JPS6383300A - Device for producing stamper for information recording disk - Google Patents
Device for producing stamper for information recording diskInfo
- Publication number
- JPS6383300A JPS6383300A JP22728186A JP22728186A JPS6383300A JP S6383300 A JPS6383300 A JP S6383300A JP 22728186 A JP22728186 A JP 22728186A JP 22728186 A JP22728186 A JP 22728186A JP S6383300 A JPS6383300 A JP S6383300A
- Authority
- JP
- Japan
- Prior art keywords
- tank
- soln
- plating
- plating solution
- pump
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007747 plating Methods 0.000 claims abstract description 68
- 238000001514 detection method Methods 0.000 claims abstract description 5
- 238000004519 manufacturing process Methods 0.000 claims description 11
- 238000010521 absorption reaction Methods 0.000 claims description 8
- 239000007788 liquid Substances 0.000 claims description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims 7
- 229910052759 nickel Inorganic materials 0.000 claims 1
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 239000000243 solution Substances 0.000 description 33
- IIACRCGMVDHOTQ-UHFFFAOYSA-M sulfamate Chemical compound NS([O-])(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-M 0.000 description 8
- 238000002835 absorbance Methods 0.000 description 7
- 230000007423 decrease Effects 0.000 description 6
- 239000007864 aqueous solution Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- KMUONIBRACKNSN-UHFFFAOYSA-N potassium dichromate Chemical compound [K+].[K+].[O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O KMUONIBRACKNSN-UHFFFAOYSA-N 0.000 description 4
- 238000009713 electroplating Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229920002433 Vinyl chloride-vinyl acetate copolymer Polymers 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000010802 sludge Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- FDDDEECHVMSUSB-UHFFFAOYSA-N sulfanilamide Chemical compound NC1=CC=C(S(N)(=O)=O)C=C1 FDDDEECHVMSUSB-UHFFFAOYSA-N 0.000 description 1
- 229940124530 sulfonamide Drugs 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Manufacturing Optical Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
［発明の目的］
（産業上の利用分野）
本発明はビデオディスク、デジタルオーディオディスク
、ドキュメントファイルディスク等の情報記録ディスク
を複製するために用いられるスタンパの製造装置の改良
に関する。Detailed Description of the Invention [Objective of the Invention] (Industrial Application Field) The present invention provides an improvement in a stamper manufacturing apparatus used for duplicating information recording discs such as video discs, digital audio discs, and document file discs. Regarding.
（従来の技術）
一般に、ビデオディスク、デジタルオーディオディスク
、ドキュメントファイルディスク等の情報記録ディスク
は以下のような方法により製造されている。(Prior Art) Generally, information recording discs such as video discs, digital audio discs, and document file discs are manufactured by the following method.
まず、ガラス等の基板に感光性樹脂を塗布し、光学的エ
ツチング処理を施し、所望の微細パターンを形成して原
盤を作製する。この原盤表面に、銀鏡反応、無電解Ｎｉ
めつき、蒸着、スパッタ等の方法により金属薄膜を設け
る。次に、原盤をＮｉ電気めっきにより所望の厚さまで
肉盛した後、これを原盤から剥離してＮｉ膜のマスター
を作製する。このマスター表面に付着している感光性樹
脂を洗い流した後、マスター表面を重クロム酸カリウム
の水溶液中で処理する。更に、マスターをＮｉ電気めっ
きにより所望の厚さまで肉盛した後、これをマスターか
ら剥離してマザーを作製する。First, a photosensitive resin is applied to a substrate such as glass, and an optical etching process is performed to form a desired fine pattern to produce a master. Silver mirror reaction, electroless Ni
A thin metal film is provided by a method such as plating, vapor deposition, or sputtering. Next, after overlaying the master to a desired thickness by Ni electroplating, this is peeled off from the master to produce a Ni film master. After washing off the photosensitive resin adhering to the master surface, the master surface is treated in an aqueous solution of potassium dichromate. Furthermore, after the master is overlaid to a desired thickness by Ni electroplating, this is peeled off from the master to produce a mother.
