AU8141298A - Apparatus for exposing substrates to gas-phase radicals - Google Patents

Apparatus for exposing substrates to gas-phase radicals

Info

Publication number
AU8141298A
AU8141298A AU81412/98A AU8141298A AU8141298A AU 8141298 A AU8141298 A AU 8141298A AU 81412/98 A AU81412/98 A AU 81412/98A AU 8141298 A AU8141298 A AU 8141298A AU 8141298 A AU8141298 A AU 8141298A
Authority
AU
Australia
Prior art keywords
gas
exposing substrates
phase radicals
radicals
phase
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU81412/98A
Inventor
Steven L. Koontz
James E. Pearson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
FLOWGENIX Corp
Original Assignee
FLOWGENIX CORP
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by FLOWGENIX CORP filed Critical FLOWGENIX CORP
Publication of AU8141298A publication Critical patent/AU8141298A/en
Abandoned legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J19/088—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/16—Surface shaping of articles, e.g. embossing; Apparatus therefor by wave energy or particle radiation, e.g. infrared heating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0894—Processes carried out in the presence of a plasma
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/0866—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using particle radiation
    • B29C2035/0872—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using particle radiation using ion-radiation, e.g. alpha-rays

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • General Health & Medical Sciences (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
AU81412/98A 1997-06-20 1998-06-22 Apparatus for exposing substrates to gas-phase radicals Abandoned AU8141298A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US87940497A 1997-06-20 1997-06-20
US08879404 1997-06-20
PCT/US1998/012170 WO1998058731A2 (en) 1997-06-20 1998-06-22 Apparatus for exposing substrates to gas-phase radicals

Publications (1)

Publication Number Publication Date
AU8141298A true AU8141298A (en) 1999-01-04

Family

ID=25374089

Family Applications (1)

Application Number Title Priority Date Filing Date
AU81412/98A Abandoned AU8141298A (en) 1997-06-20 1998-06-22 Apparatus for exposing substrates to gas-phase radicals

Country Status (2)

Country Link
AU (1) AU8141298A (en)
WO (1) WO1998058731A2 (en)

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4192706A (en) * 1975-01-22 1980-03-11 Tokyo Shibaura Electric Co., Ltd. Gas-etching device
JPS5941510B2 (en) * 1979-07-24 1984-10-08 双葉電子工業株式会社 Beryllium oxide film and its formation method
JPS56147832A (en) * 1980-04-16 1981-11-17 Toshiba Corp Surface treating device
CA1159012A (en) * 1980-05-02 1983-12-20 Seitaro Matsuo Plasma deposition apparatus
JPS5712032A (en) * 1980-06-26 1982-01-21 Sekisui Chem Co Ltd Apparatus for treatment with activated gas
JPS5740586A (en) * 1980-08-22 1982-03-06 Toshiba Corp Treatment of fluorescent substance and its device
JPS5840833A (en) * 1981-09-04 1983-03-09 Toshiba Corp Nitride film production device
JPS58208326A (en) * 1982-05-31 1983-12-05 Hashimoto Forming Co Ltd Plasma treatment
AU548915B2 (en) * 1983-02-25 1986-01-09 Toyota Jidosha Kabushiki Kaisha Plasma treatment
DE3481041D1 (en) * 1983-05-31 1990-02-22 Idemitsu Petrochemical Co METHOD FOR TREATING THERMOPLASTIC PLASTIC.
JPS6074626A (en) * 1983-09-30 1985-04-26 Fujitsu Ltd Device for plasma treatment
US4579618A (en) * 1984-01-06 1986-04-01 Tegal Corporation Plasma reactor apparatus
JPS6115976A (en) * 1984-07-03 1986-01-24 Matsushita Electric Ind Co Ltd Plasma reaction device and method for use thereof
JPS61281132A (en) * 1985-06-05 1986-12-11 Mazda Motor Corp Plasma treating apparatus
JPH0740566B2 (en) * 1986-02-04 1995-05-01 株式会社日立製作所 Plasma processing method and apparatus
JPH01236938A (en) * 1988-03-17 1989-09-21 Nissin Electric Co Ltd Plasma generator
JP2738432B2 (en) * 1988-05-06 1998-04-08 株式会社 トービ Plasma beam deposition equipment
US5369012A (en) * 1992-03-26 1994-11-29 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Method of making a membrane having hydrophilic and hydrophobic surfaces for adhering cells or antibodies by using atomic oxygen or hydroxyl radicals
US5466424A (en) * 1992-12-28 1995-11-14 Bridgestone Corporation Corona discharge surface treating method
JP3204801B2 (en) * 1993-06-18 2001-09-04 富士写真フイルム株式会社 Vacuum glow discharge processing apparatus and processing method
US5614026A (en) * 1996-03-29 1997-03-25 Lam Research Corporation Showerhead for uniform distribution of process gas

Also Published As

Publication number Publication date
WO1998058731A2 (en) 1998-12-30
WO1998058731A3 (en) 1999-05-27

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase