JPS6382943U - - Google Patents

Info

Publication number
JPS6382943U
JPS6382943U JP17661386U JP17661386U JPS6382943U JP S6382943 U JPS6382943 U JP S6382943U JP 17661386 U JP17661386 U JP 17661386U JP 17661386 U JP17661386 U JP 17661386U JP S6382943 U JPS6382943 U JP S6382943U
Authority
JP
Japan
Prior art keywords
sample
vacuum
sample holder
atmosphere
electron beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17661386U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP17661386U priority Critical patent/JPS6382943U/ja
Publication of JPS6382943U publication Critical patent/JPS6382943U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本案の一実施例を示す試料ホルダの断
面図、第2図は平面図、第3図は本案の別な実施
例を示す試料ホルダの断面図である。 1……外枠、2……内板、3……試料、6……
真空吸着路、8,9……基準面、14……ばね。
FIG. 1 is a cross-sectional view of a sample holder showing one embodiment of the present invention, FIG. 2 is a plan view, and FIG. 3 is a cross-sectional view of a sample holder showing another embodiment of the present invention. 1...outer frame, 2...inner plate, 3...sample, 6...
Vacuum suction path, 8, 9...Reference surface, 14...Spring.

Claims (1)

【実用新案登録請求の範囲】 1 真空内と大気間を移動して描画試料を保持す
る試料ホルダにおいて、該試料ホルダ部材の一部
に、大気中において真空源を接続することにより
試料を真空吸着するよう構成し、かつメカニカル
な試料固定機能を持たせた事を特徴とする電子線
描画装置の試料ホルダ。 2 請求の範囲第1項において、試料の真空吸着
面の一部に弾性体からなる試料のメカニカルな固
定機能を備えた事を特徴とする電子線描画装置の
試料ホルダ。
[Claims for Utility Model Registration] 1. In a sample holder that moves between a vacuum and the atmosphere to hold a drawn sample, a vacuum source is connected to a part of the sample holder member in the atmosphere so that the sample can be vacuum-adsorbed. A sample holder for an electron beam lithography system, characterized by being configured to do so and having a mechanical sample fixing function. 2. The sample holder for an electron beam lithography apparatus according to claim 1, characterized in that a part of the vacuum suction surface of the sample is provided with a mechanical fixing function for the sample made of an elastic body.
JP17661386U 1986-11-19 1986-11-19 Pending JPS6382943U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17661386U JPS6382943U (en) 1986-11-19 1986-11-19

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17661386U JPS6382943U (en) 1986-11-19 1986-11-19

Publications (1)

Publication Number Publication Date
JPS6382943U true JPS6382943U (en) 1988-05-31

Family

ID=31117024

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17661386U Pending JPS6382943U (en) 1986-11-19 1986-11-19

Country Status (1)

Country Link
JP (1) JPS6382943U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2013039080A1 (en) * 2011-09-16 2015-03-26 住友重機械工業株式会社 Board manufacturing equipment

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2013039080A1 (en) * 2011-09-16 2015-03-26 住友重機械工業株式会社 Board manufacturing equipment

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