このマザー表面を重クロム酸カリウムの水溶液中で処理
する。次いで、マザーをＮｉ電気めっきにより所望の厚
さまで肉盛した後、これをマザーから剥離してスタンパ
を作製する。This mother surface is treated in an aqueous solution of potassium dichromate. Next, the mother is overlaid to a desired thickness by Ni electroplating, and then separated from the mother to produce a stamper.
上記のようにして得られたスタンパを用いて、塩化ビニ
ル−酢酸ビニル共重合体を圧縮成形したり、アクリル樹
脂やポリカーボネート樹脂を射出成形する。更に、反射
用の金属膜を形成した後、保護膜を形成するなどして情
報記録ディスクを製造する。Using the stamper obtained as described above, a vinyl chloride-vinyl acetate copolymer is compression molded, or an acrylic resin or a polycarbonate resin is injection molded. Furthermore, after forming a reflective metal film, a protective film is formed, etc., to manufacture an information recording disk.
ところで、上記のＮｉめつき工程で溶解アノードを用い
た場合、アノードからの不純物、スラッジがカソード表
面に付着し、その結果としてスタンパ表面の信号を損傷
させ、特にスタンパ自体の信号特性に影響を及ぼすとい
う問題があった。By the way, when a molten anode is used in the above Ni plating process, impurities and sludge from the anode adhere to the cathode surface, resulting in damage to the signal on the stamper surface and particularly affecting the signal characteristics of the stamper itself. There was a problem.
この問題はアノードとして不溶解アノードを使用すれば
解決することができる（例えば特開昭５８−１５７９８
４号）。しかし、不溶解アノードを使用した場合、カソ
ード表面に析出するＮｉはめつき液からのみ供給される
ため、長時間めっきを続けると、めっき液中のＮｉｌｌ
ｉ度が減少してしまう。このようにＮｉ濃度が減少する
と、カソード表面での水素の放電量が増加し、Ｎｉの放
電量が減少してカソード効率が低下する。このため、め
っき時間が増大して定時間内でのスタンパ製造ができな
くなる。また、析出したＮｉ皮膜中に水素ガスが共析し
たり、スタンパ表面に水素ガスの泡が付着してガスピッ
トが発生する。This problem can be solved by using an insoluble anode as an anode (for example, Japanese Patent Application Laid-Open No. 58-15798
No. 4). However, when an insoluble anode is used, the Ni deposited on the cathode surface is supplied only from the plating solution, so if plating continues for a long time, Nill in the plating solution
The i degree will decrease. When the Ni concentration decreases in this way, the amount of hydrogen discharged on the cathode surface increases, the amount of Ni discharged decreases, and the cathode efficiency decreases. For this reason, the plating time increases, making it impossible to manufacture the stamper within a fixed time. Further, hydrogen gas eutectoids in the deposited Ni film, or hydrogen gas bubbles adhere to the stamper surface, resulting in gas pits.
したがって、これらの問題を解決し同一条件下でＮｉめ
っきを行なうためには、作業を一旦中止しめっき液をサ
ンプリングしてＮｉ１濃度を測定し、適当な量のめっき
液を補給しなければならず、作業能率を低下させる原因
となっていた。Therefore, in order to solve these problems and perform Ni plating under the same conditions, it is necessary to temporarily stop the operation, sample the plating solution, measure the Ni1 concentration, and replenish the appropriate amount of plating solution. , which caused a decrease in work efficiency.
（発明が解決しようとする問題点）
本発明は上記問題点を解決するためになされたものであ
り、Ｎｉめっき液のＮｉ濃度の測定及びめっき液の補給
を自動的に行なうことかでき、作業能率を低下させるこ
となくほぼ同一の条件でめっきを継続することができ、
信号特性等の劣化しない情報記録ディスク用スタンパを
連続的に製造し得る装置を提供することを目的とする。(Problems to be Solved by the Invention) The present invention has been made to solve the above-mentioned problems, and is capable of automatically measuring the Ni concentration of the Ni plating solution and replenishing the plating solution. Plating can be continued under almost the same conditions without reducing efficiency,
An object of the present invention is to provide an apparatus that can continuously manufacture stampers for information recording disks without deterioration of signal characteristics, etc.
