所定間隔をおいて放射状に取
り付けられている。各アーム端は、少なくとも前
記ガス噴射口に近接した位置において、ガス噴射
口から噴射される活性化ガスが、表面処理を要す
る被処理材料表面に一様に接触するように被処理
材料14の開口端をガス噴射口に臨ませて保持す
る被処理材料保持部材15を有する。従つて開口
端を有する被処理材料、例えばシヤーレ、試験
管、瓶、パイプ等がガス噴射口に近接したとき、
活性化ガスは被処理材料の開口端から内側に吹き
こまれ、内側表面に一様に接触する。
A rotating shaft 12 that can rotate continuously or intermittently is supported within the reactor, and a plurality of arms 13 are usually attached radially to this rotating shaft at predetermined intervals. Each arm end has an opening in the material to be treated 14, at least at a position close to the gas injection port, so that the activated gas injected from the gas injection port uniformly contacts the surface of the material to be processed that requires surface treatment. It has a material holding member 15 that holds the material with its end facing the gas injection port. Therefore, when a material to be treated with an open end, such as a shear dish, test tube, bottle, pipe, etc., comes close to the gas injection port,
The activated gas is blown inward from the open end of the material to be treated and uniformly contacts the inner surface.

図示したように、ガス噴射口が鉛直下方向を臨
む場合には、各アーム端には適宜の水平保持器1
6が取り付けられ、水平保持器に配設した保持部
材によつて被処理材料をその開口端が常に水平位
置にあるように保持される。被処理部材がシヤー
レのように開口端を有すると共に安定に載置でき
る成形品の場合には、保持部材は水平保持器上に
配設された単なるプレート部材であつてよく、こ
の上にシヤーレを載置すれば、シヤーレはその開
口端を常に水平にして回転軸のまわりを回動す
る。
As shown in the figure, when the gas injection port faces vertically downward, an appropriate horizontal holder 1 is attached to each arm end.
6 is attached, and the material to be processed is held by a holding member disposed on the horizontal holder so that its open end is always in a horizontal position. If the member to be processed is a molded product that has an open end and can be placed stably, such as a shear dish, the holding member may be a simple plate member disposed on a horizontal holder, and the shear dish is placed on this plate member. Once placed, the shear will rotate around the rotation axis with its open end always kept horizontal.

図示した装置を用いて、例えば瓶状成形品の内
側中空表面を処理する場合を例として説明する
と、水平保持器上の保持部材にこの瓶を載置した
後、適宜の速度で回転軸を回転させ、減圧装置
(図示せず)に接続された排気管17によつて反
応器内を所定の真空度に達せしめる。次に、ガス
導入管より所定の流量にてガスをプラズマ発生炉
に送りつつ、所定の真空度下でマイクロ波を照射
して活性化し、ガス輸送管を経て噴出口より噴出
させて、瓶が噴出口に近接したときに瓶内に活性
化ガスを吹きこむようにして瓶内側表面を処理す
るのである。
To explain the case of processing, for example, the inner hollow surface of a bottle-shaped molded product using the illustrated device, the bottle is placed on a holding member on a horizontal holder, and then the rotating shaft is rotated at an appropriate speed. The inside of the reactor is brought to a predetermined degree of vacuum through an exhaust pipe 17 connected to a pressure reducing device (not shown). Next, the gas is sent to the plasma generation furnace at a predetermined flow rate from the gas introduction pipe, activated by irradiation with microwaves under a predetermined degree of vacuum, and is ejected from the spout through the gas transport pipe to form a bottle. The inside surface of the bottle is treated by blowing activated gas into the bottle when it approaches the spout.

このように本発明の装置によれば、成形品が、
反応器内の活性化ガス噴出口に対して所定の位置
関係を占めるように、例えば容器状の成形品であ
れば、噴出された活性化ガスが容器の開口端から
容器内に吹きこまれるように、反応器内の連続的
に又は断続的に回動されるので、特に容器、管等
の形状の成形品の内側表面を均一に処理でき、更
に複数の成形品を同様に一度に処理できる利点が
あり、多数の成形品の連続処理も可能となる。ま
た、勿論、本発明の装置はフイルムやシート状の
被処理材料の表面処理にも好適に用いることがで
きる。
As described above, according to the apparatus of the present invention, the molded product can be
For example, in the case of a container-shaped molded product, the ejected activated gas is blown into the container from the open end of the container so that it occupies a predetermined positional relationship with respect to the activated gas outlet in the reactor. In addition, since it is rotated continuously or intermittently within the reactor, it is possible to uniformly treat the inner surface of molded products, especially in the shape of containers, pipes, etc., and it is also possible to treat multiple molded products at the same time. This has the advantage that it also allows continuous processing of a large number of molded articles. Moreover, of course, the apparatus of the present invention can also be suitably used for surface treatment of film or sheet-like materials to be treated.

