JPS6382216U - - Google Patents

Info

Publication number
JPS6382216U
JPS6382216U JP1986177948U JP17794886U JPS6382216U JP S6382216 U JPS6382216 U JP S6382216U JP 1986177948 U JP1986177948 U JP 1986177948U JP 17794886 U JP17794886 U JP 17794886U JP S6382216 U JPS6382216 U JP S6382216U
Authority
JP
Japan
Prior art keywords
quadrangular pyramidal
pyramidal prism
optical axis
intensity
light source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1986177948U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1986177948U priority Critical patent/JPS6382216U/ja
Publication of JPS6382216U publication Critical patent/JPS6382216U/ja
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案の原理を示す図、第2図は本考
案の一実施例を示す構成図、第3図は本考案の一
実施例による加工光学系を示す構成図、第4図は
従来例の原理を示す図、第5図は第4図の四角錐
形プリズムとビームの強度とを夫々光軸方向から
みた図である。 主要部分の符号の説明、1……ガウスビーム、
2……凸レンズ、3……四角錐形プリズム。
Fig. 1 is a diagram showing the principle of the invention, Fig. 2 is a block diagram showing an embodiment of the invention, Fig. 3 is a block diagram showing a processing optical system according to an embodiment of the invention, and Fig. 4 is FIG. 5, which is a diagram showing the principle of the conventional example, is a diagram of the quadrangular pyramidal prism and the beam intensity of FIG. 4 as viewed from the optical axis direction. Explanation of symbols of main parts, 1...Gaussian beam,
2... Convex lens, 3... Square pyramidal prism.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] レーザ光源からのレーザ光の光軸と四角錐形プ
リズムの光軸とが一致するように配置されて、前
記四角錐形プリズムから被加工物上に強度が均一
のビームを照射する強度均一化加工光学系であつ
て、前記レーザ光源と前記四角錐形プリズムとの
間にその光軸が一致するように配置されたレンズ
を設け、前記レンズにより前記四角錐形プリズム
への前記レーザ光の入射光束径を変化させるよう
にしたことを特徴とする強度均一化加工光学系。
Intensity uniformization processing in which the optical axis of the laser beam from the laser light source is arranged so that the optical axis of the quadrangular pyramidal prism coincides with the optical axis of the quadrangular pyramidal prism, and a beam with uniform intensity is irradiated onto the workpiece from the quadrangular pyramidal prism. The optical system includes a lens disposed between the laser light source and the quadrangular pyramidal prism so that their optical axes coincide with each other, and the lens directs the incident light beam of the laser beam to the quadrangular pyramidal prism. An intensity uniform processing optical system characterized by changing the diameter.
JP1986177948U 1986-11-19 1986-11-19 Pending JPS6382216U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1986177948U JPS6382216U (en) 1986-11-19 1986-11-19

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1986177948U JPS6382216U (en) 1986-11-19 1986-11-19

Publications (1)

Publication Number Publication Date
JPS6382216U true JPS6382216U (en) 1988-05-30

Family

ID=31119625

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1986177948U Pending JPS6382216U (en) 1986-11-19 1986-11-19

Country Status (1)

Country Link
JP (1) JPS6382216U (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009251381A (en) * 2008-04-08 2009-10-29 Mitsubishi Electric Corp Laser irradiation device
JP2010051999A (en) * 2008-08-27 2010-03-11 Toshiba Corp Laser irradiation apparatus
JP2013254025A (en) * 2012-06-05 2013-12-19 Mitsubishi Electric Corp Laser irradiating apparatus

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009251381A (en) * 2008-04-08 2009-10-29 Mitsubishi Electric Corp Laser irradiation device
JP2010051999A (en) * 2008-08-27 2010-03-11 Toshiba Corp Laser irradiation apparatus
JP2013254025A (en) * 2012-06-05 2013-12-19 Mitsubishi Electric Corp Laser irradiating apparatus

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