［発明の構成］
（問題点を解決するための手段）
本発明の情報記録ディスク用スタンパの製造装置は、Ｎ
ｉめつき液を収容するめつき槽と、めっき液中のＮｉ濃
度を検出する吸光光度計と、該吸光光度計に前記めっき
槽中のＮｉめっき液を所定量供給する手段と、前記めっ
き槽にＮｉめっき液を補給する手段と、前記吸光光度計
の検出信号に応じて前記Ｎｉめっき液補給手段の駆動信
号を出力する演算制御器とを具備したことを特徴とする
ものである。[Structure of the Invention] (Means for Solving the Problems) An apparatus for manufacturing a stamper for an information recording disk according to the present invention comprises:
i: a plating tank containing a plating solution; an absorption photometer for detecting the Ni concentration in the plating solution; a means for supplying a predetermined amount of Ni plating solution in the plating tank to the absorption photometer; The present invention is characterized by comprising means for replenishing Ni plating solution, and an arithmetic controller that outputs a drive signal for the Ni plating solution replenishment means in response to a detection signal from the spectrophotometer.
本発明において、演算制御器としては、汎用コンピュー
タ、マイクロコンピュータ、デジタル論理回路等で構成
されるものが挙げられる。In the present invention, the arithmetic controller includes a general-purpose computer, a microcomputer, a digital logic circuit, and the like.
（作用）
上記のような情報記録ディスク用スタンパの製造装置に
よれば、めっき中に常時Ｎｉめつき液中のＮｉ′ａ度を
測定し、Ｎｉ濃度が設定値以下になった場合には直ちに
Ｎｉめっき液を補給することができるので、Ｎｉ濃度の
低下による製造時間の増大等の問題を生ずることなく、
良好なスタンパを製造することができる。(Function) According to the manufacturing apparatus for a stamper for information recording disks as described above, the degree of Ni'a in the Ni plating solution is constantly measured during plating, and if the Ni concentration falls below a set value, the Ni'a concentration is immediately measured. Since the Ni plating solution can be replenished, there is no problem such as an increase in production time due to a decrease in Ni concentration.
A good stamper can be manufactured.
＝５− （実施例） 以下、本発明の実施例を図面を参照して説明する。=5- (Example) Embodiments of the present invention will be described below with reference to the drawings.
第１図は本発明に係る情報記録ディスク用スタンパの製
造装置の構成図である。第１図において、めっき槽１に
はＮｉめっき液２が収容され、アノード（例えば不溶解
性の白金電極）３及びカソード（例えばマザー）４が浸
漬される。これらアノード３とカソード４とは図示しな
い電源に接続され、両者の間に直流電圧が印加される。FIG. 1 is a block diagram of an apparatus for manufacturing a stamper for information recording disks according to the present invention. In FIG. 1, a plating bath 1 contains a Ni plating solution 2, into which an anode (for example, an insoluble platinum electrode) 3 and a cathode (for example, a mother) 4 are immersed. These anode 3 and cathode 4 are connected to a power source (not shown), and a DC voltage is applied between them.
また、予備槽５にもＮｉめっき液２が収容されており、
このＮｉめっき液２は循環ポンプ６によりくみあげられ
、熱交換器７で所定温度に調整され、供給配管８を通っ
て前記めっき槽１へ供給される。そして、めっき槽１で
オーバーフローしたＮｉめっき液２はオーバーフロー配
管９を通って予備槽５へ戻される。更に、補給槽１０に
もＮｉめっぎ液２が収容され、このＮｉめっき液２は後
記する演算制御器１８の信号により駆動する補給ポンプ
１１によってくみあげられ、補給配管１２を通って前記
予備槽５へ供給される。なお、補給槽１０内のＮｉめっ
き液２の濃度は、めつき槽１及び予備槽５内のＮｉめつ
き液２の濃度よりも高濃度に設定されている。In addition, Ni plating solution 2 is also stored in the preliminary tank 5.