【図面の簡単な説明】[Brief explanation of the drawing]

図面は本発明の装置の一実施例を示す断面略図
であつて、マイクロ波電力により活性化されたガ
スを用いる処理装置を示す。 1……マイクロ波電力発生装置、5……プラズ
マ発生炉、7……ガス活性化室、8……ガス供給
管、9……反応器、10……活性化ガス輸送管、
11……活性化ガス噴射口、12……回転軸、1
3……アーム、14……成形品、15……成形品
保持部材、16……水平保持器。
The drawing is a schematic cross-sectional view showing one embodiment of the apparatus of the present invention, and shows a processing apparatus using gas activated by microwave power. DESCRIPTION OF SYMBOLS 1... Microwave power generator, 5... Plasma generation furnace, 7... Gas activation chamber, 8... Gas supply pipe, 9... Reactor, 10... Activated gas transport pipe,
11... Activated gas injection port, 12... Rotating shaft, 1
3... Arm, 14... Molded product, 15... Molded product holding member, 16... Horizontal retainer.

Claims (1)

【特許請求の範囲】 1 反応器と、ガス活性化室で活性化されたガス
をこの反応器内に導いて端部のガス噴射口から噴
射させるガス輸送管と、反応器内に支持された回
転軸から放射状に形成されたアームと、被処理材
料の処理すべき開口端に活性化ガスが一様に噴射
されるように上記ガス噴射口に近接した位置で上
記開口端をガス噴射口に臨ませて保持するために
上記アームに取り付けられた被処理材料保持部材
とからなることを特徴とする活性化ガスによる処
理装置。 2 ガス噴射口が鉛直下方向を臨み、保持部材が
被処理材料をその開口端を常に水平にして保持す
ることを特徴とする特許請求の範囲第1項記載の
活性化ガスによる処理装置。
[Claims] 1. A reactor, a gas transport pipe that guides the gas activated in the gas activation chamber into the reactor and injects it from the gas injection port at the end, and a gas transport pipe supported within the reactor. An arm formed radially from the rotating shaft and a gas injection port at a position close to the gas injection port so that activated gas is uniformly injected to the opening end of the material to be processed. 1. A processing apparatus using an activated gas, comprising a material holding member attached to the arm for holding the material facing toward the object. 2. The activated gas processing apparatus according to claim 1, wherein the gas injection port faces vertically downward, and the holding member holds the material to be processed with its open end always horizontal.
JP8735680A 1980-06-26 1980-06-26 Apparatus for treatment with activated gas Granted JPS5712032A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8735680A JPS5712032A (en) 1980-06-26 1980-06-26 Apparatus for treatment with activated gas

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8735680A JPS5712032A (en) 1980-06-26 1980-06-26 Apparatus for treatment with activated gas

Publications (2)

Publication Number Publication Date
JPS5712032A JPS5712032A (en) 1982-01-21
JPS638975B2 true JPS638975B2 (en) 1988-02-25

Family

ID=13912596

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8735680A Granted JPS5712032A (en) 1980-06-26 1980-06-26 Apparatus for treatment with activated gas

Country Status (1)

Country Link
JP (1) JPS5712032A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01148858U (en) * 1988-04-04 1989-10-16

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU548915B2 (en) * 1983-02-25 1986-01-09 Toyota Jidosha Kabushiki Kaisha Plasma treatment
EP0326191A3 (en) * 1983-02-25 1991-12-27 Toyota Jidosha Kabushiki Kaisha Apparatus and method for plasma treatment of resin material
US4994298A (en) * 1988-06-07 1991-02-19 Biogold Inc. Method of making a biocompatible prosthesis
AU8141298A (en) * 1997-06-20 1999-01-04 Flowgenix Corporation Apparatus for exposing substrates to gas-phase radicals
US6617152B2 (en) 2001-09-04 2003-09-09 Corning Inc Method for creating a cell growth surface on a polymeric substrate

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5064182A (en) * 1973-10-11 1975-05-31

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5064182A (en) * 1973-10-11 1975-05-31

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01148858U (en) * 1988-04-04 1989-10-16

Also Published As

Publication number Publication date
JPS5712032A (en) 1982-01-21

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