This Ni plating solution 2 is pumped up by a circulation pump 6, adjusted to a predetermined temperature by a heat exchanger 7, and supplied to the plating tank 1 through a supply pipe 8. Then, the Ni plating solution 2 that overflowed in the plating tank 1 is returned to the preliminary tank 5 through an overflow pipe 9. Further, a Ni plating solution 2 is also stored in the replenishment tank 10, and this Ni plating solution 2 is pumped up by a replenishment pump 11 driven by a signal from an arithmetic controller 18, which will be described later, and passes through a replenishment pipe 12 to the reserve tank. 5. Note that the concentration of the Ni plating solution 2 in the supply tank 10 is set higher than the concentration of the Ni plating solution 2 in the plating tank 1 and the preliminary tank 5.
前記めっき槽１内のＮｉめっき液２は測定用ポンプ１３
によりくみあげられ、測定用配管１４を通って吸光光度
計１５へ供給される。この吸光光度計１５での測定が終
了したＮｉめつき液２は戻り配管１６を通ってめつき槽
１へ戻される。この吸光光度計１５では所定波長でのＮ
ｉめつき液２の吸光度（Ｎｉ？ｇ濃度に対応する）が測
定される。The Ni plating solution 2 in the plating tank 1 is supplied to the measuring pump 13.
and is supplied to the absorption photometer 15 through the measurement piping 14. The Ni plating solution 2 that has been measured by the spectrophotometer 15 is returned to the plating tank 1 through a return pipe 16. In this spectrophotometer 15, N
The absorbance (corresponding to the Ni?g concentration) of the plating solution 2 is measured.
この吸光光度計１５での検出信号はＡ／Ｄ変換器１７を
介して演算制御器１８に入力され、印字装置１９により
Ｎｉ１濃度として記録される。また、演算制御器１８に
おいて吸光光度計１５で測定されたＮｉｍ度と制御のた
めに設定した所定のＮｉ濃度とを比較して、前者が後者
よりも低くなった場合に、演算制御器１８から補給ポン
プ１１へ駆動信号が出力され、補給槽１０から予備槽５
へ高濃度のＮｉめつき液２が補給される。そして、補給
ポンプ１１は一定量の高濃度のＮｉめつき液２が補給さ
れた時点で停止される。なお、補給ポンプ１１は吸光光
度計１５で測定されるＮＨ３度が第２の設定値まで増加
した時点で停止するようにしてもよい。The detection signal from the spectrophotometer 15 is input to the arithmetic controller 18 via the A/D converter 17, and recorded by the printing device 19 as the Ni1 concentration. In addition, the arithmetic controller 18 compares the Nim degree measured by the spectrophotometer 15 with a predetermined Ni concentration set for control, and if the former is lower than the latter, the arithmetic controller 18 A drive signal is output to the replenishment pump 11, and the supply tank 10 to the reserve tank 5
A high concentration Ni plating solution 2 is supplied to the tank. Then, the replenishment pump 11 is stopped when a certain amount of high-concentration Ni plating liquid 2 is replenished. Note that the replenishment pump 11 may be stopped when the NH3 degree measured by the spectrophotometer 15 increases to a second set value.
実際に、第１図図示の装置を用い、以下のような条件で
スタンパの製造を行なった。まず、めつき槽１と予備槽
５内のめっき液及び補給槽１０内の補給用めっき液とし
てそれぞれ以下の組成のものを用意した。Actually, a stamper was manufactured using the apparatus shown in FIG. 1 under the following conditions. First, the plating solutions in the plating tank 1 and the preliminary tank 5 and the replenishment plating solution in the replenishment tank 10 were prepared with the following compositions, respectively.
めっき液
スルファミン酸Ｎｉ ６００ｑ／り
臭化Ｎｉ ５０／ρ
゛ホウ酸 ４０ｑ／ク
ビツト防止剤 １ｄ、／／１（ナイスター８
０６、上材工業製商品名）補給用めっき液
スルファミンＩ！！Ｎｉ ９００ｇ／ｇスルファミン
酸Ｎｉ水溶液の吸光度分布（８７０〜３００ｎｍ）を第
２図に示す。第２図から明らかなように、７２０ｎｍ及
び３９５ｎｍに吸光ピークが現われている。Plating solution Ni sulfamate 600q/Ni dibromide 50/ρ ゛Boric acid 40q/Kvitz inhibitor 1d, //1 (Nystar 8
06, Uezai Kogyo product name) Replenishment plating solution Sulfamine I! ! The absorbance distribution (870 to 300 nm) of the Ni 900 g/g sulfamate Ni aqueous solution is shown in FIG. As is clear from FIG. 2, absorption peaks appear at 720 nm and 395 nm.
また、吸光光度計の光源として、発光ピークが７００ｎ
ｍのＬＥＤ （ＴＬＲｌｏｌ、東芝製商品名）を使用し
た。第３図にスルファミン酸Ｎｉ濃度と波長７００ｎｍ
における吸光度との関係を示す。第３図から明らかなよ
うに、スルファミン酸Ｎｉ濃度と波長７００ｎｍにおけ
る吸光度とは直線的な関係を示す。Also, as a light source for an absorption photometer, the emission peak is 700n.
m LED (TLRlol, trade name manufactured by Toshiba) was used. Figure 3 shows the concentration of Ni sulfamate and the wavelength of 700 nm.
The relationship between the absorbance and the absorbance is shown. As is clear from FIG. 3, there is a linear relationship between the concentration of Ni sulfamate and the absorbance at a wavelength of 700 nm.
そして、演算制御器１８によりめっき槽１のスルファミ
ン酸Ｎｉ濃度が初期値（６００Ｃ］／１）の９５％以下
の濃度になった場合に、補給ポンプ１１を駆動させて補
給槽１０内のＮｉめつき液が予備槽５に補給されるよう
にプログラムしてめっきを行なった。第４図に経過時間
とスルファミン酸Ｎｉ′ａ度との関係を示す。第４図か
ら明らかなように、めっき液中のスルファミン酸Ｎｉ濃
度を一定の幅で維持管理できることが確認された。Then, when the Ni sulfamate concentration in the plating tank 1 becomes 95% or less of the initial value (600C]/1) by the arithmetic controller 18, the replenishment pump 11 is driven to remove the Ni in the replenishment tank 10. Plating was carried out by programming the plating solution to be supplied to the preliminary tank 5. FIG. 4 shows the relationship between elapsed time and sulfamic acid Ni'a degree. As is clear from FIG. 4, it was confirmed that the concentration of Ni sulfamate in the plating solution could be maintained within a constant range.
［発明の効果］
以上詳述したように本発明の情報記録ディスり用スタン
バの製造装置によれば、めっき液中のＮｉｓ度を容易に
維持することができ、作業能率を低下させることなく信
号特性等の劣化しない情報記録ディスク用スタンパを連
続的に製造でき、その工業的価値は極めて大である。[Effects of the Invention] As detailed above, according to the apparatus for manufacturing an information recording disk standber of the present invention, the Nis level in the plating solution can be easily maintained, and the signal strength can be increased without reducing work efficiency. Stampers for information recording disks whose characteristics do not deteriorate can be manufactured continuously, and their industrial value is extremely large.
第１図は本発明の実施例における情報記録ディスク用ス
タンパの製造装置の構成図、第２図はスルファミン酸Ｎ
ｉ水溶液の吸光度分布図、第３図はスルファミン酸Ｎｉ
８濃度と７００ｎｍにお（ブる吸光度との関係を示す特
性図、第４図は本発明の実施例における情報記録ディス
ク用スタンパの製造装置を使用した場合のめっき液中の
スルファミン酸Ｎｉ濃度の経時変化を示す特性図である
。
１・・・めっき槽、２・・・Ｎｉめっき液、３・・・カ
ソード、４・・・アノード、５・・・予備槽、６・・・
循環ポンプ、７・・・熱交換器、８・・・供給配管、９
・・・オーバーフロー配管、１０・・・補給槽、１１・
・・補給ポンプ、１２・・・補給配管、１３・・・測定
用ポンプ、１４・・・測定用配管、１５・・・吸光光度
計、１６・・・戻り配管、１７・・・Ａ／Ｄ変換器、１
８・・・演算制御器、１９・・・印字装置。FIG. 1 is a block diagram of an apparatus for manufacturing a stamper for information recording disks according to an embodiment of the present invention, and FIG.
i Absorbance distribution diagram of aqueous solution, Figure 3 is Ni sulfamate
Figure 4 shows the relationship between Ni sulfamate concentration and absorbance at 700 nm. It is a characteristic diagram showing changes over time. 1... Plating tank, 2... Ni plating solution, 3... Cathode, 4... Anode, 5... Preliminary tank, 6...
Circulation pump, 7... Heat exchanger, 8... Supply piping, 9
...overflow piping, 10...replenishment tank, 11.
... Replenishment pump, 12 ... Replenishment pipe, 13 ... Measurement pump, 14 ... Measurement pipe, 15 ... Absorption photometer, 16 ... Return pipe, 17 ... A/D converter, 1
8... Arithmetic controller, 19... Printing device.
Claims (1)
濃度を検出する吸光光度計と、該吸光光度計に前記めつ
き槽中のＮｉめつき液を所定量供給する手段と、前記め
つき槽にＮｉめつき液を補給する手段と、前記吸光光度
計の検出信号に応じて前記Ｎｉめつき液補給手段の駆動
信号を出力する演算制御器とを具備したことを特徴とす
る情報記録ディスク用スタンパの製造装置。A plating tank containing Ni plating solution and Ni plating solution
an absorption photometer for detecting the concentration; a means for supplying a predetermined amount of Ni plating solution in the plating tank to the absorption photometer; a means for replenishing the Ni plating solution to the plating tank; 1. An apparatus for manufacturing a stamper for an information recording disk, comprising: an arithmetic controller that outputs a drive signal for the Ni plating liquid replenishing means in accordance with a detection signal of the nickel plating liquid replenishing means.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22728186A JPS6383300A (en) | 1986-09-26 | 1986-09-26 | Device for producing stamper for information recording disk |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22728186A JPS6383300A (en) | 1986-09-26 | 1986-09-26 | Device for producing stamper for information recording disk |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6383300A true JPS6383300A (en) | 1988-04-13 |
Family
ID=16858356
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22728186A Pending JPS6383300A (en) | 1986-09-26 | 1986-09-26 | Device for producing stamper for information recording disk |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6383300A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01177719A (en) * | 1988-01-08 | 1989-07-14 | Yokogawa Electric Corp | Frequency standard device |
| JP2001234382A (en) * | 2000-02-16 | 2001-08-31 | Memory Tec Kk | Method and device for electrocasting nickel |
| JP2009079247A (en) * | 2007-09-26 | 2009-04-16 | C Uyemura & Co Ltd | Electroplating method |
| CN102912410A (en) * | 2012-11-12 | 2013-02-06 | 江苏矽研半导体科技有限公司 | Liquid stopping device applied to electroplating equipment |
-
1986
- 1986-09-26 JP JP22728186A patent/JPS6383300A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01177719A (en) * | 1988-01-08 | 1989-07-14 | Yokogawa Electric Corp | Frequency standard device |
| JP2001234382A (en) * | 2000-02-16 | 2001-08-31 | Memory Tec Kk | Method and device for electrocasting nickel |
| JP2009079247A (en) * | 2007-09-26 | 2009-04-16 | C Uyemura & Co Ltd | Electroplating method |
| CN102912410A (en) * | 2012-11-12 | 2013-02-06 | 江苏矽研半导体科技有限公司 | Liquid stopping device applied to electroplating equipment |
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